JPH02208306A - 新規な光反応性薄膜状重合体の製造方法 - Google Patents
新規な光反応性薄膜状重合体の製造方法Info
- Publication number
- JPH02208306A JPH02208306A JP2841889A JP2841889A JPH02208306A JP H02208306 A JPH02208306 A JP H02208306A JP 2841889 A JP2841889 A JP 2841889A JP 2841889 A JP2841889 A JP 2841889A JP H02208306 A JPH02208306 A JP H02208306A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- film
- thin film
- light
- monomolecular film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000010409 thin film Substances 0.000 title abstract description 28
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 150000002148 esters Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 229920001651 Cyanoacrylate Polymers 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 22
- 239000000463 material Substances 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 7
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 4
- 238000010894 electron beam technology Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract description 3
- 238000001393 microlithography Methods 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 abstract description 2
- 238000007654 immersion Methods 0.000 abstract 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 14
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 9
- 239000010453 quartz Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000000862 absorption spectrum Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 5
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- -1 olefin compound Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- OCOCSIDEWXUOQN-UHFFFAOYSA-N 2-cyanopenta-2,4-dienoic acid Chemical compound OC(=O)C(C#N)=CC=C OCOCSIDEWXUOQN-UHFFFAOYSA-N 0.000 description 1
- ZZAGLMPBQOKGGT-UHFFFAOYSA-N [4-[4-(4-prop-2-enoyloxybutoxy)benzoyl]oxyphenyl] 4-(4-prop-2-enoyloxybutoxy)benzoate Chemical compound C1=CC(OCCCCOC(=O)C=C)=CC=C1C(=O)OC(C=C1)=CC=C1OC(=O)C1=CC=C(OCCCCOC(=O)C=C)C=C1 ZZAGLMPBQOKGGT-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- NFURDKBDRIUBCV-UHFFFAOYSA-N dodecyl 3-[4-(3-dodecoxy-3-oxoprop-1-enyl)phenyl]prop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C=CC1=CC=C(C=CC(=O)OCCCCCCCCCCCC)C=C1 NFURDKBDRIUBCV-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2841889A JPH02208306A (ja) | 1989-02-07 | 1989-02-07 | 新規な光反応性薄膜状重合体の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2841889A JPH02208306A (ja) | 1989-02-07 | 1989-02-07 | 新規な光反応性薄膜状重合体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02208306A true JPH02208306A (ja) | 1990-08-17 |
JPH0368044B2 JPH0368044B2 (enrdf_load_stackoverflow) | 1991-10-25 |
Family
ID=12248107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2841889A Granted JPH02208306A (ja) | 1989-02-07 | 1989-02-07 | 新規な光反応性薄膜状重合体の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02208306A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007270146A (ja) * | 2006-03-10 | 2007-10-18 | Nagoya Institute Of Technology | 表示素子用導電性高分子薄膜及びその製造方法並びにそれを用いてなるエレクトロクロミック表示素子 |
-
1989
- 1989-02-07 JP JP2841889A patent/JPH02208306A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007270146A (ja) * | 2006-03-10 | 2007-10-18 | Nagoya Institute Of Technology | 表示素子用導電性高分子薄膜及びその製造方法並びにそれを用いてなるエレクトロクロミック表示素子 |
Also Published As
Publication number | Publication date |
---|---|
JPH0368044B2 (enrdf_load_stackoverflow) | 1991-10-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Anderson et al. | Solution-processable and functionalizable ultra-high molecular weight polymers via topochemical synthesis | |
EP0119162A2 (de) | Photopolymerisierbare Zusammensetzung, damit beschichtetes Material und Verfahren zur Herstellung von Reliefabbildungen | |
JP6486266B2 (ja) | ビニルエーテル化合物に由来する構造単位を含む化合物 | |
US4734481A (en) | Novel organometallic polymers | |
JPH10207066A (ja) | 化学増幅ポジ型レジスト材料及びパターン形成方法 | |
Du et al. | All-hydrocarbon benzocyclobutene resin with low Dk and high-resolution photo-imageable dielectric performance | |
JPH02208306A (ja) | 新規な光反応性薄膜状重合体の製造方法 | |
EP0077577A2 (en) | Photographic articles comprising a compound having acetylenic bonds and methods for producing the articles | |
EP0261991A2 (en) | Method for forming fine patterns of conjugated polymers | |
Kudo et al. | One-pot synthesis of a novel ladder polymer of calixarene via condensation reaction of resorcinol and alkanedial based on dynamic covalent chemistry | |
Maekawa et al. | Higher sensitive extreme ultraviolet (EUV) resist materials derived from pt-Butylcalix [n] arenes (n= 4 and 8) | |
Chae et al. | Photo-crosslinking and negative-type micropattern formation of a polymeric photobase generator containing phthalimido carbamate groups | |
JPS6354422A (ja) | 配向ポリマ−材料 | |
Kudo et al. | Synthesis of hyperbranched polyacetals via an+ b2‐type polyaddition (n= 3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography | |
Park et al. | Synthesis and Characteristics of a Novel Acid Amplifier with a Low Absorbance at 193nm | |
Klinger et al. | Synthesis of polymeric 1‐iminopyridinium ylides as photoreactive polymers | |
CN116162186A (zh) | 基于聚苯乙烯类硫鎓盐的产酸剂及其光刻胶组合物 | |
JPH01213321A (ja) | 新規な薄膜状重合体の製造方法 | |
JP2751779B2 (ja) | 光分解性高分子化合物およびフォトレジスト組成物 | |
JPH01139620A (ja) | 新規な薄膜状重合体の製造方法 | |
Cai et al. | Introduction of functional groups into polymer films via deep-UV photolysis or electron-beam lithography: modification of polystyrene and poly (3-octylthiophene) by a functionalized perfluorophenyl azide | |
Yang et al. | Self-assembly of homopolymer and copolymers of N-4-hydroxyphenyl-acrylamide with diazoresin via H-bonding attraction | |
JPS63130135A (ja) | 有機薄膜 | |
CN112592303B (zh) | 含双鎓盐结构的光致产酸剂、制备方法及光刻胶组合物 | |
Bonetti et al. | Photosensitive Hypervalent Fluorinated Sulfur Containing Polymers for Light Sensitive Applications |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |