JPH02141878U - - Google Patents

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Publication number
JPH02141878U
JPH02141878U JP5168989U JP5168989U JPH02141878U JP H02141878 U JPH02141878 U JP H02141878U JP 5168989 U JP5168989 U JP 5168989U JP 5168989 U JP5168989 U JP 5168989U JP H02141878 U JPH02141878 U JP H02141878U
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JP
Japan
Prior art keywords
current
density distribution
current density
cup holder
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5168989U
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English (en)
Japanese (ja)
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JPH065661Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5168989U priority Critical patent/JPH065661Y2/ja
Publication of JPH02141878U publication Critical patent/JPH02141878U/ja
Application granted granted Critical
Publication of JPH065661Y2 publication Critical patent/JPH065661Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)
JP5168989U 1989-05-02 1989-05-02 電流密度分布測定装置 Expired - Lifetime JPH065661Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5168989U JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5168989U JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Publications (2)

Publication Number Publication Date
JPH02141878U true JPH02141878U (enExample) 1990-11-29
JPH065661Y2 JPH065661Y2 (ja) 1994-02-09

Family

ID=31571346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5168989U Expired - Lifetime JPH065661Y2 (ja) 1989-05-02 1989-05-02 電流密度分布測定装置

Country Status (1)

Country Link
JP (1) JPH065661Y2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007018921A (ja) * 2005-07-08 2007-01-25 Hitachi High-Tech Science Systems Corp 真空排気系を利用したシリンダを用いたイオンビーム電流測定機構
JP2009543053A (ja) * 2006-06-29 2009-12-03 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド ビーム密度の二次元測定方法および装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007018921A (ja) * 2005-07-08 2007-01-25 Hitachi High-Tech Science Systems Corp 真空排気系を利用したシリンダを用いたイオンビーム電流測定機構
JP2009543053A (ja) * 2006-06-29 2009-12-03 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド ビーム密度の二次元測定方法および装置

Also Published As

Publication number Publication date
JPH065661Y2 (ja) 1994-02-09

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