JPH02221131A - Mold for molding optical element - Google Patents
Mold for molding optical elementInfo
- Publication number
- JPH02221131A JPH02221131A JP4116889A JP4116889A JPH02221131A JP H02221131 A JPH02221131 A JP H02221131A JP 4116889 A JP4116889 A JP 4116889A JP 4116889 A JP4116889 A JP 4116889A JP H02221131 A JPH02221131 A JP H02221131A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- base material
- molding
- film
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000465 moulding Methods 0.000 title claims abstract description 32
- 230000003287 optical effect Effects 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- 238000000576 coating method Methods 0.000 claims abstract description 26
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract 2
- 239000011651 chromium Substances 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- 230000008646 thermal stress Effects 0.000 abstract description 11
- 229910019590 Cr-N Inorganic materials 0.000 abstract description 9
- 229910019588 Cr—N Inorganic materials 0.000 abstract description 9
- 238000000034 method Methods 0.000 description 7
- 239000005304 optical glass Substances 0.000 description 5
- 229910007744 Zr—N Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/03—Press-mould materials defined by material properties or parameters, e.g. relative CTE of mould parts
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光学素子成形用型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
一般に、例えば特公昭５５−１１６２４号公報等に開示
されるように、光学ガラスを加熱軟化させ、これを加圧
成形することにより所望形状の光学素子を得る方法が知
られている。この方法によれば、従来の研磨加工方法で
は加工が困難な形状、例えば非球面形状等を存する高品
質な光学ガラス素子を成形することが可能となり、また
製造コストを著しく低くすることが可能となる。ところ
が、この方法では、光学ガラスを加熱軟化させて加圧成
形するために、光学ガラスと成形用型との離型性に問題
があった。離型性が悪いと、高温状態下で加熱プレスさ
れたガラスが成形用型に付着してしまい、成形用型の再
使用が不可能となって、型寿命が短（なってしまう。Generally, as disclosed in, for example, Japanese Patent Publication No. 55-11624, a method is known in which an optical element of a desired shape is obtained by heating and softening optical glass and press-molding it. According to this method, it is possible to mold high-quality optical glass elements with shapes that are difficult to process using conventional polishing methods, such as aspherical shapes, and it is also possible to significantly reduce manufacturing costs. Become. However, in this method, since the optical glass is heated and softened and then pressure molded, there is a problem in the releasability between the optical glass and the mold. If the mold releasability is poor, the glass heated and pressed under high temperature conditions will adhere to the mold, making it impossible to reuse the mold and shortening the life of the mold.
そこで、従来、特開昭６２−８７４２３号公報に開示さ
れるように、例えば金属からなる型基材の表面にクロム
（Ｃｒ）および窒素（Ｎ）を主成分とする化合物の被膜
を形成し、離型性を良好にした成形用型が用いられてい
た。Therefore, as disclosed in Japanese Patent Application Laid-Open No. 62-87423, for example, a film of a compound containing chromium (Cr) and nitrogen (N) as main components is formed on the surface of a mold base material made of metal. A mold with good mold releasability was used.
しかし、上記のようにＣｒおよびＮを主成分とする化合
物の被膜を形成した成形用型では、ガラスの成形および
熱間加工の各工程における温度サイクルによって、型基
材と被膜との線膨張係数の差から次式のような熱応力が
発生する。However, in a mold formed with a coating of a compound mainly composed of Cr and N as described above, the coefficient of linear expansion between the mold base material and the coating is Thermal stress as shown in the following equation is generated due to the difference in .
σい−Ｅｆ（α、−α、）（Ｔ−Ｔａ）σＬｋ：熱応力
Ｅ、：被膜のヤング率
αｆ ：被膜の線膨張係数
α、：型基材の線膨張係数
Ｔ ：成形時の温度
Ｔｏ ：常温
したがって、被膜の線膨張係数α、と型基材の線膨張係
数α、との差が大きい程、熱応力も大きくなる。従来の
成形用型では、型基材と被膜との線膨張係数の差が大き
いため、両者の間に大きな熱応力が生じ、型基材から被
膜が剥離したり、被膜にクラックが発生するとう問題が
あった。σ-Ef(α,-α,)(T-Ta)σLk: Thermal stress E,: Young's modulus of the coating αf: Coefficient of linear expansion α of the coating,: Coefficient of linear expansion T of the mold base material: Temperature during molding To: room temperature Therefore, the larger the difference between the linear expansion coefficient α of the film and the linear expansion coefficient α of the mold base material, the larger the thermal stress. In conventional molds, there is a large difference in linear expansion coefficient between the mold base material and the coating, which creates a large thermal stress between the two, which can cause the coating to peel off from the mold base material or cause cracks in the coating. There was a problem.
本発明は、かかる従来の問題点に鑑みてなされたもので
、型基材とＣｒ−ＮＪＩ被膜との間に生じる熱応力が小
さく、膜剥離等を生じることがない、長寿命の光学素子
成形用型を提供することを目的とする。The present invention has been made in view of such conventional problems, and has a long lifespan for molding optical elements in which the thermal stress generated between the mold base material and the Cr-NJI coating is small, and film peeling does not occur. The purpose is to provide a template for use.
上記目的を達成するために、本発明は、ＣｒおよびＮを
主成分とする化合物の被膜により少なくとも成形面の最
表層を形成してなる光学素子成形用型において、型基材
と前記被膜との間に、線膨張係数が型基材を形成する材
料（例えばＳｉＣ等）と前記被膜を形成する材料との間
に値を有する材料からなる膜を少な（とも−層形成した
中間層を設けた。In order to achieve the above object, the present invention provides a mold for molding an optical element in which at least the outermost layer of the molding surface is formed by a film of a compound containing Cr and N as main components. In between, an intermediate layer formed of a material having a coefficient of linear expansion between that of the material forming the mold base material (for example, SiC, etc.) and the material forming the coating film is provided. .
ここで、例えばＳｉＣの線膨張係数は３．９×１０−’
（”Ｃ−’）であり、Ｃｒ−Ｎ系被膜の線膨張係数は
７．５Ｘ１０−”（’Ｃ伺）である、したがって、例え
ばＳｉＣにより型基材を形成した場合では、型基材とＣ
ｒ−Ｎ系被膜との間の線膨張係数を有する材料として、
Ｔａ、 ＡＮＮ、 ＺｒＮ等が適当である。 これら材
料の各線膨張係数は、Ｔａが６．６Ｘ １０−’ＣＣ−
’）、八ｌＮが５．Ｏｘ １０−’（’ｃ−’）、Ｚｒ
Ｎが７．２４ｘｔＯ−’（’Ｃ”’）である。Here, for example, the linear expansion coefficient of SiC is 3.9×10-'
("C-'), and the linear expansion coefficient of the Cr-N coating is 7.5X10-"('C-'). Therefore, for example, when the mold base material is formed of SiC, the mold base material C
As a material that has a coefficient of linear expansion between that of the r-N based coating,
Ta, ANN, ZrN, etc. are suitable. The coefficient of linear expansion of each of these materials is Ta is 6.6X 10-'CC-
'), 8lN is 5. Ox 10-'('c-'), Zr
N is 7.24xtO-'('C''').
上記構成の光学素子成形用型においては、型基材とＣｒ
−Ｎ系被膜との間に特定の中間層を設けたので、型基材
と中間層との間および中間層とＣｒ−Ｎ系被膜との間に
生じる各熱応力は、型基材とＣｒ−Ｎ系被膜との間で生
じている熱応力より小さくなる。In the mold for molding an optical element having the above configuration, the mold base material and Cr
- Since a specific intermediate layer is provided between the mold base material and the intermediate layer, and between the intermediate layer and the Cr-N base film, the thermal stress generated between the mold base material and the Cr-N base film is reduced. -It is smaller than the thermal stress occurring between the N-based coating and the N-based coating.
したがって、全体として成形用型に生じる熱応力が緩和
される。この結果、光学ガラスの成形および熱間加圧の
各工程における温度サイクルにおいて十分な耐久性を有
することになり、成形用型の型寿命が長くなる。Therefore, the thermal stress generated in the mold as a whole is alleviated. As a result, the mold has sufficient durability in the temperature cycles in each process of optical glass molding and hot pressing, and the mold life of the mold is extended.
（第１実施例）
第１図に示すように、ＳｉＣからなる型基材ｌを所瞥形
状に加工し、光学的要求の生じる成形面１ａに鏡面研磨
を施した。そして、その成形面１ａに、スパッタ法によ
りＴａ単体膜２を中間層として約０．２５μｍの厚さで
形成した。また、このＴａ単体１１１２の上に、同じく
スパッタ法によりＣｒ−Ｎ系被１Ｉ１３を最表層として
約０．３μ密の厚さで形成し、光学素子成形用型を得た
。(First Example) As shown in FIG. 1, a mold base material 1 made of SiC was processed into a desired shape, and the molding surface 1a where optical requirements were generated was mirror-polished. Then, on the molding surface 1a, a single Ta film 2 was formed as an intermediate layer with a thickness of about 0.25 μm by sputtering. Further, on this Ta element 1112, a Cr--N based coating 1I13 was formed as the outermost layer to a thickness of about 0.3 μm by the same sputtering method to obtain a mold for molding an optical element.
本実施例の光学素子成形用型を用いて光学素子の成形を
５０００ショット行ったところ、成形面には全く変化が
なく、膜剥離は生しなかった。また、光学的要求等の初
期性能も維持していた。すなわち、本実施例の光学素子
成形用型は、中間層として設けたＴａ単体膜２によって
型基ｕｌとＣｒ−Ｎ系被膜３との間に生ずる熱応力を緩
和することができ、膜剥離等がなく、型寿命が長くなる
。When an optical element was molded for 5000 shots using the mold for molding an optical element of this example, there was no change at all on the molding surface and no film peeling occurred. In addition, initial performance such as optical requirements was maintained. That is, in the mold for molding an optical element of this example, the thermal stress generated between the mold base ul and the Cr-N coating 3 can be alleviated by the Ta single film 2 provided as an intermediate layer, and film peeling, etc. can be alleviated. There is no damage, and the mold life is extended.
なお、本実施例におけるＴａ単体膜２の代わりに、ＡＩ
Ｎ系膜またはＺｒ−Ｎ系膜を用いても同様の効果を得る
ことができる。Note that in place of the Ta single film 2 in this example, AI
Similar effects can be obtained by using an N-based film or a Zr-N-based film.
（第２実施例）
第２図に示すように、ＳｉＣからなる型基材１を所望形
状に加工し、光学的要求の生じる成形面１ａに鏡面研磨
を施した。そして、その成形面１ａに、イオンブレーテ
ィング法によりｉ−Ｎ系１１１４を約０．１μ噸の厚さ
で形成した後、そのＡＮＮ系ｙ、４上にＴａ単体膜２を
約０．１μ−の厚さで形成し、さらにＴａ単体膜２上に
Ｚｒ−Ｎ系膜５を約０．１μ霞の厚さで形成し、三層構
造の中間層とした。(Second Example) As shown in FIG. 2, a mold base material 1 made of SiC was processed into a desired shape, and the molding surface 1a where optical requirements were generated was mirror-polished. Then, after forming an i-N system 1114 with a thickness of about 0.1 μm on the molding surface 1a by the ion-blating method, a Ta single film 2 is formed on the ANN system y, 4 with a thickness of about 0.1 μm. Further, a Zr--N film 5 was formed on the Ta single film 2 to a thickness of about 0.1 μm to form an intermediate layer of a three-layer structure.
また、Ｚｎ−Ｎ系膜５上にＣｒ−Ｎ系被膜３を最表層と
して約０．２５μ−の厚さで形成し、光学素子成形用型
を得た。Further, a Cr--N based coating 3 was formed as the outermost layer on the Zn--N based film 5 to a thickness of about 0.25 .mu.m to obtain a mold for molding an optical element.
本実施例の光学素子成形用型を用いて光学素子の成形を
５０００ショット行ったところ、前記第１実施例と同様
にして、成形面には全く変化がなく、膜剥離は生じなか
った。また、光学的要求等の初期性能も維持していた。When an optical element was molded for 5,000 shots using the mold for molding an optical element of this example, there was no change in the molding surface at all, and no film peeling occurred, as in the first example. In addition, initial performance such as optical requirements was maintained.
すなわち、本実施例の光学素子成形用型は、Ａρ−Ｎ系
膜、４．Ｔａ単体膜２およびＺｒ−Ｎ系膜５を型基材１
に近い線膨張係数を有するものから順に積層した中間層
によって、型基材ｌとＣｒ−Ｎ系被１１！３との間に生
ずる熱応力を緩和することができ、膜剥離等がなく、型
寿命が長くなる。That is, the mold for molding an optical element of this example includes an Aρ-N film, 4. A Ta single film 2 and a Zr-N film 5 are placed on a mold base material 1.
The intermediate layers laminated in the order of linear expansion coefficient close to Longer lifespan.
なお、本実施例における中間層の代わりに、例えばＡＩ
Ｎ系膜、Ｔａ単体膜、Ｚｒ−Ｎ系膜の中から２種類選択
し、２層構造の中間層を設けても同様の効果を得ること
ができる。Note that instead of the intermediate layer in this embodiment, for example, AI
The same effect can be obtained by selecting two types from among the N-based film, Ta single film, and Zr-N-based film and providing an intermediate layer with a two-layer structure.
〔発明の効果］
以上のように、本発明の光学素子成形用型によれば、型
基材とＣｒ−Ｎ系被膜との間に、線膨張係数が両者の間
の値を有する材料からなる膜を中間層として設けている
ので、型基本とＣｒ−系被膜との間に生じる熱応力を緩
和でき、膜剥離等を生じることなく、型寿命が長くなる
。[Effects of the Invention] As described above, according to the mold for molding an optical element of the present invention, there is a material between the mold base material and the Cr-N coating made of a material having a linear expansion coefficient between the two. Since the film is provided as an intermediate layer, thermal stress generated between the mold base and the Cr-based coating can be alleviated, and the mold life can be extended without causing film peeling or the like.
第１図は本発明の光学素子成形用型の第１実施例を示す
縦断面図、第２図は本発明の光学素子成形用型の第２実
施例を示す縦断面図である。
１・・・型基材
１ａ・・・成形面
２・・・Ｔａ単体膜
３・・・Ｃｒ−Ｎ系被膜
４・・・ＡＮ−Ｎ系膜
５・・・Ｚｒ−Ｎ系膜
特許出願人 オリンパス光学工業株式会社第１図
□□−一
■・・・型基材
ｌａ・・・成形面
２・・・Ｔａ単体膜
３−Ｃｒ−Ｎ系膜１．膜
第２図
□□ニ」FIG. 1 is a longitudinal sectional view showing a first embodiment of the mold for molding an optical element of the present invention, and FIG. 2 is a longitudinal sectional view showing a second embodiment of the mold for molding an optical element of the present invention. 1... Mold base material 1a... Molding surface 2... Ta single film 3... Cr-N based coating 4... AN-N based film 5... Zr-N based film Patent applicant Olympus Optical Industry Co., Ltd. Figure 1 □□-1■...Mold base material la...Molding surface 2...Ta single film 3-Cr-N film 1. Membrane Figure 2 □□N
Claims (2)
より少なくとも成形面の最表層を形成してなる光学素子
成形用型において、型基材と前記被膜との間に、線膨張
係数が型基材を形成する材料と前記被膜を形成する材料
との間の値を有する材料からなる膜を少なくとも一層成
形した中間層を設けたことを特徴とする光学素子成形用
型。(1) In an optical element mold in which at least the outermost layer of the molding surface is formed by a coating of a compound containing chromium and nitrogen as main components, there is a linear expansion coefficient between the mold base material and the coating. 1. A mold for molding an optical element, comprising: an intermediate layer formed by molding at least one layer of a film made of a material having a value between the material forming the material and the material forming the film.
とを特徴とする請求項１記載の光学素子成形用型。(2) The mold for molding an optical element according to claim 1, wherein the material forming the mold base material is silicon carbide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4116889A JPH02221131A (en) | 1989-02-21 | 1989-02-21 | Mold for molding optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4116889A JPH02221131A (en) | 1989-02-21 | 1989-02-21 | Mold for molding optical element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02221131A true JPH02221131A (en) | 1990-09-04 |
Family
ID=12600896
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4116889A Pending JPH02221131A (en) | 1989-02-21 | 1989-02-21 | Mold for molding optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02221131A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03237024A (en) * | 1990-02-13 | 1991-10-22 | Asahi Optical Co Ltd | Optical element forming mold and its regenerating method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62132734A (en) * | 1985-12-05 | 1987-06-16 | Olympus Optical Co Ltd | Mold for forming optical element |
| JPS63260831A (en) * | 1987-04-20 | 1988-10-27 | Hitachi Ltd | Forming mold for optical element |
| JPH01100031A (en) * | 1987-10-14 | 1989-04-18 | Hitachi Ltd | Mold for forming optical element |
-
1989
- 1989-02-21 JP JP4116889A patent/JPH02221131A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62132734A (en) * | 1985-12-05 | 1987-06-16 | Olympus Optical Co Ltd | Mold for forming optical element |
| JPS63260831A (en) * | 1987-04-20 | 1988-10-27 | Hitachi Ltd | Forming mold for optical element |
| JPH01100031A (en) * | 1987-10-14 | 1989-04-18 | Hitachi Ltd | Mold for forming optical element |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03237024A (en) * | 1990-02-13 | 1991-10-22 | Asahi Optical Co Ltd | Optical element forming mold and its regenerating method |
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