JPH02147973A - Apparatus for inspecting semiconductor - Google Patents

Apparatus for inspecting semiconductor

Info

Publication number
JPH02147973A
JPH02147973A JP63302695A JP30269588A JPH02147973A JP H02147973 A JPH02147973 A JP H02147973A JP 63302695 A JP63302695 A JP 63302695A JP 30269588 A JP30269588 A JP 30269588A JP H02147973 A JPH02147973 A JP H02147973A
Authority
JP
Japan
Prior art keywords
bellows
inspection stage
inspection
heat
tray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63302695A
Other languages
Japanese (ja)
Inventor
Shuji Akiyama
収司 秋山
Yoshisuke Kitamura
北村 義介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP63302695A priority Critical patent/JPH02147973A/en
Publication of JPH02147973A publication Critical patent/JPH02147973A/en
Pending legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To improve reliability of machines to be provided in a chamber of high and low temperature atmospheres as well as reduce production cost by providing a stretchable mechanism comprising heat-insulating members which stretch according to movement of an inspection stage. CONSTITUTION:In bellows mechanisms 23, 24, a Y-directional bellows 24 stretches along a Y guide rail 25 according to movement of an inspection stage 22 without no gap generated between a heat-insulating wall 2 and the inspection stage 22 when the inspection stage 22 moves along Y direction, while similarly an X-directional bellows 23 stretches along an X guide rail 26 according to movement of the inspection stage 22 without no gap generated between the heat-insulation wall 2 and the inspection stage 22 when the inspection stage moves along X direction. Therefore heat generated on the inspection stage 22 is cut by the Y-directional bellows 24 and the X-directional bellows 23: it prevents thermal influence to an omitted driving mechanism, electrical wiring, etc. provided on lower faces of respective moving stages 19, 20.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は半(体検査装置に係り、特に検査トレー内に複
数収容された半導体素子を検査するトレ一方式の半導体
検査装置に関する。
[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention relates to a half-body inspection device, and in particular to a one-tray type semiconductor inspection device for inspecting a plurality of semiconductor devices housed in an inspection tray. Regarding equipment.

(従来の技術) 従来、パッケージング済みの半導体素子の電気的諸特性
を検査する工程では、半導体素子のパッケージか多種多
様にわたるため、夫々のパッケージの杆順に合わせた専
用検査装置(ICハンドラ)が必要とされていたか、近
年の半導体素子の多品種少量生産化に対応し、alll
lll二部ット等の交換を行うことで一台で多くの形状
の半導体素子の測定が可能なユニバーサルハンドラが開
発されている。
(Prior Art) Conventionally, in the process of inspecting the electrical characteristics of packaged semiconductor devices, since there are a wide variety of semiconductor device packages, a dedicated inspection device (IC handler) is required to match the order of each package. Perhaps it was necessary, or in response to the recent trend toward high-mix, low-volume production of semiconductor devices, all
A universal handler has been developed that is capable of measuring semiconductor elements of many shapes with one unit by exchanging two parts.

このようなユニバーサルハンドラへの半導体素子供給形
態として、トレ一方式が知られている。
A one-tray type is known as a form of supplying semiconductor elements to such a universal handler.

このトレ一方式は、第5図に示すようにトレー1上に多
数例えば格子状に素子収納部2を設け、この素子収納部
2内にパッケージ済みの半導体素子3例えばQFP、S
OP等を収容し、ICハンドラのテストヘッドに設けら
れたプローブ針等の検査端子に上記トレー1上の各半導
体素子3を順次当接して検査する方式である。
As shown in FIG. 5, in this one-tray type, a large number of device storage sections 2 are provided on a tray 1, for example, in a lattice shape, and packaged semiconductor devices 3, such as QFP, S
This is a method in which each semiconductor element 3 on the tray 1 is sequentially brought into contact with an inspection terminal such as a probe needle provided on a test head of an IC handler.

また近′年では、所定の検査温度下例えば高温・低温環
境下での半導体索子の試験を行うために、検査部を高温
・低温チャンバ内に収容1−1このチャンバ内で一連の
試験を行うように構成されたいわゆる高低温方式のIC
ハンドラが知られている。
In addition, in recent years, in order to test semiconductor cords at predetermined test temperatures, for example in high and low temperature environments, the test section is housed in a high temperature and low temperature chamber. A so-called high-temperature type IC configured to perform
Handler is known.

(発明が解決しようとする課題) ところで、近年の半導体素子の耐久性向上により、温度
条件の厳しい環境下での使用が多くなりつつある。この
ような厳しい温度条件下における半導体素子の特性を検
査するために、半導体検査装置の検査設定温度もさらに
高温・低温化しており、例えば−60℃〜200℃の温
度下での検査が必要とされている。
(Problems to be Solved by the Invention) By the way, due to the recent improvement in the durability of semiconductor elements, they are increasingly being used in environments with severe temperature conditions. In order to test the characteristics of semiconductor devices under such severe temperature conditions, the test temperature settings of semiconductor testing equipment are becoming higher and lower; for example, testing at temperatures between -60°C and 200°C is now necessary. has been done.

しかしながら、チャンバ内には、トレー搬送系の駆動機
溝や電気配線等、高温・低温下での使用において耐久性
に問題が生じる機器類が収容されていることから、チャ
ンバの高温・低温化を容易に行えないという問題があっ
た。また、これら機器類を耐熱または耐寒構造にしよう
とすれば装置コストの上昇につながるという問題があっ
た。
However, since the chamber houses equipment such as drive grooves for the tray conveyance system and electrical wiring, which have durability issues when used in high and low temperatures, The problem was that it was not easy to do. Furthermore, there is a problem in that if these devices are made to have a heat-resistant or cold-resistant structure, the cost of the equipment will increase.

本発明は上述した従来の事情に鑑みてなされたもので、
簡易な構造で高温・低温雰囲気のチャンバ内に配設され
る機器類の信頼性を高め、また装置製造コストの低減が
図れる半導体検査装置を提供することを目的とするもの
である。
The present invention has been made in view of the above-mentioned conventional circumstances,
It is an object of the present invention to provide a semiconductor inspection device that has a simple structure, increases the reliability of equipment installed in a chamber with a high-temperature/low-temperature atmosphere, and can reduce device manufacturing costs.

[発明の構成] (課題を解決するための手段) 本発明の半導体検査装置は、チャンバ内に少なくとも2
次元的に移動可能に配設された加熱または冷却機構を有
する検査台上に半導体素子を複数収容した検査トレーを
載置し2、前記検査台を移動させながら前記トレー上の
各半導体素子を所定の検査温度下で検査する半導体検査
装置において、前記チャンバの前記検査台移動方向断面
のうち少なくとも前記検査台の2次元方向移動範囲をほ
ぼ覆うように配設され、検査台の移動に追従し5て伸縮
する断熱性部材からなる伸縮機構を設けたことを特徴と
するものである。
[Structure of the Invention] (Means for Solving the Problems) The semiconductor inspection apparatus of the present invention includes at least two
An inspection tray containing a plurality of semiconductor devices is placed on an inspection table having a heating or cooling mechanism arranged to be movable in dimension, and each semiconductor device on the tray is placed in a predetermined position while moving the inspection table. In a semiconductor testing device that performs testing at a testing temperature of The device is characterized by being provided with an expansion/contraction mechanism made of a heat insulating member that expands and contracts.

尚、伸縮機構としては、検査台の移動方向に追従して伸
縮する断熱性部材からなる蛇腹機構が好適である。また
、蛇腹機構内部にエアーパージすることでさらに断熱効
果を高める構成とすることもできる。
Note that as the expansion/contraction mechanism, a bellows mechanism made of a heat insulating member that expands/contracts following the moving direction of the examination table is suitable. Moreover, it is also possible to provide a configuration in which the heat insulating effect is further enhanced by air purging inside the bellows mechanism.

(作 用) 上記構成の半導体検査装置によれば、簡易な構造で高温
・低温雰囲気のチャンバ内に配設される機器類の信頼性
を高めることができ、また装置製造コストの低減を図る
ことが可能となる。
(Function) According to the semiconductor inspection device having the above configuration, it is possible to improve the reliability of equipment installed in a chamber with a high-temperature/low-temperature atmosphere with a simple structure, and to reduce the cost of manufacturing the device. becomes possible.

(実施例) 以下、本発明を高温方式の半導体検査装置に適用(7た
一実施例について図を参照して説明する。
(Example) Hereinafter, one example in which the present invention is applied to a high-temperature type semiconductor inspection device will be described with reference to the drawings.

第1図は実施例の半導体検査装置を示す平面図で、第2
図は第1図のA方向側面図である。
FIG. 1 is a plan view showing the semiconductor inspection apparatus of the embodiment, and the second
The figure is a side view in the A direction of FIG. 1.

検査部を収容した高温チャンバ11は、耐熱性部材例え
ばステンレス部材からなる断熱壁12により覆われてお
り、この高温チャンバ11外に前述第4図に示した如く
半導体索子3を収納したトレー1を多数段収容したトレ
ーストッカ13が配設されている。本実施例で用いるト
レー1は、ステンレスやアルミニウム等の伝熱性に優れ
た部材からなり、その大きさは約2551+1m X 
210+nm X高さl0IllIn、表面に4行×5
列の格子状に夫々独立した半導体素子収容部3が形成さ
れている。
A high-temperature chamber 11 containing an inspection section is covered with a heat-insulating wall 12 made of a heat-resistant material, for example, a stainless steel material, and outside the high-temperature chamber 11 is a tray 1 containing semiconductor cords 3 as shown in FIG. A trace stocker 13 containing a large number of stages is provided. The tray 1 used in this example is made of a material with excellent heat conductivity such as stainless steel or aluminum, and its size is approximately 2551 + 1 m x
210+nm x height l0IllIn, 4 lines x 5 on the surface
Independent semiconductor element accommodating portions 3 are formed in a grid pattern in rows.

トレーストッカ13内に収容された各トレー1は、トレ
ーストッカ13内の取出し機構14ににす1枚ずつ取出
されて断熱壁12に設けられた搬入口]5から高温チャ
ンバ11内のトレー予01加熱機構16へと搬送される
Each tray 1 accommodated in the trace stocker 13 is taken out one by one by the take-out mechanism 14 in the trace stocker 13, and the trays 1 in the high-temperature chamber 11 are taken out one by one by the take-out mechanism 14 in the trace stocker 13. It is transported to the heating mechanism 16.

このトレー予備加熱機構16に搬送されたトレ1は検査
設定温度例えば200℃まで加熱される。
The tray 1 conveyed to the tray preheating mechanism 16 is heated to an inspection set temperature, for example, 200°C.

そしてトレー予備加熱機構16の上方に配設されたトレ
ー搬送機構17のトレー搬入用保持部18aにより保持
されて、Xステージ19、Yステージ20、Zステージ
(昇降機構)21からなる3次元移動機構により駆動さ
れる検査台22上へと移載される。
A three-dimensional movement mechanism consisting of an X stage 19, a Y stage 20, and a Z stage (elevating mechanism) 21 is held by a tray loading holder 18a of a tray transport mechanism 17 disposed above the tray preheating mechanism 16. The sample is transferred onto the inspection table 22 which is driven by.

この検査台22にはヒータ機構例えばシリコンラバーヒ
ータが内蔵されており、載置したトレー1を検査設定温
度下例えば200’Cに保持しながら予め定められた検
査手順に基づきトレー1内の半導体素子3の各端子を図
示を省略したプローブ針に順次当接させて電気的諸特性
を測定する。
This inspection table 22 has a built-in heater mechanism, for example, a silicon rubber heater, and while the tray 1 on which it is placed is maintained at a set inspection temperature, for example, 200'C, the semiconductor elements in the tray 1 are inspected based on a predetermined inspection procedure. The various electrical characteristics are measured by sequentially bringing each terminal of No. 3 into contact with a probe needle (not shown).

ところで、上記Xステージ19の移動方向とYステージ
20の移動方向は、断熱チャンバ11内下方へ検査台2
2の熱が進入しないように断熱部材例えばナイロンフィ
ラメント布からなる伸縮機構例えば蛇腹機構23.24
により覆われている。
By the way, the moving direction of the X stage 19 and the moving direction of the Y stage 20 are such that the inspection table 2 is moved downwardly into the heat insulating chamber 11.
A heat insulating member, for example, an elastic mechanism made of nylon filament cloth, for example, a bellows mechanism 23, 24, to prevent heat from entering.
covered by.

この蛇腹機構23.24は、第3図に示すように、X方
向蛇腹24はYステージ20のスライド方向両側面に夫
々設けられた一対のYガイドレール25に取付けられて
おり、断熱壁2と検査台22のY方向側面間とを完全に
覆っている。一方、X方向蛇腹23はYステージ20下
側のXステージ19のスライド方向両側面に夫々設けら
れた一対のXガイドレール26に取付けられており、断
熱壁2と検査台22のX方向側面間とを完全に覆ってい
る。
As shown in FIG. 3, in this bellows mechanism 23 and 24, the X-direction bellows 24 is attached to a pair of Y guide rails 25 provided on both sides of the Y stage 20 in the sliding direction. It completely covers both sides of the inspection table 22 in the Y direction. On the other hand, the X-direction bellows 23 is attached to a pair of X guide rails 26 provided on both sides of the X-stage 19 in the sliding direction below the Y-stage 20, and between the heat-insulating wall 2 and the X-direction side surfaces of the examination table 22. completely covers.

このような蛇腹機構23.24では、検査台22がY方
向に移動時には、X方向蛇腹24が検査台22の移動と
ともにYガイドレール25に沿つて伸縮し、断熱壁2と
検査台22間に隙間が生じず、同様にして、検査台22
がX方向に移動する際には、X方向蛇腹23が検査台2
2の移動とともにXガイドレール26に沿って伸縮し、
断熱壁2と検査台22間に隙間は生じない。従って、検
査台22で発せられた熱は、上記Y方向蛇腹24および
X方向蛇腹23とにより遮蔽され、各移動ステージ19
.20下面に配設されている図示を省略した駆動機構や
電気配線等への熱的影響を防止できる。
In such a bellows mechanism 23, 24, when the examination table 22 moves in the Y direction, the X direction bellows 24 expands and contracts along the Y guide rail 25 as the examination table 22 moves, and there is a space between the heat insulating wall 2 and the examination table 22. In the same way, the inspection table 22
When moving in the X direction, the X direction bellows 23 moves against the examination table 2.
2, expands and contracts along the X guide rail 26,
There is no gap between the heat insulating wall 2 and the inspection table 22. Therefore, the heat generated by the inspection table 22 is shielded by the Y-direction bellows 24 and the X-direction bellows 23, and each moving stage 19
.. It is possible to prevent thermal effects on the drive mechanism, electrical wiring, etc. (not shown) disposed on the lower surface of the device 20.

検査の終了したトレー1は、再びトレー搬送機構17の
下方へと移動され、ここでトレー搬送機構17のトレー
搬出用保持部18bにより保持されて搬出ステーション
27へと搬送された後、搬出口28から断熱チャン・く
−11外へと搬出される。
The tray 1 that has been inspected is again moved below the tray transport mechanism 17, where it is held by the tray unloading holding part 18b of the tray transport mechanism 17 and transported to the unloading station 27, and then transferred to the unloading port 28. It was then carried out to the outside of the insulation chamber.

上記トレー搬送機構17は、第4図に示すように、断熱
チャンバ11の上面断熱壁12 a 1.: X方向に
沿って設けられたベースプレート31に取付けられてい
る。ベースプレート31には、長平方向に沿って長方形
のスライド孔32が穿設されており、このスライド孔3
2の両側のベースプレート上には夫々スライド機構例え
ばLMガイド機構33が設けられている。そしてこのL
Mガイド機構33を介して所定の間隔例えば325m1
m間隔でトレー搬入用保持部18a1 トレー搬出用保
持部18bを吊設したスライド板34が搭載されている
As shown in FIG. 4, the tray conveyance mechanism 17 includes an upper heat insulating wall 12a1 of the heat insulating chamber 11. : It is attached to the base plate 31 provided along the X direction. A rectangular slide hole 32 is bored in the base plate 31 along the elongated direction.
Slide mechanisms such as LM guide mechanisms 33 are provided on the base plates on both sides of 2, respectively. And this L
A predetermined interval, for example 325 m1, is provided via the M guide mechanism 33.
A slide plate 34 is mounted with a tray carrying-in holding part 18a1 and a tray carrying-out holding part 18b suspended at intervals of m.

スライド板34は、ベースプレート31上に設けられた
伸縮機構例えばロットレスシリンダ35によりLMガイ
ド機構33に沿って図中左右に移動するように構成され
ている。
The slide plate 34 is configured to move from side to side in the figure along the LM guide mechanism 33 by means of a telescoping mechanism, such as a rotless cylinder 35, provided on the base plate 31.

スライド孔32の長手方向両内壁には一対のガイドレー
ル36が設けられており、このガイドレール36にスラ
イド板34の進行方向両側のスライド孔32を覆い、ス
ライド板34の移動方向に伸縮する断熱部材例えばナイ
ロンフィラメント布からなる伸縮機構例えば蛇腹機構3
7が取付けられている。この蛇腹機構37により、スラ
イド板34の移動時にもスライド孔32が常時閉塞され
た状態となり、スライド孔32からの熱の漏洩が防止で
きる。
A pair of guide rails 36 are provided on both inner walls in the longitudinal direction of the slide hole 32, and the guide rails 36 are provided with a heat insulating material that covers the slide holes 32 on both sides in the direction of movement of the slide plate 34 and expands and contracts in the direction of movement of the slide plate 34. Elastic mechanism made of a member such as nylon filament cloth, such as the bellows mechanism 3
7 is installed. With this bellows mechanism 37, the slide hole 32 is always closed even when the slide plate 34 is moved, and heat leakage from the slide hole 32 can be prevented.

このように、本実施例の半導体検査装置によれば、検査
台22の熱は、この検査台22の下面に断熱チャンバの
水平断面を覆うように配設され、検査台22の移動に追
従して伸縮する断熱性の蛇腹機構23.24を配設した
ので、検査台下方に配設された機器類例えば検査台移動
機構や電気配線類を、高温雰囲気から隔離することがで
き、チャンバ内に配設されるこれら機器類の信頼性が高
まる。また、高価な耐熱部材により機器類を構成する必
要がなくなるため、装置製造コストの低減も図れる。
As described above, according to the semiconductor inspection apparatus of this embodiment, the heat of the inspection table 22 is disposed on the lower surface of the inspection table 22 so as to cover the horizontal section of the heat insulating chamber, and the heat of the inspection table 22 follows the movement of the inspection table 22. Since the insulating bellows mechanisms 23 and 24 that expand and contract with each other are installed, equipment placed below the examination table, such as the examination table moving mechanism and electrical wiring, can be isolated from the high-temperature atmosphere. The reliability of these devices installed will increase. Further, since there is no need to configure the equipment with expensive heat-resistant members, it is possible to reduce the manufacturing cost of the device.

ところで、上述実施例では、本発明を高温測定を行う半
導体検査装置に適用した例について説明したが、本発明
はこれに限定されるものではなく、低温測定を行う半導
体検査装置にも同様に適用することが可能である。この
場合には、予備加熱機構、検査台等の加熱機構が冷却機
構となる。
By the way, in the above-mentioned embodiment, an example was explained in which the present invention is applied to a semiconductor inspection device that performs high-temperature measurements, but the present invention is not limited to this, and can be similarly applied to a semiconductor inspection device that performs low-temperature measurements. It is possible to do so. In this case, a heating mechanism such as a preheating mechanism or an examination table serves as a cooling mechanism.

尚、断熱チャンバ外へと搬送されたトレー1は、次処理
工程例えば断熱チャン・〈側面のソータ機構29に搬送
され、ここで検査結果に基づいた半導体素子3の選別が
行われる。
The tray 1 transported outside the heat insulation chamber is transported to the next processing step, for example, to a sorter mechanism 29 on the side of the heat insulation chamber, where the semiconductor devices 3 are sorted based on the inspection results.

[発明の効果] 以上説明したように、本発明によれば、簡易な構造で高
温・低温雰囲気のチャンバ内に配設される機器類の信頼
性を高め、装置製造コストの低減を図ることが可能とな
る。
[Effects of the Invention] As explained above, according to the present invention, it is possible to improve the reliability of equipment arranged in a chamber with a high-temperature/low-temperature atmosphere with a simple structure, and to reduce device manufacturing costs. It becomes possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の一実施例の半導体検査装置の構成を
示す正面図、第2図は第1図のA方向側面図、第3図は
第1図の蛇腹機構の構成を示す平面、正面および側面図
、第4図は実施例のトレー搬送機構の構成を示す平面お
よび正面図、第5図はトレーの構成を示す平面図である
。 1・・・・・・トレー 3・・・・・・半導体素子、1
1・・・・・・高温チャンバ、12・・・・・・断熱壁
、16・・・・・・トレー予備加熱機構、17・・・・
・・トレー搬送機構、19・・・・・・Xステージ、2
0・・・・・・Yステ−ジ、22・・・・・・検査台、
23・・・・・・X方向蛇腹、24・・・・・Y方向蛇
腹、31・・・・・・ベースプレート、32・・・・・
・スライド孔、7・・・・・・蛇腹機構。
1 is a front view showing the configuration of a semiconductor inspection apparatus according to an embodiment of the present invention, FIG. 2 is a side view in the direction A of FIG. 1, and FIG. 3 is a plan view showing the configuration of the bellows mechanism of FIG. 1. , a front and side view, FIG. 4 is a plan view and a front view showing the structure of the tray conveyance mechanism of the embodiment, and FIG. 5 is a plan view showing the structure of the tray. 1... Tray 3... Semiconductor element, 1
DESCRIPTION OF SYMBOLS 1... High temperature chamber, 12... Heat insulation wall, 16... Tray preheating mechanism, 17...
...Tray transport mechanism, 19...X stage, 2
0...Y stage, 22...Inspection table,
23...X-direction bellows, 24...Y-direction bellows, 31...base plate, 32...
・Slide hole, 7... Bellows mechanism.

Claims (1)

【特許請求の範囲】 チャンバ内に少なくとも2次元的に移動可能に配設され
た加熱または冷却機構を有する検査台上に半導体素子を
複数収容した検査トレーを載置し、前記検査台を移動さ
せながら前記トレー上の各半導体素子を所定の検査温度
下で検査する半導体検査装置において、 前記チャンバの前記検査台移動方向断面のうち少なくと
も前記検査台の2次元方向移動範囲をほぼ覆うように配
設され、検査台の移動に追従して伸縮する断熱性部材か
らなる伸縮機構を設けたことを特徴とする半導体検査装
置。
[Scope of Claims] An inspection tray containing a plurality of semiconductor devices is placed on an inspection table having a heating or cooling mechanism that is disposed movably in at least two dimensions in a chamber, and the inspection table is moved. In a semiconductor testing apparatus for testing each semiconductor element on the tray at a predetermined testing temperature, the chamber is arranged so as to substantially cover at least a two-dimensional moving range of the testing table in a cross section of the testing table in the moving direction. What is claimed is: 1. A semiconductor inspection device comprising: an expansion mechanism made of a heat insulating member that expands and contracts in accordance with the movement of an inspection table;
JP63302695A 1988-11-30 1988-11-30 Apparatus for inspecting semiconductor Pending JPH02147973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63302695A JPH02147973A (en) 1988-11-30 1988-11-30 Apparatus for inspecting semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63302695A JPH02147973A (en) 1988-11-30 1988-11-30 Apparatus for inspecting semiconductor

Publications (1)

Publication Number Publication Date
JPH02147973A true JPH02147973A (en) 1990-06-06

Family

ID=17912080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63302695A Pending JPH02147973A (en) 1988-11-30 1988-11-30 Apparatus for inspecting semiconductor

Country Status (1)

Country Link
JP (1) JPH02147973A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998047011A1 (en) * 1997-04-16 1998-10-22 Advantest Corporation Semiconductor device tester

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63151037A (en) * 1986-12-16 1988-06-23 Tokyo Electron Ltd Inspection of semiconductor element
JPS63164442A (en) * 1986-12-26 1988-07-07 Tokyo Electron Ltd Wafer prober

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63151037A (en) * 1986-12-16 1988-06-23 Tokyo Electron Ltd Inspection of semiconductor element
JPS63164442A (en) * 1986-12-26 1988-07-07 Tokyo Electron Ltd Wafer prober

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998047011A1 (en) * 1997-04-16 1998-10-22 Advantest Corporation Semiconductor device tester
US6225798B1 (en) 1997-04-16 2001-05-01 Advantest Corporation Semiconductor device tester

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