JPH02115851A - Damping-waterless planographic printing plate - Google Patents
Damping-waterless planographic printing plateInfo
- Publication number
- JPH02115851A JPH02115851A JP27012088A JP27012088A JPH02115851A JP H02115851 A JPH02115851 A JP H02115851A JP 27012088 A JP27012088 A JP 27012088A JP 27012088 A JP27012088 A JP 27012088A JP H02115851 A JPH02115851 A JP H02115851A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- silicone rubber
- group
- photosensitive layer
- printing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 53
- 239000004945 silicone rubber Substances 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 35
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 12
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000004185 ester group Chemical group 0.000 claims description 4
- 150000008282 halocarbons Chemical group 0.000 claims description 4
- 125000005650 substituted phenylene group Chemical group 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 239000004721 Polyphenylene oxide Chemical group 0.000 claims description 3
- 125000003368 amide group Chemical group 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 229920000570 polyether Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 abstract description 13
- -1 polysiloxane Polymers 0.000 abstract description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 12
- 229920001296 polysiloxane Polymers 0.000 abstract description 8
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 7
- 239000012965 benzophenone Substances 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 229920005601 base polymer Polymers 0.000 abstract description 2
- 238000006482 condensation reaction Methods 0.000 abstract description 2
- 239000003431 cross linking reagent Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 81
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
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- 239000011347 resin Substances 0.000 description 14
- 239000000178 monomer Substances 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
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- 238000000034 method Methods 0.000 description 7
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- 125000003118 aryl group Chemical group 0.000 description 6
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- 238000000576 coating method Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
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- 239000002184 metal Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
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- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 4
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- 238000004132 cross linking Methods 0.000 description 4
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 4
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- 239000002904 solvent Substances 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
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- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 229920006026 co-polymeric resin Polymers 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N cyclobenzothiazole Natural products C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 2
- NIUHGYUFFPSEOW-UHFFFAOYSA-N (4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1 NIUHGYUFFPSEOW-UHFFFAOYSA-N 0.000 description 2
- XUVKSPPGPPFPQN-UHFFFAOYSA-N 10-Methyl-9(10H)-acridone Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C(=O)C2=C1 XUVKSPPGPPFPQN-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
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- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
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- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
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- 239000012792 core layer Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
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- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
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- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000002199 base oil Substances 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000005474 octanoate group Chemical group 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001791 phenazinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、湿し水不要の平版印刷版材料に関し、詳しく
はシリコーンゴム層と感光層との間の接着性が改良され
、印刷に使用したときの耐刷力が向上した、優れた湿し
水不要の平版印刷版材料に関する。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a lithographic printing plate material that does not require dampening water, and more specifically, has improved adhesion between a silicone rubber layer and a photosensitive layer, and is suitable for use in printing. This invention relates to an excellent lithographic printing plate material that does not require dampening water and has improved printing durability when applied.
[発明の背景]
従来、湿し水不要の平版印刷版材料(以下、必要に応じ
1版材料」という)としては、支持体上に順に感光層及
びインキ反撥層を塗設したものが知られている。この版
材料を露光・現像することにより湿し水不要の平版印刷
版(以下、必要に応じ「印刷版」という)を得ることが
できる。[Background of the Invention] Conventionally, as a lithographic printing plate material that does not require dampening water (hereinafter referred to as a 1st plate material if necessary), one in which a photosensitive layer and an ink repellent layer are sequentially coated on a support is known. ing. By exposing and developing this plate material, a lithographic printing plate that does not require dampening water (hereinafter referred to as "printing plate" as necessary) can be obtained.
インキ反撥層を構成する材料として、シリコーンゴムを
用いた技術は知られているが(例えば特開昭50−59
103号参照)、シリコーンゴム層は、元来、感光層と
の接着性が不十分であり、この版材料から得られた印刷
版は耐剛性が十分とは言えず、また版材料を長時間保存
しておくと、その接着力が低下し、十分な画像が得られ
ないという欠点があった。Techniques using silicone rubber as a material constituting the ink repellent layer are known (for example, Japanese Patent Laid-Open No. 50-59
103), the silicone rubber layer originally has insufficient adhesion with the photosensitive layer, and printing plates obtained from this plate material do not have sufficient rigidity, and the plate material cannot be used for long periods of time. If it is stored, its adhesive strength decreases, and it has the disadvantage that a sufficient image cannot be obtained.
このような感光層とシリコーンゴム層との間の接着性を
改良する方法には、例えばシリコーンゴム層を改良した
り、中間層を設けたりして接着性の向上を図ろうとする
方法が主としであるが、感光層を改良する方法もあり、
この場合は、感光層の種類によってもシリコーンゴム層
との接着性が影響され、特に感光層として(メタ)アク
リレート系の光重合性組成物を用いた場合は、シリコー
ンゴム層との接着性が十分でないという欠点を有する。The main methods for improving the adhesion between the photosensitive layer and the silicone rubber layer include, for example, improving the silicone rubber layer or providing an intermediate layer to improve the adhesion. However, there are ways to improve the photosensitive layer.
In this case, the type of photosensitive layer also affects the adhesion with the silicone rubber layer, and especially when a (meth)acrylate-based photopolymerizable composition is used as the photosensitive layer, the adhesion with the silicone rubber layer is affected. It has the disadvantage of not being sufficient.
更に米国特許第3,890.149号明細書に、感光層
に隣接してシリコーンゴム層を有する版材料において、
該感光層成分の一部に、光カチオン重合開始剤としてジ
アゾニウム塩を用いたものが開示されている。しかしな
がらこの版材料は、生保存したときに耐刷力が劣る、即
ち保存性が悪く、またこの版材料を使用した場合には、
露光時にガスが発生してシリコーンゴム層が剥離し易く
なる傾向があり、現像時の耐スクラッチ性が劣るという
欠点がある。Further, U.S. Pat. No. 3,890,149 discloses a plate material having a silicone rubber layer adjacent to the photosensitive layer,
It is disclosed that a diazonium salt is used as a photocationic polymerization initiator in some of the components of the photosensitive layer. However, this plate material has poor printing durability when stored raw, that is, it has poor storage stability, and when this plate material is used,
There is a drawback that gas is generated during exposure and the silicone rubber layer tends to peel off easily, and scratch resistance during development is poor.
そこで本発明者等は、前記の感光層とシリコーンゴム層
との間の接着性について、感光層の改良に着眼して種々
研究を行った結果、感光層の1成分として、一般式[I
]で示される特定の構造単位を有する化合物を用いるこ
とにより、シリコーンゴム層との接着性が良好で、耐剛
力に優れた版材料が得られることを見出し、本発明をす
るに至った。Therefore, the present inventors conducted various studies on the adhesion between the photosensitive layer and the silicone rubber layer, focusing on improving the photosensitive layer.
] It was discovered that by using a compound having a specific structural unit represented by the formula, a plate material having good adhesion to the silicone rubber layer and excellent stiffness resistance could be obtained, and the present invention was developed based on this finding.
[発明の目的コ
本発明の目的は、感光層とシリコーンゴム層との間の接
着性が良好で、印刷したとき耐刷力等に優れた印刷版を
形成し得る湿し水不要の平版印刷版材料を提供すること
にある。[Objective of the Invention] The object of the present invention is to provide planographic printing that does not require dampening water and can form a printing plate that has good adhesion between a photosensitive layer and a silicone rubber layer and has excellent printing durability when printed. The goal is to provide printing materials.
[発明の構成]
したがって、本発明の前記目的は、支持体上に、順に感
光層、シリコーンゴム層を有する湿し水不要の平版印刷
版材料において、該感光層が(A)一般式[I]で示さ
れる構造単位を有する化合物および(B)光重合開始剤
を含有していることを特徴とする湿し水不要の平版印刷
版材料によって達成された。[Structure of the Invention] Therefore, the object of the present invention is to provide a lithographic printing plate material that does not require dampening water and has a photosensitive layer and a silicone rubber layer in this order on a support, in which the photosensitive layer is formed by (A) the general formula [I ] This was achieved by a lithographic printing plate material that does not require dampening water and is characterized by containing a compound having the structural unit shown in the following formula and (B) a photopolymerization initiator.
一般式[I]
[式中、Rは水素原子またはメチル基を表し、R′は水
素原子またはメチル基を表す。General formula [I] [wherein R represents a hydrogen atom or a methyl group, and R' represents a hydrogen atom or a methyl group.
またXはフェニレン基または置換フェニレン基、もしく
はフェニレン基、炭素数1〜10個の炭化水素またはハ
ロゲン化炭化水素またはポリエーテル基をエステル基と
してもつカルボキシル基またはアミド基を表す。コ
[作用]
本発明は、感光層の1成分として一般式[I]で示され
る特定の構造単位を有する化合物を用いることにより架
橋効果により感光層とシリコーンゴム層との間の接着性
に寄与して、これらの眉間の接着力を高め強固に接着す
る。その結果、耐刷力等に優れた印刷版を形成し得る版
材料が得られる。Further, X represents a phenylene group, a substituted phenylene group, a phenylene group, a carboxyl group or an amide group having a hydrocarbon having 1 to 10 carbon atoms, a halogenated hydrocarbon, or a polyether group as an ester group. [Function] The present invention contributes to the adhesion between the photosensitive layer and the silicone rubber layer through a crosslinking effect by using a compound having a specific structural unit represented by the general formula [I] as one component of the photosensitive layer. to increase the adhesion between these eyebrows and create a strong bond. As a result, a plate material capable of forming a printing plate with excellent printing durability etc. is obtained.
[本発明の具体的な構成] 以下、本発明を更に詳細に説明する。[Specific configuration of the present invention] The present invention will be explained in more detail below.
本発明の湿し水不要の平版印刷版材料は、支持体上に、
順に感光層、シリコーンゴム層を有する層構成を基本と
しているが、本発明では感光層に特徴があり、該感光層
は、具体的には(A) −DI式N]で示される構造単
位を有する化合物および(B)光重合開始剤を含有して
いる。The lithographic printing plate material of the present invention that does not require dampening water has a
The basic layer structure is a photosensitive layer and a silicone rubber layer in this order, but the present invention is characterized by the photosensitive layer, and specifically, the photosensitive layer has a structural unit represented by (A) -DI formula N]. and (B) a photopolymerization initiator.
(A)一般式CI]で示される構造単位を有する化合物
一般式[I]
[式中、Rは水素原子またはメチル基を表し、R′は水
素原子またはメチル基を表す。(A) Compound having a structural unit represented by the general formula [I] [In the formula, R represents a hydrogen atom or a methyl group, and R' represents a hydrogen atom or a methyl group.
またXはフェニレン基または置換フェニレン基、もしく
はフェニレン基、炭素数1〜10個の炭化水素またはハ
ロゲン化炭化水素またはポリエーテル基をエステル基と
してもつカルボキシル基またはアミド基を表す。]
Xで表される置換フェニレン基の置換基としては、メチ
ル基、エチル基等を表し、また炭素数1〜10個の炭化
水素をエステル基としてもつカルられ、ポリエーテル基
をエステル基としてもつカルボキシル基としては、例え
ば
本発明に用いられる一般式[I]で示される構造単位を
有する樹脂は、例えば、次のものが挙げられる
以下余白
(CHz−C+
H3
本発明に用いられる一般式[I]で示される構造単位を
有する樹脂は、主鎖となる樹脂と2−イソシアネートエ
チル(メタ)アクリレートとの高分子反応により得られ
るものである。Further, X represents a phenylene group, a substituted phenylene group, a phenylene group, a carboxyl group or an amide group having a hydrocarbon having 1 to 10 carbon atoms, a halogenated hydrocarbon, or a polyether group as an ester group. ] As a substituent of the substituted phenylene group represented by As carboxyl groups, resins having a structural unit represented by the general formula [I] used in the present invention include, for example, the following. ] The resin having the structural unit represented by is obtained by a polymer reaction between the main chain resin and 2-isocyanate ethyl (meth)acrylate.
この主鎖となる樹脂は、特に限定されるものではないが
、具体的には活性水酸基を有する種々の高分子化合物が
用いられるが、好ましくは、米国特許箱4,123.2
76号明細書に記載されているようなヒドロキシエチル
(メタ)アクリレートを主な繰り返し単位として含む樹
脂、もしくはグリシジルメタクリレート、ポリビニルア
ルコールまたはポリエチレングリコール等をエステル基
として有する(メタ)アクリレート樹脂等が挙げられる
。The resin serving as the main chain is not particularly limited, but specifically, various polymeric compounds having active hydroxyl groups are used, but preferably, US Patent Box 4,123.2
Examples include resins containing hydroxyethyl (meth)acrylate as a main repeating unit as described in Specification No. 76, or (meth)acrylate resins having glycidyl methacrylate, polyvinyl alcohol, polyethylene glycol, etc. as ester groups. .
前記の活性水酸基を有する高分子化合物は、活性水酸基
を有する単量体と他の単量体とを共重合体して製造され
るが、この活性水酸基を有する単量体として好ましいも
のは、芳香族性水酸基を有する単量体であり、この芳香
族性水酸基を有する!#全量体しては、例えば、N−(
4−ヒドロキシフェニル)アクリルアミド、N−(4−
ヒドロキシフェニル)メタクリルアミド、o−、m−ま
たはp−ヒドロキシスチレン、またはo−、m−または
p−ヒドロキシフェニルアクリレート、o−、m−また
はp−ヒドロキシフェニルメタクリレート等が挙げられ
る。The above-mentioned polymeric compound having an active hydroxyl group is produced by copolymerizing a monomer having an active hydroxyl group with another monomer. Preferred monomers having an active hydroxyl group are aromatic It is a monomer that has a family hydroxyl group, and it has an aromatic hydroxyl group! # For example, N-(
4-hydroxyphenyl)acrylamide, N-(4-
(hydroxyphenyl) methacrylamide, o-, m- or p-hydroxystyrene, or o-, m- or p-hydroxyphenylacrylate, o-, m- or p-hydroxyphenyl methacrylate, and the like.
