JPH02131143U - - Google Patents
Info
- Publication number
- JPH02131143U JPH02131143U JP3934789U JP3934789U JPH02131143U JP H02131143 U JPH02131143 U JP H02131143U JP 3934789 U JP3934789 U JP 3934789U JP 3934789 U JP3934789 U JP 3934789U JP H02131143 U JPH02131143 U JP H02131143U
- Authority
- JP
- Japan
- Prior art keywords
- clean room
- room
- adsorbent
- catalyst
- clean
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003463 adsorbent Substances 0.000 claims 3
- 239000003054 catalyst Substances 0.000 claims 3
- 238000004140 cleaning Methods 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 1
Landscapes
- Ventilation (AREA)
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3934789U JPH0712825Y2 (ja) | 1989-04-03 | 1989-04-03 | クリーンルーム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3934789U JPH0712825Y2 (ja) | 1989-04-03 | 1989-04-03 | クリーンルーム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02131143U true JPH02131143U (US07166745-20070123-C00016.png) | 1990-10-31 |
| JPH0712825Y2 JPH0712825Y2 (ja) | 1995-03-29 |
Family
ID=31548180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3934789U Expired - Fee Related JPH0712825Y2 (ja) | 1989-04-03 | 1989-04-03 | クリーンルーム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0712825Y2 (US07166745-20070123-C00016.png) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04126513A (ja) * | 1990-08-31 | 1992-04-27 | Hitachi Plant Eng & Constr Co Ltd | クリーンルーム |
| JPH04221164A (ja) * | 1990-12-21 | 1992-08-11 | Toray Ind Inc | システム畳およびクリーン化ルーム |
| US6897165B2 (en) | 2001-06-06 | 2005-05-24 | Matsushita Electric Industrial Co., Ltd. | Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4006436A4 (en) * | 2019-07-22 | 2022-08-31 | S.Y. Technology, Engineering & Construction Co., Ltd. | ENERGY SAVING VENTILATION SYSTEM USING PROCESS EXHAUST AIR |
-
1989
- 1989-04-03 JP JP3934789U patent/JPH0712825Y2/ja not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04126513A (ja) * | 1990-08-31 | 1992-04-27 | Hitachi Plant Eng & Constr Co Ltd | クリーンルーム |
| JPH04221164A (ja) * | 1990-12-21 | 1992-08-11 | Toray Ind Inc | システム畳およびクリーン化ルーム |
| US6897165B2 (en) | 2001-06-06 | 2005-05-24 | Matsushita Electric Industrial Co., Ltd. | Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0712825Y2 (ja) | 1995-03-29 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |