JPH02144195A - Device for producing and supplying ultrapure water - Google Patents
Device for producing and supplying ultrapure waterInfo
- Publication number
- JPH02144195A JPH02144195A JP29558788A JP29558788A JPH02144195A JP H02144195 A JPH02144195 A JP H02144195A JP 29558788 A JP29558788 A JP 29558788A JP 29558788 A JP29558788 A JP 29558788A JP H02144195 A JPH02144195 A JP H02144195A
- Authority
- JP
- Japan
- Prior art keywords
- ozone
- ultrapure water
- pure water
- primary pure
- water production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 85
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 84
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 63
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000002347 injection Methods 0.000 claims abstract description 18
- 239000007924 injection Substances 0.000 claims abstract description 18
- 239000012528 membrane Substances 0.000 claims abstract description 18
- 230000001954 sterilising effect Effects 0.000 claims abstract description 18
- 230000000694 effects Effects 0.000 claims abstract description 13
- 230000002411 adverse Effects 0.000 claims abstract description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 4
- 239000010935 stainless steel Substances 0.000 claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 claims description 59
- 238000000354 decomposition reaction Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 6
- 238000007872 degassing Methods 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims description 2
- 241000894006 Bacteria Species 0.000 abstract description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000001223 reverse osmosis Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000000108 ultra-filtration Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000001580 bacterial effect Effects 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002070 germicidal effect Effects 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 208000034309 Bacterial disease carrier Diseases 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000005949 ozonolysis reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000003206 sterilizing agent Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、電子工業、医薬品製造、食品製造等の技術分
野で要求される高度に精製された純水、いわゆる超純水
を多量に製造供給するシステムにおいて超純水を高度無
菌状態に維持する装置に関する。Detailed Description of the Invention (Industrial Field of Application) The present invention is capable of producing large quantities of highly purified pure water, so-called ultrapure water, which is required in technical fields such as electronic industry, pharmaceutical manufacturing, and food manufacturing. The present invention relates to a device for maintaining ultrapure water in a highly sterile state in a supply system.
（従来の技術）
第２図は従来技術の超純水製造供紹システムの代表的１
例を示す。(Conventional technology) Figure 2 is a typical example of a conventional ultrapure water production and supply system.
Give an example.
このシステムの一次純水タンク（ａ）には−火線水製造
装置（ｂ）から一次純水が補給され、このタンクからの
純水が循環ポンプ（Ｃ）により超純水製造装置（ｄ）に
向かって送られ、超純水製造装置は少なくとも水中無機
物を極減するポリシャー（ｅ）を含み通常その前後には
生菌を殺す紫外線殺菌灯げ）および微粒子や高分子有機
物を除くためのミクロンフィルターあるいは限外濾過膜
または逆浸透膜の精密濾過器（ｇ）が設けられており、
これらを通過して精製された超純水が供給ライン（ハ）
を経てユーズポイント（ｉ）の各超純水消費個所に分配
供給され、未使用分はリターンライン（ｊ）を経て一次
純水タンク（ａ）に戻り循環するようになっている。The primary pure water tank (a) of this system is supplied with primary pure water from the caustic water production equipment (b), and the pure water from this tank is sent to the ultrapure water production equipment (d) by the circulation pump (C). Ultrapure water production equipment includes at least a polisher (e) that minimizes inorganic substances in the water, and before and after that, an ultraviolet sterilizing lamp that kills living bacteria) and a micron filter to remove particulates and high-molecular organic substances. Alternatively, a microfilter (g) of ultrafiltration membrane or reverse osmosis membrane is provided,
Ultrapure water purified by passing through these is supplied to the supply line (c)
The ultrapure water is distributed and supplied to each ultrapure water consuming point at the use point (i) through the line (i), and the unused portion is returned to the primary pure water tank (a) via a return line (j) for circulation.
このような超純水製造供給システムは、システム中に紫
外線殺菌灯が存在し、またシステム中に水流停滞個所が
存在しないようにして常時運転により循環流が維持され
ているもかかわらず、バクテリアの発生がみられること
が多く、これが超純水の水質を悪化させる一因となり、
ユーズポイントで超純水により処理される製品の品質の
悪化、歩留り、生産性の低下を招いている。This kind of ultrapure water production and supply system does not contain bacteria, despite the presence of ultraviolet germicidal lamps in the system and the constant operation of the system to ensure that there are no stagnation points in the system to maintain a circulating flow. Occurrence is often observed, and this contributes to deterioration of the quality of ultrapure water.
This results in deterioration in the quality of products treated with ultrapure water at the point of use, and a decrease in yield and productivity.