またこの芳香族性水酸基を有する単量体と共重合し得る
他の単量体としては、スチレンまたはそのアルキル置換
話導体、アクリル酸アルキルエステル、アクリル酸アリ
ールエステル、メタクリル酸アルキルエステル、メタク
リル酸アリールエステル、または脂肪酸ビニルエステル
が挙げられる。これらの中で好ましい個々の単量体の例
は、アクリル酸、メタクリル酸とアクリル酸メチル、ア
クリル酸エチル、アクリル酸ブチル、アクリル酸ベンジ
ル、メタクリル酸メチル、メタクリル酸エチル、メタク
リル酸ブチル、メタクリル酸ベンジル等が挙げられる。Other monomers that can be copolymerized with this monomer having an aromatic hydroxyl group include styrene or its alkyl-substituted conductor, alkyl acrylate, aryl acrylate, alkyl methacrylate, aryl methacrylate. Examples include esters and fatty acid vinyl esters. Examples of preferred individual monomers among these are acrylic acid, methacrylic acid and methyl acrylate, ethyl acrylate, butyl acrylate, benzyl acrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate, methacrylic acid Examples include benzyl.
そして前記の例示した個々の単量体である芳香族性水酸
基を有する単量体と前記の例示した個々の単量体である
他の単量体とを組合せて得られる主鎖となる樹脂は、例
えば、N−(4〜ヒドロキシフエニル)アクリルアミド
とアクリル酸メチル、アクリル酸エチル、アクリル酸ベ
ンジル、メタクリル酸メチルまたはメタクリル酸エチル
等との共重合体、N−(4−ヒドロキシフェニル)アク
リルアミドとアクリル酸メチル、アクリル酸エチル、ア
クリル酸ベンジル、メタクリル酸メチルまたはメタクリ
ル酸エチル等との共重合体、o−、m〜またはp−ヒド
ロキシフェニルアクリレートとアクリル酸メチル、アク
リル酸エチル、アクリル酸ベンジル、メタクリル酸メチ
ルまたはメタクリル酸エチル等との共重合体等が挙げら
れる。The resin that becomes the main chain obtained by combining the above-mentioned individual monomers, which are monomers having an aromatic hydroxyl group, and the above-mentioned individual monomers, which are other monomers, is For example, copolymers of N-(4-hydroxyphenyl)acrylamide and methyl acrylate, ethyl acrylate, benzyl acrylate, methyl methacrylate or ethyl methacrylate, N-(4-hydroxyphenyl)acrylamide and Copolymers of methyl acrylate, ethyl acrylate, benzyl acrylate, methyl methacrylate or ethyl methacrylate, o-, m- or p-hydroxyphenylacrylate and methyl acrylate, ethyl acrylate, benzyl acrylate, Examples include copolymers with methyl methacrylate or ethyl methacrylate.
以下に、本発明に用いられる一般式[I]で示される構
造単位を有する化合物とメタクリル酸メチルとの共重合
樹脂の合成例を示す。Below, a synthesis example of a copolymer resin of a compound having a structural unit represented by the general formula [I] and methyl methacrylate used in the present invention will be shown.
合成例
滴下ロート、攪拌機、還流冷却器および温度計を備え付
けた300 m℃の四つロフラスコ中にトルエン500
mρ、メタクリル酸−2−ヒドロキシエチル250mm
ol 、メタクリル酸メチル250mmolを入れる。Synthesis Example 500 g of toluene was added in a 300 m° C. four-necked flask equipped with a dropping funnel, stirrer, reflux condenser and thermometer.
mρ, 2-hydroxyethyl methacrylate 250mm
Add 250 mmol of methyl methacrylate.
続いてこのフラスコ内を十分に窒素で置換した後、80
℃の恒温水槽に浸し、窒素を流しながら攪拌し、全体が
80℃になったところで、滴下ロートよりアゾビスイソ
ブチルニトリルの1モル溶液10mJ2を一度に投下し
た。このまま24時間反応を続けた。反応溶液の一部を
取りガスクロマトグラフィーで千ツマ−の吸収が現れな
いの確認した後に、全体の温度を60℃に下げた。Subsequently, after purging the inside of this flask sufficiently with nitrogen, 80
The mixture was immersed in a thermostatic water bath at a temperature of 0.degree. C. and stirred while flowing nitrogen, and when the temperature reached 80.degree. C., 10 mJ2 of a 1 molar solution of azobisisobutylnitrile was dropped at once from the dropping funnel. The reaction was continued for 24 hours. After a portion of the reaction solution was taken and gas chromatography was performed to confirm that no absorption of 1,000 yen was observed, the overall temperature was lowered to 60°C.
全体の温度が60℃になったところで、ジブチル錫ジラ
ウレートを5a+molを加え、更に2−イソシアネー
トエチルメタクリレート25Qmmolを30分かけて
滴下した。続いてこのまま3時間攪拌し、反応液中のイ
ソシアネートの赤外吸収スペクトルの吸収が消えたこと
を確認してから、室温に下げた後、5文のヘキサン中に
徐々に滴下した。When the overall temperature reached 60°C, 5a+mol of dibutyltin dilaurate was added, and further 25Qmmol of 2-isocyanate ethyl methacrylate was added dropwise over 30 minutes. Subsequently, the mixture was stirred as it was for 3 hours, and after confirming that the infrared absorption spectrum of the isocyanate in the reaction mixture had disappeared, the mixture was lowered to room temperature, and then gradually added dropwise into 5 portions of hexane.
得られた溶液を12時間放置すると、白色の樹脂がきれ
いに沈殿した。ヘキサンをデカンテーションにより除去
し、更にガラスフィルターを用いて濾過し、減圧乾燥す
ると、93%の収率で目的の樹脂を得た。When the resulting solution was left to stand for 12 hours, a white resin was clearly precipitated. Hexane was removed by decantation, and the mixture was further filtered using a glass filter and dried under reduced pressure to obtain the desired resin with a yield of 93%.
本発明に用いられる一般式[I]で示される構造単位を
有する他の樹脂は、前記の合成例に準じて、当業界では
容易に合成することができる。Other resins having the structural unit represented by the general formula [I] used in the present invention can be easily synthesized in the art according to the synthesis example described above.
(B)光重合開始剤
本発明に用いられる(B)成分である光重合開始剤とし
ては、この技術の分野において従来より用いられるもの
が挙げられるが、好ましいものは、次のようなものを使
用することができる。(B) Photopolymerization initiator The photopolymerization initiator used in the present invention as component (B) includes those conventionally used in this technical field, but the following are preferred. can be used.
ベンゾインメチルエーテル、ベンゾインイソプロピルエ
ーテル、α、α−ジメトキシーα−フェニルアセトフェ
ノン等のベンゾイン誘導体、ベンゾフェノン、2.4−
ジクロルベンゾフェノン、0−ベンゾイル安息香酸メチ
ル、4.4°−ビス(ジメチルアミノ)ベンゾフェノン
、4.4’−ビス(ジエチルアミノ)ベンゾフェノン等
のベンゾフェノン誘導体、2−クロルチオキサントン、
2−イソプロピルチオキサントン等のチオキサントン話
導体、2−クロルアントラキノン、2−メチルアントラ
キノン等のアントラキノン話導体、N−メチルアクリド
ン、N−ブチルアクリドン等のアクリドン誘導体、α。Benzoin derivatives such as benzoin methyl ether, benzoin isopropyl ether, α, α-dimethoxy α-phenylacetophenone, benzophenone, 2.4-
Benzophenone derivatives such as dichlorobenzophenone, methyl 0-benzoylbenzoate, 4.4°-bis(dimethylamino)benzophenone, 4.4′-bis(diethylamino)benzophenone, 2-chlorothioxanthone,
Thioxanthone conductors such as 2-isopropylthioxanthone, anthraquinone conductors such as 2-chloroanthraquinone and 2-methylanthraquinone, acridone derivatives such as N-methylacridone and N-butylacridone, α.
α−ジェトキシアセトフェノン、ベンジル、フルオレノ
ン、キサントン、ウラニル化合物、ハロゲン化合物等。α-jethoxyacetophenone, benzyl, fluorenone, xanthone, uranyl compound, halogen compound, etc.
この他米国特許第2,367.660号明細書に開示さ
れているビシナールボリケタルドニル化合物、同第2,
367.661号および第2,367.670号明細書
に開示されているα−カルボニル化合物、同第2,44
8,828号明細書に開示されているアシロインエーテ
ル、同第2,722,512号明細書に開示されている
α−炭化水素で置換された芳香族アシロイン化合物、同
第3,048,127号および第2,951,758号
明細書に開示されている多核キノン化合物、同第3,5
49,367号明細書に開示されているドリアリールイ
ミダゾールダイマー/p−アミノフェニルケトンの組合
せ、同第3,870,524号明細書に開示されている
ベンゾチアゾール系化合物、同第4,239.850号
明細書に開示されているベンゾチアゾール系化合物/ト
リへロメチル−S −)−リアジン系化合物及び同第3
,751,259号明細書に開示されているアクリジン
及びフェナジン化合物、同第4.212.970号明細
書に開示されているオキサジアゾール化合物等。In addition, vicinal boriketaldonyl compounds disclosed in U.S. Pat. No. 2,367.660;
α-carbonyl compounds disclosed in No. 367.661 and No. 2,367.670, No. 2,44
Asiloin ether disclosed in No. 8,828; α-hydrocarbon-substituted aromatic acyloin compounds disclosed in No. 2,722,512; No. 3,048,127 Polynuclear quinone compounds disclosed in No. 3 and No. 2,951,758;
The doryarylimidazole dimer/p-aminophenyl ketone combination disclosed in No. 49,367, the benzothiazole compound disclosed in No. 3,870,524, and the benzothiazole compound disclosed in No. 4,239. Benzothiazole compounds/triheromethyl-S-)-riazine compounds disclosed in No. 850 and No. 3 of the same
, acridine and phenazine compounds disclosed in , 751,259, and oxadiazole compounds disclosed in , 4,212,970.
これらの光重合開始剤の使用量は、感光層を構成する成
分の総重量を基準にして、約0.5重量%〜約15重量
%、好ましくは2重量%〜10重量%である。The amount of these photopolymerization initiators used is about 0.5% to about 15% by weight, preferably 2% to 10% by weight, based on the total weight of the components constituting the photosensitive layer.
本発明に用いられる感光層には、更に熱重合防止剤を加
えておくことが好ましく、例えばハイドロキノン、p−
メトキシフェノール、ジ−t−ブチル−p−クレゾール
、ピロガロール、t−ブチルカテコール、ベンゾキノン
、 4.4’−チオビス(3−メチル−6−t−ブチル
フェノール) 、2.2’−メチレンビス(4−メチル
−6−t−ブチルフェノール)、2−メルカプトベンゾ
イミダゾール等が有用である。It is preferable to further add a thermal polymerization inhibitor to the photosensitive layer used in the present invention, such as hydroquinone, p-
Methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4.4'-thiobis(3-methyl-6-t-butylphenol), 2.2'-methylenebis(4-methyl -6-t-butylphenol), 2-mercaptobenzimidazole, and the like are useful.
本発明に用いられる感光層は、前記の(A)、(B)の
成分を主として含むものであるが、更に次に記載される
如き不飽和上ツマ−を加えることが好ましい。The photosensitive layer used in the present invention mainly contains the above-mentioned components (A) and (B), but it is preferable to further add an unsaturated layer as described below.
エチレングリコールジ(メタ)アクリレート、ポリエチ
レングリコールジ(メタ)アクリレート、トリメチロー
ルエタントリ(メタ)アクリレート、トリメチロールプ
ロパントリ(メタ)アクリレート、ネオペンチルグリコ
ールジ(メタ)アクリレート、ペンタエリスリトールお
よびジペンタエリスリトールのトリ、テトラもしくはヘ
キサ(メタ)アクリレート、エボキシジ(メタ)アクリ
レート、特公昭52−7361号公報開示されているよ
うなオリゴアクリレート、特公昭48−41708号公
報開示されているようなアクリルウレタン樹脂またはア
クリルウレタンのオリゴマー等である。Ethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, trimethylolethane tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol and dipentaerythritol Tri, tetra or hexa(meth)acrylate, epoxy di(meth)acrylate, oligoacrylate as disclosed in Japanese Patent Publication No. 52-7361, acrylic urethane resin or acrylic as disclosed in Japanese Patent Publication No. 48-41708 These include urethane oligomers.
これらの千ツマ−またはオリゴマーと(A)ポリマーと
の組成比は、重量で1:9〜7:3の範囲が好ましいが
、更に好ましくは重量で1:3〜1:1の範囲である。The composition ratio of these polymers or oligomers to the polymer (A) is preferably in the range of 1:9 to 7:3 by weight, and more preferably in the range of 1:3 to 1:1 by weight.
また本発明に用いられる感光層には、必要に応じて結合
剤を添加することができる。好ましい結合剤としては種
々の高分子化合物が使用され得るが、より好ましくは特
開昭54−98613号に記載されているような芳香族
性水酸基を有する単量体、例えばN−(4−ヒドロキシ
フェニル)アクリルアミド、N−(4−ヒドロキシフェ
ニル)メタクリルアミド、0−1m−1またはp−ヒド
ロキシスチレン、0−1m−1またはp−ヒドロキシフ
ェニルメタクリレート等と他の単量体との共重合体、米
国特許第4.123,276号明細書中に記載されてい
るようなヒドロキシエチルアクリレート単位またはヒド
ロキシエチルメタクリレート単位を主なる繰り返し単位
として含むポリマー シェラツク、ロジン等の天然樹脂
、ポリビニルアルコール、米国特許第3,751,25
7 号明細書中に記載されているようなポリアミド樹脂
、米国特許第3,660,097号明細書中に記載され
ているような線状ポリウレタン樹脂、ポリビニルアルコ
ールのフタレート化樹脂、ビスフェノールAとエピクロ
ルヒドリンから縮合されたエポキシ樹脂、酢酸セルロー
ス、セルロースアセテートフタレート等のセルロース類
が包含される。Furthermore, a binder can be added to the photosensitive layer used in the present invention, if necessary. Various polymeric compounds can be used as the preferred binder, but monomers having aromatic hydroxyl groups such as those described in JP-A No. 54-98613, such as N-(4-hydroxy Copolymers of phenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, 0-1m-1 or p-hydroxystyrene, 0-1m-1 or p-hydroxyphenyl methacrylate, etc. and other monomers, Polymers containing hydroxyethyl acrylate units or hydroxyethyl methacrylate units as the main repeating unit as described in U.S. Pat. No. 4,123,276; Natural resins such as shellac and rosin; polyvinyl alcohol; 3,751,25
7, linear polyurethane resins as described in U.S. Pat. No. 3,660,097, phthalated resins of polyvinyl alcohol, bisphenol A and epichlorohydrin. Includes celluloses such as epoxy resins condensed from cellulose, cellulose acetate, and cellulose acetate phthalate.
本発明に用いられる感光層を構成する成分は、例えば、
2−メトキシエタノール、2−メトキシエチルアセテー
ト、シクロヘキサン、メチルエチルケトン、エチレンジ
クロライド等の適当な溶剤または後述する如き現像液と
して用いられる溶剤を単独またはこれらを適当に混合し
た溶媒に溶解して支持体上に被覆される。The components constituting the photosensitive layer used in the present invention are, for example,
A suitable solvent such as 2-methoxyethanol, 2-methoxyethyl acetate, cyclohexane, methyl ethyl ketone, ethylene dichloride, etc. or a solvent used as a developer as described below is dissolved alone or in a suitable mixture of these solvents and applied onto a support. coated.
更に感光層には、上記以外に露光後或は現像後に像を可
視化させるための色素(例えば、ビクトリアピュアブル
ーBO)I (保土谷化学社製)、オイルブルー’8
03 (オリエント化学工業社製)等のトリフェニルメ
タン系、ジフェニルメタン系色素等)、塗布性を改良す
るためのアルキルエーテル類(例えば、エチルセルロー
ス、メチルセルロース等)、弗素系界面活性剤、ノニオ
ン系界面活性剤(例えば、プルロニックL64(層重化
社製)等)、塗膜の柔軟性を付与するための可塑剤(例
えば、ポリエチレングリコール、リン酸トリクレジル、
アクリル酸又はメタクリル酸ポリマー等)、安定剤(例
えばリン酸、シュウ酸、酒石酸等)を含有することがで
きる。Furthermore, in addition to the above, the photosensitive layer contains dyes (for example, Victoria Pure Blue BO) I (manufactured by Hodogaya Chemical Co., Ltd.) and Oil Blue '8 to make the image visible after exposure or development.
03 (manufactured by Orient Kagaku Kogyo Co., Ltd.), alkyl ethers to improve coating properties (e.g., ethyl cellulose, methyl cellulose, etc.), fluorine-based surfactants, nonionic surfactants. agents (e.g., Pluronic L64 (manufactured by Layered Co., Ltd.), etc.), plasticizers for imparting flexibility to the coating film (e.g., polyethylene glycol, tricresyl phosphate,
acrylic acid or methacrylic acid polymers, etc.), stabilizers (for example, phosphoric acid, oxalic acid, tartaric acid, etc.).
本発明に用いられるシリコーンゴム層は、インキ反撥層
であり、核層に使用されるシリコーンゴムとしては、次
のような一般式[I]で示される繰り返し単位を有する
分子量数千〜数十万の主鎖中または主鎖の末端に水酸基
を有する線状有機ポリシクロキサンを主成分とするもの
が好ましい。The silicone rubber layer used in the present invention is an ink repellent layer, and the silicone rubber used for the core layer has a molecular weight of several thousand to several hundred thousand and has a repeating unit represented by the following general formula [I]. Preferably, the main component is a linear organic polycycloxane having a hydroxyl group in the main chain or at the end of the main chain.
一般式[■]
(Si−0%
ここでnは2以上の整数、Rは炭素数1〜1oのアルキ
ル基、ハロゲン化アルキル基、アルコキシル基、ビニル
基、アリール基、シラノール基(OH基) であり、R
の60%以上がメチル基であるものが好ましい。なお上
記シラノール基(O)1基)は主鎖中または主鎖の末端
のどちらにあってもよいが、末端にあることが好ましい
。General formula [■] (Si-0% where n is an integer of 2 or more, R is an alkyl group having 1 to 1 carbon atoms, a halogenated alkyl group, an alkoxyl group, a vinyl group, an aryl group, a silanol group (OH group) and R
It is preferable that 60% or more of the methyl groups are methyl groups. The silanol group (O) 1 group) may be located either in the main chain or at the end of the main chain, but is preferably located at the end.
本発明において有用なシリコーンゴムは、このようなシ
リコーン・ベースポリマーと、次に挙げるようなシリコ
ーン架橋剤との縮合反応によって得られるものである。The silicone rubber useful in the present invention is obtained by a condensation reaction between such a silicone base polymer and a silicone crosslinking agent as listed below.
(1) R−5i−+OR’)
(2) R−5i+0^C)
(3) R−5i+0N=CR’2)iここでRは、−
能代[IIで示されるポリマーの置換基であるRと同義
であり、R′はメチル基エチル基等のアルキル基であり
、ACはアセチル基である。(1) R-5i-+OR') (2) R-5i+0^C) (3) R-5i+0N=CR'2)i where R is -
It has the same meaning as R, which is a substituent of the polymer represented by Noshiro [II, R' is an alkyl group such as a methyl group or an ethyl group, and AC is an acetyl group.
これらのシリコーンゴムは市販品としても入手でき、例
えば東芝シリコーン社製YE−3085等がある。また
その他の有用なシリコーンゴムは、前述の如きベース・
ポリマーと、次のような一般式[II ]で示される繰
り返し単位を有するシリコーンオイルとの反応、あるい
はRの3%程度がビニル基であるシリコーンのベース・
ポリマーとの付加反応、あるいは該シリコーンオイル同
士の反応によっても得ることができる。These silicone rubbers are also available as commercial products, such as YE-3085 manufactured by Toshiba Silicone Corporation. Other useful silicone rubbers include the base and
A reaction between a polymer and a silicone oil having a repeating unit represented by the following general formula [II], or a silicone base oil in which about 3% of R is a vinyl group.
