JPH02122824A - Seal structure of assembling type vacuum chamber - Google Patents

Seal structure of assembling type vacuum chamber

Info

Publication number
JPH02122824A
JPH02122824A JP27499888A JP27499888A JPH02122824A JP H02122824 A JPH02122824 A JP H02122824A JP 27499888 A JP27499888 A JP 27499888A JP 27499888 A JP27499888 A JP 27499888A JP H02122824 A JPH02122824 A JP H02122824A
Authority
JP
Japan
Prior art keywords
gasket
gaskets
vacuum chamber
string
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27499888A
Other languages
Japanese (ja)
Inventor
Kazuhiko Okamura
和彦 岡村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP27499888A priority Critical patent/JPH02122824A/en
Publication of JPH02122824A publication Critical patent/JPH02122824A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/002Component parts of these vessels not mentioned in B01J3/004, B01J3/006, B01J3/02 - B01J3/08; Measures taken in conjunction with the process to be carried out, e.g. safety measures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Refrigerator Housings (AREA)

Abstract

PURPOSE:To seal precisely without leakage by putting string-like gaskets in the upper and lower surface of right and left plates which compose a vacuum chamber. CONSTITUTION:Grooves for string-like gasket are formed in the upper and lower surfaces of right and left plates 1, 2 which compose a vacuum chamber and there square gaskets 9 are fixed. The gasket grooves are so formed that the both ends of the string like square gaskets 9 are curved and extended slightly from the end surfaces in front and rear of the side plates 1, 2. Moreover, an endless square gasket 10 is provided in the front and back side doors 5, 6. Airtightness between the right and left side plats 1, 2 and up and down side plates 3, 4 are maintained by the gaskets 9. The airtightness among the front and back side doors 5, 6 and right and left and up and down plates 1, 2, 3, 4 is kept by properly adjusting the extended length A of gaskets 9 and the gasket 10 and as a result, close sealing is improved and leakage is prevented.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は真空チャンバーのシール構造に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a seal structure for a vacuum chamber.

〔従来の技術1 従来の真空チャンバーは前後の扉部を除き、上下・左右
の板材は溶接構造であったため、上下・左右にシールは
使用していなかった。
[Conventional technology 1] In conventional vacuum chambers, except for the front and rear doors, the top, bottom, left and right plates were welded, so seals were not used on the top, bottom, left and right sides.

[発明が解決しようとする課題] しかし、前述の従来技術では溶接部分があるため、その
ままでは平行度、平面度、寸法精度等の精度が出ないと
いう問題点を有する。また1接後再加工するとしても難
しい場合や無理な場合があり限界があるという問題点を
有する。そこで本発明はこのような問題点を解決するも
ので、その目的とするところは、(′@接を使わず組立
式で、精度が良く、漏れのない真空チャンバーを提供す
るところにある。
[Problems to be Solved by the Invention] However, the above-mentioned conventional technology has a problem in that accuracy such as parallelism, flatness, and dimensional accuracy cannot be achieved if the welded portion is present. Further, even if reprocessing is performed after the first contact, there are cases where it is difficult or impossible, and there is a problem that there is a limit. The present invention is intended to solve these problems, and its purpose is to provide a vacuum chamber that can be assembled without using contacts, has high precision, and is leak-free.

[課題を解決するための手段1 本発明の組立式真空チャンバーのシール構造は、チャン
バーを構成する左右の側板の上下面に紐状のガスケット
を介在させ、かつこの紐状ガスケットの両端をll11
1板の前後端面よりわずかに出っ張るように湾曲させ、
前後扉を閉めると、この部分は前後扉についているエン
ドレスのガスケットが押し当てられ密着するようなtM
 aとしたことを特徴とする。
[Means for Solving the Problems 1] The sealing structure of the prefabricated vacuum chamber of the present invention includes string-shaped gaskets interposed between the upper and lower surfaces of the left and right side plates constituting the chamber, and both ends of the string-shaped gaskets
It is curved so that it slightly protrudes from the front and rear end surfaces of one plate,
When the front and rear doors are closed, the endless gaskets attached to the front and rear doors are pressed against this part, making a close contact.
It is characterized by a.

[実 施 例] 第1.2.3図はそれぞれ本発明の実施例における、上
板3をはずしたところの平面図、前扉5をはずしたとこ
ろの正面図、側面図であり、第4図は前後扉5.6のP
矢視図である。
[Embodiment] Figures 1.2.3 are a plan view with the top plate 3 removed, a front view with the front door 5 removed, and a side view, respectively, in an embodiment of the present invention. The figure shows P for front and rear doors 5.6
It is an arrow view.

チャンバーを構成する左右の側板l、2の上下面には紐
状のガスケット溝が形成されており、ここに紐状の角ガ
スケット9が取付けられている。
String-shaped gasket grooves are formed in the upper and lower surfaces of the left and right side plates 1 and 2 constituting the chamber, and string-shaped square gaskets 9 are attached thereto.

このガスケット溝は、第1図のように紐状角ガスケット
9の両端を湾曲させ、側板l、2の前後端面よりわずか
に出っ張る様に形成されている。また前後の扉5.6に
はエンドレスの角ガスケットIOが取付けられている。
As shown in FIG. 1, this gasket groove is formed by curving both ends of the string-like square gasket 9 so as to slightly protrude from the front and rear end surfaces of the side plates 1 and 2. Furthermore, endless square gaskets IO are attached to the front and rear doors 5.6.

ここでガスケットIOは、前後のR5,6を左右の側板
1.2に押しつけた時、ガスケット9に当たり密着する
ように配置されている。
Here, the gasket IO is arranged so that when the front and rear R5, 6 are pressed against the left and right side plates 1.2, they come into contact with the gasket 9 and come into close contact.

以上のシール構成でチャンバーを組み立てると、左右側
板l、2と上下板3,4の間の気密性はガスケット9に
より保たれる。また左右上下板1.2.3.4と1ii
i後扉5.6との間の気密性は、ガスケット9の出っ張
り量Aを適当にとることで、ガスケットlOにより保た
れ、またガスケット9、IOは完全に密着するため、ガ
スケット9、lOの間の回り込みによる漏れもない。本
実施例では、ガスケット9、lOとも5 mm’の角ガ
スケット(材質パイトン)を使用し、出っ張り量Aは0
.4mrrlとしている。
When the chamber is assembled with the above sealing configuration, the gasket 9 maintains airtightness between the left and right side plates 1 and 2 and the upper and lower plates 3 and 4. In addition, left and right upper and lower plates 1.2.3.4 and 1ii
i The airtightness between the rear door 5.6 and the rear door 5.6 can be maintained by the gasket IO by appropriately setting the protrusion amount A of the gasket 9, and since the gaskets 9 and IO are in complete contact, There is no leakage due to wraparound. In this example, both the gasket 9 and lO are 5 mm' square gaskets (made of Piton), and the amount of protrusion A is 0.
.. It is set at 4mrrl.

本実施例では第2図におけるチヘ・ンバーの内寸法B、
Cの寸法精度と、左右上下tfil、2.34の内面の
平滑性及び平面度・平行度が要求されるために組立式と
せざるを得なかった。
In this embodiment, the inner dimension B of the front panel in Fig. 2,
Since dimensional accuracy of C, horizontal and vertical Tfil, smoothness, flatness and parallelism of the inner surface of 2.34 were required, it had to be assembled.

また本実施例では左右fllll IM l、2に角ガ
スケント9を取付ける為の溝をつけているが」−下板3
4の下面・上面につけても良い。
In addition, in this embodiment, grooves are provided on the left and right IM l, 2 for attaching the square gasket 9.''-Lower plate 3
You can also attach it to the bottom or top of 4.

また本発明のシール構造は、第5図に示すように真空チ
ャンバー間の連結にも適用できる6[発明の効果] 以上述べたように本発明によれば、組立て式の真空チャ
ンバーにおいて、ガスケットを組み合わせ互いに密着さ
せることにより漏れを無くすことができ、その結果溶接
を使わないで済む為、チャンバーの内寸法及び内面の平
行度・平面度等精度の高い真空チャンバーが得られると
いう効果を有する。
Furthermore, the seal structure of the present invention can be applied to the connection between vacuum chambers as shown in FIG. By combining and bringing them into close contact with each other, leakage can be eliminated, and as a result, welding is not required, which has the effect of providing a vacuum chamber with high precision in terms of internal dimensions and parallelism and flatness of the inner surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のシール構造を有する真空チャンバーの
上板をはずした平面図。 第2図は同じ(前扉をはずした正面図。 第3図は同じ(側面図。 第4図−は同じく前後扉のP矢視図、第5図は上記真空
チャンバーを二つ連結した場合の側面図。 l・・・左側板 ・右側板 ・上板 ・底板 ・ 前扉板 ・後扉板 ・扉固定用アングル ボルト・ナツト 紐状角ガスケット ・エンドレス角ガスケッ ト
FIG. 1 is a plan view of a vacuum chamber having a seal structure according to the present invention with the top plate removed. Figure 2 is the same (front view with the front door removed. Figure 3 is the same (side view). Figure 4- is the same view from the P arrow of the front and rear doors, and Figure 5 is the case where the two vacuum chambers mentioned above are connected. Side view of l...Left side plate, right side plate, top plate, bottom plate, front door plate, rear door plate, door fixing angle bolt, nut string-shaped square gasket, endless square gasket

Claims (1)

【特許請求の範囲】[Claims] 板材と板材の間にガスケットを介在させ、漏れのない様
にした組立式の真空チャンバーにおいて、真空チャンバ
ーを構成する左右の側板の上下面に紐状のガスケットを
介在させ、かつこの紐状ガスケットの両端を側板の前後
端面よりわずかに出っ張るように湾曲させ、前後扉を閉
めると、この部分は前後扉についているエンドレスのガ
スケットが押し当てられ密着するような構造としたこと
を特徴とする組立式真空チャンバーのシール構造。
In an assembly-type vacuum chamber in which a gasket is interposed between the plate materials to prevent leakage, string-like gaskets are interposed on the upper and lower surfaces of the left and right side plates that make up the vacuum chamber, and the string-like gasket is A prefabricated vacuum characterized by having both ends curved so as to protrude slightly from the front and rear end surfaces of the side plates, so that when the front and rear doors are closed, endless gaskets attached to the front and rear doors are pressed against these parts and are in close contact with each other. Chamber seal structure.
JP27499888A 1988-10-31 1988-10-31 Seal structure of assembling type vacuum chamber Pending JPH02122824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27499888A JPH02122824A (en) 1988-10-31 1988-10-31 Seal structure of assembling type vacuum chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27499888A JPH02122824A (en) 1988-10-31 1988-10-31 Seal structure of assembling type vacuum chamber

Publications (1)

Publication Number Publication Date
JPH02122824A true JPH02122824A (en) 1990-05-10

Family

ID=17549472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27499888A Pending JPH02122824A (en) 1988-10-31 1988-10-31 Seal structure of assembling type vacuum chamber

Country Status (1)

Country Link
JP (1) JPH02122824A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058130U (en) * 1991-07-18 1993-02-05 株式会社トヤマ Ultra high vacuum container
US7160393B2 (en) * 2003-03-26 2007-01-09 Cyg Corporation Vacuum chamber assembly
KR100752242B1 (en) * 2007-02-05 2007-08-27 에이스하이텍 주식회사 Slit of arc chamber generating semiconductor plasma
WO2010094724A1 (en) * 2009-02-22 2010-08-26 Mapper Lithography Ip B.V. Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
EP2293321A1 (en) * 2009-09-08 2011-03-09 Applied Materials, Inc. Mechanical modularity chambers
CN103920423A (en) * 2014-04-21 2014-07-16 厦门大学 Vacuum chamber with visual growth process for preparing graphene

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058130U (en) * 1991-07-18 1993-02-05 株式会社トヤマ Ultra high vacuum container
US7160393B2 (en) * 2003-03-26 2007-01-09 Cyg Corporation Vacuum chamber assembly
KR100752242B1 (en) * 2007-02-05 2007-08-27 에이스하이텍 주식회사 Slit of arc chamber generating semiconductor plasma
WO2010094724A1 (en) * 2009-02-22 2010-08-26 Mapper Lithography Ip B.V. Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
US8690005B2 (en) 2009-02-22 2014-04-08 Mapper Lithography Ip B.V. Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
EP2293321A1 (en) * 2009-09-08 2011-03-09 Applied Materials, Inc. Mechanical modularity chambers
WO2011029783A1 (en) * 2009-09-08 2011-03-17 Applied Materials, Inc. Mechanical modularity chambers
CN103920423A (en) * 2014-04-21 2014-07-16 厦门大学 Vacuum chamber with visual growth process for preparing graphene

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