JPH02131143U - - Google Patents

Info

Publication number
JPH02131143U
JPH02131143U JP3934789U JP3934789U JPH02131143U JP H02131143 U JPH02131143 U JP H02131143U JP 3934789 U JP3934789 U JP 3934789U JP 3934789 U JP3934789 U JP 3934789U JP H02131143 U JPH02131143 U JP H02131143U
Authority
JP
Japan
Prior art keywords
clean room
room
adsorbent
catalyst
clean
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3934789U
Other languages
Japanese (ja)
Other versions
JPH0712825Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3934789U priority Critical patent/JPH0712825Y2/en
Publication of JPH02131143U publication Critical patent/JPH02131143U/ja
Application granted granted Critical
Publication of JPH0712825Y2 publication Critical patent/JPH0712825Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Ventilation (AREA)
  • Treating Waste Gases (AREA)
  • Separation Of Gases By Adsorption (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

図は本考案のクリーンルームの一実施例を示す
断面図である。 １……クリーンルーム、２……前室、３……後
室、４……吸入グクト、５ａ，５ｂ，５ｃ，５ｄ
……除害ブロツク。 The figure is a sectional view showing an embodiment of the clean room of the present invention. 1... Clean room, 2... Front chamber, 3... Back chamber, 4... Inhalation gas, 5a, 5b, 5c, 5d
...Abatement block.

Claims (1)

【実用新案登録請求の範囲】 １ 洗浄機構を通して不純物を除去した清浄空気
を、室上部又は側部より室内へ流入し、対向部よ
り導出せしめると共に、該導出空気を清浄化して
循環するよう構成したクリーンルームにおいて、
前記清浄機構に触媒、吸着剤等で構成された除害
ブロツクを設けたことを特徴とするクリーンルー
ム。 ２ 前記除害ブロツクの触媒、吸着剤等が、ハニ
カム構造に成形されてなることを特徴とする請求
項１記載のクリーンルーム。 ３ 前記除害ブロツクの触媒、吸着剤が適宜組合
せて併用されることを特徴とする請求項１又は２
記載のクリーンルーム。[Claims for Utility Model Registration] 1. Clean air from which impurities have been removed through a cleaning mechanism flows into the room from the top or side of the room, is led out from the opposing part, and the drawn air is purified and circulated. In the clean room,
A clean room characterized in that the cleaning mechanism is provided with an abatement block composed of a catalyst, an adsorbent, etc. 2. The clean room according to claim 1, wherein the catalyst, adsorbent, etc. of the abatement block are formed into a honeycomb structure. 3. Claim 1 or 2, characterized in that the catalyst and adsorbent of the abatement block are used in an appropriate combination.
Clean room as described.
JP3934789U 1989-04-03 1989-04-03 Clean room Expired - Fee Related JPH0712825Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3934789U JPH0712825Y2 (en) 1989-04-03 1989-04-03 Clean room

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3934789U JPH0712825Y2 (en) 1989-04-03 1989-04-03 Clean room

Publications (2)

Publication Number Publication Date
JPH02131143U true JPH02131143U (en) 1990-10-31
JPH0712825Y2 JPH0712825Y2 (en) 1995-03-29

Family

ID=31548180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3934789U Expired - Fee Related JPH0712825Y2 (en) 1989-04-03 1989-04-03 Clean room

Country Status (1)

Country Link
JP (1) JPH0712825Y2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04126513A (en) * 1990-08-31 1992-04-27 Hitachi Plant Eng & Constr Co Ltd Clean room
JPH04221164A (en) * 1990-12-21 1992-08-11 Toray Ind Inc System 'tatami' carpet and clean room
US6897165B2 (en) 2001-06-06 2005-05-24 Matsushita Electric Industrial Co., Ltd. Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021013048A1 (en) * 2019-07-22 2021-01-28 世源科技工程有限公司 Energy-saving ventilation system using process exhaust air

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04126513A (en) * 1990-08-31 1992-04-27 Hitachi Plant Eng & Constr Co Ltd Clean room
JPH04221164A (en) * 1990-12-21 1992-08-11 Toray Ind Inc System 'tatami' carpet and clean room
US6897165B2 (en) 2001-06-06 2005-05-24 Matsushita Electric Industrial Co., Ltd. Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber

Also Published As

Publication number Publication date
JPH0712825Y2 (en) 1995-03-29

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees