JPH02209441A - Cu alloy stock for lead frame of semiconductor device having excellent effect of suppressing wear in stamping die - Google Patents

Cu alloy stock for lead frame of semiconductor device having excellent effect of suppressing wear in stamping die

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Publication number
JPH02209441A
JPH02209441A JP3190989A JP3190989A JPH02209441A JP H02209441 A JPH02209441 A JP H02209441A JP 3190989 A JP3190989 A JP 3190989A JP 3190989 A JP3190989 A JP 3190989A JP H02209441 A JPH02209441 A JP H02209441A
Authority
JP
Japan
Prior art keywords
die
lead frame
alloy
stamping
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3190989A
Other languages
Japanese (ja)
Other versions
JP2501636B2 (en
Inventor
Rensei Futatsuka
二塚 錬成
Shunichi Chiba
俊一 千葉
Teruo Ueno
上野 輝生
Seiji Noguchi
誠司 野口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Shindoh Co Ltd
Original Assignee
Mitsubishi Shindoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindoh Co Ltd filed Critical Mitsubishi Shindoh Co Ltd
Priority to JP1031909A priority Critical patent/JP2501636B2/en
Publication of JPH02209441A publication Critical patent/JPH02209441A/en
Application granted granted Critical
Publication of JP2501636B2 publication Critical patent/JP2501636B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To improve the effect of suppressing wear in a die and to prolong its service life by adding specified amounts of Mg, Ca, Zn, etc., to a conventionally used Cu alloy as the stock for a die used at the time of stamping a lead frame in a semiconductor device. CONSTITUTION:As the stock for a die used at the time of manufacturing a lead frame used in the manufacturing of various semiconductor devices from its sheet material or wire material by stamping, a Cu alloy of which one or more kinds among, by weight, 0.001 to 0.05% Mg, 0.001 to 0.01 % Ca and 0.001 to 1% Zn are further added to a Cu alloy contg. 0.05 to 0.25% Fe, 0.015 to 0.07% P and 0.0005 to 0.01% Pb is used. The effect of suppressing wear in the die is made excellent, so that the die having prolonged service life can be obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、各種の半導体装置の製造において、板材や
条材などの素材からリードフレームをスタンピング(打
抜き加工)する際に用いられる金型の摩耗がきわめて少
なく、すなわちスタンピング金型の摩耗抑制効果にすぐ
れ、したがってスタンピング金型の使用寿命のより一層
の延命化を可能にする半導体装置のリードフレーム用C
u合金素材に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a mold used for stamping (punching) lead frames from materials such as plates and strips in the manufacture of various semiconductor devices. C for lead frames of semiconductor devices, which has extremely little wear, that is, has an excellent effect of suppressing the wear of stamping dies, and therefore makes it possible to further extend the service life of stamping dies.
This relates to u-alloy materials.

〔従来の技術〕[Conventional technology]

先に、同一出願人は、特開昭60−176258号とし
て、重量%で(以下%は重量%を示す)、F a:o、
05〜0.26%、  P :0.015〜0.07%
、Pb:0.001〜0,01%、 を含有し、残りがCuと不可避不純物からなる組成を有
するCu合金で構成してなる素材を、スタンピング金型
の摩耗抑制効果にすぐれた半導体装置のリードフレーム
用Cu合金素材として提案した。
Previously, the same applicant published JP-A-60-176258 in % by weight (hereinafter % indicates % by weight), F a:o,
05-0.26%, P: 0.015-0.07%
, Pb: 0.001 to 0.01%, and the remainder is Cu and unavoidable impurities. Proposed as a Cu alloy material for lead frames.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記の従来Cu合金素材は、半導体装置のリードフレー
ムに要求される強度、繰り返し曲げ性、および耐熱性を
具備するものの、スタンピング金型の摩耗抑制効果の点
では未だ十分満足するものでないのが現状である。
Although the above-mentioned conventional Cu alloy materials have the strength, repeated bendability, and heat resistance required for lead frames of semiconductor devices, the current situation is that they are still not fully satisfactory in terms of the wear suppression effect of stamping dies. It is.

〔課題を解決するための手段〕[Means to solve the problem]

そこで、本発明者等は、上述のような観点から、上記の
従来Cu合金素材に着目し、これのスタンピング金型の
摩耗抑制効果を一段と向上せしめるべく研究を行なった
結果、上記従来Cu合金素材に、少量のMg、Ca、お
よびZnのうちの1種または2種以上を含有させると、
半導体装置のリードフレームに要求される強度、繰り返
し曲げ性、および耐熱性を損なうことなく、スタンピン
グ金型の摩耗抑制効果が一段と向上するようになり、ス
タンピング金型の使用寿命の著しい延命化を可能にする
という知見を得たのである。
Therefore, from the above-mentioned viewpoint, the present inventors focused on the above-mentioned conventional Cu alloy material and conducted research to further improve the wear-suppressing effect of the stamping die. When containing a small amount of one or more of Mg, Ca, and Zn,
The wear suppression effect of stamping dies has been further improved without compromising the strength, repeated bendability, and heat resistance required for semiconductor device lead frames, making it possible to significantly extend the service life of stamping dies. We obtained the knowledge to do so.

この発明は、上記知見にもとづいてなされたものであっ
て、 F e:0.o!+−0,25%、    P :0.
O12〜0.07%、Pb:0.0005〜0,01%
、 を含有し、さらに、 Mg:0.001〜0.05%、 Ca:0.001〜
0.01%、Zn:0.001〜1% のうちの1種または2種以上、 を含有し、残りがCuと不可避不純物からなる組成を有
するCu合金で構成してなるスタンピング金型の摩耗抑
制効果にすぐれた半導体装置のリードフレーム用Cu合
金素材に特徴を有するものである。
This invention was made based on the above findings, and includes F e:0. o! +-0.25%, P:0.
O12~0.07%, Pb:0.0005~0.01%
, furthermore, Mg: 0.001~0.05%, Ca: 0.001~
0.01%, Zn: 0.001-1%, one or more of them, and the rest is Cu and unavoidable impurities. This Cu alloy material for lead frames of semiconductor devices is characterized by its excellent suppressive effect.

つぎに、この発明のCu合金素材において、成分組成を
上記の通りに限定した理由を説明する。
Next, the reason why the composition of the Cu alloy material of the present invention is limited as described above will be explained.

(a)  FeおよびP これら両成分には、素地に微細に析出するFe−P化合
物を形成して、Cu合金素材の強度および繰り返し曲げ
性、さらに耐熱性を向上させる作用があるが、その含有
量がFeおよびP成分のいずれかでもF e:0.05
%未満およびP :0.015%未満になると、前記作
用に所望の効果が得られず、一方その含有量がFeおよ
びP成分のいずれかでもF e:o、25%およびP 
: 0.07%を越えると導電性が低下するようになる
ことから、その含有量をそれぞれF e:0.05−0
.25%、P :0.O12〜0.07%と定めた。
(a) Fe and P Both of these components have the effect of forming Fe-P compounds that precipitate finely on the base material and improving the strength, repeated bendability, and heat resistance of the Cu alloy material. Even if the amount is either Fe or P component, Fe: 0.05
% and P: less than 0.015%, the desired effect cannot be obtained in the above action, and on the other hand, even if the content is either Fe or P component, Fe:o, 25% and P
: If it exceeds 0.07%, the conductivity decreases, so the content is reduced to Fe: 0.05-0.
.. 25%, P: 0. It was set as O12-0.07%.

(b)  Pb pb酸成分は、上記のようにCu合金素材からリードフ
レームをスタンピング成形するのに用いられる金型が摩
耗しないように作用する働きがあるが、その含有量が0
.0005%未満では前記作用に所望の効果が得られず
、一方その含有量が0.01%を越えると、結晶粒界お
よび粒内に析出するpb量が多くなって、繰り返し曲げ
性およびめっき性が低下するようになることから、その
含有量を0.0005〜0,01%と定めた。
(b) Pb As mentioned above, the Pb acid component has the function of preventing wear of the mold used for stamping lead frames from Cu alloy materials, but when its content is 0.
.. If the content is less than 0.005%, the desired effect cannot be obtained, while if the content exceeds 0.01%, the amount of Pb precipitated at grain boundaries and inside the grains will increase, resulting in poor repeatability and plating properties. The content was set at 0.0005 to 0.01%.

