JPH02141783A - Manufacture of fixing roller - Google Patents
Manufacture of fixing rollerInfo
- Publication number
- JPH02141783A JPH02141783A JP29461288A JP29461288A JPH02141783A JP H02141783 A JPH02141783 A JP H02141783A JP 29461288 A JP29461288 A JP 29461288A JP 29461288 A JP29461288 A JP 29461288A JP H02141783 A JPH02141783 A JP H02141783A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- teflon
- resistor layer
- base material
- heating resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 37
- 229920006362 Teflon® Polymers 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 24
- 239000004809 Teflon Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 238000002425 crystallisation Methods 0.000 claims description 8
- 230000008025 crystallization Effects 0.000 claims description 8
- 239000002470 thermal conductor Substances 0.000 claims description 4
- 230000004927 fusion Effects 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract 1
- 239000002585 base Substances 0.000 description 11
- 238000007747 plating Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910017888 Cu—P Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000005338 frosted glass Substances 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Fixing For Electrophotography (AREA)
- Control Of Resistance Heating (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、複写機等に用いる定着ローラの製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a fixing roller used in copying machines and the like.
従来の定着ローラとしては、例えば実開昭６１−１６０
４６４号がある。この技術は、アルミニューム等の金属
パイプ内にヒータを内蔵させ、このヒータの発する熱に
より金属パイプを１８０°Ｃ〜２００°Ｃ程度に加熱し
、この金属パイプと圧着ローラの間にトナーの現像され
た用紙を通してトナーを熱定着させるものであった。As a conventional fixing roller, for example,
There is No. 464. This technology incorporates a heater inside a metal pipe made of aluminum or the like, heats the metal pipe to about 180°C to 200°C using the heat generated by this heater, and develops toner between the metal pipe and the pressure roller. The toner was then thermally fixed through the heated paper.
このような従来技術によると、金属パイプの表面温度が
通常使用可能な１８０°Ｃ〜２００℃程度になるまでに
は、ヒータの電力投入後５分間程度の立ち上がり時間を
要し、しかもこの電力としてＩＫＷを必要としていた。According to such conventional technology, it takes about 5 minutes after the heater is powered on for the surface temperature of the metal pipe to reach the normal usable range of 180°C to 200°C, and moreover, this electric power is IKW was needed.
そこで、本出願人は既に特願昭６２−１４１５９６号に
よって上記の問題を解決する定着ローラの発明を出願し
た。この技術を第５図の断面図によって説明する。Therefore, the present applicant has already filed an invention for a fixing roller which solves the above problem in Japanese Patent Application No. 62-141596. This technique will be explained with reference to the cross-sectional view of FIG.
この第５図に示す定着ローラはガラス、ホーローもしく
はセラミック等の低熱伝導体製のローラ基材ｌの表面に
発熱抵抗体層２を形成し、その表面をテフロン層３で覆
い、発熱抵抗体層２の両端にリング状の電極４を取り付
けた構造である。The fixing roller shown in FIG. 5 has a heat generating resistor layer 2 formed on the surface of a roller base material l made of a low thermal conductor such as glass, enamel or ceramic, and the surface thereof is covered with a Teflon layer 3. It has a structure in which ring-shaped electrodes 4 are attached to both ends of the electrode.
以上の従来技術によると、熱の立ち上がり時間は従来の
１１５程度以下が期待でき、しかも消費電力を低減させ
ることができる特徴がある。According to the above-mentioned conventional technology, the heat rise time can be expected to be about 115 times or less than the conventional technology, and the power consumption can be reduced.
しかし、製造工程において、発熱抵抗体層の形成に無電
解Ｎｉ合金めっき膜を用いた場合、テフロン層加工時等
の加熱行程において結晶化がおこり、その個所の抵抗値
が大きく変化してしまうために全体の抵抗値がばらつく
ことになる。そのために加工工程中の温度管理を厳しく
制御しなければならないという問題がある。However, in the manufacturing process, when an electroless Ni alloy plating film is used to form the heating resistor layer, crystallization occurs during the heating process such as when processing the Teflon layer, and the resistance value at that location changes significantly. The overall resistance value will vary. Therefore, there is a problem in that temperature management during the processing process must be strictly controlled.
（課題を解決する為の手段〕
本発明は、低熱伝導体製のローラ基材の表面に発熱抵抗
体層を形成し、その後にその表面にテフロン層を形成し
、上記発熱抵抗体層に電極を接続し、この電極を介して
印加電力を印加することにより発生するジュール熱によ
ってトナー現像された用紙のトナーを熱定着させる定着
ローラの製造方法において、ローラ基材の表面に発熱抵
抗体層を形成した後に加熱処理を施し、その後にテフロ
ン層形成処理を行うようにしたことを特徴とする。(Means for Solving the Problems) The present invention involves forming a heating resistor layer on the surface of a roller base material made of a low thermal conductor, then forming a Teflon layer on the surface, and electrodes on the heating resistor layer. In this method, a heating resistor layer is provided on the surface of the roller base material. It is characterized in that a heat treatment is performed after the formation, and then a Teflon layer forming treatment is performed.
以上の構成によると、発熱抵抗体層を完全に結晶化させ
て抵抗値の安定化を確保した後にテフロン層形成処理を
行うことができることになり、発熱抵抗体層の抵抗値の
ばらつきをなくすことができることになる。According to the above configuration, the Teflon layer formation process can be performed after the heating resistor layer is completely crystallized and the resistance value is stabilized, thereby eliminating variations in the resistance value of the heating resistor layer. will be possible.
〔実 施 例］ 以下に本発明の詳細な説明する。〔Example] The present invention will be explained in detail below.
第１図は断面図であり、図において、５はローラ基材で
あり、熱伝導率の悪い材質例えばフェノール樹脂等の合
成樹脂、すりガラス、結晶ガラス等のガラス、アルミナ
セラミックス、あるいはホーロー加工したステンレスパ
イプ等製であり、外径３０ｆｆ１１、長さ２８０ｍｍ、
肉厚１〜１．５［［［ｍの管体である。Figure 1 is a cross-sectional view, and in the figure, 5 is the roller base material, which is made of a material with poor thermal conductivity, such as synthetic resin such as phenol resin, glass such as frosted glass or crystal glass, alumina ceramics, or enameled stainless steel. Made of pipe etc., outer diameter 30ff11, length 280mm,
It is a tube with a wall thickness of 1 to 1.5 m.
６はこのローラ基材５の表面に無電解メツキにより形成
した発熱抵抗体層、７は発熱抵抗体層６を形成したロー
ラ基材５の両側に設けた電極、８はこの発熱抵抗体層６
を覆う絶縁層を形成するテフロン層である。6 is a heat generating resistor layer formed on the surface of this roller base material 5 by electroless plating, 7 is an electrode provided on both sides of the roller base material 5 on which the heat generating resistor layer 6 is formed, 8 is this heat generating resistor layer 6
A Teflon layer that forms an insulating layer covering the
つぎに、このような構成の定着ローラの製造方法を以下
に説明する。Next, a method for manufacturing the fixing roller having such a configuration will be described below.
■ ローラ基材５の表面が鏡面の場合は、酸またはアル
カリ処理による化学エツチングあるいはホーニング等に
より表面を適度な粗面とする。(2) If the surface of the roller base material 5 is a mirror surface, the surface is made appropriately rough by chemical etching or honing using acid or alkali treatment.
■ ローラ基材５をトリクロルエチレンで１０分間蒸気
洗浄する。■ Steam cleaning the roller base material 5 with trichlorethylene for 10 minutes.
■ 塩化スズと塩酸の水溶液に１分間漬け、３０秒水洗
後、続いて塩化パラジウムと塩酸の水溶液に１分間漬け
、３０秒水洗する工程を数回繰り返して前処理とする。(2) Pretreatment is performed by repeating the process of soaking in an aqueous solution of tin chloride and hydrochloric acid for 1 minute, washing with water for 30 seconds, then soaking in an aqueous solution of palladium chloride and hydrochloric acid for 1 minute, and washing with water for 30 seconds several times.
