JPH02130819A - Vapor growth device - Google Patents

Abstract

PURPOSE:To continuously operate a normal pressure vapor growth device by a method wherein a wafer holding plate is divided into two, a solid wafer holding plate of a part carrying the wafer and a wafer holding plate covering the part of a wafer periphery while being able to be removed. CONSTITUTION:A wafer 1 is carried on a solid wafer holding plate 2 and its periphery is covered by a removable holding plate 3 while being made to perform vapor growth under a gas blowing-out plate 4. Thereby, dust sticks only to the removable wafer holding plate 3. The removable wafer holding plate only is to be regularly exchanged and the solid wafer holding plate is left as it is. Being in this way divided into the removable wafer holding plate and the solid wafer holding plate, the wafer holding plate is avoided from being regularly removed for cleaning while not requiring to adjust the height of the wafer holding plate and the gas blowing-out plate. The device can be continuously operated.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a vapor phase growth apparatus, and particularly to an atmospheric pressure vapor growth apparatus.

[Conventional technology]

Conventionally, this type of vapor phase growth apparatus is shown in Figures 2 (A) and (B).
As shown in FIG. 2, the wafer 1 was placed on a continuously moving wafer holding plate 5, and a vapor-phase grown film was attached to the wafer under the gas blowing plate 4 by the reaction gas.

[Problem to be solved by the invention]

In the conventional vapor phase growth apparatus described above, the reactive film adheres not only to the wafer but also to the wafer holding plate, so that it eventually becomes dust and adheres to the wafer.

Therefore, the wafer holding plate must be replaced periodically, but there is a drawback that it takes a lot of time to position the gap between the wafer holding plate and the gas blowing plate.

[Means to solve the problem]

The vapor phase growth apparatus of the present invention has a gas blowing plate for blowing a reaction gas onto the wafer, and a large number of wafer holding plates that move continuously while holding the wafer, wherein the wafer holding plate is It is characterized by having a structure that is divided into a fixed wafer holding plate on which the wafer rests, and a removable wafer holding plate that covers the area around the wafer.

〔Example〕

Next, the present invention will be explained with reference to the drawings.

FIG. 1(A) is a plan view of one embodiment of the present invention, and FIG. 1(B) is a plan view of an embodiment of the present invention.
) is a vertical sectional view of FIG. 1(A). The wafer 1 is mounted on a fixed wafer holding plate 2, its outer periphery is covered with a removable wafer holding plate 3, and vapor phase growth is performed under the gas blowing plate 4, so that dust is only stored on the removable wafer holding plate 3. adhere to. Only the removable wafer holding plates should be replaced periodically, and the fixed wafer holding plates should be left as they are.

〔Effect of the invention〕

As explained above, by dividing the wafer holding plate into a removable wafer holding plate and a fixed wafer holding plate, it is no longer necessary to remove the wafer holding plate periodically for cleaning, and the wafer holding plate and gas blowing There is no need to adjust the height of the plate, and the device can be operated continuously.

[Brief Description of the Drawings] Figure 1 (A) is a plan view of an embodiment of the present invention, Figure 1 (B)
1A is a longitudinal sectional view of FIG. 1(A), FIG. 2(A) is a plan view of a conventional vapor phase growth apparatus, and FIG. 2(B) is a longitudinal sectional view of FIG. 2(A). 1...Wafer 2...Fixed wafer holding plate, 3...Removable wafer holding plate, 4...Reactive gas blowing slope, 5...・・・
...Wafer holding plate. Agent Patent Attorney Susumu Uchihara

Claims (1)

[Claims] In a vapor phase growth apparatus that has a gas blowing plate for blowing reaction gas onto the wafer and a large number of wafer holding plates that move continuously while holding the wafer, the wafer holding plate is used to fix the part on which the wafer is placed. A vapor phase growth apparatus characterized by having a structure that is divided into a wafer holding plate and a wafer holding plate that covers a portion around the wafer and cannot be removed.