従来、超純水システムで前記のように不可避的に発生す
るバクテリア数を極力低レベルに保つための対策として
は、定期的に運転を一時停止して次亜塩素酸ソーダ、過
酸化水素、オゾン等の殺菌剤あるいは熱水等をシステム
中に一定時間保持することによりシステム内の殺菌およ
びその洗浄駆逐を実施することが一般的に行われている
。（特公昭６３−２４４３３号、特公昭６３−２０１９
３号、特開昭６３−６９５８８号等参照）。Conventionally, as a measure to keep the number of bacteria that inevitably occur in ultrapure water systems as low as possible, as described above, the operation has been temporarily stopped and sodium hypochlorite, hydrogen peroxide, or ozone has been used. It is common practice to sterilize the inside of the system and clean and eliminate the sterilization by keeping a sterilizing agent or hot water in the system for a certain period of time. (Special Publication No. 63-24433, Special Publication No. 63-2019
No. 3, JP-A No. 63-69588, etc.).
また超純水システムは、前記のバクテリヤの生死菌体に
よる他、各種の水質の悪化の要因を含んでおり、原水に
由来する有機物および装置、配管を構成する有機合成材
料よりの溶出による有機物（以下ＴＯＣと総称する）は
ポリシャーでは精製されないので所定の目的純度を得ら
れぬ場合がある。In addition to the above-mentioned living and dead bacteria, ultrapure water systems also contain various factors that deteriorate water quality. Since TOC (hereinafter collectively referred to as TOC) is not purified by a polisher, it may not be possible to obtain the desired purity.
（発明が解決しようとする課題）
前記従来技術の超純水製造システムの運転−時停止中の
殺菌洗浄によるバクテリア汚染防止対策では、システム
の運転を数時間乃至１日間程度停止することを余儀なく
される。超純水を消費する本来の生産活動もこの間操業
を停止またはスローダウンしなければならないので、年
間連続操業を目指す電子工業分野等にあっては、生産性
の低下を招く重要問題となる。(Problem to be Solved by the Invention) In order to prevent bacterial contamination by sterilizing and cleaning during operation and stoppage of the ultrapure water production system of the prior art, the operation of the system must be stopped for several hours to one day. Ru. The original production activities that consume ultrapure water must also be stopped or slowed down during this period, which is an important problem in the electronics industry, etc., which aims to operate continuously throughout the year, leading to a decrease in productivity.
また−時的に殺菌洗浄を充分な程度に実施するためには
、それに伴って派生する副次的諸問題の解決を必要とす
る。すなわち殺菌剤を使用する場合は、その後遺症が残
らないようにするための超純水による徹底した後洗浄の
負担および洗浄排水の処理の問題が生ずる。また熱水殺
菌においては昇降温に要する熱エネルギーの消費の問題
、有機合成材料の装置、配管等に対する熱影響の問題が
あり、これらは未解決である。In addition, in order to perform sterilization cleaning to a sufficient degree from time to time, it is necessary to solve the various secondary problems that arise. That is, when a disinfectant is used, there arises the burden of thorough post-cleaning with ultrapure water to prevent any after-effects from remaining, and the problem of processing the cleaning wastewater. Furthermore, in hot water sterilization, there are problems in the consumption of thermal energy required for raising and lowering the temperature, and problems in the effects of heat on equipment for organic synthetic materials, piping, etc., and these problems remain unresolved.
またシステム中の超純水中の微粒子数、Ｔ。Also, the number of fine particles in the ultrapure water in the system, T.
Ｃもバクテリア数の増加により大幅に増加する傾向にあ
る。C also tends to increase significantly due to an increase in the number of bacteria.
本発明は、従来技術のこれらの問題点を解決し、超純水
製造供給システムの運転を正常な保守時間以外に長時間
にわたって停止することを必要とせず、継続的に運転し
ながら超純水中のバクテリア数を最低レベルにコントロ
ールし、また超純水のＴＯＣレベルを極限にまで低減し
て供給することのできる超純水製造供給システムを提供
することを目的とする。The present invention solves these problems of the prior art, and eliminates the need to stop the operation of an ultrapure water production and supply system for a long time outside of normal maintenance hours, and allows ultrapure water to be produced while continuously operating. The purpose of the present invention is to provide an ultrapure water production and supply system capable of controlling the number of bacteria in the water to the lowest level and supplying ultrapure water with the TOC level reduced to the minimum.
（課題を解決するための手段）
前記目的は、本発明により、超純水製造供給システムの
連続運転中にその循環ラインの適切な個所にオゾンを連
続的に最低２０〜１００ｐｐｂ程度の低いオゾン濃度と
なるよう注入し、その下流をこのオゾンによる常時殺菌
環境に維持することに基づいて達成される。(Means for Solving the Problems) According to the present invention, ozone is continuously supplied to appropriate locations in the circulation line of the ultrapure water production and supply system during continuous operation, and the ozone concentration is as low as 20 to 100 ppb. This is achieved by injecting the ozone so as to maintain the downstream environment in a constant sterilization environment using ozone.
特に本発明の超純水製造供給システムは、循環ライン中
の超純水製造装置の下流にオゾンを低濃度に連続注入す
るオゾン注入部を設け、オゾン注入点と一次純水タンク
との間で循環ライン中のバクテリアを常時殺菌するとと
もに、超純水製造装置の上流に低圧紫外線オゾン分解装
置を設けてユーズポイントから一次純水タンクに戻って
来た水中のオゾンを超純水製造装置に流入前に分解して
除去するようにする。In particular, the ultrapure water production and supply system of the present invention is provided with an ozone injection section that continuously injects ozone at a low concentration downstream of the ultrapure water production device in the circulation line, and between the ozone injection point and the primary pure water tank. In addition to constantly sterilizing bacteria in the circulation line, a low-pressure ultraviolet ozone decomposition device is installed upstream of the ultrapure water production equipment, and the ozone in the water that returns to the primary pure water tank from the use point flows into the ultrapure water production equipment. Please disassemble and remove it first.
超純水製造装置を構成するポリシャー、限外濾過膜、逆
浸透膜等は一般にオゾンに耐えられない材質のものであ
ることが多いが、本発明では循環ラインのその上流の一
次純水タンク出口あるいは循環ポンプ出口との間に低圧
紫外線オゾン分解装置を設けるので、ここでオゾンが分
解されるとともに紫外線によりエネルギーを高められた
オゾンは水中に残留する僅かの有機物を酸化分解する。Polishers, ultrafiltration membranes, reverse osmosis membranes, etc. that make up ultrapure water production equipment are generally made of materials that cannot withstand ozone, but in the present invention, the primary pure water tank outlet upstream of the circulation line Alternatively, a low-pressure ultraviolet ozone decomposition device is provided between the outlet of the circulation pump, so that ozone is decomposed here and the ozone whose energy has been increased by ultraviolet rays oxidizes and decomposes a small amount of organic matter remaining in the water.
低圧紫外線オゾン分解装置は、通常の殺菌線の波長２５
４ｎｍの紫外線、さらに有機物の分解効果を高めるため
に波長１８５ｎｍの紫外線を発するものを用いることが
でき、好ましい結果が得られる。Low-pressure ultraviolet ozone decomposition equipment uses wavelength 25 of normal germicidal radiation.
Preferred results can be obtained by using ultraviolet rays with a wavelength of 4 nm, and furthermore, those that emit ultraviolet rays with a wavelength of 185 nm to enhance the decomposition effect of organic substances.
オゾンの注入と紫外線の分解作用により生じたガスの除
去を促進するため、紫外線オゾン分解装置の後に膜脱気
装置を設けることができ、生じた酸素ガス、炭酸ガスま
たは水中に溶解する可能性のある極低分子量の揮発性物
質の除去を行うことにより、超純水製造装置の機能を高
めることができる。このような膜脱気装置は、超純水の
用途との関係で酸素を取除（必要がある場合や、炭素ガ
スを取除いて後続するポリシャ゛−の寿命の延長を図る
ことを必要とする場合に付加することが望ましい。A membrane deaerator can be installed after the ultraviolet ozonolysis device to facilitate the removal of the gases produced by the ozone injection and the decomposition action of ultraviolet light, which eliminates the possibility of dissolving the generated oxygen gas, carbon dioxide gas or water. By removing certain extremely low molecular weight volatile substances, the functionality of ultrapure water production equipment can be improved. Such membrane deaerators are used to remove oxygen (if required) in connection with ultrapure water applications, or to remove carbon gas to extend the life of subsequent polishers. It is desirable to add it when doing so.
なお、膜脱気装置内での殺菌、ＴＯＣ低減等を徹底して
行う場合には、紫外線オゾン分解装置と膜脱気装置の配
列順序を逆にしてもよい。In addition, when thorough sterilization, TOC reduction, etc. are carried out within the membrane deaerator, the arrangement order of the ultraviolet ozone decomposition device and the membrane deaerator may be reversed.
超純水の用途との関係では、オゾン注入部は、電子工業
用超純水製造供給システムではユーズポイントと一次純
水タンクとの間に設け、また医薬品製造および食品製造
用超純水製造供給システムでは超純水製造装置とユーズ
ポイントとの間に設ける。In relation to the application of ultrapure water, the ozone injection part is installed between the use point and the primary pure water tank in ultrapure water production and supply systems for the electronic industry, and in ultrapure water production and supply systems for pharmaceutical manufacturing and food manufacturing. In the system, it is installed between the ultrapure water production equipment and the use point.
本発明はまた、超純水製造供給システムの構成に際して
、常時殺菌目的のオゾンが低濃度でも存在することに対
して、一次純水タンク、超純水製造装置を構成するハウ
ジング、配管材料およびユーズポイントとの間のライン
配管材料は、ステンレス鋼材で表面が電解研磨などで鏡
面仕上げされ、さらに必要な場合溶出を防止する酸化不
動態膜で覆ったものとし、オゾンによるアタックを防ぎ
材料よりの溶出を防止し、バクテリヤの着生、ＴＯＣの
生成を極減する。こうして極減したＴＯＣおよびオゾン
注入により生じたバクテリヤの死骸等の微粒子は超純水
製造装置のポリシャー後に設置した限外濾過膜、逆浸透
膜またはそれらの祖合せにより完全に除去される。The present invention also provides a primary pure water tank, a housing constituting an ultrapure water production device, piping materials, and used materials, in view of the constant presence of ozone for sterilization purposes even at low concentrations when configuring an ultrapure water production and supply system. The line piping material between the points is made of stainless steel and the surface is polished to a mirror finish by electrolytic polishing, etc., and if necessary, it is covered with an oxidized passivation film to prevent elution, which prevents ozone attack and prevents elution from the material. It prevents bacterial colonization and TOC generation. The extremely reduced TOC and fine particles such as dead bacteria generated by ozone injection are completely removed by an ultrafiltration membrane, a reverse osmosis membrane, or a combination thereof installed after the polisher of the ultrapure water production device.
以上を総合して、本発明の超純水製造装置は、構成とし
ては、−火線水製造装置に連なる一次純水タンクからの
純水を少なくともポリシャーを含む超純水製造装置に送
り精製した超純水を供給ラインを経由して各ユーズポイ
ントに送り、未使用超純水をリターンラインを経由して
一次純水タンクに戻す循環ラインにおいて、超純水製造
装置から一次純水タンクまでのライン中にオゾン注入部
を設け循環水流に連続注入するオゾンによりその下流を
低濃度オゾンの殺菌環境に維持するとともに、該下流を
表面が鏡面で研磨され酸化不動態膜で覆われているステ
ンレス鋼材で構成して低濃度オゾンによってもたらされ
る副次的不利影響を抑制し、かつ前記一次純水タンクか
ら超純水製造装置までのライン中に低圧紫外線オゾン分
解装置および必要により膜脱気装置を備えて残留オゾン
および溶解ガスによる超純水への副次的不利影響を抑制
するようにしたことを特徴とする。In summary, the ultrapure water production device of the present invention has the following configurations: - Pure water from the primary pure water tank connected to the caustic water production device is sent to the ultrapure water production device including at least a polisher and purified. A line from the ultrapure water production equipment to the primary pure water tank in the circulation line that sends pure water to each use point via the supply line and returns unused ultrapure water to the primary pure water tank via the return line. An ozone injection part is installed inside the circulating water stream, and ozone is continuously injected into the circulating water stream to maintain the downstream area in a sterilizing environment with low concentration ozone. The system is configured to suppress the side effects brought about by low concentration ozone, and is equipped with a low-pressure ultraviolet ozone decomposition device and, if necessary, a membrane degassing device in the line from the primary pure water tank to the ultrapure water production device. It is characterized by suppressing secondary adverse effects on ultrapure water due to residual ozone and dissolved gases.
以下、本発明の超純水製造供給装置を、第２図の従来技
術と対比される第１図のｉ環うインのフローに沿って具
体的に説明すると次のとおりである。Hereinafter, the ultrapure water production and supply apparatus of the present invention will be specifically explained along the flowchart of FIG. 1, which is compared with the prior art shown in FIG. 2.
一次純水製造装置（１）より供給される一次純水は一次
純水タンク（２）に貯留され、このタンクからの純水が
循環ポンプ（３）により、少なくともポリシャー（４）
を含む超純水製造装置（５）に送られるが、本発明では
循環ポンプ（３）の出口から先ず低圧紫外線オゾン分解
装置（６）、膜脱気装置（７）を通したのち超純水製造
装置（５）に送られ、これら装置で処理されて超純水と
なる。The primary pure water supplied from the primary pure water production device (1) is stored in the primary pure water tank (2), and the pure water from this tank is pumped to at least the polisher (4) by the circulation pump (3).
However, in the present invention, the ultrapure water is first passed from the outlet of the circulation pump (3) through a low-pressure ultraviolet ozone decomposition device (6) and a membrane deaerator (7). The water is sent to production equipment (5) and processed by these equipment to become ultrapure water.
この超純水は供給ライン（８）を経由してユーズポイン
ト（９）の各超純水消費個所に分配供給され、未使用分
にリターンライン００）を経て一次純水タンク（２）に
戻り循環するが、本発明では医薬品製造用および食品製
造用超純水製造供給装置の場合は、超純水製造装置（５
）の出口のオゾン注入部（１０でオゾンが超純水中に注
入され供給ライン（８）配管を経てユーズポイント（９
）に供給される。電子工業用超純水製造供給装置の場合
ではユーズポイント（９）後のリターンライン００）の
オゾン注入部０２）でオゾンが注入される。This ultrapure water is distributed and supplied to each ultrapure water consumption point of the use point (9) via the supply line (8), and the unused portion is returned to the primary pure water tank (2) via the return line 00). However, in the case of the ultrapure water production and supply apparatus for pharmaceutical and food production in the present invention, the ultrapure water production apparatus (5
) Ozone is injected into the ultrapure water at the outlet of the ozone injection part (10) and passes through the supply line (8) piping to the use point (9).
). In the case of an ultrapure water production and supply device for the electronics industry, ozone is injected at the ozone injection part 02) of the return line 00) after the use point (9).
オゾンを注入部０１）より注入する場合は、この注入点
から下流の供給ライン（８）ユーズポイント（９）、リ
ターンラインθ０）の配管中は超純水中のオゾンの殺菌
効果により常時殺菌状態となり、注入部０力より注入す
る場合はそれより下流のリターンライン００）の配管中
が常時殺菌状態となり、バクテリヤ数を極低レベルに保
つことができる。When injecting ozone from the injection point 01), the supply line (8), use point (9), and return line θ0) downstream from this injection point are constantly sterilized due to the sterilizing effect of ozone in the ultrapure water. Therefore, when injecting from the injection part 0 force, the piping of the return line 00) downstream from it is constantly sterilized, and the number of bacteria can be kept at an extremely low level.
ユーズポイント（９）にて使用されなかった超純水は、
オゾンが残留している状態で一次純水タンク（２）に戻
り一次純水製造装置（１）よりの補給水とともに循環ポ
ンプ（３）により低圧紫外線オゾン分解装置（６）に送
られる。従って一次純水タンク（２）および循環ポンプ
（３）内においても殺菌状態が保たれバクテリヤの発生
が防止できる。低圧紫外線オゾン分解装置（６）では残
留オゾンが分解され酸素に変わり、ここでＴＯＣが分解
される。The ultrapure water that was not used at the use point (9) is
The residual ozone is returned to the primary pure water tank (2) and is sent to the low-pressure ultraviolet ozone decomposition device (6) by the circulation pump (3) together with make-up water from the primary pure water production device (1). Therefore, the sterilization state is maintained also in the primary pure water tank (2) and the circulation pump (3), and the generation of bacteria can be prevented. In the low-pressure ultraviolet ozone decomposition device (6), residual ozone is decomposed and converted into oxygen, where TOC is decomposed.
膜脱気装置（７）では酸素および炭酸ガスが脱気され、
次の超純水製造装置（５）に再び送られ、そのポリシャ
ー（４）および限外濾過膜、逆浸透膜からなる精密濾過
器０３）を通り、オゾン殺菌により生じたバクテリヤの
死骸等の微粒子は精密濾過器０３）でカットされ、超純
水製造装置（５）から出る超純水は高純度の水質のもの
となる。Oxygen and carbon dioxide gas are degassed in the membrane deaerator (7),
Fine particles such as dead bacteria generated by ozone sterilization are sent to the next ultrapure water production equipment (5) and passed through the polisher (4) and a precision filter 03) consisting of an ultrafiltration membrane and a reverse osmosis membrane. is cut by a precision filter 03), and the ultrapure water that comes out of the ultrapure water production device (5) is of high purity water quality.
さらに前記同様のオゾン注入を連続的に行うことにより
循環ライン中は循環を活用してバクテリヤ数を極低レベ
ルに維持することができるとともに、ＴＯＣを分解しか
つ溶出を防ぎ、ＴＯＣも極低レベルの超純水を製造供給
することができる。Furthermore, by continuously injecting ozone in the same way as above, it is possible to maintain the number of bacteria at an extremely low level by utilizing circulation in the circulation line, and also to decompose TOC and prevent elution, resulting in an extremely low level of TOC. We can manufacture and supply ultrapure water.