(c)Mg、Ca、およびZn これらの成分には、特にpb酸成分の共存においてスタ
ンピング金型の摩耗をより一段と抑制して、その使用寿
命を延命化、すなわち金型が所定の摩耗量に達した場合
に施される再使用のための金型研磨までのスタンピング
回数を著しく増大させる作用があるが、その含有量がい
ずれの成分の場合も0.001%未満では前記作用に所
望の効果が得られず、一方その含’h−ffiが、Mg
にあっては0.05%を越えると、溶解鋳造時の溶湯の
粘性が高くなるばかりでなく、酸化も激しくなって鋳塊
欠陥が多発するようになり、またCaにあっては0.0
1%を越えると、添加含有時の酸化消耗が激しく、含有
歩留が著しく低下するようになって経済的でなく、さら
にZnにあっては1%を越えると、導電性の低下が著し
くなることから、その含有量を、それぞれMg+0.0
01〜0.05%、Ca:0.001〜0.01%、Z
 n:0.001〜1%と定めた。
(c) Mg, Ca, and Zn These components, especially in the coexistence of the PB acid component, can further suppress the wear of the stamping mold and extend its service life, i.e., the mold can reach a specified amount of wear. However, if the content of any component is less than 0.001%, the desired effect will not be achieved. is not obtained, and on the other hand, its content 'h-ffi is Mg
If the Ca content exceeds 0.05%, not only will the viscosity of the molten metal during melting and casting become high, but oxidation will also become severe and ingot defects will occur frequently.
If it exceeds 1%, oxidation consumption will be severe when it is added and the content yield will drop significantly, making it uneconomical. Furthermore, in the case of Zn, if it exceeds 1%, the conductivity will drop significantly. Therefore, the content is Mg+0.0, respectively.
01-0.05%, Ca: 0.001-0.01%, Z
n: determined to be 0.001 to 1%.

なお、この発明のCu合金素材において、不可避不純物
として含有する酸素の含有量を50ppI11以下とす
るのが望ましく、一方Ag、Aj7.B。
In the Cu alloy material of the present invention, it is desirable that the content of oxygen contained as an unavoidable impurity is 50 ppI11 or less, while Ag, Aj7. B.

Co、Cr、Mn、NI 、Si 、およびSnなどの
成分は、これが1種または2種以上含有しても、その含
有総量が0.2%以下であれば素材特性に何らの悪影響
も及ぼすものではない。
Even if one or more of components such as Co, Cr, Mn, NI, Si, and Sn are contained, if the total content is 0.2% or less, they will not have any adverse effect on the material properties. isn't it.

〔実 施 例〕〔Example〕

つぎに、この発明のCu合金素材を実施例により具体的
に説明する。
Next, the Cu alloy material of the present invention will be specifically explained with reference to Examples.

通常の低周波溝型溶解炉を用い、それぞれ第1表に示さ
れる成分組成をもったCu合金溶湯を調製し、半連続鋳
造法にて、厚さ:150m+sX幅:400m1X長さ
: 1500mmの寸法をもった鋳塊に鋳造し、この鋳
塊に、開始湿度二800℃、終了温度=550℃の条件
で熱間圧延を施し、前記終了温度から水冷して板厚:1
2mmの熱延板とし、この熱延板に、片面;0.5m+
sづつの面側を施した後、冷間圧延、中間焼鈍、および
酸洗を1サイクルとし、これを繰り返し行ない、かつ最
終冷間圧延率を30%とする条件で冷間圧延を施して、
板厚:0.381關の冷延板とすることにより本発明C
u合金素材IA〜3Eおよび従来Cu合金素材1a〜3
cをそれぞれ製造した。
Using a normal low-frequency groove melting furnace, prepare Cu alloy molten metals having the respective compositions shown in Table 1, and use a semi-continuous casting method to obtain dimensions of thickness: 150 m + width: 400 m 1 × length: 1500 mm. This ingot was hot rolled at a starting humidity of 2800°C and a finishing temperature of 550°C, and then water-cooled from the finishing temperature to form a plate with a thickness of 1.
A 2mm hot-rolled plate, one side; 0.5m+
After applying each side of s, cold rolling, intermediate annealing, and pickling are performed in one cycle, and this is repeated, and cold rolling is performed under the condition that the final cold rolling rate is 30%,
The present invention C can be achieved by using a cold-rolled plate with a plate thickness of 0.381.
u alloy materials IA-3E and conventional Cu alloy materials 1a-3
c were produced respectively.

ついで、この結果得られた各種のCu合金素材について
、強度および耐熱性を評価する目的で、引張強さと伸び
、および軟化温度を測定し、さらに繰り返し曲げ試験を
行なうと共に、Cu合金素材のスタンピング金型に及ぼ
す摩耗抑制効果を評価する目的でスタンピング金型摩耗
試験を行なった。
Next, in order to evaluate the strength and heat resistance of the various Cu alloy materials obtained as a result, tensile strength, elongation, and softening temperature were measured, and repeated bending tests were conducted. A stamping die wear test was conducted to evaluate the wear suppression effect on the die.

なお、軟化温度は、長さ:50mmX幅:50mmX厚
さ:OJ81mの寸法をも7た試験片を、種々の温度に
1時間加熱保持し、加熱後の試験片のビッカース硬さを
加熱温度ごとに測定し、試験片に急激な硬さ低下が発生
する加熱温度をもって現わした。
The softening temperature is determined by heating and holding test pieces with dimensions of length: 50 mm x width: 50 mm x thickness: OJ81 m at various temperatures for 1 hour, and measuring the Vickers hardness of the test pieces after heating at each heating temperature. The hardness was measured at the heating temperature at which a sudden decrease in hardness occurred in the test piece.

また、繰り返し曲げ試験は、長さ:200m+sX幅=
15mmx厚さ:0.381+amの寸法をもった試験
片の一方端部を、幅:0.5mmX深さニア0mmの寸
法をもった溝内に挿入して直立させ、試験片を締め付け
た状態で、左右両側へ90″づつの交互的げを行ない、
この90″曲げを1回として数え、この試験片が破断す
るまでの曲げ回数を測定した。
In addition, in the repeated bending test, length: 200m + sX width =
Insert one end of a test piece with dimensions of 15 mm x thickness: 0.381 + am into a groove with dimensions of width: 0.5 mm x depth of near 0 mm, stand upright, and tighten the test piece. , make alternating strikes of 90″ on both the left and right sides,
This 90'' bend was counted as one bend, and the number of bends until the test piece broke was measured.

さらに、スタンピング金型摩耗試験は、金型として市販
のCo:18%、WC:残りからなる組成を有するWC
基超硬合金製のものを用い、16リードのリードフレー
ムをスタンピング(プレス打抜き加工)することにより
行ない、スタンピングされたリードフレームに0.01
5m+mのパリが発生するに至るまでのスタンピング回
数を測定した。これらの結果を第1表に示した。
Furthermore, the stamping die wear test was conducted using commercially available WC as a die having a composition consisting of 18% Co and the remainder of WC.
This is done by stamping (press punching) a 16-lead lead frame using a base cemented carbide.
The number of times of stamping until a 5 m+m paris was generated was measured. These results are shown in Table 1.

〔発明の効果〕〔Effect of the invention〕

第1表に示される結果から、本発明Cu合金素材IA〜
3Eは、いずれもMg、Ca、あるいはZnの微量含有
によって、これらの成分を含有しない従来Cu合金素材
1a〜3cに比して一段とすぐれた摩耗抑制効果をスタ
ンピング金型に及はし、金型使用寿命の延命化を可能と
することが明らかであり、さらに上記成分の含有によっ
て強度、耐熱性、および繰り返し曲げ性が低下しないこ
とも示されている。
From the results shown in Table 1, the present invention Cu alloy material IA~
3E all contain trace amounts of Mg, Ca, or Zn, which gives stamping molds a much better wear-suppressing effect than conventional Cu alloy materials 1a to 3c that do not contain these components. It is clear that the service life can be extended, and it has also been shown that the strength, heat resistance, and repeated bendability do not decrease due to the inclusion of the above components.

上述のように、この発明のCu合金素材は、半導体装置
のリードフレームに要求される強度、耐熱性、および繰
り返し曲げ性を具備した上で、スタンピング金型の摩耗
を抑制し、もってスタンピング金型が著しく長い使用寿
命を示すようになるなど工業上有用な特性を有するので
ある。
As described above, the Cu alloy material of the present invention not only has the strength, heat resistance, and repeated bendability required for lead frames of semiconductor devices, but also suppresses the wear of stamping dies. It has industrially useful properties such as a significantly long service life.

Claims (1)

【特許請求の範囲】[Claims] (1)Fe:0.05〜0.25%、P:0.015〜
0.07%、Pb:0.0005〜0、01%、 を含有し、さらに、 Mg:0.001〜0.05%、Ca:0.001〜0
.01%、Zn:0.001〜1% のうちの1種または2種以上、 を含有し、残りがCuと不可避不純物からなる組成(以
上重量%)を有するCu合金で構成してなるスタンピン
グ金型の摩耗抑制効果にすぐれた半導体装置のリードフ
レーム用Cu合金素材。
(1) Fe: 0.05~0.25%, P: 0.015~
0.07%, Pb: 0.0005-0.01%, and further contains Mg: 0.001-0.05%, Ca: 0.001-0
.. 01%, Zn: 0.001 to 1%, and the rest is Cu and unavoidable impurities (weight %). A Cu alloy material for semiconductor device lead frames that has excellent mold wear suppression effects.
JP1031909A 1989-02-10 1989-02-10 Cu alloy material for the lead frame of semiconductor device, which has excellent effect of suppressing stamping die wear Expired - Lifetime JP2501636B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1031909A JP2501636B2 (en) 1989-02-10 1989-02-10 Cu alloy material for the lead frame of semiconductor device, which has excellent effect of suppressing stamping die wear

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1031909A JP2501636B2 (en) 1989-02-10 1989-02-10 Cu alloy material for the lead frame of semiconductor device, which has excellent effect of suppressing stamping die wear

Publications (2)

Publication Number Publication Date
JPH02209441A true JPH02209441A (en) 1990-08-20
JP2501636B2 JP2501636B2 (en) 1996-05-29

Family

ID=12344117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1031909A Expired - Lifetime JP2501636B2 (en) 1989-02-10 1989-02-10 Cu alloy material for the lead frame of semiconductor device, which has excellent effect of suppressing stamping die wear

Country Status (1)

Country Link
JP (1) JP2501636B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007291518A (en) * 2006-03-30 2007-11-08 Dowa Metaltech Kk Cu-Fe-P-Mg BASED COPPER ALLOY, ITS PRODUCTION METHOD, AND CONDUCTIVE COMPONENT

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60176258A (en) * 1984-02-22 1985-09-10 Tamagawa Kikai Kinzoku Kk Lead material for semiconductor
JPS6296630A (en) * 1985-10-22 1987-05-06 Kobe Steel Ltd Copper alloy having superior suitability to working under shear
JPS62164843A (en) * 1986-01-16 1987-07-21 Mitsubishi Shindo Kk Cu-alloy lead material for semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60176258A (en) * 1984-02-22 1985-09-10 Tamagawa Kikai Kinzoku Kk Lead material for semiconductor
JPS6296630A (en) * 1985-10-22 1987-05-06 Kobe Steel Ltd Copper alloy having superior suitability to working under shear
JPS62164843A (en) * 1986-01-16 1987-07-21 Mitsubishi Shindo Kk Cu-alloy lead material for semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007291518A (en) * 2006-03-30 2007-11-08 Dowa Metaltech Kk Cu-Fe-P-Mg BASED COPPER ALLOY, ITS PRODUCTION METHOD, AND CONDUCTIVE COMPONENT

Also Published As

Publication number Publication date
JP2501636B2 (en) 1996-05-29

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