JPH02110679U - - Google Patents
Info
- Publication number
- JPH02110679U JPH02110679U JP1965089U JP1965089U JPH02110679U JP H02110679 U JPH02110679 U JP H02110679U JP 1965089 U JP1965089 U JP 1965089U JP 1965089 U JP1965089 U JP 1965089U JP H02110679 U JPH02110679 U JP H02110679U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- wafer
- vapor phase
- attached
- growth apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 1
- 125000002524 organometallic group Chemical group 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1965089U JPH02110679U (cs) | 1989-02-23 | 1989-02-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1965089U JPH02110679U (cs) | 1989-02-23 | 1989-02-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02110679U true JPH02110679U (cs) | 1990-09-04 |
Family
ID=31235347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1965089U Pending JPH02110679U (cs) | 1989-02-23 | 1989-02-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02110679U (cs) |
-
1989
- 1989-02-23 JP JP1965089U patent/JPH02110679U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0095887A1 (en) | Apparatus for plasma chemical vapour deposition | |
| JPH02110679U (cs) | ||
| JPS5855253Y2 (ja) | 化学気相成長装置 | |
| JPH0521867Y2 (cs) | ||
| JPS62148574U (cs) | ||
| JPS6268227U (cs) | ||
| JPH0296724U (cs) | ||
| JPH0539625Y2 (cs) | ||
| JPH0610675Y2 (ja) | プラズマ処理装置 | |
| JPS6140774Y2 (cs) | ||
| JPH01125369U (cs) | ||
| JPS62170627U (cs) | ||
| JPS6262432U (cs) | ||
| JPS62201927U (cs) | ||
| JPS62126362U (cs) | ||
| JPS61142441U (cs) | ||
| JPH05211125A (ja) | 気相成長装置 | |
| JPH0530352Y2 (cs) | ||
| JPS58110071U (ja) | 気相成長装置のノズル高さ調整装置 | |
| JPH0527504Y2 (cs) | ||
| JPS61192443U (cs) | ||
| JPS59129419A (ja) | 真空装置 | |
| JPH0314165U (cs) | ||
| JPH0229521U (cs) | ||
| JPS6351432U (cs) |