JPH02181399A - Synchrotron device - Google Patents

Synchrotron device

Info

Publication number
JPH02181399A
JPH02181399A JP64000534A JP53489A JPH02181399A JP H02181399 A JPH02181399 A JP H02181399A JP 64000534 A JP64000534 A JP 64000534A JP 53489 A JP53489 A JP 53489A JP H02181399 A JPH02181399 A JP H02181399A
Authority
JP
Japan
Prior art keywords
pattern
electromagnet
steering electromagnet
pattern memory
steering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP64000534A
Other languages
Japanese (ja)
Inventor
Shiyouji Kawazu
河津 象司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP64000534A priority Critical patent/JPH02181399A/en
Publication of JPH02181399A publication Critical patent/JPH02181399A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To improve the beam efficiency by exciting a steering electromagnet by a preprogrammed pattern in the same way as in a deflection magnet or a tetrode electromagnet. CONSTITUTION:The device is composed of a steering electromagnet 11, an exciting power source 4 for the steering electromagnet 11, a pattern memory 2 to deliver the pattern depending on a timing, a computer 1 to write the pattern to the pattern memory, and a timer 3 to deliver an instruction value renewal signal to the pattern memory. A pattern for beam orbit correction from the incidence to the projection is written in the pattern memory 2 by the computer 1. The pattern memory 2 transmits the written pattern to the steering electromagnet exciting power source 4 depending on the signal from the timer 3. Consequently, since the beam orbit can be corrected from the incidence to the projection of the beam, the beam efficiency can be improved.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は半導体露光や医療用に用いられるシンクロトロ
ン装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to a synchrotron device used for semiconductor exposure and medical purposes.

(従来の技術) 半導体露光や医療用に用いられるシンクロトロン装置は
一般的に第3図に示すような機器で構成されている。す
なわち、ビームを偏向するための偏向電磁石6.ビーム
の発散を防ぎビームをあるサイズにまとめるための四極
電磁石7、ビームを加速するための高周波加速室JIM
8.ビームをまねずために必要な真空を提供するビーム
ダク1−〇、ビームを入射、または出射するための入・
出射機器10、ビームをまわす効率を向上させるための
ステアリング電磁石11.である。
(Prior Art) A synchrotron device used for semiconductor exposure or medical purposes is generally composed of equipment as shown in FIG. namely, a deflection electromagnet for deflecting the beam; 6. Quadrupole electromagnet 7 for preventing beam divergence and consolidating the beam into a certain size, high frequency acceleration chamber JIM for accelerating the beam
8. Beam duct 1-0 provides the necessary vacuum to avoid beam radiation;
Exit device 10, steering electromagnet 11 for improving beam turning efficiency. It is.

従来技術によると、ステアリング電磁石11の迅転方法
は偏向電磁石6のパターン運転とは異なり、一定値の定
常運転を行っていた。これは、従来のシンクロトロン装
置ではビーム入射の際にビームが失なわれることが多く
、入射時に限りビーム軌道のずれを補正しようというも
のであった。
According to the prior art, the method of rapid rotation of the steering electromagnet 11 is different from the pattern operation of the bending electromagnet 6, and a steady operation with a constant value is performed. This is because in conventional synchrotron devices, beams are often lost during beam injection, and the idea was to correct deviations in the beam trajectory only at the time of beam injection.

(発明が解決しようとする課題) 上記従来技術によると、入射直前のビーム゛耐流値が、
出射後には、わずか10%程度になってしまい、いかに
も効率の悪いものであった。
(Problem to be Solved by the Invention) According to the above-mentioned conventional technology, the current value of the beam immediately before incidence is
After the emission, the efficiency was only about 10%, which was quite inefficient.

近年、シンクロトロン装置が、半導体露光や医療用に用
いられるようになってきて、上記の様に10%のように
効率の悪いシンクロトロン装置では非常に問題であるこ
とがいわれている。
In recent years, synchrotron devices have come to be used for semiconductor exposure and medical purposes, and it is said that synchrotron devices with efficiency as low as 10% as described above are extremely problematic.

そこで本発明におけるシンクロトロン装置では、ビーム
の入射〜出射に至る過程においてビーム効率を向上させ
ることを目的とする。
Therefore, in the synchrotron device according to the present invention, it is an object of the present invention to improve beam efficiency in the process from beam input to beam output.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段) 本発明のシンクロトロン装置においては、ステアリング
電磁石をパターン励磁する構成とする。
(Means for Solving the Problems) In the synchrotron device of the present invention, the steering electromagnet is pattern-excited.

(作 用) ステアリング電磁石をパターン励磁することにより、シ
ンクロトロン装置の入射時のビーム軌道の補正のみなら
ず、加速中出射時に適合した補正をとれることになる。
(Function) By pattern-exciting the steering electromagnet, it is possible not only to correct the beam trajectory when it enters the synchrotron device, but also to make corrections that are suitable for when it is exiting during acceleration.

(実施例) 以下1図面を参照して実施例の説明を行なう。(Example) An embodiment will be described below with reference to one drawing.

第1図は本発明の一実施例を示すもので、ステアリング
電磁石11、開用励磁電源4.パターンをタイミングに
従って送り出すためのパターンメモリ2、パターンメモ
リにパターンを書き込むための計算機1、パターンメモ
リに指令値更新信号を送り出すタイマー3とで構成され
る。
FIG. 1 shows an embodiment of the present invention, in which a steering electromagnet 11, an open excitation power source 4. It is composed of a pattern memory 2 for sending out a pattern according to timing, a computer 1 for writing the pattern into the pattern memory, and a timer 3 for sending out a command value update signal to the pattern memory.

計算機1よりパターンメモリ2に入射から出射に至るま
でのビーム軌道補正用のパターンが書き込まれる。パタ
ーンメモリ2は書き込まれたパターンをタイマー3から
くる信号に従って、ステアリング電磁石励磁電源4に送
信する。ステアリング電磁石励磁電源4は送られてきた
パターンに従ってステアリング電磁石11を第2図に示
す様に偏向電磁石の励磁パターンと同期をとりながら励
磁することになる。
A pattern for correcting the beam trajectory from incidence to exit is written into pattern memory 2 by computer 1. The pattern memory 2 transmits the written pattern to the steering electromagnet excitation power source 4 in accordance with the signal coming from the timer 3. The steering electromagnet excitation power source 4 excites the steering electromagnet 11 in accordance with the sent pattern in synchronization with the excitation pattern of the bending electromagnet, as shown in FIG.

」二記の様に、本実施例の構成とすることによりシンク
ロトロン装置のビームの入射から出射に至るまでの間、
ビーム軌道を補正できるのでシンクロトロン装置のビー
ム効率が飛躍的に向上する。
2, the configuration of this embodiment allows for
Since the beam trajectory can be corrected, the beam efficiency of the synchrotron device can be dramatically improved.

〔発明の効果〕〔Effect of the invention〕

以上述べたように、本発明のシンクロトロン装置におけ
るステアリング電磁石の励磁方式を用いることにより従
来方式では非常に悪かったビーム効率を飛躍的に向上さ
せることが出来る。
As described above, by using the excitation method of the steering electromagnet in the synchrotron device of the present invention, the beam efficiency, which was extremely poor in the conventional method, can be dramatically improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す図、第2図は本発明の
作用を示す図、第3図は一般的なシンクロトロン装置を
示す図である。 1・・・計算機      2・・・パターンメモリ3
・・・タイマー 4・・・ステアリング電磁石励磁電源 +1 各・・・ステアリング電磁石 代理人 弁理士 則 近 憲 佑 同    第子丸   健 第1図 時間 第2図
FIG. 1 is a diagram showing an embodiment of the present invention, FIG. 2 is a diagram showing the operation of the present invention, and FIG. 3 is a diagram showing a general synchrotron device. 1...Calculator 2...Pattern memory 3
...Timer 4...Steering electromagnet excitation power supply +1 Each...Steering electromagnet agent Patent attorney Noriyuki Chika Ken Yudo Daishimaru Ken Fig. 1 Time Fig. 2

Claims (1)

【特許請求の範囲】[Claims]  ビーム加速器のシンクロトロン装置において、ステア
リング電磁石を偏向磁石あるいは四極電磁石と同じよう
にプレプログラム化されたパターンによって励磁するよ
うにしたことを特徴とするシンクロトロン装置。
A synchrotron device for a beam accelerator, characterized in that a steering electromagnet is excited by a preprogrammed pattern in the same way as a deflection magnet or a quadrupole electromagnet.
JP64000534A 1989-01-06 1989-01-06 Synchrotron device Pending JPH02181399A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP64000534A JPH02181399A (en) 1989-01-06 1989-01-06 Synchrotron device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP64000534A JPH02181399A (en) 1989-01-06 1989-01-06 Synchrotron device

Publications (1)

Publication Number Publication Date
JPH02181399A true JPH02181399A (en) 1990-07-16

Family

ID=11476427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP64000534A Pending JPH02181399A (en) 1989-01-06 1989-01-06 Synchrotron device

Country Status (1)

Country Link
JP (1) JPH02181399A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117563A1 (en) * 2011-03-03 2012-09-07 株式会社日立製作所 Synchrotron magnet power supply control system and control method, and synchrotron

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012117563A1 (en) * 2011-03-03 2012-09-07 株式会社日立製作所 Synchrotron magnet power supply control system and control method, and synchrotron

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