It can also be obtained by an addition reaction with a polymer or a reaction between the silicone oils.
能代[I1] HR
(式中、Rは一般式[I1で示されるポリマーの置換基
であるRと同義であり、mは2以上の整数、nは0また
は1以上の整数である。)このような架橋反応によって
シリコーンゴムを得るためには、架橋反応を触媒を用い
て行う。この触媒としては、錫、亜鉛、コバルト、鉛、
カルシウム、マンガン、等の金属の有機カルボン酸塩、
例えばラウリン酸ジブチルスズ、スズ(11)オクトエ
ート、ナフテン酸コバルト等、あるいは塩化金酸等が用
いられる。Noshiro [I1] HR (In the formula, R has the same meaning as R, which is a substituent of the polymer represented by the general formula [I1, m is an integer of 2 or more, and n is an integer of 0 or 1 or more.) This In order to obtain silicone rubber by such a crosslinking reaction, the crosslinking reaction is carried out using a catalyst. This catalyst includes tin, zinc, cobalt, lead,
Organic carboxylates of metals such as calcium, manganese, etc.
For example, dibutyltin laurate, tin (11) octoate, cobalt naphthenate, or chloroauric acid are used.
またシリコーンゴムの強度を向上させ、印刷作業中に生
じる19擦力に耐えるシリコーンゴムを得るためには、
充填剤(フィラー)を混合することもできる。予めフィ
ラーの混合されたシリコーンゴムは、シリコーンゴムス
トック、あるいはシリコーンゴムディスバージョンとし
て市販されており、本発明のようにコーティングにより
シリコーンゴム膜を得ることが好ましい場合には、RT
VあるいはLTVシリコーンゴムのディスバージョンが
好んで用いられる。このような例としては、トーレシリ
コーン社製Syl Off 23,5RX−257,5
H237等のペーパーコーティング用シリコーンゴムデ
ィスバージョンがある。In addition, in order to improve the strength of silicone rubber and obtain silicone rubber that can withstand the 19 friction force generated during printing operations,
Fillers can also be mixed. Silicone rubber mixed with filler in advance is commercially available as silicone rubber stock or silicone rubber dispersion, and when it is preferable to obtain a silicone rubber film by coating as in the present invention, RT
V or LTV silicone rubber dispersions are preferably used. An example of this is Syl Off 23,5RX-257,5 manufactured by Toray Silicone.
There are silicone rubber dispersions for paper coating such as H237.
本発明においては、縮合架橋タイプのシリコーンゴムを
用いることが好ましい。In the present invention, it is preferable to use condensation and crosslinking type silicone rubber.
シリコーンゴム層には、更に接着性を向上させるために
アミノ基を有するシランカップリング剤を含有している
ことが好ましい。The silicone rubber layer preferably contains a silane coupling agent having an amino group in order to further improve adhesiveness.
好ましいシランカップリング剤としては、例えば次のよ
うなものがある。Examples of preferable silane coupling agents include the following.
(a) H2NCH2CH2NH(C)+2) ssi
(OCHs) 。(a) H2NCH2CH2NH(C)+2) ssi
(OCHs).
(b) )IJCEzCLNH(CH2) ssi (
OCth) 2 (CHa)(C) 82N (C)+
2) sSi (OEt) !本発明に用いられるシリ
コーンゴム層中には、更に光増感剤を少量含有させるこ
とができる。(b) )IJCEzCLNH(CH2) ssi (
OCth) 2 (CHa) (C) 82N (C)+
2) sSi (OEt)! The silicone rubber layer used in the present invention may further contain a small amount of photosensitizer.
本発明に用いられるシリコーンゴム層は、シリコーンゴ
ムを適当な溶媒に溶解した後、感光層上に塗布、乾燥す
る。The silicone rubber layer used in the present invention is prepared by dissolving silicone rubber in a suitable solvent, applying it onto the photosensitive layer, and drying it.
本発明の版材料に用いられる支持体としては、通常の平
版印刷機にセットできるたわみ性と印刷時に加わる荷重
に耐えるものであることが好ましく、例えばアルミニウ
ム、亜鉛、銅、鋼等の金属板、及びクロム、亜鉛、銅、
ニッケル、アルミニウム及び鉄等がメツキまたは蒸着さ
れた金属板、紙、プラスチックフィルム及びガラス板、
樹脂コート紙、アルミニウム等の金属箔が張られた紙等
が挙げられる。The support used in the plate material of the present invention is preferably one that is flexible enough to be set in a normal lithographic printing machine and that can withstand the load applied during printing, such as a metal plate made of aluminum, zinc, copper, steel, etc. and chromium, zinc, copper,
Metal plates, paper, plastic films, and glass plates plated or vapor-deposited with nickel, aluminum, iron, etc.
Examples include resin-coated paper and paper covered with metal foil such as aluminum.
これらのうち好ましいものはアルミニウム板である。Among these, aluminum plates are preferred.
上記接着性向上のための支持体自体に対する処理は特に
限定されるものではなく、各種粗面化処理等が含まれる
。The treatment for the support itself to improve the adhesion is not particularly limited, and includes various surface roughening treatments.
また支持体に感光層を被覆する前に、感光層と支持体と
の十分な接着性を得るために、支持体にプライマー層を
設けてもよく、該プライマー層には例えポリエステル樹
脂、塩化ビニル−酢酸ビニル共重合体、アクリル樹脂、
塩化ビニル樹脂、ポリアミド樹脂、ポリビニルブチラー
ル樹脂、エポキシ樹脂、アクリレート系共重合体、酢酸
ビニル系共重合体、フェノ′キシ樹脂、ポリ゛ウレタン
樹脂、ポリカーボネート樹脂、ポリアクリロニトリルブ
タジェン、ポリ酢酸ビニル等が挙げられる。In addition, before coating the photosensitive layer on the support, a primer layer may be provided on the support in order to obtain sufficient adhesion between the photosensitive layer and the support. -vinyl acetate copolymer, acrylic resin,
Vinyl chloride resin, polyamide resin, polyvinyl butyral resin, epoxy resin, acrylate copolymer, vinyl acetate copolymer, phenoxy resin, polyurethane resin, polycarbonate resin, polyacrylonitrile butadiene, polyvinyl acetate, etc. Can be mentioned.
また上記プライマー層を構成するアンカー剤としては、
例えばシランカップリング剤、シリコーンブライマー等
を用いることができ、また有機チタネート等も有効であ
る。In addition, as the anchor agent constituting the primer layer,
For example, silane coupling agents, silicone primers, etc. can be used, and organic titanates and the like are also effective.
本発明の版材を構成する各層の厚さは、以下の通りであ
る。即ち支持体は50〜400μm、好ましくは100
〜300 μva 、感光層は0.05〜10μtn
、好ましくは0.5〜5μm1シリコ一ンゴム層は0゜
5〜100μm、好ましくは1〜40μmである。The thickness of each layer constituting the plate material of the present invention is as follows. That is, the support has a thickness of 50 to 400 μm, preferably 100 μm.
~300μva, photosensitive layer 0.05~10μtn
The silicone rubber layer has a thickness of 0.5 to 100 μm, preferably 1 to 40 μm.
本発明において、シリコーンゴム層の上面には必要に応
じて保護層を有していてもよい。In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary.
本発明の湿し水不要の版材は、例えば次のようにして製
造される。The plate material of the present invention that does not require dampening water is manufactured, for example, as follows.
支持体上に、リバースロールコータ、エアーナイフコー
タ、メーヤバーコータ等の通常のコータあるいはホエラ
ーのような回転塗布装置を用い、感光層を構成すべき組
成物溶液を塗布乾燥する。A composition solution to form a photosensitive layer is applied onto a support using a conventional coater such as a reverse roll coater, an air knife coater, or a Meyer bar coater, or a rotary coating device such as a Whaler, and then dried.
なお必要に応じて支持体と感光層の間に該感光層と同様
の方法でプライマー層を設けてた後、上記感光層上にシ
リコーンゴム溶液を同様な方法で塗布し、通常100〜
120℃の温度で数分間熱処理して、十分に硬化せしめ
てシリコーンゴム層を形成する。必要に応じて該シリコ
ーンゴム層上にラミネーターを用いて保護フィルムを設
けることができる。If necessary, a primer layer is provided between the support and the photosensitive layer in the same manner as for the photosensitive layer, and then a silicone rubber solution is applied on the photosensitive layer in the same manner.
Heat treatment is performed at a temperature of 120° C. for several minutes to fully cure and form a silicone rubber layer. If necessary, a protective film can be provided on the silicone rubber layer using a laminator.
次に本発明の湿し水不要の版材料を用いて湿し水不要の
印刷版を製造する方法を説明する。Next, a method for manufacturing a printing plate that does not require dampening water using the plate material that does not require dampening water of the present invention will be explained.
原稿であるポジフィルムをポジ型版材表面に真空密着さ
せ、露光する。この露光用の光源は、紫外線を豊富に発
生する水銀灯、カーボンアーク灯、キセノンランプ、メ
タルハライドランプ、蛍光灯等が用いられる。A positive film, which is the manuscript, is vacuum-adhered to the surface of the positive plate material and exposed. As a light source for this exposure, a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, etc., which generate abundant ultraviolet light, are used.
次いでポジフィルムを剥がし、現像液を用いて現像する
。現像液としては湿し水不要の版材の現像液として公知
のものが使用できる。例えば脂肪族炭化水素類(ヘキサ
ン、ヘプタン、 アイソパーE、H,G” (エッソ化
学社製、脂肪族炭化水素類の商品名)或はガソリン、灯
油等)、芳香族炭化水素類(トルエン、キシレン等)、
或はハロゲン化炭化水素類(トリクレン等)に下記の極
性溶媒を添加したものが好適である。Next, the positive film is peeled off and developed using a developer. As the developer, any known developer for plate materials that do not require dampening water can be used. For example, aliphatic hydrocarbons (hexane, heptane, Isopar E, H, G" (manufactured by Esso Chemical Co., Ltd., product name of aliphatic hydrocarbons), gasoline, kerosene, etc.), aromatic hydrocarbons (toluene, xylene, etc.) etc),
Alternatively, it is preferable to use a halogenated hydrocarbon (triclene, etc.) to which the following polar solvent is added.
アルコール°類(メタノール、エタノール、水等)、エ
ーテル類(メチルセロソルブ、エチルセロソルブ、ブチ
ルセロソルブ、メチルカルピトール、エチルカルピトー
ル、ブチルカルピトール、ジオキサン等)、ケトン類(
アセトン、メチルエチルケトン等)、エステル類(酢酸
エチル、メチルセロソルブアセテート、セロソルブアセ
テート、カルピトールアセテート等)
またクリスタルバイオレット、アストラゾンレット等の
染料を現像液に加えて現像と同時に画像部の染色を行う
こともできる。Alcohols (methanol, ethanol, water, etc.), ethers (methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl calpitol, ethyl calpitol, butyl calpitol, dioxane, etc.), ketones (
Acetone, methyl ethyl ketone, etc.), esters (ethyl acetate, methyl cellosolve acetate, cellosolve acetate, carpitol acetate, etc.) Also, dyes such as crystal violet and astrazonelet can be added to the developer to dye the image area at the same time as development. You can also do it.
現像は、例えば上記のような現像液を含む現像用パッド
でこすったり現像液を版面に注いだ後に現像ブラシでこ
する等、公知の方法で行うことができる。Development can be carried out by a known method, such as rubbing with a developing pad containing a developer as described above, or pouring a developer onto the printing plate and then rubbing with a developing brush.
上記現像により、未露光部のシリコーンゴムが除去され
て感光層が露出し、露光部はシリコーンゴム層が残って
いる印刷版が得られる。By the above development, the silicone rubber in the unexposed areas is removed and the photosensitive layer is exposed, and a printing plate is obtained in which the silicone rubber layer remains in the exposed areas.
以下余白
[実施例]
次に、本発明を実施例よって詳しく説明するが、本発明
は、これらの実施例に限定されるものではない。[Examples] Next, the present invention will be explained in detail with reference to Examples, but the present invention is not limited to these Examples.
実施例1
厚み0.24m+oの脱脂されたアルミニウム板に、次
の組成のブライマー層を塗布し、150℃で3分間硬化
させ、厚さ2μmのブライマー層を形成した。Example 1 A brimer layer having the following composition was applied to a degreased aluminum plate having a thickness of 0.24 m+o and was cured at 150° C. for 3 minutes to form a brimer layer having a thickness of 2 μm.
[ブライマー層の組成コ
ノールA系エポキシ樹脂)50部
エボメート5002
(油化シェルエポキシ社製、硬化剤)50部トルエン
400部メチルセロソ
ルブ 400部このブライマー層上
に下記の組成の感光性組成物−1を塗布し、100℃で
3分間乾燥して厚さ2μmの感光層を形成した。[Brimer layer composition Conol A epoxy resin] 50 parts Evomate 5002 (manufactured by Yuka Shell Epoxy Co., Ltd., hardening agent) 50 parts Toluene
400 parts methyl cellosolve 400 parts Photosensitive composition-1 having the following composition was coated on the brimer layer and dried at 100° C. for 3 minutes to form a 2 μm thick photosensitive layer.
