JPH0343420A - Heat-resistant resin composition - Google Patents

Heat-resistant resin composition

Info

Publication number
JPH0343420A
JPH0343420A JP17725089A JP17725089A JPH0343420A JP H0343420 A JPH0343420 A JP H0343420A JP 17725089 A JP17725089 A JP 17725089A JP 17725089 A JP17725089 A JP 17725089A JP H0343420 A JPH0343420 A JP H0343420A
Authority
JP
Japan
Prior art keywords
formula
bisimide
aminophenol
heat
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17725089A
Other languages
Japanese (ja)
Inventor
Hirobumi Kawada
博文 河田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP17725089A priority Critical patent/JPH0343420A/en
Publication of JPH0343420A publication Critical patent/JPH0343420A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To obtain the title polyimide-based composition suitable for laminate, having excellent heat resistance, water-vapor resistance, solubility and shelf stability by subjecting an N,N'-bisimide compound of unsaturated dicarboxylic acid, aminophenol and a monocyclic aromatic diamine to addition reaction. CONSTITUTION:(A) An N,N'-bisimide compound of unsaturated dicarboxylic acid (e.g. maleic acid N,N'-4,4'-diphenylmethanebisimide) shown by formula I (R<1> is >=2C bifunctional group; R<2> is bifunctional group containing double bond between carbon and carbon), (B) an aminophenol (e.g. o-aminophenol) shown by formula II (R<3> is H, halogen or alkyl) and (C) a monocyclic aromatic diamine (e.g. o-phenylenediamine) shown by formula III (R<4> is H or alkyl) are subjected to addition reaction to give the aimed composition. Preferably 1mol component A is blended with 0.1-1.0mol components B+C.

Description

【発明の詳細な説明】 [発明の目的〕 (産業上の利用分野) 本発明は、耐熱性、耐湿性、溶解性、保存安定性に優れ
たポリイミド系の耐熱性樹脂組成物に間する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention provides a polyimide-based heat-resistant resin composition that has excellent heat resistance, moisture resistance, solubility, and storage stability.

(従来の技術) 電子機器の発達に伴い、それらに使用されるプリント配
線板に要求される特性はますます厳しくなっており、特
に耐熱性が要求される場合にはポリイミド樹脂が使用さ
れるようになってきた。
(Prior art) With the development of electronic devices, the characteristics required of the printed wiring boards used in them are becoming increasingly strict, and polyimide resins are increasingly being used especially when heat resistance is required. It has become.

これらに使用されるポリイミド樹脂として、不飽和ジカ
ルボン酸のN、N′−ビスイミドとジアミノジフェニル
メタンとの反応物や、不飽和ジカルボン酸のN、N’−
ビスイミドとアミンフェノールとの反応物の付加反応型
のものがあり、それらは種々の欠点をもっている。
Polyimide resins used for these include reaction products of unsaturated dicarboxylic acid N,N'-bisimide and diaminodiphenylmethane, and unsaturated dicarboxylic acid N,N'-bisimide and diaminodiphenylmethane.
There are addition reaction types of bisimide and amine phenol reactants, which have various drawbacks.

(発明が解決しようとする課題) 即ち、前者の不飽和ジカルボン酸のN、N′−ビスイミ
ドとジアミノジフェニルメタンとの反応物は、耐熱性が
極めて優れているものの、溶剤への溶解性が悪く、N−
メチルピロリドンなどの高沸点の極性溶剤にしか溶解せ
ず、また得られるワニスし保存安定性が悪く製造上の欠
点があった。
(Problems to be Solved by the Invention) That is, the former reaction product of N,N'-bisimide of unsaturated dicarboxylic acid and diaminodiphenylmethane has extremely excellent heat resistance, but has poor solubility in solvents. N-
It is only soluble in high-boiling polar solvents such as methylpyrrolidone, and the resulting varnish has poor storage stability, which is a manufacturing drawback.