■ ８０°Ｃ５ｐＨ４，６の無電解Ｎ１−Ｐメツキ浴に
より０．１〜０．２μｍの発熱抵抗体層２を形成する。(2) A heating resistor layer 2 of 0.1 to 0.2 μm is formed in an electroless N1-P plating bath at 80° C. and pH 4.6.
また、発熱抵抗体層６は、８０°Ｃ，ｐＨ９の無電解Ｎ
１−Ｃｕ−Ｐメツキ浴により０．１〜０．５ ｕ ｍに
形成してもよい。このとき、以下に説明する電極近傍の
発熱抵抗体層６の膜厚を薄くしておくと全長にわたって
比較的均一な温度分布が得られることになるもので、こ
のような膜厚にするにはメツキ時に片側ずつ一定時間メ
ツキ槽より出すことで容易に形成することができる。Further, the heating resistor layer 6 is made of electroless N at 80°C and pH 9.
It may be formed to a thickness of 0.1 to 0.5 um using a 1-Cu-P plating bath. At this time, if the thickness of the heating resistor layer 6 near the electrodes is made thin, as will be explained below, a relatively uniform temperature distribution can be obtained over the entire length. It can be easily formed by taking one side out of the plating tank for a certain period of time during plating.
■ 真空中（ｌ Ｘ １０−’ｔｏｒｒ） １時間所定
の温度で加熱処理を行う。なお、加熱雰囲気はこれに限
らずＮ２．大気中でもよい。(2) Heat treatment is performed at a predetermined temperature for 1 hour in vacuum (l×10-'torr). Note that the heating atmosphere is not limited to this, but may be N2. Can be used in the atmosphere.
上記加熱温度は無電解Ｎｉ合金の結晶化特性により異な
るが、加熱により結晶化させて安定層を形成する必要が
ある。Although the above-mentioned heating temperature varies depending on the crystallization characteristics of the electroless Ni alloy, it is necessary to crystallize it by heating and form a stable layer.
第２図はＮ１−Ｐメツキ膜の示差熱のグラフであり、Ｐ
の含有量の差により結晶化温度が異なるという特性がわ
かり、たとえばＰの含有量が５．３ ｗ ｔ％以下の場
合４５０°Ｃ以上での加熱温度での熱処理が必要であり
、１３．４ ｗ ｔ％以上では３５０°Ｃ以上の加熱温
度での熱処理が必要である。Figure 2 is a graph of differential heat of N1-P plating film, and P
It has been found that the crystallization temperature differs depending on the difference in the content of P. For example, when the content of P is 5.3 wt% or less, heat treatment at a heating temperature of 450°C or higher is required; If the content exceeds wt%, heat treatment at a heating temperature of 350°C or higher is required.
また、この他Ｎｉ合金に対しても４５０°Ｃ以上での加
熱温度での熱処理を行う必要がある。In addition, it is also necessary to heat treat Ni alloys at a heating temperature of 450°C or higher.
そこで、後述する工程のテフロン層形成工程において４
００°Ｃ前後の加熱処理が必要であるため、結晶化温度
がその温度以下ならばテフロン層形成工程中に結晶化し
て安定層となる。しかし、結晶化温度がそれ以上の温度
の場合はテフロン層形成工程温度が結晶化を進めて抵抗
値を決定させてしまうためにテフロン層形成工程の加熱
処理の正確さが問われて作業が非常に困難になる。Therefore, in the Teflon layer forming step, which will be described later,
Since heat treatment at around 00°C is required, if the crystallization temperature is below that temperature, it will crystallize during the Teflon layer forming process and become a stable layer. However, if the crystallization temperature is higher than that, the Teflon layer forming process temperature will advance crystallization and determine the resistance value, so the accuracy of the heat treatment in the Teflon layer forming process will be questioned, making the work extremely difficult. becomes difficult.
そのため、上記のように予め所定の温度で加熱処理を施
し、完全に結晶化させてしまうことによって抵抗値の安
定化を確保することができることになる。Therefore, by performing heat treatment at a predetermined temperature in advance as described above to completely crystallize, it is possible to ensure stabilization of the resistance value.
