JPH02116038A - Optical disk - Google Patents
Optical diskInfo
- Publication number
- JPH02116038A JPH02116038A JP63268628A JP26862888A JPH02116038A JP H02116038 A JPH02116038 A JP H02116038A JP 63268628 A JP63268628 A JP 63268628A JP 26862888 A JP26862888 A JP 26862888A JP H02116038 A JPH02116038 A JP H02116038A
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent substrate
- reflective film
- reflecting
- films
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 23
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 230000001681 protective effect Effects 0.000 claims abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 14
- 238000005260 corrosion Methods 0.000 abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 abstract description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 11
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000005341 toughened glass Substances 0.000 abstract description 3
- 238000004380 ashing Methods 0.000 abstract description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 238000000059 patterning Methods 0.000 abstract description 2
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 238000000992 sputter etching Methods 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 230000002950 deficient Effects 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000001746 injection moulding Methods 0.000 description 7
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ＣＤ−ＲＯＭ等に用いられる光ディスクに関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disc used in a CD-ROM or the like.
近年、コンパクトディスクにコンピュータ用のディジタ
ル情報を記録した光ディスク、所謂ＣＤ−ＲＯＭが普及
してきており、文献情報の検索等に盛んに利用されてき
ているが、このＣＤ−ＲＯＭは基本的にはコンパクトデ
ィスクと同じ構造を有している。In recent years, so-called CD-ROMs, which are optical discs in which digital information for computers is recorded on compact discs, have become popular, and are widely used for searching for literature information, etc. However, CD-ROMs are basically compact discs. It has the same structure as a disk.
第２図は従来の光ディスクの半径方向に切断した場合の
断面図である。FIG. 2 is a cross-sectional view of a conventional optical disc taken in the radial direction.
第２図に示すように、ポリカーボネート等の熱可塑性樹
脂から成る透明基板１の表面に、符号化された記録情報
に対応する凹凸パターンを形成し、前記凹凸パターンの
形成された透明基板１の表面に、蒸着法等にりアルミニ
ウム等の反射率の高い金属から成る反射膜４を形成し、
その後反射膜４の上に保護膜３を積層した構造となって
いる。As shown in FIG. 2, an uneven pattern corresponding to encoded recorded information is formed on the surface of a transparent substrate 1 made of a thermoplastic resin such as polycarbonate, and the surface of the transparent substrate 1 on which the uneven pattern is formed is formed. Then, a reflective film 4 made of a metal with high reflectivity such as aluminum is formed by vapor deposition or the like,
Thereafter, a protective film 3 is laminated on the reflective film 4.
ここで、前述した凹凸パターンを有する透明基板１の形
成は通常射出成形法を用いて行われる。Here, the formation of the transparent substrate 1 having the above-mentioned uneven pattern is usually performed using an injection molding method.
この射出成形法は、例えば、真利藤雄、林謙二共著ｒＣ
Ｄプレーヤ入門」第２５頁（コロナ社、１９８３年）に
開示されているように、マスタリングプロセスを経て形
成されたマザースタンパに、軟化させたポリカーボネー
ト樹脂を射出し、前記ポリカーボネート樹脂が硬化した
後マザースタンパから剥離し前記マザースタンバの凹凸
パターンを射出した前記ポリカーボネート樹脂上に転写
して、凹凸パターンを有する基板を形成する方法である
。This injection molding method is, for example, co-authored by Fujio Mari and Kenji Hayashi.
As disclosed in "Introduction to D Player", page 25 (Corona Publishing, 1983), softened polycarbonate resin is injected onto a mother stamper formed through a mastering process, and after the polycarbonate resin has hardened, the mother stamper is injected. This is a method of peeling off the stamper and transferring the uneven pattern of the mother stamper onto the injected polycarbonate resin to form a substrate having an uneven pattern.
しかしながら、上述した従来の光ディスクにおいては、
以下に述べるような問題点があった。すなわち、幅０．
４μｍ前後、流さ０．９〜３．３μｍの極めて微細な凹
凸パターンを射出成形法を用いてマザースタンバからポ
リカーボネート樹脂の透明基板１に転写する際に、凹凸
パターンの欠け、突起、パリ等が発生することがあり、
光ディスクの製造工程上大きな問題となっていた。特に
、ＣＤ−ＲＯＭの場合には従来のコンパクトディスクに
較べて格段の信頼性が求められていることから、前述の
問題点を如何に解決するかが、大きな課題となっている
のが現状である。However, in the conventional optical disc mentioned above,
There were problems as described below. That is, the width is 0.
When an extremely fine uneven pattern of around 4 μm and a width of 0.9 to 3.3 μm is transferred from the mother stand to the polycarbonate resin transparent substrate 1 using the injection molding method, chips, protrusions, cracks, etc. occur in the uneven pattern. There are things to do,
This has become a major problem in the manufacturing process of optical discs. In particular, CD-ROMs are required to be far more reliable than conventional compact discs, so the current challenge is how to solve the above-mentioned problems. be.
又、既に述べたように従来の光ディスクでは、反射膜４
は凹凸パターンを有する透明基板１の表面に形成される
。ところで、本発明者らの検討によれば、凹凸パターン
上に形成された反射膜４と透明基板１との密着不良（反
射膜４の透明基板１からの浮き上がり）の殆んどが凹凸
パターンの凹部と凸部の境界で発生することが明らかと
なった。更に、従来構造のＣＤ−ＲＯＭを長時間放置し
た時の反射膜４の腐食発生箇所を評価した結果、やはり
凹凸パターンの凹部と凸部の境界を中心として、反射膜
４の腐食が多く発生することが明らかとなった。この様
な、反射膜４の密着不良あるいは腐食は、当然なことな
がら光ディスクの信頼性を著しく損なうものであり、前
述の射出成形時め突起、パリ等の問題と同様、大きな問
題となっている。この反射膜の密着不良・腐食の問題の
改善も、より高い信頼性を求められるＣＤ−ＲＯＭにと
っては、極めて重要な問題と言える。Furthermore, as already mentioned, in conventional optical discs, the reflective film 4
is formed on the surface of the transparent substrate 1 having an uneven pattern. By the way, according to studies by the present inventors, most of the poor adhesion between the reflective film 4 formed on the uneven pattern and the transparent substrate 1 (lifting of the reflective film 4 from the transparent substrate 1) is caused by the uneven pattern. It has become clear that this phenomenon occurs at the boundary between concavities and convexities. Furthermore, as a result of evaluating the locations where corrosion occurred on the reflective film 4 when a CD-ROM with a conventional structure was left for a long period of time, it was found that corrosion of the reflective film 4 often occurred mainly at the boundaries between the concave and convex portions of the concavo-convex pattern. It became clear that Such poor adhesion or corrosion of the reflective film 4 naturally significantly impairs the reliability of the optical disc, and is a major problem similar to the aforementioned problems such as protrusions and cracks during injection molding. . Improving the problem of poor adhesion and corrosion of the reflective film is also an extremely important problem for CD-ROMs, which require higher reliability.
この様な反射膜の密着不良や腐食の発生原因は、未だ不
明な点も多いが、密着不良の一因は凹部と凸部の境界で
の応力集中により反射膜が大きな力を受けるためと考え
られる。又、反射膜の腐食については、凹部と凸部の境
界で反射膜の膜質が劣化すること、及び密着不良の場合
と同様応力集中により、所謂応力腐食が起こり腐食が促
進されることが原因と考えられる。The causes of poor adhesion and corrosion of the reflective film are still largely unknown, but one reason for the poor adhesion is thought to be that the reflective film is subjected to large forces due to stress concentration at the boundaries between concave and convex parts. It will be done. Corrosion of the reflective film is also caused by deterioration of the quality of the reflective film at the boundary between concave and convex parts, and stress concentration, similar to the case of poor adhesion, which causes so-called stress corrosion and accelerates corrosion. Conceivable.
本発明の目的は、反射膜の腐食を防止し、高い信頼性を
具備する光ディスクを提供することにある。An object of the present invention is to provide an optical disc that prevents corrosion of the reflective film and has high reliability.
本発明の光ディスクは、強化ガラス、石英又は合成樹脂
等の透明基板の上に設けてディジタル情報に対応°した
パターンを有する金属膜等の反射膜パターンと、前記反
射膜を含む前記透明基板の表面に設けた保護膜とを備え
ている。The optical disc of the present invention includes a reflective film pattern such as a metal film provided on a transparent substrate such as tempered glass, quartz, or synthetic resin and having a pattern corresponding to digital information, and a surface of the transparent substrate including the reflective film. It is equipped with a protective film provided on the surface.