（作 用）
以上のように、本発明の超純水製造供給装置においては
、超純水の循環システムの適所にオゾンの低濃度注入部
およびオゾン分解部を設けることにより、オゾン注入点
より下流の許容される限り広範囲の循環ライン範囲が常
時殺菌状態に維持されることにより、そしてこのライン
範囲を不動態酸化被膜で覆われた鏡面ステンレス鋼製と
することにより、バクテリアの生育、材料の溶出による
ＴＯＣの生成は極減される。(Function) As described above, in the ultrapure water production and supply apparatus of the present invention, by providing the low concentration ozone injection part and the ozone decomposition part at appropriate locations in the ultrapure water circulation system, By keeping the wide circulation line range permissible at all times in a sterile state, and by making this line range from mirror-polished stainless steel covered with a passive oxide film, bacterial growth and material leaching are prevented. The generation of TOC due to
そしてオゾン分解部でオゾン、ＴＯＣの分解を行うこと
により、超純水製造装置のポリシャーによる超純水製出
機能が高められ、かつ殺菌バクテリアの死骸、分解ＴＯ
Ｃの残留物等の微粒子の除去が行われる。Then, by decomposing ozone and TOC in the ozone decomposition section, the ability to produce ultrapure water by the polisher of the ultrapure water production equipment is enhanced, and the dead bodies of sterilizing bacteria and decomposed TOC are improved.
Particulates such as C residues are removed.
これらの結果ユーズポイントに供給される超純水のバク
テリア数およびＴＯＣ値のレベルは極度に低下させるこ
とができ、しかもこれらの作用、結果は超純水製造供給
システムの連続稼動を長時間中断することなく、また副
次的不利影響を伴わずに遂行される。As a result of these actions, the level of bacterial counts and TOC values of ultrapure water supplied to the point of use can be extremely reduced, and moreover, these effects and results can interrupt the continuous operation of the ultrapure water production and supply system for a long time. carried out without incident and without adverse side effects.
（実施列）
以下、本発明の超純水製造供給装置の実施例を°運転結
果の水質数値により従来技術と比較して下表に示す。(Execution row) Examples of the ultrapure water production and supply apparatus of the present invention are shown in the table below in comparison with the conventional technology based on the water quality values obtained from the operation results.
本発明はオゾン注入部（１１）を超純水製造袋で（５）
の出口に設置している実施例であり、比較従来技術は過
酸化水素による定期殺菌を実施している例であり、水質
はともに一次純水タンク入口およびユーズポイントで検
出した。The present invention uses an ultrapure water production bag (5) as the ozone injection part (11).
This is an example in which the water is installed at the outlet of the water tank, and the comparative prior art is an example in which periodic sterilization using hydrogen peroxide is carried out, and the water quality is both detected at the inlet of the primary pure water tank and at the use point.
（発明の効果）
本発明によると、超純水製造供給システムの運転を継続
しながらユーズポイントに供給する超純水中のバクテリ
ア数およびＴＯＣ値を実施例に示すように極減レベルに
維持することができ、しかも副次的悪影響のでないよう
にすることができる。(Effects of the Invention) According to the present invention, the number of bacteria and the TOC value in the ultrapure water supplied to the use point can be maintained at extremely reduced levels while continuing the operation of the ultrapure water production and supply system as shown in the examples. In addition, it is possible to prevent side effects from occurring.
第１図は本発明の超純水製造供給装置の実施例のフロー
線図、第２図は比較のための従来技術の超純水装置の代
表例のフロー線図である。
（１）・・・−次純水製造装置、（２）・・・−次純水
タンク、（３）・・・循環ポンプ、（４）・・・ポリシ
ャー、（５）・・・超純水製造装置、（６）・・・低圧
紫外線オゾン分解装置、（７）・・・膜脱気装置、（８
）・・・供給ライン、（９）・・・ユーズポイント、０
０）・・・リターンライン、（ＩＩ）０２）・・・オゾ
ン注入部、側・・・精密濾ｉｆＡ器、（ａ）・・・−次
純水タンク、（１））・・・−次純水製造装置、（Ｃ）
・・・循環ポンプ、（ｄ）・・・超純水製造装置、（ｅ
）・・・ポリシャー、（ｆ）・・・紫外線殺菌器、（ｇ
）・・・精密濾過器、（ロ）・・・供給ライン、（ｉ）
・・・ユーズポイント、
（ｊ）・・・リターンライン。FIG. 1 is a flow diagram of an embodiment of the ultrapure water production and supply apparatus of the present invention, and FIG. 2 is a flow diagram of a representative example of a conventional ultrapure water apparatus for comparison. (1)...-Next-pure water production equipment, (2)...-Next-pure water tank, (3)...Circulation pump, (4)...Polisher, (5)...Ultra-pure Water production equipment, (6)...Low pressure ultraviolet ozone decomposition equipment, (7)...Membrane deaerator, (8
)... Supply line, (9)... Use point, 0
0)...Return line, (II)02)...Ozone injection part, Side...Precision filtration ifA device, (a)...-Next pure water tank, (1))...-Next Pure water production equipment, (C)
... Circulation pump, (d) ... Ultrapure water production equipment, (e
)...Polisher, (f)...Ultraviolet sterilizer, (g
)...Precision filter, (b)... Supply line, (i)
...Use point, (j)...Return line.
Claims (4)
純水を少なくともポリシャーを含む超純水製造装置に送
り、精製した超純水を供給ラインを経由して各ユーズポ
イントに送り、未使用超純水をリターンラインを経由し
て一次純水タンクに戻す循環ラインにおいて、超純水製
造装置から一次純水タンクまでのライン中にオゾン注入
部を設け循環水流に連続注入するオゾンによりその下流
を低濃度オゾンの殺菌環境に維持するとともに該下流を
表面が鏡面に研磨され酸化不動態膜で覆われているステ
ンレス鋼材で構成して低濃度オゾンによってももたられ
る副次的不利影響を抑制し、かつ前記一次純水タンクか
ら超純水製造装置までのライン中に低圧紫外線オゾン分
解装置および必要により膜脱気装置を備えて残留オゾン
および溶解ガスによる超純水への副次的不利影響を抑制
するようにしたことを特徴とする超純水製造供給装置。(1) Pure water from the primary pure water tank connected to the primary pure water production equipment is sent to the ultrapure water production equipment that includes at least a polisher, and the purified ultrapure water is sent to each use point via the supply line. In the circulation line that returns the used ultrapure water to the primary pure water tank via the return line, an ozone injection section is installed in the line from the ultrapure water production equipment to the primary pure water tank, and ozone is continuously injected into the circulating water flow. The downstream part is maintained in a sterilizing environment with low concentration ozone, and the downstream part is made of stainless steel whose surface is polished to a mirror finish and covered with an oxidized passivation film to prevent the secondary adverse effects caused by low concentration ozone. A low-pressure ultraviolet ozone decomposition device and, if necessary, a membrane degassing device are installed in the line from the primary pure water tank to the ultrapure water production equipment to prevent secondary disadvantages to ultrapure water caused by residual ozone and dissolved gases. An ultrapure water production and supply device characterized by suppressing the influence.
〜１００ｐｐｂに維持する請求項１の装置。(2) The ozone concentration value of the low concentration ozone environment is at least 20
2. The apparatus of claim 1, wherein the device maintains ˜100 ppb.
イントまでの供給ライン中に備えられている請求項１の
装置。(3) The apparatus according to claim 1, wherein the ozone injection part is provided in a supply line from an ultrapure water production apparatus to a use point.
タンクまでのリターンライン中に備えられている請求項
１の装置。(4) The apparatus according to claim 1, wherein the ozone injection section is provided in a return line from the use point to the primary pure water tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29558788A JP2606910B2 (en) | 1988-11-21 | 1988-11-21 | Ultrapure water production and supply equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29558788A JP2606910B2 (en) | 1988-11-21 | 1988-11-21 | Ultrapure water production and supply equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02144195A true JPH02144195A (en) | 1990-06-01 |
| JP2606910B2 JP2606910B2 (en) | 1997-05-07 |
Family
ID=17822559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29558788A Expired - Lifetime JP2606910B2 (en) | 1988-11-21 | 1988-11-21 | Ultrapure water production and supply equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2606910B2 (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02261594A (en) * | 1989-03-31 | 1990-10-24 | Japan Organo Co Ltd | Device for producing ultra pure water |
| WO1993008931A2 (en) * | 1991-11-08 | 1993-05-13 | Tadahiro Ohmi | System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water |
| US5702673A (en) * | 1995-04-17 | 1997-12-30 | Ebara Corporation | Ozone generating apparatus |
| EP0856491A2 (en) * | 1997-01-31 | 1998-08-05 | Core Corporation | Apparatus for producing ozone water |
| JP2007196225A (en) * | 2006-01-27 | 2007-08-09 | Millipore Corp | Water purification system and method |
| US7793684B2 (en) | 2006-01-27 | 2010-09-14 | Millipore Corporation | Water purification system and method |
| WO2011051211A3 (en) * | 2009-10-30 | 2011-07-21 | Siemens Aktiengesellschaft | Method for operating a water treatment system and water treatment system suitable for performing the method, in particular for very pure water |
| JP2012096187A (en) * | 2010-11-04 | 2012-05-24 | Sumitomo Metal Mining Co Ltd | Ultrapure water production system, method for washing the same, and method for producing ultrapure water using the same |
| WO2013008721A1 (en) * | 2011-07-08 | 2013-01-17 | 栗田工業株式会社 | Device for supplying ozone water and method for supplying ozone water |
| JP2015178107A (en) * | 2015-06-08 | 2015-10-08 | 栗田工業株式会社 | Method of producing ultrapure water and ultrapure water production equipment |
| WO2020226094A1 (en) * | 2019-05-08 | 2020-11-12 | 株式会社キッツ | Washing water treatment device, disinfection and water treatment device, and washing water treatment method |
| JP2022118082A (en) * | 2017-10-31 | 2022-08-12 | 株式会社キッツ | Cleaning water treatment apparatus and sterilization purification apparatus |
-
1988
- 1988-11-21 JP JP29558788A patent/JP2606910B2/en not_active Expired - Lifetime
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02261594A (en) * | 1989-03-31 | 1990-10-24 | Japan Organo Co Ltd | Device for producing ultra pure water |
| WO1993008931A2 (en) * | 1991-11-08 | 1993-05-13 | Tadahiro Ohmi | System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water |
| WO1993008931A3 (en) * | 1991-11-08 | 1993-06-10 | Tadahiro Ohmi | System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water |
| US5589005A (en) * | 1991-11-08 | 1996-12-31 | Ohmi; Tadahiro | System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water |
| US5702673A (en) * | 1995-04-17 | 1997-12-30 | Ebara Corporation | Ozone generating apparatus |
| EP0856491A3 (en) * | 1997-01-31 | 1998-12-02 | Core Corporation | Apparatus for producing ozone water |
| EP0856491A2 (en) * | 1997-01-31 | 1998-08-05 | Core Corporation | Apparatus for producing ozone water |
| JP2012125769A (en) * | 2006-01-27 | 2012-07-05 | Emd Millipore Corp | Water purification system and method |
| JP2007196225A (en) * | 2006-01-27 | 2007-08-09 | Millipore Corp | Water purification system and method |
| US7793684B2 (en) | 2006-01-27 | 2010-09-14 | Millipore Corporation | Water purification system and method |
| US7931810B2 (en) | 2006-01-27 | 2011-04-26 | Millipore Corporation | Water purification system and method |
| US8146752B2 (en) | 2006-01-27 | 2012-04-03 | Emd Millipore Corporation | Water purification system and method |
| US8177977B2 (en) | 2006-01-27 | 2012-05-15 | Emd Millipore Corporation | Water purification system and method |
| WO2011051211A3 (en) * | 2009-10-30 | 2011-07-21 | Siemens Aktiengesellschaft | Method for operating a water treatment system and water treatment system suitable for performing the method, in particular for very pure water |
| JP2012096187A (en) * | 2010-11-04 | 2012-05-24 | Sumitomo Metal Mining Co Ltd | Ultrapure water production system, method for washing the same, and method for producing ultrapure water using the same |
| WO2013008721A1 (en) * | 2011-07-08 | 2013-01-17 | 栗田工業株式会社 | Device for supplying ozone water and method for supplying ozone water |
| JP2013017932A (en) * | 2011-07-08 | 2013-01-31 | Kurita Water Ind Ltd | Apparatus and method for supplying ozone water |
| JP2015178107A (en) * | 2015-06-08 | 2015-10-08 | 栗田工業株式会社 | Method of producing ultrapure water and ultrapure water production equipment |
| JP2022118082A (en) * | 2017-10-31 | 2022-08-12 | 株式会社キッツ | Cleaning water treatment apparatus and sterilization purification apparatus |
| WO2020226094A1 (en) * | 2019-05-08 | 2020-11-12 | 株式会社キッツ | Washing water treatment device, disinfection and water treatment device, and washing water treatment method |
| KR20220006514A (en) | 2019-05-08 | 2022-01-17 | 가부시키가이샤 기츠 | Washing water treatment apparatus for semiconductor manufacturing, liquid crystal manufacturing, and electronic parts, and washing water treatment method for semiconductor manufacturing, liquid crystal manufacturing and electronic parts |
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| Publication number | Publication date |
|---|---|
| JP2606910B2 (en) | 1997-05-07 |
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