さらに高沸点溶剤はプリプレグ中に残存しやすく、積層
板にした場合、耐熱性等の特性を低下させる欠点がある
。 一方、後者の不飽和ジカルボン酸のN  N′−ビ
スイミドとアミノフェノールとの反応物は、溶解性が極
めて良好であり、低沸点溶剤が利用できワニスの保存安
定性が良い反面、アミノフェノール骨格中のOH基が親
水性であるため耐湿性が悪い欠点がある。 このように
、特性上及び製造上にIJ優れた積層板用耐熱性樹脂組
成物を得ることは困難であった。
Furthermore, high boiling point solvents tend to remain in the prepreg, which has the disadvantage of deteriorating properties such as heat resistance when made into a laminate. On the other hand, the latter reaction product of N N'-bisimide of an unsaturated dicarboxylic acid and aminophenol has extremely good solubility, allows the use of low boiling point solvents, and has good storage stability of the varnish. Since the OH group is hydrophilic, it has the disadvantage of poor moisture resistance. As described above, it has been difficult to obtain a heat-resistant resin composition for laminates with excellent IJ in terms of properties and production.

本発明は、上記の事情に鑑みてなされたもので、耐熱性
、耐湿性、溶解性、保存安定性に優れた、または積層板
の特性上及び製造上に優れた、積層板用の耐熱性樹脂組
成物を提供しようとするものである。
The present invention has been made in view of the above circumstances, and provides a heat resistant laminate with excellent heat resistance, moisture resistance, solubility, and storage stability, or with excellent properties and manufacturing properties of the laminate. The present invention aims to provide a resin composition.

[発明の構成] (課題を解決するための手段) 本発明者は、上記の目的を達成しようと鋭意研究を重ね
た結果、後述の組成物を用いることによって、上記目的
を達成できることを見いだし、本発明を完成したもので
ある。
[Structure of the Invention] (Means for Solving the Problem) As a result of extensive research to achieve the above object, the present inventor discovered that the above object could be achieved by using the composition described below, This completes the present invention.

すなわち、本発明は、 (A>−数式 (但し、式中R1は少なくとも2個の炭素原子を有する
2価の基を、R2は炭素原子間の二重結合を含む2価の
基を表す)で示される不飽和ジカルボン酸のN、N′−
ビスイミド化合物、(B)−数式 (但し、式中R′は水素原子、ハロゲン原子又はアルキ
ル基を表す)で示されるアミノフェノール、(C)−数
式 (但し、式中R4は水素原子又はアルキル基で、4個の
R4は同−又は異なる基を表す)で示される単環芳香族
ジアミン を付加反応させてなることを特徴とする耐熱性樹脂組成
物である。
That is, the present invention has the following formula: (A>- formula (wherein R1 represents a divalent group having at least two carbon atoms, and R2 represents a divalent group containing a double bond between carbon atoms) N, N'- of the unsaturated dicarboxylic acid represented by
Bisimide compound, aminophenol represented by the formula (B) (wherein R' represents a hydrogen atom, a halogen atom, or an alkyl group), (C)-a formula (wherein R4 represents a hydrogen atom or an alkyl group) This is a heat-resistant resin composition characterized by being formed by addition-reacting monocyclic aromatic diamines represented by the following four R4 groups (representing the same or different groups).

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明に用いる(A)不飽和ジカルボン酸のNN′−ビ
スイミド化合物としては次の一般式を有するものを使用
する。
As the NN'-bisimide compound of unsaturated dicarboxylic acid (A) used in the present invention, one having the following general formula is used.