本発明は平坦な表面を有する透明基板の上に、アルミニ
ウム等の反射率の高い金属膜からなる反射膜を蒸着して
設けた後、前記反射膜を選択的にエツチングして、ディ
ジタル情報の符号に対応したパターンを有する反射膜を
形成することにより、従来の光ディスクで問題となって
いた凹凸パターンの凹部と凸部の境界における反射膜の
密着不良及び腐食の問題を回避するものである。In the present invention, a reflective film made of a highly reflective metal film such as aluminum is deposited on a transparent substrate having a flat surface, and then the reflective film is selectively etched to encode digital information. By forming a reflective film having a pattern corresponding to the above, problems of poor adhesion and corrosion of the reflective film at the boundaries between concave and convex portions of the concavo-convex pattern, which were problems in conventional optical discs, can be avoided.
次に、本発明の実施例について図面を参照して説明する
。Next, embodiments of the present invention will be described with reference to the drawings.
第１図は本発明の一実施例を説明するための光ディスク
の半径方向に切断した断面図である。FIG. 1 is a radial cross-sectional view of an optical disc for explaining one embodiment of the present invention.
第１図に示すように、強化ガラスからなる透明基板１の
上にアルミニウム膜を０．１５μｍの厚さに形成する。As shown in FIG. 1, an aluminum film is formed to a thickness of 0.15 μm on a transparent substrate 1 made of tempered glass.
アルミニウム膜の形成には電子ビーム蒸着法を用い、そ
の蒸着条件は到達真空度３×１０−フＴｏｒｒ、エミッ
ション電流８５ｍＡ、蒸着時の基板温度７０℃である。An electron beam evaporation method is used to form the aluminum film, and the evaporation conditions are an ultimate vacuum of 3 x 10-F Torr, an emission current of 85 mA, and a substrate temperature of 70°C during evaporation.
ついで、ディジタル情報に対応したパターンを有するホ
トレジスト膜を前記のアルミニウム膜上に形成し、前記
ホトレジスト膜をマスクとして前記アルミニウム膜をイ
オンエツチングにより除去して反射膜２を形成する。そ
の後、ホトレジスト膜を有機溶媒あるいは酸素アッシン
グにより除去した後、反射膜２を含む透明基板１の上に
、スパッタリング法を用い、Ａｒガス圧力５Ｘ１０−’
Ｔｏｒｒ、投入電力４００Ｗの条件で厚さ２μｍの酸化
珪素膜からなる保護膜３を形成する。Next, a photoresist film having a pattern corresponding to digital information is formed on the aluminum film, and the aluminum film is removed by ion etching using the photoresist film as a mask to form the reflective film 2. After that, the photoresist film is removed by organic solvent or oxygen ashing, and then sputtering is performed on the transparent substrate 1 including the reflective film 2 using an Ar gas pressure of 5 x 10-'
A protective film 3 made of a silicon oxide film with a thickness of 2 μm is formed under conditions of Torr and input power of 400 W.
以上に述べた本発明による光ディスクでは、微細な凹凸
パターンを射出成形法で透明基板１の上に形成する必要
が無いため、従来射出成形時の凹凸パターンの欠け、突
起、パリ等の発生という問題点は解決し、光デイスク製
造工程での歩留まりが大幅に向上した。又、平坦な基板
面上にパターン化した反射膜を形成する構造である為、
従来の光ディスクで問題となっていた凹凸パターンの凹
部と凸部の境界での反射膜の密着不良や腐食の発生も見
られなかった。この様に、本発明による光ディスクは、
従来の光ディスクに比較して高い信頼性を有し、コンピ
ュータ用のディジタル情報を記録するＣＤ−ＲＯＭとし
て優れた特性を具備することが確認された。In the optical disc according to the present invention as described above, there is no need to form a fine concavo-convex pattern on the transparent substrate 1 by injection molding, so there are problems such as chipping, protrusions, cracks, etc. in the concavo-convex pattern during conventional injection molding. This problem has been resolved, and yields in the optical disk manufacturing process have been significantly improved. In addition, since the structure forms a patterned reflective film on a flat substrate surface,
There was no evidence of poor adhesion or corrosion of the reflective film at the boundaries between the concave and convex portions of the concavo-convex pattern, which had been a problem with conventional optical discs. In this way, the optical disc according to the present invention
It has been confirmed that the CD-ROM has higher reliability than conventional optical discs and has excellent characteristics as a CD-ROM for recording digital information for computers.
尚、この実施例では反射膜２を成す材料としてアルミニ
ウム膜のみについて言及したが、アルミニウムの代りに
他の高反射率材料例えば金、チタン、タンタル、窒化チ
タン、窒化ジルコニウム等を用いてもよい。In this embodiment, only the aluminum film was mentioned as the material forming the reflective film 2, but other high reflectance materials such as gold, titanium, tantalum, titanium nitride, zirconium nitride, etc. may be used instead of aluminum.
以上述べたように本発明の光ディスクは、平坦な透明基
板上に反射膜を形成した後、この反射膜をエツチングに
よりパターン化することによりディジタル情報を記録す
る為、従来射出成形時に多く発生していた凹凸パターン
の欠け、突起、パリ等の問題は解決し、光デイスク製造
工程での歩留りが大幅に向上する。As described above, the optical disc of the present invention records digital information by forming a reflective film on a flat transparent substrate and then patterning this reflective film by etching, which is a problem that often occurs during conventional injection molding. Problems such as chipping, protrusions, and cracks in the concavo-convex pattern are solved, and the yield in the optical disk manufacturing process is greatly improved.
又、基板上に予め形成された凹凸パターン上に反射膜を
形成する必要が無いため、従来凹凸パターンの凹部と凸
部の境界で発生していた反射膜の密着不良や腐食を抑制
することが可能となり、信頼性を向上させた光ディスク
が実現できる。In addition, since there is no need to form a reflective film on the uneven pattern previously formed on the substrate, poor adhesion and corrosion of the reflective film that conventionally occur at the boundaries between the concave and convex parts of the uneven pattern can be suppressed. This makes it possible to realize an optical disc with improved reliability.
第１図は本発明の一実施例を説明するための光ディスク
の半径方向の断面図、第２図は従来の光ディスクの半径
方向の断面図である。
１・・・基板、２・・・反射膜、３・・・保護膜、４・
・・反射膜。FIG. 1 is a radial sectional view of an optical disc for explaining an embodiment of the present invention, and FIG. 2 is a radial sectional view of a conventional optical disc. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Reflective film, 3... Protective film, 4...
...Reflective film.
Claims (1)
ーンを有する反射膜と、前記反射膜を含む前記透明基板
の表面に設けた保護膜とを備えたことを特徴とする光デ
ィスク。An optical disc comprising: a reflective film provided on a transparent substrate and having a pattern corresponding to digital information; and a protective film provided on the surface of the transparent substrate including the reflective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63268628A JPH02116038A (en) | 1988-10-24 | 1988-10-24 | Optical disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63268628A JPH02116038A (en) | 1988-10-24 | 1988-10-24 | Optical disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02116038A true JPH02116038A (en) | 1990-04-27 |
Family
ID=17461190
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63268628A Pending JPH02116038A (en) | 1988-10-24 | 1988-10-24 | Optical disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02116038A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04281236A (en) * | 1991-03-08 | 1992-10-06 | Nec Corp | Production of optical disk and device therefor |
| JPH08180457A (en) * | 1994-12-27 | 1996-07-12 | Nec Corp | Optical disk and its manufacture |
| US5724479A (en) * | 1994-12-28 | 1998-03-03 | Takahashi; Kei | Fluid flow controlling member |
| US6797368B2 (en) * | 2002-02-28 | 2004-09-28 | Hoya Corporation | Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure |
-
1988
- 1988-10-24 JP JP63268628A patent/JPH02116038A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04281236A (en) * | 1991-03-08 | 1992-10-06 | Nec Corp | Production of optical disk and device therefor |
| JPH08180457A (en) * | 1994-12-27 | 1996-07-12 | Nec Corp | Optical disk and its manufacture |
| US5724479A (en) * | 1994-12-28 | 1998-03-03 | Takahashi; Kei | Fluid flow controlling member |
| US6797368B2 (en) * | 2002-02-28 | 2004-09-28 | Hoya Corporation | Reflective-type mask blank for exposure, method of producing the same, and reflective-type mask for exposure |
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