JPH02122696A - Manufacture of multilayer printed circuit board - Google Patents

Manufacture of multilayer printed circuit board

Info

Publication number
JPH02122696A
JPH02122696A JP27783788A JP27783788A JPH02122696A JP H02122696 A JPH02122696 A JP H02122696A JP 27783788 A JP27783788 A JP 27783788A JP 27783788 A JP27783788 A JP 27783788A JP H02122696 A JPH02122696 A JP H02122696A
Authority
JP
Japan
Prior art keywords
catalyst
hole
conductor layer
wall
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27783788A
Other languages
Japanese (ja)
Other versions
JPH0716096B2 (en
Inventor
Kyoko Koizumi
小泉 恭子
Keisuke Okada
岡田 圭祐
Hirotoku Ota
広徳 大田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP27783788A priority Critical patent/JPH0716096B2/en
Publication of JPH02122696A publication Critical patent/JPH02122696A/en
Publication of JPH0716096B2 publication Critical patent/JPH0716096B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/429Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To improve the wiring containability by forming a conductor layer on the innerwall of a through-hole including a catalytic insulation layer formed with catalytic insulation substrate and a catalytic prepreg and catalyst adsorbing section through electroless plating thereby eliminating design restriction factor such as setting of characteristic impedance. CONSTITUTION:When a mask 8 is removed through organic solvent and electroless copper plating is applied, a conductor circuit pattern 1a of exposed multilayer substrate 6 and a conductor layer 10 on the inner wall of through- holes 7a, 7b are formed. In the through-hole 7a, the conductor layer 10 is formed only on a catalytic insulation layer 5 and not formed on the catalystless insulation substrate 3, and thereby the conductor layer 10 separates on the inner wall of the through-hole 7a and the conductor circuit patterns 1a, 1b are connected each other. In the through-hole 7b, the conductor layer 10 is formed entirely on the inner wall with the previously adsorbed catalyst 9. By such arrangement, a multilayer printed circuit board 13 containing splitted via-holed 11 and conventional through-hole 12 can be obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は多層印刷配線板の製造方法に関し、特に高密度
実装のために導体層が分割して設けたスルホールを一部
に有する多層印刷配線板の製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a multilayer printed wiring board, and particularly to a multilayer printed wiring board in which a part of the conductor layer has through holes formed by dividing it for high-density packaging. This invention relates to a method for manufacturing a board.

〔従来の技術〕[Conventional technology]

LS1.IC等の高集積化、電子機器の高性能化と経済
性向上のために多層印刷配線板(以下、多層板と記す)
の高密度化が進展している。
LS1. Multilayer printed wiring boards (hereinafter referred to as multilayer boards) are used to increase the integration of ICs, etc., and to improve the performance and economic efficiency of electronic devices.
densification is progressing.

多層板の高密度化に対して、主に2つの対応が図られて
いる。第1に導体層数の増加、すなわち高多層化であり
、第2の対応が基本格子間への多配線化である。しかし
ながら、第1の対応では、眉間の導体層を接続するバイ
アホールの増加になり、第2の対応の多配線化、しいて
は、配線の収容性を著しく制限する。そのため、特に、
このバイアホールを多層板に貫通孔として設けた場合、
バイアホールを小径化する事で対応しているが、板厚/
孔径比(アスペクト比)が増加し多層板の製造性を著し
く阻害している。
Two main measures are being taken to address the increasing density of multilayer boards. The first response is to increase the number of conductor layers, that is, to increase the number of layers, and the second response is to increase the number of interconnects between basic lattices. However, in the first solution, the number of via holes connecting the conductor layers between the eyebrows increases, which significantly limits the number of wiring lines in the second solution, and hence the wiring capacity. Therefore, especially
When this via hole is provided as a through hole in a multilayer board,
This has been solved by reducing the diameter of the via hole, but the plate thickness/
The pore diameter ratio (aspect ratio) increases, which significantly impedes the productivity of multilayer boards.