■ 上記発熱抵抗体層６の表面にＰＦＡ樹脂等のテフロ
ン層４を１０〜４０μｍ形成する。このときテフロン層
形成処理温度が４００°Ｃ前後に達する。(2) A Teflon layer 4 made of PFA resin or the like is formed to a thickness of 10 to 40 μm on the surface of the heating resistor layer 6. At this time, the Teflon layer forming treatment temperature reaches around 400°C.
■ 上記発熱抵抗体層６に密着させて両端にリング状の
電極７を取り付ける。(2) Ring-shaped electrodes 7 are attached to both ends in close contact with the heating resistor layer 6.
本実施例の定着ローラはこのような工程によって形成す
ることができる。The fixing roller of this embodiment can be formed by such a process.
そこで、第３図にテフロン層形成処理前後の抵抗値変化
を示すと、図示の如く加熱処理を行ってからテフロン層
形成処理を行ったものは初期抵抗値に対するテフロン層
形成処理後の抵抗値変化が一定となり、抵抗値のばらつ
きがなくなることがわかる。Therefore, Figure 3 shows the change in resistance value before and after the Teflon layer forming process. It can be seen that the resistance value becomes constant and there is no variation in resistance value.
以上詳細に説明した本発明によると、低熱伝導体製のロ
ーラ基材の表面に発熱抵抗体層を形成し、その後にその
表面にテフロン層を形成し、上記発熱抵抗体層に電極を
接続し、この電極を介して印加電力を印加することによ
り発生するジュール熱によってトナー現像された用紙の
トナーを熱定着させる定着ローラの製造方法において、
ローラ基材の表面に発熱抵抗体層を形成した後、加熱処
理を施し、その後にテフロン層形成処理を行うようにし
たことによって、発熱抵抗体層を完全に結晶化させて抵
抗値の安定化を確保した後にテフロン層形成処理を行う
ことができることになり、発熱抵抗体層の抵抗値のばら
つきをなくすことができる効果を有する。According to the present invention described in detail above, a heating resistor layer is formed on the surface of a roller base material made of a low thermal conductor, a Teflon layer is then formed on the surface, and an electrode is connected to the heating resistor layer. , in a method for manufacturing a fixing roller that thermally fixes toner on a sheet of paper that has been developed with Joule heat generated by applying electric power through this electrode,
After forming the heat generating resistor layer on the surface of the roller base material, heat treatment is performed, followed by Teflon layer formation treatment, which completely crystallizes the heat generating resistor layer and stabilizes the resistance value. The Teflon layer forming process can be carried out after ensuring the temperature of the heat generating resistor layer, which has the effect of eliminating variations in the resistance value of the heat generating resistor layer.
第１図は実施例を示す断面図、第２図はメツキ膜の示差
熱のグラフ、第３図はテフロン層形成処理前後の抵抗値
変化を示す熱の分布状態を示すグラフ、第４図従来例の
断面図である。
５・・・ローラ基材
６・・・電極
７・・・発熱抵抗体層
８・・・テフロン層
実施例の断面図
輸 １ 国Fig. 1 is a cross-sectional view showing the embodiment, Fig. 2 is a graph of differential heat of the plating film, Fig. 3 is a graph showing the state of heat distribution showing the resistance value change before and after the Teflon layer forming treatment, and Fig. 4 is the conventional one. FIG. 3 is an example cross-sectional view. 5...Roller base material 6...Electrode 7...Heating resistor layer 8...Teflon layer Cross-sectional view of Example 1 Country
Claims (1)
形成し、その後にその表面にテフロン層を形成し、上記
発熱抵抗体層に電極を接続し、この電極を介して印加電
力を印加することにより発生するジュール熱によってト
ナー現像された用紙のトナーを熱定着させる定着ローラ
の製造方法において、 ローラ基材の表面に発熱抵抗体層を形成した後に加熱処
理を施し、 〔登録商標〕 その後にテフロン層形成処理を行うようにしたことを特
徴とする定着ローラの製造方法。 ２、請求項１記載において、発熱抵抗体層の結晶化温度
がテフロン融着温度以上のものは、結晶化温度の最高値
より高い温度で加熱処理を行うことを特徴とする定着ロ
