JPH0216381B2 - - Google Patents
Info
- Publication number
- JPH0216381B2 JPH0216381B2 JP60127486A JP12748685A JPH0216381B2 JP H0216381 B2 JPH0216381 B2 JP H0216381B2 JP 60127486 A JP60127486 A JP 60127486A JP 12748685 A JP12748685 A JP 12748685A JP H0216381 B2 JPH0216381 B2 JP H0216381B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- discharge
- groove
- magnetic field
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12748685A JPS61284572A (ja) | 1985-06-12 | 1985-06-12 | 放電電極 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12748685A JPS61284572A (ja) | 1985-06-12 | 1985-06-12 | 放電電極 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61284572A JPS61284572A (ja) | 1986-12-15 |
| JPH0216381B2 true JPH0216381B2 (pm) | 1990-04-17 |
Family
ID=14961132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12748685A Granted JPS61284572A (ja) | 1985-06-12 | 1985-06-12 | 放電電極 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61284572A (pm) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4601104B2 (ja) * | 1999-12-20 | 2010-12-22 | キヤノンアネルバ株式会社 | プラズマ処理装置 |
| KR100397751B1 (ko) * | 2001-07-18 | 2003-09-13 | 한전건 | 자성체 재료 코팅용 마그네트론 원 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57158381A (en) * | 1981-03-27 | 1982-09-30 | Nippon Sheet Glass Co Ltd | Magnetron sputtering device |
-
1985
- 1985-06-12 JP JP12748685A patent/JPS61284572A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61284572A (ja) | 1986-12-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2537210B2 (ja) | 高密度プラズマの発生装置 | |
| US6497803B2 (en) | Unbalanced plasma generating apparatus having cylindrical symmetry | |
| US4100055A (en) | Target profile for sputtering apparatus | |
| US4564435A (en) | Target assembly for sputtering magnetic material | |
| US4126530A (en) | Method and apparatus for sputter cleaning and bias sputtering | |
| US5133850A (en) | Sputtering cathode for coating substrates in cathode sputtering apparatus | |
| US5330632A (en) | Apparatus for cathode sputtering | |
| GB1438851A (en) | Ion particle accelerator | |
| JPH06235063A (ja) | スパッタリング陰極 | |
| KR20010020525A (ko) | 스퍼터 코팅 시스템 및 기판 전극을 사용하는 방법 | |
| GB2051877A (en) | Magnetically Enhanced Sputtering Device and Method | |
| JPH0216381B2 (pm) | ||
| JPH0241584B2 (pm) | ||
| JPH0925570A (ja) | スパッタリング式被膜コーティング・ステーション、スパッタリング式被膜コートする方法、および真空処理装置 | |
| JPH0241583B2 (pm) | ||
| JPH0693442A (ja) | マグネトロン・スパッタカソード | |
| JP3000417U (ja) | 陰極スパッタリング装置 | |
| JPS63140078A (ja) | スパツタリングによる成膜方法 | |
| JPS5943546B2 (ja) | スパツタリング装置 | |
| JPH0317907B2 (pm) | ||
| JPH02159375A (ja) | イオンビームスパッタリング装置 | |
| JPH0241585B2 (pm) | ||
| JP3766569B2 (ja) | マグネトロンスパッタ装置 | |
| JPS63219579A (ja) | スパツタ装置 | |
| GB2241710A (en) | Magnetron sputtering of magnetic materials in which magnets are unbalanced |