このため、上述した欠点を解消する手段として、第2図
(A)に示す様に、導体回路パターン1を形成した触媒
入り絶縁基板2を2組最外層に配置し、その内側に多層
板の貫通孔の直径より大なる同心円にくり抜いた孔部1
4を設けた触媒なしの絶縁基板3と触媒入りプリプレグ
4とを介挿させて、第2図(B)に示す様に、加熱、加
圧して多層化基板6を形成する工程と、第2図(C)に
示すように、多層化基板6の所定の位置に貫通孔7a、
7bを穿設する工程と、第2図(D>に示す様に、多層
化基板6の貫通孔7a内壁の触媒入り絶縁基板2端面に
導体回路パターン1の端面と導通接続する導体層10を
無電解めっきにより形成する工程を経て、分割されたバ
イアホール11と通常のスルホール12とを選択的に形
成する事により高密度化を達成した例がある(特願昭6
1−029361 >。
Therefore, as a means to eliminate the above-mentioned drawbacks, as shown in FIG. 2(A), two sets of catalyst-containing insulating substrates 2 on which conductor circuit patterns 1 are formed are placed in the outermost layer, and a multilayer board is placed inside them. Hole 1 hollowed out in a concentric circle larger than the diameter of the through hole
4, a catalyst-free insulating substrate 3 provided with a catalyst-containing prepreg 4 is inserted, and as shown in FIG. 2(B), a multilayer substrate 6 is formed by heating and pressurizing. As shown in FIG.
7b, and as shown in FIG. There is an example in which high density was achieved by selectively forming divided via holes 11 and normal through holes 12 through a process of forming by electroless plating (Japanese patent application No. 6).
1-029361>.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、上述した従来の製造方法では、通常のス
ルホール形成用の貫通孔の穿孔位置に貫通孔の直径より
大なる同心円にくり抜いた孔部を多層化基板の内側の触
媒なしの絶縁基板に設けるため、貫通孔と前記孔部間に
クリアランスを必要とし、平面方向の基本格子を小さく
できず、平面方向の高密度化の阻害要因になるという欠
点がある。
However, in the conventional manufacturing method described above, a concentric hole larger than the diameter of the through hole is provided in the catalyst-free insulating substrate inside the multilayer substrate at the drilling position of the through hole for normal through hole formation. However, since a clearance is required between the through hole and the hole portion, the basic lattice in the planar direction cannot be made small, which is a disadvantage in that it becomes an impediment to increasing the density in the planar direction.

又、先の孔部を触媒入りプリプレグに含浸された触媒入
レジンだけで充填する必要があるため、触媒なしの絶縁
基板の厚みが厚すぎるとボイドが発生するために、厚み
の制約が起こり、多層板の電気特性とりわけインピーダ
ンス特性に対する制約要因となる欠点がある。
In addition, since it is necessary to fill the previous hole with only the catalyst-containing resin impregnated into the catalyst-containing prepreg, if the thickness of the insulating substrate without a catalyst is too thick, voids will occur, resulting in thickness restrictions. There are drawbacks that limit the electrical properties, particularly the impedance properties, of the multilayer board.

さらに、孔部の穴数に応じで、触媒入りプリプレグ層の
樹脂量を調整する必要が生じ、又、孔部の平面方向での
薬中度に依って多層板の平滑性や層間厚コントロールが
困難となるという欠点がある。
Furthermore, it is necessary to adjust the amount of resin in the catalyst-containing prepreg layer depending on the number of holes, and the smoothness of the multilayer board and interlayer thickness control depend on the degree of chemical penetration in the planar direction of the holes. The disadvantage is that it is difficult.

本発明の目的は、高密度でインピーダンス特性に対する
制約がなく、平滑性や眉間厚のコントロールか可能な多
層印刷配線板の製造方法を提供することにある。
An object of the present invention is to provide a method for manufacturing a multilayer printed wiring board that has high density, has no restrictions on impedance characteristics, and allows control of smoothness and glabellar thickness.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の多層印刷配線板の製造方法は、予め導体回路パ
ターンを表裏両面に設けた触媒入り絶縁基板の2組をそ
れぞれ最外層に配置し、その内側に触媒なしの絶縁基板
と触媒入りプリプレグとを介挿させて加熱、加圧して多
層化基板を成型する工程と、前記多層化基板の所定の位
置に貫通孔を穿孔する工程と、前記貫通孔の一部をマス
クした後、マスクされていない前記貫通孔内壁に触媒を
吸着させる工程と、前記マスクを除去する工程と、前記
貫通孔内壁の前記触媒入り絶縁基板と前記触媒入りプリ
プレグとで形成された触媒入り絶縁層及び触媒を吸着さ
せた部分を含めて無電解めっきで導体層を形成する工程
とを含んで構成される。
In the method for manufacturing a multilayer printed wiring board of the present invention, two sets of catalyst-containing insulating substrates on which conductor circuit patterns are provided on both the front and back sides are arranged as the outermost layer, and an insulating substrate without a catalyst and a catalyst-containing prepreg are placed inside the insulating substrates. a step of forming a multilayer substrate by heating and pressurizing the multilayer substrate; a step of drilling a through hole at a predetermined position of the multilayer substrate; and a step of masking a part of the through hole, and then forming a a step of adsorbing a catalyst on the inner wall of the through hole, a step of removing the mask, and a step of adsorbing the catalyst and the insulating layer containing the catalyst formed of the insulating substrate containing the catalyst and the prepreg containing the catalyst on the inner wall of the through hole. and forming a conductor layer by electroless plating, including the portion where the conductor layer is formed.

〔実施例〕〔Example〕

次に、本発明の実施例について図面を参照して説明する
Next, embodiments of the present invention will be described with reference to the drawings.

第1図は本発明の一実施例の製造方法を説明する工程順
に示した縦断面図である。
FIG. 1 is a longitudinal cross-sectional view showing the order of steps for explaining a manufacturing method according to an embodiment of the present invention.

まず、第1図(A)に示す様に、予め導体回路パターン
la、lbを表裏両面に設けた触媒入り絶縁基板2の2
組をそれぞれ最外層に配置し、その内側に触媒なしの絶
縁基板3と触媒入りプリプレグ4とを介挿させてセット
する。
Firstly, as shown in FIG.
Each set is placed on the outermost layer, and an insulating substrate 3 without a catalyst and a prepreg 4 containing a catalyst are interposed and set inside.

次に、第1図(B)に示すように、加熱、加圧して触媒
入り絶縁層5及び触媒なしの絶縁基板3とを含む多層化
基板6を得る。
Next, as shown in FIG. 1B, heating and pressure are applied to obtain a multilayer substrate 6 including an insulating layer 5 containing a catalyst and an insulating substrate 3 without a catalyst.

次に、第1図(C)に示す様に、所定の位置にN/Cド
リリング装置により貫通孔7a、7bを穿孔する。
Next, as shown in FIG. 1(C), through holes 7a and 7b are drilled at predetermined positions using an N/C drilling device.

次に、第1図(D)に示すように、分割されたバイアホ
ールを形成する貫通孔7aをホト印刷法により、例えば
、デュポン社製ドライブィルムリストン1220@を用
いて、マスク8を形成した後、塩化パラジウムをベース
にした触媒液に浸漬して、マスク8が施されていない貫
通孔7bの内壁全体に触媒9を吸着させる。
Next, as shown in FIG. 1(D), a mask 8 is formed by photoprinting the through holes 7a forming the divided via holes using, for example, DuPont's Dry Film Muriston 1220@. After that, the catalyst 9 is immersed in a catalyst liquid based on palladium chloride to adsorb the catalyst 9 onto the entire inner wall of the through hole 7b where the mask 8 is not applied.

次に、マスク8を有機溶剤で除去した後(図示路)第1
図(E)に示すように、無電解銅めっきを施すと、多層
化基板6の露出した導体回路パターン1a及び貫通孔7
a、7bの内壁に導体層10が形成される。この場合、
貫通孔7aに於いては、触媒入り絶縁層5にのみ導体層
10が形成され、触媒なしの絶縁基板3には形成されな
いため、貫通孔7a内壁で導体層10の分離が起こり、
且つ、導体回路パターン1aと1bが接続され、一方、
貫通孔7bに於いては、先に吸着させた触媒9により、
内壁全体に導体層10が形成されることにより、分割さ
れたバイアホール11と通常のスルホール12と含む多
層印刷配線板13を得る。
Next, after removing the mask 8 with an organic solvent (as shown), the first
As shown in FIG.
A conductor layer 10 is formed on the inner walls of a and 7b. in this case,
In the through hole 7a, the conductor layer 10 is formed only on the catalyst-containing insulating layer 5 and not on the catalyst-free insulating substrate 3, so that separation of the conductor layer 10 occurs on the inner wall of the through hole 7a.
Moreover, the conductor circuit patterns 1a and 1b are connected, and on the other hand,
In the through hole 7b, due to the previously adsorbed catalyst 9,
By forming the conductor layer 10 over the entire inner wall, a multilayer printed wiring board 13 including divided via holes 11 and normal through holes 12 is obtained.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、分割されたバイアホール
を選択的に多層印刷配線板に形成する場合に、従来技術
の様な基本格子配置9層間厚、特性インピーダンス設定
等の種々設計的制約要素がなく、配線収容性が大幅に向
上した高密度な多層印刷配線板が得られる効果がある。
As explained above, when selectively forming divided via holes in a multilayer printed wiring board, the present invention has various design constraints such as basic lattice arrangement, interlayer thickness, characteristic impedance setting, etc., unlike the prior art. This has the effect of providing a high-density multilayer printed wiring board with significantly improved wiring accommodation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(A)〜(E)は本発明の一実施例の製造方法を
説明する工程順に示した縦断面図、第2図(A)〜(D
)は従来の製造方法の一例を説明する工程順に示した縦
断面図である。 la、lb・・・導体回路パターン、2・・・触媒入り
絶縁基板、3・・・触媒なしの絶縁基板、4・・・触媒
入りプリプレグ、5・・・触媒入り絶縁層、6・・・多
層化基板、7a、7b・・・貫通孔、8・・・マスク、
9・・・触媒、10・・・導体層、11・・・分割され
たバイアホール、12・・・通常のスルホール、13・
・・多層印刷配線板、14・・・孔部。
FIGS. 1(A) to (E) are longitudinal sectional views showing the manufacturing method of an embodiment of the present invention in the order of steps, and FIGS. 2(A) to (D
) is a vertical cross-sectional view showing an example of a conventional manufacturing method in the order of steps. la, lb... Conductor circuit pattern, 2... Insulating substrate containing catalyst, 3... Insulating substrate without catalyst, 4... Prepreg containing catalyst, 5... Insulating layer containing catalyst, 6... Multilayer substrate, 7a, 7b... through hole, 8... mask,
9... Catalyst, 10... Conductor layer, 11... Divided via hole, 12... Normal through hole, 13...
...Multilayer printed wiring board, 14...hole.

Claims (1)

【特許請求の範囲】[Claims]  予め導体回路パターンを表裏両面に設けた触媒入り絶
縁基板の2組をそれぞれ最外層に配置し、その内側に触
媒なしの絶縁基板と触媒入りプリプレグとを介挿させて
加熱,加圧して多層化基板を成型する工程と、前記多層
化基板の所定の位置に貫通孔を穿孔する工程と、前記貫
通孔の一部をマスクした後、マスクされていない前記貫
通孔内壁に触媒を吸着させる工程と、前記マスクを除去
する工程と、前記貫通孔内壁の前記触媒入り絶縁基板と
前記触媒入りプリプレグとで形成された触媒入り絶縁層
及び触媒を吸着させた部分を含めて無電解めっきで導体
層を形成する工程とを含む事を特徴とする多層印刷配線
板の製造方法。
Two sets of catalyst-containing insulating substrates with conductor circuit patterns on both the front and back surfaces are placed as the outermost layer, and an insulating substrate without a catalyst and a prepreg containing a catalyst are inserted inside and heated and pressurized to create a multilayer structure. a step of molding a substrate; a step of drilling a through hole in a predetermined position of the multilayered substrate; and a step of masking a part of the through hole and adsorbing a catalyst on the unmasked inner wall of the through hole. , removing the mask, and forming a conductor layer by electroless plating, including the catalyst-containing insulating layer formed by the catalyst-containing insulating substrate and the catalyst-containing prepreg and the portion on which the catalyst is adsorbed on the inner wall of the through hole. A method for manufacturing a multilayer printed wiring board, the method comprising: forming a multilayer printed wiring board.
JP27783788A 1988-11-01 1988-11-01 Method for manufacturing multilayer printed wiring board Expired - Lifetime JPH0716096B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27783788A JPH0716096B2 (en) 1988-11-01 1988-11-01 Method for manufacturing multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27783788A JPH0716096B2 (en) 1988-11-01 1988-11-01 Method for manufacturing multilayer printed wiring board

Publications (2)

Publication Number Publication Date
JPH02122696A true JPH02122696A (en) 1990-05-10
JPH0716096B2 JPH0716096B2 (en) 1995-02-22

Family

ID=17588958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27783788A Expired - Lifetime JPH0716096B2 (en) 1988-11-01 1988-11-01 Method for manufacturing multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JPH0716096B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0493094A (en) * 1990-08-08 1992-03-25 Hitachi Aic Inc Manufacture of multilayer circuit board and multilayer circuit board thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0493094A (en) * 1990-08-08 1992-03-25 Hitachi Aic Inc Manufacture of multilayer circuit board and multilayer circuit board thereof

Also Published As

Publication number Publication date
JPH0716096B2 (en) 1995-02-22

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