[感光性組成物−1]
(1)合成例で製造した共重合樹脂 120部(2)
キシレンジアミンとグリシジル
メタクリレートとの(1:4)縮合物
30部
(3)ベンゾフェノン 8部(4)
メチルジェタノールアミン 9部(5)ヒドロ
キノン 0.5部次いで、感光層の
表面に、シリコーンゴム層として、YE−3085(シ
リコーンゴムの商品名、東京シリコーン社製)の50%
トルエン溶液を塗布した後、核層を120℃で5分間硬
化させることにより厚さ2μmの硬化したシリコーンゴ
ム層を形成した。[Photosensitive composition-1] (1) 120 parts of copolymer resin produced in Synthesis Example (2)
30 parts (1:4) condensate of xylene diamine and glycidyl methacrylate (3) 8 parts benzophenone (4)
Methyljetanolamine 9 parts (5) Hydroquinone 0.5 part Next, 50% of YE-3085 (trade name of silicone rubber, manufactured by Tokyo Silicone Co., Ltd.) was applied as a silicone rubber layer on the surface of the photosensitive layer.
After applying the toluene solution, the core layer was cured at 120° C. for 5 minutes to form a cured silicone rubber layer with a thickness of 2 μm.
上記のようにして得られたシリコーンゴム層の表面に厚
さ12μmの片面をマット化したポリエチレンテレフタ
レートフィルムをラミネートして湿し水不要の平版印刷
版材料を得た。A polyethylene terephthalate film having a thickness of 12 μm and matted on one side was laminated on the surface of the silicone rubber layer obtained as described above to obtain a lithographic printing plate material that did not require dampening water.
上記の版材料の上面にポジフィルムを真空密着させた後
、光源としてメタルハイランドランプを用いて10秒間
露光した。After a positive film was vacuum-adhered to the upper surface of the above plate material, it was exposed to light for 10 seconds using a metal highland lamp as a light source.
次に露光部版材料の表面からラミネートフィルムを剥離
し、下記の現像液を用いて現像した。現像中に、版材料
の表面を現像バット(スポンジ)でこすることにより、
未露光部分のシリコーンゴム層のみが容易に除去された
。°そして露光部のシリコーンゴム層が強固に付着した
湿し水不要の平版印刷版が得られた。Next, the laminate film was peeled off from the surface of the exposure plate material and developed using the following developer. During development, by rubbing the surface of the plate material with a development bat (sponge),
Only the silicone rubber layer in the unexposed areas was easily removed. A lithographic printing plate was obtained in which the silicone rubber layer in the exposed area was firmly adhered and did not require dampening water.
[現像液組成−1]
アイソパー8 70部トルエ
ン 3部ゾルフィツト
(クラレイソブレンケミカル社製)27部次いで、上記
の印刷版を湿し水供給装置を外したハイデンベルグGT
O印刷機に取り付け、大阪インキ製造社製、OPI W
LP PROCESS W RED Hにより印刷した
ところ、2万枚の小点再現性、シャドウ部再現性の良好
な印刷物が得られた。[Developer composition-1] Isopar 8 70 parts Toluene 3 parts Solfit (manufactured by Clarei Sobrene Chemical Co., Ltd.) 27 parts Next, the above printing plate was dampened with Heidenberg GT with the water supply device removed.
Attached to O printing machine, manufactured by Osaka Ink Manufacturing Co., Ltd., OPI W
When printed using LP PROCESS W RED H, 20,000 prints with good small dot reproducibility and shadow part reproducibility were obtained.
比較例
感光層として、実施例1で用いた合成例の共重合体樹脂
にかえて、メタクリル酸メチルとメタクリル酸アリルと
の1=1の共重合体を用いた以外は、実施例1の方法に
従って平版印刷版材料を作製した。同様にこの版材料を
20秒間露光した後、現像して印刷版を得、これを用い
て印刷した所、印刷量が増えるに従って版面全体に筋状
の汚れが詔められた。Comparative Example The method of Example 1 was used, except that a 1=1 copolymer of methyl methacrylate and allyl methacrylate was used instead of the copolymer resin of the synthesis example used in Example 1 as a photosensitive layer. A lithographic printing plate material was prepared according to the method. Similarly, this plate material was exposed to light for 20 seconds and then developed to obtain a printing plate. When this was used for printing, streaks appeared over the entire plate surface as the amount of printing increased.
更に、版材料の現像において、実施例1の露光部の版材
料をスポンジでごしごしこすっても現像することができ
たが、比較例では数回力を入れてこするとシャドウ部の
シリコーンゴムは、剥離してしまった。Furthermore, in developing the plate material, it was possible to develop the plate material in the exposed area of Example 1 by scrubbing it with a sponge, but in the comparative example, the silicone rubber in the shadow area peeled off when rubbed with force several times. It happened.
上記の例において、「部」と記載されているのは、特に
断らない限り「重量部」を意味する。In the above examples, "parts" means "parts by weight" unless otherwise specified.
[発明の効果]
本発明は、感光層とシリコーンゴム層との間が強固な結
合を形成しているので、得られた湿し水不要の平版印刷
版材料を現像して得られる印刷版は、耐刷性が向上する
という優れた効果が得られるものである。[Effects of the Invention] In the present invention, since a strong bond is formed between the photosensitive layer and the silicone rubber layer, the printing plate obtained by developing the obtained lithographic printing plate material that does not require dampening water is , an excellent effect of improving printing durability can be obtained.
Claims (1)
し水不要の平版印刷版材料において、該感光層が(A)
一般式[ I ]で示される構造単位を有する化合物およ
び(B)光重合開始剤を含有していることを特徴とする
湿し水不要の平版印刷版材料。 一般式[ I ] ▲数式、化学式、表等があります▼ [式中、Rは水素原子またはメチル基を表し、R′は水
素原子またはメチル基を表す。 またXはフェニレン基または置換フェニレン基、もしく
はフェニレン基、炭素数1〜10個の炭化水素またはハ
ロゲン化炭化水素またはポリエーテル基をエステル基と
してもつカルボキシル基またはアミド基を表す。][Scope of Claims] A lithographic printing plate material that does not require dampening water and has a photosensitive layer and a silicone rubber layer in this order on a support, the photosensitive layer comprising (A)
A lithographic printing plate material that does not require dampening water and is characterized by containing a compound having a structural unit represented by the general formula [I] and (B) a photopolymerization initiator. General formula [I] ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ [In the formula, R represents a hydrogen atom or a methyl group, and R' represents a hydrogen atom or a methyl group. Further, X represents a phenylene group, a substituted phenylene group, a phenylene group, a carboxyl group or an amide group having a hydrocarbon having 1 to 10 carbon atoms, a halogenated hydrocarbon, or a polyether group as an ester group. ]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27012088A JPH02115851A (en) | 1988-10-26 | 1988-10-26 | Damping-waterless planographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27012088A JPH02115851A (en) | 1988-10-26 | 1988-10-26 | Damping-waterless planographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02115851A true JPH02115851A (en) | 1990-04-27 |
Family
ID=17481825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27012088A Pending JPH02115851A (en) | 1988-10-26 | 1988-10-26 | Damping-waterless planographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02115851A (en) |
-
1988
- 1988-10-26 JP JP27012088A patent/JPH02115851A/en active Pending
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