但し、式中R1は少なくとも2(Illの炭素原子を宥
する2僅の基を、R2は炭素原子間の二重結合を含む2
価の基を表す、 すなわち、R1は、直鎖状もしくは分
岐状のアルキレン基、炭素原子5〜6個の環をもつシク
ロアルキレン基、酸素、窒素又は硫黄原子のうち少なく
とも 1個を含む2価の複素環式基、フェニレン基又は
2価多環式芳香族基をはじめ、−NHCO−−NR’ 
−−3i R’ R’ −−3o2−などにより結合さ
れた複数個の芳香族基や脂環式基などを挙げることがで
きる。 そしてR’ 、R’ 、R’は炭素数1〜4の
アルキル基、フェニル基を表す、 また、R2すなわち
炭素原子間の二重結合を含む2価の基としては、例えば
マレイン酸残基、シトラコン酸残基、テトラヒドロフタ
ル酸残基などが挙げられ、これらは単独又は2種以上混
合して使用することができる。 これらの具体的な化合
物として例えばマレインGN、N’−4,4′−ジフェ
ニルメタンビスイミド、マレイン酸N、 N′−4,4
’−ジフェニルエーテルビスイミド、マレインIN、N
’−バラフェニレンビスイミド、マレイン酸N、N’−
ベンジジンビスイミド、マレイン酸N、N’−メタキシ
レンビスイミド、マレイン酸N、 N’−1,5−ナフ
タレンビスイミド、マレインMN、N’−4,4′−ジ
フェニルスルホンビスイミド、マレイン酸N。
However, in the formula, R1 is at least 2 (2 groups that accommodate the carbon atoms of Ill), and R2 is 2 groups containing a double bond between carbon atoms.
In other words, R1 represents a linear or branched alkylene group, a cycloalkylene group having a ring of 5 to 6 carbon atoms, or a divalent group containing at least one of oxygen, nitrogen, or sulfur atoms. including heterocyclic groups, phenylene groups or divalent polycyclic aromatic groups, -NHCO--NR'
Examples include a plurality of aromatic groups and alicyclic groups bonded by --3i R'R' --3o2- and the like. R', R', and R' represent an alkyl group having 1 to 4 carbon atoms or a phenyl group. R2, that is, a divalent group containing a double bond between carbon atoms, includes, for example, a maleic acid residue, Examples include citraconic acid residues and tetrahydrophthalic acid residues, and these can be used alone or in combination of two or more. Specific examples of these compounds include maleic GN, N'-4,4'-diphenylmethane bisimide, maleic acid N, N'-4,4
'-diphenyl ether bisimide, malein IN, N
'-Varaphenylene bisimide, maleic acid N, N'-
Benzidine bisimide, maleic acid N, N'-metaxylene bisimide, maleic acid N, N'-1,5-naphthalene bisimide, maleic MN, N'-4,4'-diphenylsulfone bisimide, maleic acid N .

N’−2,2′−4,4’−ジメチレンシクロヘキサン
ビスイミド、マレイン酸N、 N’−4,4’−ジシク
ロヘキシルメタンビスイミド、マレイン酸N、N’ −
4,4′−ジフェニルシクロヘキサンビスイミド、マレ
イン9N、N′−4,4′−ジフェニルフェニルアミン
ビスイミド、マレイン酸N、 N′−4,4’−ジフェ
ニルジフェニルシランビスイミド、マレイン酸N。
N'-2,2'-4,4'-dimethylenecyclohexane bisimide, N maleic acid, N'-4,4'-dicyclohexylmethane bisimide, N maleic acid, N'-
4,4'-diphenylcyclohexane bisimide, maleic 9N, N'-4,4'-diphenylphenylamine bisimide, maleic acid N, N'-4,4'-diphenyldiphenylsilane bisimide, maleic acid N.

N’−4,4′−ジフェニル硫黄ビスイミド、マレイン
酸N、 N’−2,2’−(4,4′−ジフェニル)プ
ロパンビスイミド、マレイン酸N、N′−メタフェニレ
ンビスイミド、マレイン酸N、N’−3,3’−(N。
N'-4,4'-diphenyl sulfur bisimide, maleic acid N, N'-2,2'-(4,4'-diphenyl)propane bisimide, maleic acid N, N'-metaphenylene bisimide, maleic acid N, N'-3,3'-(N.

N′−メタフェニレンビスベンツアミド)ビスイミドな
どが挙げられる。
Examples include N'-metaphenylenebisbenzamide)bisimide.

本発明に用いる(B)アミンフェノールとしては次の一
般式を有するものが使用できる。
As the amine phenol (B) used in the present invention, those having the following general formula can be used.

但し、式中R3は水素原子、ハロゲン原子又はアルキル
基を表す、 具体的な化合物として例えば、0−アミノ
フェノール、訃アミノフェノール、ρ−アミノフェノー
ル、2−アミノ−4−クロロフェノール、2−アミノ−
4−メチルフェノール等が挙げられ、これらは単独又は
2種以上混合して使用するごとができる。
However, in the formula, R3 represents a hydrogen atom, a halogen atom, or an alkyl group. Examples of specific compounds include 0-aminophenol, aminophenol, ρ-aminophenol, 2-amino-4-chlorophenol, and 2-aminophenol. −
Examples include 4-methylphenol, which can be used alone or in combination of two or more.

本発明に用いる(C)単環芳香族ジアミンとしては、次
の一般式を有するものが使用できる。
As the monocyclic aromatic diamine (C) used in the present invention, those having the following general formula can be used.

但し、式中R4は水素原子又はアルキル基で4個のR4
が同−又は異なる基を表すもので、具体的な化合物とし
ては、O−フェニレンジアミン、訃フェニレンジアミン
、p−フェニレンジアミン、訃トルイレンジアミン、4
,6−シメチルー訃フェニレンジアミン、2.5−ジメ
チル−p−フェニレンジアミン、2,4−ジアミノメシ
チレン、4−クロロ−〇−フェニレンジアミン、4−ク
ロロ−訃フェニレンジアミン、2−クロロ−p−フェニ
レンジアミン、2,5−ジクロロ−p−フェニレンジア
ミン、2.6−ジクロロ−〇−フェニレンジアミン、5
−クロロ−2−メチル−p−フェニレンジアミン等が挙
げられ、これらは単独もしくは2種以上混合して使用す
ることができる。
However, in the formula, R4 is a hydrogen atom or an alkyl group, and 4 R4
represent the same or different groups, and specific compounds include O-phenylenediamine, phenylenediamine, p-phenylenediamine, tolylenediamine, 4
, 6-dimethyl-phenylenediamine, 2,5-dimethyl-p-phenylenediamine, 2,4-diaminomesitylene, 4-chloro-〇-phenylenediamine, 4-chloro-phenylenediamine, 2-chloro-p-phenylene Diamine, 2,5-dichloro-p-phenylenediamine, 2,6-dichloro-〇-phenylenediamine, 5
-chloro-2-methyl-p-phenylenediamine, etc., and these can be used alone or in a mixture of two or more.

本発明の耐熱性樹脂組成物は、前述した(A)不飽和ジ
カルボン酸のN、N′−ビスイミド化合物、(B)アミ
ノフェノール、(C)単環芳香族ジアミンを無溶剤らし
くは不活性溶剤中で加熱付加反応させて得ることができ
る。 これら各成分の配合割合は、(A)不飽和ジカル
ボン酸のN、N′−ビスイミド化合物1モルに対し、(
B)アミンフェノールと(C)単環芳香族ジアミンとの
合計量[(B) +(C)]を0.1〜1,0モル配合
することが望ましい、 その割合が0,1モル未満では
反応が進まず耐熱性、靭性等の特性が低下し、また、1
.0モルを超えるど未反応アミンが残留し、耐熱性が著
しく低下し好ましくない、 各成分の配合順序や反応温
度、溶剤等は適宜選択することができ、特に限定される
ものではない。
The heat-resistant resin composition of the present invention contains the above-mentioned (A) N,N'-bisimide compound of unsaturated dicarboxylic acid, (B) aminophenol, and (C) monocyclic aromatic diamine in an inert solvent. It can be obtained by carrying out a heating addition reaction in a medium. The blending ratio of each of these components is (A) per mole of N,N'-bisimide compound of unsaturated dicarboxylic acid (
It is desirable to blend the total amount of B) amine phenol and (C) monocyclic aromatic diamine [(B) + (C)] from 0.1 to 1.0 mol. If the ratio is less than 0.1 mol, The reaction does not proceed and properties such as heat resistance and toughness deteriorate, and
.. If the amount exceeds 0 mole, unreacted amine will remain and the heat resistance will be significantly reduced, which is undesirable.The order of blending each component, reaction temperature, solvent, etc. can be selected as appropriate and are not particularly limited.

