JPH02133475U - - Google Patents
Info
- Publication number
- JPH02133475U JPH02133475U JP4183189U JP4183189U JPH02133475U JP H02133475 U JPH02133475 U JP H02133475U JP 4183189 U JP4183189 U JP 4183189U JP 4183189 U JP4183189 U JP 4183189U JP H02133475 U JPH02133475 U JP H02133475U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid
- nozzle
- coating
- discharging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 238000007599 discharging Methods 0.000 claims 2
- 239000003595 mist Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Liquid Crystal (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4183189U JPH02133475U (US06521211-20030218-C00004.png) | 1989-04-10 | 1989-04-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4183189U JPH02133475U (US06521211-20030218-C00004.png) | 1989-04-10 | 1989-04-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02133475U true JPH02133475U (US06521211-20030218-C00004.png) | 1990-11-06 |
Family
ID=31552835
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4183189U Pending JPH02133475U (US06521211-20030218-C00004.png) | 1989-04-10 | 1989-04-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02133475U (US06521211-20030218-C00004.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008518767A (ja) * | 2004-11-03 | 2008-06-05 | ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | 基板を保持する回転式装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57201564A (en) * | 1981-06-01 | 1982-12-10 | Dainippon Printing Co Ltd | Coating method |
| JPS60100434A (ja) * | 1983-11-05 | 1985-06-04 | Mitsubishi Electric Corp | 半導体基板の絶縁被膜処理装置 |
| JPS6250768B2 (US06521211-20030218-C00004.png) * | 1978-12-08 | 1987-10-27 | Hitachi Seisakusho Kk |
-
1989
- 1989-04-10 JP JP4183189U patent/JPH02133475U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6250768B2 (US06521211-20030218-C00004.png) * | 1978-12-08 | 1987-10-27 | Hitachi Seisakusho Kk | |
| JPS57201564A (en) * | 1981-06-01 | 1982-12-10 | Dainippon Printing Co Ltd | Coating method |
| JPS60100434A (ja) * | 1983-11-05 | 1985-06-04 | Mitsubishi Electric Corp | 半導体基板の絶縁被膜処理装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008518767A (ja) * | 2004-11-03 | 2008-06-05 | ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング | 基板を保持する回転式装置 |
