JPH0210973A - X-ray image pickup element - Google Patents
X-ray image pickup elementInfo
- Publication number
- JPH0210973A JPH0210973A JP63162333A JP16233388A JPH0210973A JP H0210973 A JPH0210973 A JP H0210973A JP 63162333 A JP63162333 A JP 63162333A JP 16233388 A JP16233388 A JP 16233388A JP H0210973 A JPH0210973 A JP H0210973A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- image pickup
- pickup element
- solid
- fluorescent substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052772 Samarium Inorganic materials 0.000 claims abstract description 4
- -1 halogen chemical compound Chemical class 0.000 claims abstract description 4
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims abstract description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 14
- 238000003384 imaging method Methods 0.000 claims description 14
- 229910052788 barium Inorganic materials 0.000 claims description 4
- 239000010408 film Substances 0.000 abstract description 5
- 238000000034 method Methods 0.000 abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 4
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 230000003595 spectral effect Effects 0.000 abstract description 3
- 238000007740 vapor deposition Methods 0.000 abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract description 2
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 238000005092 sublimation method Methods 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- QRVXKVFNBYFEOG-UHFFFAOYSA-N phosphanylidynesamarium Chemical compound [Sm]#P QRVXKVFNBYFEOG-UHFFFAOYSA-N 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野]
この発明は、広く一般に用いられる歓X線の撮像素子に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a widely used X-ray imaging device.
[発明の概要1
この発明は、軟X線領域の撮像において、固体撮像素子
上に、600nm以上の発光帯を持つハロゲン化バリウ
ム(サマリウム)の螢光体の薄膜を形成させ、これを保
護するためのX線透過率が高く、かつ耐放射線性の高い
物質(Be、Cの単結晶、ポリイミドのフィルム)を、
窓材として使用した窓を取り付け、一体化した小型で長
寿命であり、かつ高分解能なX線撮像素子に関する。[Summary of the Invention 1 The present invention protects the solid-state imaging device by forming a thin film of barium halide (samarium) phosphor having an emission band of 600 nm or more in imaging in the soft X-ray region. materials with high X-ray transmittance and high radiation resistance (Be, C single crystal, polyimide film),
The present invention relates to a compact, long-life, and high-resolution X-ray imaging device that is integrated with a window used as a window material.
[従来の技術1
従来、固体撮像素子上に螢光体を取り付け、放射線を可
視及び赤外光へ変換して撮像する装置として、特公昭5
8−37702号公告の前記螢光体にメタルバックをし
たものがあげられている。[Prior art 1] Conventionally, a phosphor was attached to a solid-state image sensor, and a device for converting radiation into visible and infrared light to capture an image was developed using the Japanese Patent Publication No. 5
No. 8-37702 discloses the phosphor with a metal back.
[発明が解決しようとする課題1
しかし、従来の螢光体の付いた固体撮像素子は、X線に
対して、弱い材料の組み合わせであり、かつ螢光体層形
成においても決して高分解能を得られる方式となってい
ない。[Problem to be solved by the invention 1 However, conventional solid-state imaging devices with phosphors are made of materials that are weak against X-rays, and even in the formation of the phosphor layer, high resolution cannot be achieved. It is not a method that can be used.
ずなわち、固体撮像素子によるX線の撮像は、長寿命を
一番に要求される。このため、X線を完全に螢光体層で
変換せねば、シリコンを用いた固体撮像素子に像の焼き
肴きを発生させる。また、螢光体層においても、X線に
よる着色などの損傷を避けなければならない、このため
、耐X線性のある螢光層でほぼ完全に可視光または赤外
光に変換せねばならない、さらに、変換過程において、
像のにじみを最大限に減らす課題がある。In other words, the most important requirement for X-ray imaging using a solid-state imaging device is long life. For this reason, if the X-rays are not completely converted by the phosphor layer, image burnout will occur in the solid-state image pickup device using silicon. In addition, the phosphor layer must also avoid damage such as coloring due to X-rays. Therefore, it is necessary to use a phosphor layer that is resistant to X-rays and almost completely converts it into visible or infrared light. , in the conversion process,
The challenge is to reduce blurring of images to the maximum extent possible.
[課題を解決するための手段]
上記の課題点を解決するために、この発明は、螢光体と
して、現在、一般的に使用されているジノコンを使った
固体撮像素子の分光感度特性に適合した耐X線性のある
ハロゲン化バリウム(サマリウム)を用い、この螢光体
の単体の層を形成させた。また、膜厚を30μm以下に
押さえることにより螢光体層中でのにぢみを消すことと
した。[Means for Solving the Problems] In order to solve the above-mentioned problems, the present invention is compatible with the spectral sensitivity characteristics of solid-state imaging devices using Zinocon, which is currently commonly used as a phosphor. A single layer of this phosphor was formed using barium halide (samarium) which is resistant to X-rays. Furthermore, it was decided to eliminate blur in the phosphor layer by keeping the film thickness to 30 μm or less.
[作用]
上記の手段により、この発明では、次の作用を得ること
となった盛
ハロゲン化バリウム(サマリウム)の使用することは、
この物質がE300nm以上、特に700nm以上にも
発光帯を持つことにより、シリコン系の分光感度で最適
である800nm域にほぼ一致した。[Function] By using the above means, in this invention, the following effects are obtained by using barium halide (samarium):
Since this substance has an emission band at E300 nm or higher, particularly at 700 nm or higher, the spectral sensitivity of the silicon-based material almost coincides with the optimum 800 nm range.
また、蒸着による成膜の成功により、薄く一様な螢光体
のみの層の形成が行なえる様になったことにより、X線
に対し長寿命になった。また、膜厚を高分解能を保てる
30μm以下に制御可能となった。In addition, the success of film formation by vapor deposition has made it possible to form a thin and uniform layer consisting only of phosphor, resulting in a longer lifespan against X-rays. In addition, it has become possible to control the film thickness to 30 μm or less, which maintains high resolution.
この発明の実施例を、以下の図面と表にもとすいて説明
を行なう。Embodiments of the invention will be described with reference to the following drawings and tables.
第1図において、固体撮像素子の本体101の受光面側
に、撮像素子の受光面上に蒸着により形成した螢光体層
を、保護するために、窓102を取り付けた。この窓の
窓材は、耐X線性があり、かつX線透過性が高い必要性
があるため、下記の第2図は、撮像素子の断面図で、撮
像素子202の表面に直接、螢光体層を形成させる。薄
膜形成にあたっては、真空蒸着法を用いた。このときフ
ッ化物系においては、昇華法により行ない、他のハロゲ
ン化物においては、フラッシュ法により30μm以下の
薄膜を一様に、螢光体201として形成させることがで
きた1本発明においては、軟X線領域を対称としたこと
から、膜厚を10μmとした。このことにより、X線の
透過は、0゜01%以下に押さえられ、固体撮像素子の
損傷を、はぼ完全になくし、かつ解像度の劣化を201
2 p / m m以上にした。In FIG. 1, a window 102 is attached to the light-receiving surface side of the main body 101 of the solid-state image sensor in order to protect the phosphor layer formed by vapor deposition on the light-receiving surface of the image sensor. The window material for this window needs to be both X-ray resistant and highly X-ray transparent. Form body layers. A vacuum evaporation method was used to form the thin film. At this time, in the case of fluorides, a sublimation method was used, and in the case of other halides, a thin film of 30 μm or less was uniformly formed as the phosphor 201 by a flash method. Since the X-ray region was symmetrical, the film thickness was set to 10 μm. As a result, the transmission of X-rays is suppressed to 0.01% or less, almost completely eliminating damage to the solid-state image sensor, and reducing resolution deterioration by 201%.
2 p/mm or more.
また、フッ化物系を除くこの系の母材は、湿気と炭酸ガ
スに弱いため、螢光体201を保護する窓102との空
間に、乾燥した窒素ガスの薄層を作り、環境因子による
損傷を防いだ。In addition, this base material, excluding fluoride base materials, is susceptible to moisture and carbon dioxide gas, so a thin layer of dry nitrogen gas is created in the space between the window 102 that protects the phosphor 201 and damage caused by environmental factors. prevented.
さらに、撮像素子の本体及び透過による他へのX線損傷
を防ぐため、表面を約1mmのポリイミド樹脂のX線シ
ールド203でおおった。Furthermore, in order to prevent X-ray damage to the main body of the imaging device and others due to transmission, the surface was covered with an X-ray shield 203 made of polyimide resin about 1 mm thick.
以上により、一体化となった小型で長寿命なX#il擾
像素子ができた。As a result of the above, an integrated compact and long-life X#il imaging element was completed.
[発明の効果]
この発明は、以上説明したように、固体撮像素子の分光
感度特性に適した螢光物質を、はぼX線を完全に吸収す
る厚さで成膜したことにより、101p/mmを越^、
約30〜40℃p / m mの分解能をもった長寿命
のX線撮像素子を作り出すことに成功した。[Effects of the Invention] As explained above, the present invention has a 101p/ Beyond mm ^,
We succeeded in creating a long-life X-ray imaging device with a resolution of approximately 30-40°C p/mm.
第1図は、この発明によって完成したX線IR像素子の
外観図、第2図は、このX線撮像素子の主たる構成要素
の部分の実施例を簡易的に示す断面図である。
・・本体
・・窓
・・螢光体
・・撮像素子
・・X線シールドFIG. 1 is an external view of an X-ray IR imaging device completed according to the present invention, and FIG. 2 is a sectional view simply showing an embodiment of the main components of this X-ray imaging device.・・Main body・・Window・・Fluorescent body・・Image sensor・・X-ray shield
Claims (1)
の螢光体層を形成させたことを特徴とするX線撮像素子
。Barium halide (samarium) is placed on the solid-state image sensor.
An X-ray imaging device characterized by forming a phosphor layer of.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63162333A JPH0210973A (en) | 1988-06-28 | 1988-06-28 | X-ray image pickup element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63162333A JPH0210973A (en) | 1988-06-28 | 1988-06-28 | X-ray image pickup element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0210973A true JPH0210973A (en) | 1990-01-16 |
Family
ID=15752555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63162333A Pending JPH0210973A (en) | 1988-06-28 | 1988-06-28 | X-ray image pickup element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0210973A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6042267A (en) * | 1997-04-09 | 2000-03-28 | Hamamatsu Photonics K.K. | X-ray image pickup apparatus for intraoral radiography |
-
1988
- 1988-06-28 JP JP63162333A patent/JPH0210973A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6042267A (en) * | 1997-04-09 | 2000-03-28 | Hamamatsu Photonics K.K. | X-ray image pickup apparatus for intraoral radiography |
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