次に本発明の耐熱性樹脂組成物の代表的な製造方法につ
いて説明する。
Next, a typical manufacturing method of the heat-resistant resin composition of the present invention will be explained.

反応容器内に、不飽和ジカルボン酸のN、N′−ビスイ
ミド化合物とアミノフェノールと単環芳香族ジアミンと
を、所定の割合で仕込み10(1〜200℃に加熱して
内容物を溶融し、所定の粘度、キュアタイムまで付加反
応を進める。 この反応物をアセトン、メチルエチルケ
トン、ジオキサン、テトラヒドロフラン、メチルセロソ
ルブ等の溶剤に溶解して積層板用として好適な特性を有
する樹脂組成物を製造することができる。 また、最初
から溶剤を使用することらできる。 例えば反応容器中
に不飽和ジカルボン酸のN、N’−ビスイミド化合物と
アミノフェノールと単環芳香族ジアミンとをジオキサン
と共に仕込み、ジオキサンを還流させながら所定の粘度
、キュアタイムまで付加反応を進行させ、その後さらに
溶剤を加えて冷却して積層板用の樹脂組成物を製造する
ことができる。
Into a reaction vessel, an unsaturated dicarboxylic acid N,N'-bisimide compound, aminophenol, and monocyclic aromatic diamine were charged in a predetermined ratio (heated to 1 to 200°C to melt the contents, The addition reaction is allowed to proceed until a predetermined viscosity and cure time are reached. This reaction product is dissolved in a solvent such as acetone, methyl ethyl ketone, dioxane, tetrahydrofuran, methyl cellosolve, etc. to produce a resin composition having properties suitable for use in laminates. Alternatively, a solvent can be used from the beginning. For example, an unsaturated dicarboxylic acid N,N'-bisimide compound, aminophenol, and monocyclic aromatic diamine are charged together with dioxane, and the dioxane is refluxed. However, the addition reaction is allowed to proceed until a predetermined viscosity and cure time are reached, and then a solvent is further added and cooled to produce a resin composition for a laminate.

こうして製造された樹脂組成物は、本発明の目的に反し
ない限度において、必要に応じ種々の添加剤や充填剤を
添加配合することができる。 例えば硬化速度の調整の
ためのイミダゾールなど触媒、接着性付与のためのカッ
プリング剤、難燃性付与のための難燃剤、無機質充填剤
等を適宜加えることができる。
The resin composition thus produced may contain various additives and fillers as necessary, within limits that do not contradict the purpose of the present invention. For example, a catalyst such as imidazole for adjusting the curing rate, a coupling agent for imparting adhesion, a flame retardant for imparting flame retardancy, an inorganic filler, etc. can be added as appropriate.

(実施例) 次に本発明を実施例によって説明する。(Example) Next, the present invention will be explained by examples.

実施例 l 攪拌機と温度計を備えたフラスコに、マレイン酸N、 
N′−4,4”−ジフェニルメタンビスイミド358g
と2−アミノ −4−クロロフェノール71g と訃フ
ェニレンジアミン540およびジオキサン480gを仕
込み、攪拌しながら加熱する。100℃を超えると次第
に溶解をはじめ褐色の液体となる。 この液体を120
°Cに昇温して 1時間攪拌して耐熱性樹脂組成物を得
た。 この組成物に更にジオキサンを加えて撹拌し−様
なワニスを製造した。
Example l In a flask equipped with a stirrer and a thermometer, maleic acid N,
N'-4,4''-diphenylmethane bisimide 358g
71 g of 2-amino-4-chlorophenol, 540 g of phenylenediamine, and 480 g of dioxane were charged and heated while stirring. When the temperature exceeds 100°C, it gradually begins to dissolve and becomes a brown liquid. 120% of this liquid
The temperature was raised to °C and stirred for 1 hour to obtain a heat-resistant resin composition. Dioxane was further added to this composition to produce a stirred-like varnish.

実施例 2 攪拌機と温度計を備えたフラスコに、マレイン酸N、 
N’−4,4′−ジフェニルメタンビスイミド358g
と0−アミノフェノール54gと訃トルイレンジアミン
61gおよびジオキサン470gを仕込み、実施例1と
同様にして耐熱性樹脂組成物およびワニスを製造した。
Example 2 In a flask equipped with a stirrer and a thermometer, maleic acid N,
N'-4,4'-diphenylmethane bisimide 358g
A heat-resistant resin composition and a varnish were prepared in the same manner as in Example 1 by charging 54 g of 0-aminophenol, 61 g of toluylene diamine, and 470 g of dioxane.

実施例 3 攪拌機と温度計を備えたフラスコに、マレイン酸N、 
N’−4,4’−ジフェニルメタンビスイミド358g
と訃アミノフェノール54gとp−キシリレンジアミン
eaogおよびジオキサン480gを仕込み、実施例1
と同様にして耐熱性樹脂組成物およびワニスを製造した
Example 3 In a flask equipped with a stirrer and a thermometer, maleic acid N,
N'-4,4'-diphenylmethane bisimide 358g
Example 1
A heat-resistant resin composition and varnish were produced in the same manner as above.

比較例 1 マレイン酸N、 N”−4,4′−ジフェニルメタンビ
スイミド358qと、4.4′−ジアミノジフェニルメ
タン198gおよびN−メチルピロリドン550gをフ
ラスコに仕込み、実施例1と同様にして耐熱性樹脂組成
物を得た。 この組成物に更にN−メチルピロリドンを
加えて攪拌して−様なワニスを製造した。
Comparative Example 1 358q of maleic acid N, N''-4,4'-diphenylmethane bisimide, 198 g of 4,4'-diaminodiphenylmethane, and 550 g of N-methylpyrrolidone were charged into a flask, and a heat-resistant resin was prepared in the same manner as in Example 1. A composition was obtained. N-methylpyrrolidone was further added to this composition and stirred to produce a --like varnish.

比較例 2 マレイン9N、N′−4,4′−ジフェニルメタンビス
イミド3589と、訃アミノフェノール109gおよび
ジオキサン460gをフラスコに仕込み、実施例1と同
様にして耐熱性樹脂組成物およびワニスを製造した。
Comparative Example 2 A heat-resistant resin composition and varnish were prepared in the same manner as in Example 1 by charging 3589 g of malein 9N, N'-4,4'-diphenylmethane bisimide, 109 g of aminophenol, and 460 g of dioxane.

実施例1〜3及び比較例1〜2で製造したワニスを用い
て、厚さ180μ慴のガラスクロスに塗布・含浸し、1
50°Cの温度で乾燥して樹脂分43重量%のプリプレ
グを得た。 このプリプレグ8枚と厚さ18μ僧の銅箔
2枚を用いて、180°Cの温度。
Using the varnishes produced in Examples 1 to 3 and Comparative Examples 1 to 2, a glass cloth with a thickness of 180 μm was coated and impregnated.
It was dried at a temperature of 50°C to obtain a prepreg with a resin content of 43% by weight. Using 8 sheets of this prepreg and 2 sheets of 18μ thick copper foil, the temperature was 180°C.

