JPH02142525U - - Google Patents

Info

Publication number
JPH02142525U
JPH02142525U JP4819790U JP4819790U JPH02142525U JP H02142525 U JPH02142525 U JP H02142525U JP 4819790 U JP4819790 U JP 4819790U JP 4819790 U JP4819790 U JP 4819790U JP H02142525 U JPH02142525 U JP H02142525U
Authority
JP
Japan
Prior art keywords
sample
gas
reaction
gas outlet
reaction gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4819790U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4819790U priority Critical patent/JPH02142525U/ja
Publication of JPH02142525U publication Critical patent/JPH02142525U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP4819790U 1990-05-10 1990-05-10 Pending JPH02142525U (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4819790U JPH02142525U (de) 1990-05-10 1990-05-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4819790U JPH02142525U (de) 1990-05-10 1990-05-10

Publications (1)

Publication Number Publication Date
JPH02142525U true JPH02142525U (de) 1990-12-04

Family

ID=31564793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4819790U Pending JPH02142525U (de) 1990-05-10 1990-05-10

Country Status (1)

Country Link
JP (1) JPH02142525U (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645266A (ja) * 1991-12-30 1994-02-18 Texas Instr Inc <Ti> 単一ウエーハ半導体処理装置用プログラム可能な多ゾーンガス注入器

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5678497A (en) * 1979-11-27 1981-06-27 Fujitsu Ltd Vapor growth apparatus
JPS56137639A (en) * 1980-03-31 1981-10-27 Chiyou Lsi Gijutsu Kenkyu Kumiai Decompression vapor growth device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5678497A (en) * 1979-11-27 1981-06-27 Fujitsu Ltd Vapor growth apparatus
JPS56137639A (en) * 1980-03-31 1981-10-27 Chiyou Lsi Gijutsu Kenkyu Kumiai Decompression vapor growth device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645266A (ja) * 1991-12-30 1994-02-18 Texas Instr Inc <Ti> 単一ウエーハ半導体処理装置用プログラム可能な多ゾーンガス注入器

Similar Documents

Publication Publication Date Title
JPH0167739U (de)
JPH04115531A (ja) 化学気相成長装置
JPH02142525U (de)
AU4195985A (en) Chemical vapour deposition wafer boat
JPH01147067A (ja) カーボン硬質膜の被覆方法
KR100266840B1 (ko) 감압 cvd 장치
JPH0186227U (de)
JPH0220213Y2 (de)
JPS63106765U (de)
JPS63140619U (de)
JPH03111561U (de)
KR970052086A (ko) 화학기상 증착 장치의 샤워 헤드(Shower Head)
JPS6182957U (de)
JPS63175158U (de)
JPH03120030U (de)
JPH01100433U (de)
JPH073635Y2 (ja) 気相成長装置
JPH0519330Y2 (de)
JPH0350324U (de)
JPS6454329U (de)
JPH04633U (de)
JPS6311575U (de)
JPS6389231U (de)
JPS63106766U (de)
JPS6346473U (de)