JPH02142527U - - Google Patents

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Publication number
JPH02142527U
JPH02142527U JP5112789U JP5112789U JPH02142527U JP H02142527 U JPH02142527 U JP H02142527U JP 5112789 U JP5112789 U JP 5112789U JP 5112789 U JP5112789 U JP 5112789U JP H02142527 U JPH02142527 U JP H02142527U
Authority
JP
Japan
Prior art keywords
substrate
ultra
fine fiber
cleaning machine
scrubber cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5112789U
Other languages
English (en)
Other versions
JPH0617283Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989051127U priority Critical patent/JPH0617283Y2/ja
Publication of JPH02142527U publication Critical patent/JPH02142527U/ja
Application granted granted Critical
Publication of JPH0617283Y2 publication Critical patent/JPH0617283Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【図面の簡単な説明】
第１図Ａ及びＢは本考案の実施例を説明するた
めの説明図、第２図Ａ及びＢは装置を説明するた
めの図、第３図は従来例を説明するための図、第
４図Ａ，Ｂ，Ｃはそれぞれ洗浄動作を説明するた
めの図で、Ａは本考案Ｂ，Ｃは従来例である。 １………超極細繊維、２……スポンジ、３……
ブラツシ、４……異物、５……基板、６，１７…
…ローラ、７……純水、８，１１，１５，１８…
…モーター、９……ノズル、１０……アーム、１
２……エアーシリンダー、１３……円板、１４…
…ユニツト、１５……シヤワーである。

Claims (1)

    【実用新案登録請求の範囲】
  1. 鏡面研磨した基板表面をスクラブ洗浄するスク
    ラバー洗浄機において、弾性部材の表面を太さ１
    〜２μｍの超極細繊維部材で包み、超極細繊維で
    基板表面をこする様に成してスクラブ洗浄を行う
    ことを特徴とするスクラバー洗浄機。
JP1989051127U 1989-04-29 1989-04-29 スクラバー洗浄機 Expired - Lifetime JPH0617283Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989051127U JPH0617283Y2 (ja) 1989-04-29 1989-04-29 スクラバー洗浄機

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989051127U JPH0617283Y2 (ja) 1989-04-29 1989-04-29 スクラバー洗浄機

Publications (2)

Publication Number Publication Date
JPH02142527U true JPH02142527U (ja) 1990-12-04
JPH0617283Y2 JPH0617283Y2 (ja) 1994-05-02

Family

ID=31570283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989051127U Expired - Lifetime JPH0617283Y2 (ja) 1989-04-29 1989-04-29 スクラバー洗浄機

Country Status (1)

Country Link
JP (1) JPH0617283Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0547724A (ja) * 1991-08-13 1993-02-26 Shin Etsu Handotai Co Ltd ウエーハのブラシ洗浄装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9748090B2 (en) 2015-01-22 2017-08-29 Toshiba Memory Corporation Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612734A (en) * 1979-07-10 1981-02-07 Nec Corp Wafer polishing method
JPS57143831A (en) * 1981-03-03 1982-09-06 Toshiba Corp Process of semiconductor wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612734A (en) * 1979-07-10 1981-02-07 Nec Corp Wafer polishing method
JPS57143831A (en) * 1981-03-03 1982-09-06 Toshiba Corp Process of semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0547724A (ja) * 1991-08-13 1993-02-26 Shin Etsu Handotai Co Ltd ウエーハのブラシ洗浄装置

Also Published As

Publication number Publication date
JPH0617283Y2 (ja) 1994-05-02

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