ーラの製造方法。[Claims] 1. A heating resistor layer is formed on the surface of a roller base material made of a low thermal conductor, a Teflon layer is then formed on the surface, an electrode is connected to the heating resistor layer, and this In a method for manufacturing a fixing roller that thermally fixes toner on paper that has been developed with Joule heat generated by applying electric power through an electrode, heat treatment is performed after forming a heating resistor layer on the surface of the roller base material. [Registered Trademark] followed by a Teflon layer forming process. 2. A method for manufacturing a fixing roller according to claim 1, characterized in that when the heating resistor layer has a crystallization temperature equal to or higher than the Teflon fusion temperature, the heat treatment is performed at a temperature higher than the maximum crystallization temperature. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63294612A JPH087510B2 (en) | 1988-11-24 | 1988-11-24 | Fixing roller manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63294612A JPH087510B2 (en) | 1988-11-24 | 1988-11-24 | Fixing roller manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02141783A true JPH02141783A (en) | 1990-05-31 |
| JPH087510B2 JPH087510B2 (en) | 1996-01-29 |
Family
ID=17810012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63294612A Expired - Fee Related JPH087510B2 (en) | 1988-11-24 | 1988-11-24 | Fixing roller manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH087510B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS579091A (en) * | 1980-06-18 | 1982-01-18 | Mitsubishi Gas Chemical Co | Heater |
| JPS59178471A (en) * | 1983-03-29 | 1984-10-09 | Kyocera Corp | Heat fixing roller |
| JPS63158582A (en) * | 1986-12-23 | 1988-07-01 | Fuji Xerox Co Ltd | Formation of resistance heating element layer of heating and fixing roll |
-
1988
- 1988-11-24 JP JP63294612A patent/JPH087510B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS579091A (en) * | 1980-06-18 | 1982-01-18 | Mitsubishi Gas Chemical Co | Heater |
| JPS59178471A (en) * | 1983-03-29 | 1984-10-09 | Kyocera Corp | Heat fixing roller |
| JPS63158582A (en) * | 1986-12-23 | 1988-07-01 | Fuji Xerox Co Ltd | Formation of resistance heating element layer of heating and fixing roll |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH087510B2 (en) | 1996-01-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH02308291A (en) | Heat fixing roll for copying machine and its manufacture | |
| JPH02141783A (en) | Manufacture of fixing roller | |
| KR20200137427A (en) | Heater structure of aerosol generator | |
| JPH01177577A (en) | Fixing roll and its production | |
| JPS59149385A (en) | Heat fixing device | |
| JPS6087376A (en) | Fixing device | |
| JPS6425543A (en) | Manufacture of film including silicon oxide | |
| WO2020037852A1 (en) | Heating body and manufacturing method therefor, and aerosol generation apparatus | |
| JP2000317896A (en) | Manufacture of thin film plane structure | |
| JPS60225770A (en) | Thernal head | |
| JPH11143275A (en) | Fixing device | |
| GB926002A (en) | Improvements in radiant electrical resistance heaters and the production thereof | |
| JPH09146400A (en) | Fixing roller | |
| JPS5967567A (en) | Heat fixation roll | |
| JPH0529065A (en) | Manufacture of fixing roller | |
| JPH0636121B2 (en) | Heat fixing roll for copier | |
| JPH10160698A (en) | Micro sensor | |
| JP2919086B2 (en) | Fixing device | |
| EP1002446A1 (en) | Elecric heaters | |
| JPH05299155A (en) | Flame spraying heating element generating far infrared radiation | |
| JPH01103412A (en) | Method of heating roll | |
| JPS6217484Y2 (en) | ||
| JPS59155873A (en) | Heat fixing device | |
| JPH03129694A (en) | Heating element | |
| RU2239002C2 (en) | Method of preventing attachment of scale to stainless steel heating surface |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |