JPH02209799A - Manufacture of multilayered circuit board - Google Patents

Manufacture of multilayered circuit board

Info

Publication number
JPH02209799A
JPH02209799A JP3041789A JP3041789A JPH02209799A JP H02209799 A JPH02209799 A JP H02209799A JP 3041789 A JP3041789 A JP 3041789A JP 3041789 A JP3041789 A JP 3041789A JP H02209799 A JPH02209799 A JP H02209799A
Authority
JP
Japan
Prior art keywords
board
vias
substrate
boards
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3041789A
Other languages
Japanese (ja)
Inventor
Yoshihiko Imanaka
佳彦 今中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3041789A priority Critical patent/JPH02209799A/en
Publication of JPH02209799A publication Critical patent/JPH02209799A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To decrease signal leakage and enable high-speed transmission by fitting up via holes in a board with copper paste, printing copper paste on the board for laminating a plurality of boards, aligning vias in the upper board with electron circuit patterns on the lower board, and pressurizing and baking said boards for integration. CONSTITUTION:Via holes made in a photosensitive glass board 1 are filled up with Cu paste to make vias 2 and the conductor lines 3 of electron circuits are formed thereon. After the many vias 2 are made in the photosensitive glass board 1, a spacer patterns 4 are printed on the periphery thereof by screen printing. Boards are accurately matched to connect the vias in the upper board to the conductor lines on the lower substrate and the boards 1, 1', and 1'' are laminated through air layers with the spacer patterns 4 are conductor lines 3 acting as spacers. An integrated circuit having the air layers between the substrates is formed by laminating said substrates while registering, mounting a weight on the top, and baking the laminated substrates in an N2 gas current.

Description

【発明の詳細な説明】 〔概要〕 感光性ガラス基板を用いた多層回路基板の製造方法に関
し、 信号の漏洩が少なく、また高速伝送を実現することを目
的とし、 感光性ガラス基板のバイア形成位置に孔開けを行う工程
と、該基板に形成したバイアに銅ペーストを充填する工
程と、該基板上に銅ペーストを印刷して微細な電子回路
パターンとスペーサパターンを形成する工程と、複数の
基板を積層し、上側基板のバイアと下側基板の電子回路
パターンをそれぞれ位置合わせし、相互に回路接続を行
う工程と、複数個からなる該基板を加圧しながら焼成し
、一体化する工程と、を含んで多層回路基板の製造方法
を構成する。
[Detailed Description of the Invention] [Summary] Regarding a method for manufacturing a multilayer circuit board using a photosensitive glass substrate, the present invention aims to reduce signal leakage and realize high-speed transmission. filling the vias formed in the substrate with copper paste; printing the copper paste on the substrate to form fine electronic circuit patterns and spacer patterns; a step of laminating the substrates, aligning the vias of the upper substrate and the electronic circuit pattern of the lower substrate, and connecting the circuits to each other; a step of baking the plurality of substrates under pressure and integrating them; A method for manufacturing a multilayer circuit board includes:

〔産業上の利用分野〕[Industrial application field]

本発明は感光性ガラス基板を用いた多層回路基板の製造
方法に関する。
The present invention relates to a method for manufacturing a multilayer circuit board using a photosensitive glass substrate.

大量の情報を迅速に処理する必要から情報処理技術の進
歩は著しく、情報処理装置の主要部を構成している半導
体装置は単位素子の小形化による大容量化が進み、また
これを搭載する基板は多層化が進んでいる。
Due to the need to quickly process large amounts of information, information processing technology has advanced significantly, and the semiconductor devices that make up the main part of information processing equipment have become larger in capacity due to the miniaturization of unit elements, and the substrates on which they are mounted have become larger. is becoming increasingly multilayered.

すなわち、従来のICやLSIよりも一段と大容量化し
たVLS Iが実用化されており、また半導体チップに
対するパンシベーション技術の進歩により、半導体チッ
プを直接にセラミック回路基板へ搭載することが可能と
なった。
In other words, VLSI, which has a much larger capacity than conventional ICs and LSIs, has been put into practical use, and advances in pansivation technology for semiconductor chips have made it possible to directly mount semiconductor chips on ceramic circuit boards. Ta.

そして、多数の半導体チップをセラミック回路基板に密
に搭載して使用するが、−個の半導体チップの端子数が
多いことから回路基板上にパターン形成する配線の数は
膨大となり、必然的に多層配線構造が必要となる。
A large number of semiconductor chips are densely mounted on a ceramic circuit board for use, but since the number of terminals on each semiconductor chip is large, the number of wiring patterns to be formed on the circuit board becomes enormous, and it is necessary to use multiple layers. A wiring structure is required.

また、情報伝送の多重化によって信号を搬送する繰り返
し周波数は増加しており、そのために基板材料や配線パ
ターンの形成材料が自ずと制限されている。
Furthermore, due to multiplexing of information transmission, the repetition frequency for carrying signals is increasing, which naturally limits the materials for forming substrates and wiring patterns.

すなわち、多層配線基板を構成する単位基板の厚さは2
0〜30μmに過ぎず、そのために伝送周波数の増加と
共に層間の漏話(Cross−talk)の抑制が必要
となる。
In other words, the thickness of the unit board constituting the multilayer wiring board is 2
It is only 0 to 30 μm, and therefore, it is necessary to increase the transmission frequency and suppress cross-talk between layers.

また、伝送周波数の増加と共に信号の遅延時間をなるべ
く少なく抑えることが必要条件となる。
Furthermore, as the transmission frequency increases, it becomes a necessary condition to suppress the signal delay time as much as possible.

[従来の技術] 眉間の漏話を抑制するには多層配線基板を構成する基板
の誘電率εを下げる必要がある。
[Prior Art] In order to suppress crosstalk between the eyebrows, it is necessary to lower the dielectric constant ε of the substrate constituting the multilayer wiring board.

すなわち、基板を挾んで形成される配線パターン間の静
電容量Cは、 C=εA/4πd    ・・・ (1)こ\で、  
Aは対向するパターンの面積、dは基板の厚さ、 で与えられるが、dの厚さは小形化やスルーホールでの
電圧降下量を少なくするため厚くできないことから、線
間容量を減らすには誘電率εの少ない基板を用いる必要
がある。
In other words, the capacitance C between the wiring patterns formed by sandwiching the substrate is: C=εA/4πd... (1) Here,
A is the area of the opposing patterns, and d is the thickness of the substrate.The thickness of d cannot be increased to reduce the size and voltage drop in through holes, so it is necessary to reduce the line capacitance. It is necessary to use a substrate with a small dielectric constant ε.

また、信号の遅延時間τは、 τ’:3.33  ε””(n see/m)  ・・
・ (2)で与えられ、この式からも信号の高速伝送の
ためには誘電率εの小さな基板を用いる必要がある。
Also, the signal delay time τ is τ': 3.33 ε"" (n see/m)...
- It is given by (2), and from this equation, it is necessary to use a substrate with a small dielectric constant ε for high-speed signal transmission.

また、当然のことながら高速伝送を行うためには配線パ
ターンを低抵抗な金属材料で形成し、電圧降下量をなる
ぺ(少なくする必要がある。
Naturally, in order to perform high-speed transmission, it is necessary to form the wiring pattern from a low-resistance metal material to minimize the amount of voltage drop.

これらのことから従来は誘電率が小さく、また焼成温度
が低い硼硅酸ガラスからなるガラスセラミックスを用い
て基板を作り、配線パターンは金(Au)や銅(Cu)
など導電率の高い材料を用いて多層配線基板が作られて
いた。
For these reasons, conventionally, substrates were made using glass ceramics made of borosilicate glass, which has a small dielectric constant and a low firing temperature, and wiring patterns were made using gold (Au) or copper (Cu).
Multilayer wiring boards were made using materials with high conductivity, such as

こ−で、硼硅酸ガラスからなるガラスセラミックスは誘
電率εが約5とセラミックスの中では最も低く、優れた
材料ではあるが、信号の高速伝送を行うには不十分であ
り、より誘電率εの小さな基板の実用化が必要とされて
いた。
Glass-ceramics made of borosilicate glass have a dielectric constant ε of approximately 5, the lowest among ceramics, and are excellent materials, but are insufficient for high-speed signal transmission, and have a higher dielectric constant. There was a need to put a substrate with a small ε into practical use.

また、ガラスセラミックスなどからなる回路基板に多数
の半導体集積回路を搭載して使用するには必然的に多層
構造が必要であり、各層の電子回路を多数のバイアで回
路接続するが、このバイア形成のためのバイアホールを
如何にして作るかり問題である。
In addition, mounting a large number of semiconductor integrated circuits on a circuit board made of glass ceramics or the like inevitably requires a multilayer structure, and the electronic circuits in each layer are connected with a large number of vias. The problem is how to make via holes for this purpose.

例えば、レーザ照射によってセラミック基板に孔開けす
ることが行われているが、多数の孔を順々に開けてゆ(
場合は多くの時間を要し、量産には向いていない。
For example, holes are made in ceramic substrates by laser irradiation, but many holes are opened one after another.
It takes a lot of time and is not suitable for mass production.

また、レーザ加工によって基板に孔開けを行う場合は裏
面側に所謂る“パリ”を生じるため基板の研磨が必要と
なる。
Further, when drilling holes in a substrate by laser processing, polishing of the substrate is required because so-called "paris" are generated on the back side.

このようなことから量産に適した孔開は方法を実用化す
ることが必要である。
For this reason, it is necessary to put into practical use a hole-drilling method suitable for mass production.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

以上記したように従来は硼硅酸ガラスセラミックス基板
からなり、AuやCuなど高導電率金属材料を配線パタ
ーン形成材料とした多層回路基板を用いて高速伝送が行
われている。
As described above, high-speed transmission has conventionally been performed using a multilayer circuit board made of a borosilicate glass ceramic substrate and using a highly conductive metal material such as Au or Cu as a wiring pattern forming material.

然し、信号伝送周波数が増加するに従って、より低誘電
率の回路基板が必要であり、また半導体集積回路を基板
上に直接に搭載するため多層構造をとる必要があり、こ
の場合、バイア形成のためのバイアホールを如何に容易
に形成するかX問題である。
However, as the signal transmission frequency increases, circuit boards with lower dielectric constants are required, and in order to mount semiconductor integrated circuits directly on the board, it is necessary to use a multilayer structure. The problem is how to easily form a via hole.

〔課題を解決するための手段〕[Means to solve the problem]

上記の課題は感光性ガラス基板のバイア形成位置に孔開
けを行う工程と、この基板に形成したバイアに銅ペース
トを充填する工程と、この基板上に銅ペーストを印刷し
て微細な電子回路パターンとスペーサパターンを形成す
る工程と、複数の基板を積層し、上側基板のバイアと下
側基板の電子回路パターンをそれぞれ位置合わせし、相
互に回路接続を行う工程と、複数個からなるこれら基板
を加圧しながら焼成し、一体化する工程とを用いて形成
した多層回路基板を使用することにより解決することが
できる。
The above challenges involve the process of drilling holes at the via formation positions on the photosensitive glass substrate, the process of filling the vias formed on this substrate with copper paste, and the process of printing the copper paste on this substrate to create a fine electronic circuit pattern. The process of stacking multiple boards, aligning the vias on the upper board and the electronic circuit pattern on the lower board, and connecting the circuits to each other. This problem can be solved by using a multilayer circuit board formed using a process of baking and integrating under pressure.

〔作用] 本発明は感光性ガラス基板を写真蝕刻技術を用いてバイ
アホールを形成することで、多数のバイアホールを一度
に開けること\、スクリーン印刷法によりパターン形成
する際に必然的に生ずるパターンの凸部をそのま\利用
して積層することにより配線パターンの周囲を空気で覆
うようにしたものである。
[Function] The present invention forms via holes on a photosensitive glass substrate using photo-etching technology, thereby making it possible to open a large number of via holes at once, and to eliminate the pattern that inevitably occurs when forming a pattern using a screen printing method. The periphery of the wiring pattern is covered with air by stacking the layers using the convex portions as they are.

このようにすると、配線パターン間の誘電材料の誘電率
はガラスの誘電率に空気の誘電率を加味したものになる
ため、従来よりも減少させることができ、これにより伝
送特性を向上することができる。
In this way, the permittivity of the dielectric material between the wiring patterns is the same as the permittivity of glass plus the permittivity of air, so it can be reduced compared to the conventional method, thereby improving transmission characteristics. can.

次に、感光性ガラス基板については一部の会社からも市
販されており、選択エツチング性の優れているところに
特徴がある。〔例えば品名フォトセラム(Fo toc
eram) + コーニング社〕この理由を説明すると
次のようになる。
Next, photosensitive glass substrates are commercially available from some companies, and are characterized by excellent selective etching properties. [For example, product name: Fotoc
eram) + Corning Inc.] The reason for this can be explained as follows.

感光性ガラスは二酸化硅素(SiO□)、酸化リチウム
(LizO)、酸化カリ(KZO)、アルミナ(ALO
3)を主な成分とし、これに微量の酸化セリウム(Ce
O2)と酸化jffl(AgzO)が含まれている。
Photosensitive glass is silicon dioxide (SiO□), lithium oxide (LizO), potassium oxide (KZO), alumina (ALO).
3) as the main component, and a trace amount of cerium oxide (Ce).
02) and oxidized jffl (AgzO).

フォトセラムの場合はCeO,の含有量は0.02重世
%、また、Ag、Oの含有量は0.006重量%である
In the case of photoceram, the content of CeO is 0.02% by weight, and the content of Ag and O is 0.006% by weight.

ガラスの中ではAg”とCe”は均一に分散しているが
、ガラスの一部に紫外線を照射すると、八g  ”  
+  Ce”  −+   Ag’  十 Ce”  
  −(1)の反応を生じてAgイオンが還元されるが
、このガラスを転移温度と軟化温度の間の温度で加熱す
ると、 n  Ag’   −(Ag)n        −・
・(2)のように還元されたAg粒子は凝集して結晶性
粒子(コロイド)となり、これが結晶核として働き、L
i zO・SiO□の結晶が析出して白濁化する。
Ag" and Ce" are uniformly dispersed in glass, but when a part of the glass is irradiated with ultraviolet light, 8g"
+ Ce" -+ Ag' 10 Ce"
-The reaction (1) occurs and Ag ions are reduced, but when this glass is heated to a temperature between the transition temperature and the softening temperature, nAg' - (Ag)n -.
・As shown in (2), the reduced Ag particles aggregate to form crystalline particles (colloids), which act as crystal nuclei and L
Crystals of zO.SiO□ precipitate and become cloudy.

なお、感光性ガラスの結晶核としてはAg以外に金(A
u)や洞(Cu)なども使われている。
In addition to Ag, gold (A
u) and dong (Cu) are also used.

そして、結晶化したLi2O・SiO□の弗酸(HF)
に対する溶解度は母体ガラスの数10倍も大きいので選
択エツチングができるのである。
Then, hydrofluoric acid (HF) of crystallized Li2O・SiO□
The solubility in glass is several ten times higher than that of the base glass, so selective etching is possible.

〔実施例〕〔Example〕

感光性ガラス基板としては厚さが0.5mmのフォトセ
ラムを用い、搭載するLSIのバイア形成位置に紫外線
の投影露光を行って感光させた。
A photoceram with a thickness of 0.5 mm was used as the photosensitive glass substrate, and the via formation position of the LSI to be mounted was exposed by projection exposure to ultraviolet rays.

こ\で、LSIチップの大きさは1cm角であり、これ
に径200 μmのバイアを縦・横それぞれ20iづつ
形成した。
Here, the size of the LSI chip was 1 cm square, and vias with a diameter of 200 μm were formed in it, 20 i each in length and width.

この基板に600°C,1時間の処理を行って露光部を
LizO−3iOzとする結晶化処理を行った後、5%
の肝で処理することにより多数個のバイアを形成した。
After performing crystallization treatment on this substrate at 600°C for 1 hour to make the exposed area LizO-3iOz, 5%
A large number of vias were formed by treating the liver of the patient.

次に、LSIチップ搭載位置にCuペーストを置き、上
よりゴム製ローラで摺動する処理を行ってバイアの中に
Cuペーストを充填した後、表面に付着しているCuペ
ースとを拭き取り、この上に電子回路パターンとスペー
サパターンとをスクリーン印刷した。
Next, place the Cu paste at the LSI chip mounting position, fill the vias with the Cu paste by sliding it with a rubber roller from above, and then wipe off the Cu paste adhering to the surface. An electronic circuit pattern and a spacer pattern were screen printed on top.

第2図は感光性ガラス基板1に孔開けしたバイアホール
にCuペーストを充填してバイア2を作り、この上に電
子回路の導体線路3を形成した状態を示す断面図である
FIG. 2 is a sectional view showing a state in which a via hole made in a photosensitive glass substrate 1 is filled with Cu paste to form a via 2, and a conductor line 3 of an electronic circuit is formed thereon.

また、第1図(A)は感光性ガラス基板1の上にこのよ
うにして多数のパイ、ア2を形成した後、スペーサパタ
ーン4を周辺部にスクリーン印刷した状態を示している
Moreover, FIG. 1(A) shows a state in which after forming a large number of pi and a 2 in this manner on the photosensitive glass substrate 1, a spacer pattern 4 is screen printed on the periphery.

なお、この基板上には電子回路を構成する導体線路も印
刷されるが、こ−では記載を省略しである。
Note that conductor lines constituting the electronic circuit are also printed on this board, but their description is omitted here.

次に、同図(B)はか−る基板を位置合わせして積層し
た状態を示し、上の基板のバイアは下の基板の導体線路
に接続しており、また各基板l。
Next, Figure (B) shows the state in which the boards are aligned and stacked, the vias of the upper board are connected to the conductor lines of the lower board, and each board l.

1”、1”はそれぞれスペーサパターン4と導体線路3
をスペーサとして空気層を介して積層されている。
1" and 1" are spacer pattern 4 and conductor line 3, respectively.
are laminated with an air layer in between as a spacer.

そして、この実施例の場合はか\る基板20枚を位置合
わせしながら積層し、上に50gのおもりを載せ、N2
気流中で1000’Cで5時間焼成することにより各基
板間に空気層が介在している集積回路が完成した。
In the case of this example, 20 substrates were stacked while being aligned, a 50g weight was placed on top, and N2
By baking in an air stream at 1000'C for 5 hours, an integrated circuit with an air layer interposed between each substrate was completed.

このようにして形成した集積回路について伝播遅延時間
を測定したところ5.3ns/mの値を示し、従来の8
 ns/mに較べ、大幅に減少させることができた。
When the propagation delay time of the integrated circuit thus formed was measured, it showed a value of 5.3 ns/m, compared to the conventional 8
Compared to ns/m, it was possible to reduce it significantly.

なお、この値から逆算して見掛けの誘電率の値は2.5
であった。
In addition, by back-calculating from this value, the value of the apparent permittivity is 2.5
Met.

〔発明の効果〕〔Effect of the invention〕

感光性ガラス基板を用いることでバイアの形成を容易に
し、また基板間に空気層を介して積層する本発明の実施
により、作業性が向上すると共に信号の高速伝送が可能
となる。
The use of photosensitive glass substrates facilitates the formation of vias, and the implementation of the present invention in which the substrates are laminated with an air layer interposed therebetween improves work efficiency and enables high-speed signal transmission.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る多層回路基板の構成図、第2図は
本発明を適用した感光性ガラス基板の断面図、 である。 図において、 1.1’、1”は感光性ガラス基板、 2はバイア、       3は導体線路、4はスペー
サパターン、 である。
FIG. 1 is a block diagram of a multilayer circuit board according to the present invention, and FIG. 2 is a sectional view of a photosensitive glass substrate to which the present invention is applied. In the figure, 1.1', 1'' is a photosensitive glass substrate, 2 is a via, 3 is a conductor line, and 4 is a spacer pattern.

Claims (1)

【特許請求の範囲】[Claims]  感光性ガラス基板のバイア形成位置に孔開けを行う工
程と、該基板に形成したバイアに銅ペーストを充填する
工程と、該基板上に銅ペーストを印刷して微細な電子回
路パターンとスペーサパターンを形成する工程と、複数
の基板を積層し、上側基板のバイアと下側基板の電子回
路パターンをそれぞれ位置合わせし、相互に回路接続を
行う工程と、複数個からなる該基板を加圧しながら焼成
し、一体化する工程と、を含むことを特徴とする多層回
路基板の製造方法。
A process of drilling a hole at a via formation position on a photosensitive glass substrate, a process of filling copper paste into the via formed on the substrate, and a process of printing a copper paste on the substrate to form a fine electronic circuit pattern and a spacer pattern. 1) stacking multiple substrates, aligning the vias on the upper substrate and the electronic circuit pattern on the lower substrate, and connecting the circuits to each other; and 2) firing the multiple substrates while pressurizing them. A method for manufacturing a multilayer circuit board, comprising the steps of: and integrating.
JP3041789A 1989-02-09 1989-02-09 Manufacture of multilayered circuit board Pending JPH02209799A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3041789A JPH02209799A (en) 1989-02-09 1989-02-09 Manufacture of multilayered circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3041789A JPH02209799A (en) 1989-02-09 1989-02-09 Manufacture of multilayered circuit board

Publications (1)

Publication Number Publication Date
JPH02209799A true JPH02209799A (en) 1990-08-21

Family

ID=12303375

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3041789A Pending JPH02209799A (en) 1989-02-09 1989-02-09 Manufacture of multilayered circuit board

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JP (1) JPH02209799A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002174744A (en) * 2000-12-06 2002-06-21 Toppan Printing Co Ltd Board for mounting optical parts, package substrate and printed circuit board
JP2002174742A (en) * 2000-12-06 2002-06-21 Toppan Printing Co Ltd Board for mounting optical part, package substrate and printed circuit board
JP2003204152A (en) * 1999-05-27 2003-07-18 Hoya Corp Manufacturing method for double-sided wiring board

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003204152A (en) * 1999-05-27 2003-07-18 Hoya Corp Manufacturing method for double-sided wiring board
JP2002174744A (en) * 2000-12-06 2002-06-21 Toppan Printing Co Ltd Board for mounting optical parts, package substrate and printed circuit board
JP2002174742A (en) * 2000-12-06 2002-06-21 Toppan Printing Co Ltd Board for mounting optical part, package substrate and printed circuit board
JP4538949B2 (en) * 2000-12-06 2010-09-08 凸版印刷株式会社 Substrate manufacturing method for mounting optical components
JP4590722B2 (en) * 2000-12-06 2010-12-01 凸版印刷株式会社 Substrate manufacturing method for mounting optical components

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