40 kgf/cn2の圧力で120分間加熱加圧一体
に底形して、板厚1.6Illの耐熱性銅張積層板を製
造した。 得られた積層板について、銅箔引剥し強さ、
吸水率、ガラス転位点、曲げ強さ及びはんだ耐熱性、並
びにワニスについて可使時間及び溶解性を試験したので
、その結果を第1表に示した。 本発明のワニスは溶解
性、可使時間に優れており、また積層板の特性において
ら良好であり、本発明の効果が確認された。
A heat-resistant copper-clad laminate having a thickness of 1.6 Ill was produced by heat-pressing and integrally bottom-shaping it at a pressure of 40 kgf/cn2 for 120 minutes. Regarding the obtained laminate, the copper foil peel strength,
The water absorption rate, glass transition point, bending strength, soldering heat resistance, and pot life and solubility of the varnish were tested, and the results are shown in Table 1. The varnish of the present invention has excellent solubility and pot life, and also has good properties for laminated plates, confirming the effects of the present invention.

[発明の効果] 以上の説明および第1表からも明らかなように、本発明
の耐熱性樹脂組成物は、耐熱性、耐湿性に優れ、また溶
解性、保存安定性が良好であり、積層板の特性上及び製
造上も優れたもので積層板用として好適なものである。
[Effects of the Invention] As is clear from the above explanation and Table 1, the heat-resistant resin composition of the present invention has excellent heat resistance and moisture resistance, and also has good solubility and storage stability. It has excellent properties and manufacturing properties and is suitable for use in laminates.

Claims (1)

【特許請求の範囲】 1(A)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^1は少なくとも2個の炭素原子を有す
る2価の基を、R^2は炭素原子間の二重結合を含む2
価の基を表す)で示 される不飽和ジカルボン酸のN,N′−ビスイミド化合
物、 (B)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^3は水素原子、ハロゲン原子又はアル
キル基を表す)で示されるアミ ノフェノール、 (C)一般式 ▲数式、化学式、表等があります▼ (但し、式中R^4は水素原子又はアルキル基で、4個
のR^4は同一又は異なる基を表す)で示される単環芳
香族ジアミン を付加反応させてなることを特徴とする耐熱性樹脂組成
物。
[Claims] 1 (A) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, in the formula, R^1 represents a divalent group having at least 2 carbon atoms, and R^2 represents a carbon 2 containing double bonds between atoms
N,N'-bisimide compound of unsaturated dicarboxylic acid represented by (representing a valent group), (B) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (However, in the formula, R^3 is a hydrogen atom, a halogen (C) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, in the formula, R^4 is a hydrogen atom or an alkyl group, and four R^4 are the same or different groups) A heat-resistant resin composition characterized in that it is formed by addition-reacting a monocyclic aromatic diamine represented by the following:
JP17725089A 1989-07-11 1989-07-11 Heat-resistant resin composition Pending JPH0343420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17725089A JPH0343420A (en) 1989-07-11 1989-07-11 Heat-resistant resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17725089A JPH0343420A (en) 1989-07-11 1989-07-11 Heat-resistant resin composition

Publications (1)

Publication Number Publication Date
JPH0343420A true JPH0343420A (en) 1991-02-25

Family

ID=16027788

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17725089A Pending JPH0343420A (en) 1989-07-11 1989-07-11 Heat-resistant resin composition

Country Status (1)

Country Link
JP (1) JPH0343420A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015074686A (en) * 2013-10-07 2015-04-20 日立化成株式会社 Thermosetting resin composition, and prepreg, laminated board, and print circuit board using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015074686A (en) * 2013-10-07 2015-04-20 日立化成株式会社 Thermosetting resin composition, and prepreg, laminated board, and print circuit board using the same

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