JPH02102723U - - Google Patents
Info
- Publication number
- JPH02102723U JPH02102723U JP1182989U JP1182989U JPH02102723U JP H02102723 U JPH02102723 U JP H02102723U JP 1182989 U JP1182989 U JP 1182989U JP 1182989 U JP1182989 U JP 1182989U JP H02102723 U JPH02102723 U JP H02102723U
- Authority
- JP
- Japan
- Prior art keywords
- edge
- partition wall
- exchange chamber
- substrate exchange
- seal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005192 partition Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 238000001947 vapour-phase growth Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims 4
- 238000000638 solvent extraction Methods 0.000 claims 4
- 230000002093 peripheral effect Effects 0.000 claims 2
- 230000007423 decrease Effects 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989011829U JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989011829U JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02102723U true JPH02102723U (zh) | 1990-08-15 |
| JPH071789Y2 JPH071789Y2 (ja) | 1995-01-18 |
Family
ID=31220726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989011829U Expired - Fee Related JPH071789Y2 (ja) | 1989-02-03 | 1989-02-03 | 縦型気相成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH071789Y2 (zh) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016039174A (ja) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | 反応容器の密閉構造、および基板処理装置 |
| JP2017197779A (ja) * | 2016-04-25 | 2017-11-02 | トヨタ自動車株式会社 | 成膜装置及び成膜方法 |
| CN107326340A (zh) * | 2017-08-29 | 2017-11-07 | 京东方科技集团股份有限公司 | 成膜设备 |
| US11251019B2 (en) | 2016-12-15 | 2022-02-15 | Toyota Jidosha Kabushiki Kaisha | Plasma device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63190327A (ja) * | 1987-02-03 | 1988-08-05 | Toshiba Corp | 気相成長装置 |
-
1989
- 1989-02-03 JP JP1989011829U patent/JPH071789Y2/ja not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63190327A (ja) * | 1987-02-03 | 1988-08-05 | Toshiba Corp | 気相成長装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016039174A (ja) * | 2014-08-05 | 2016-03-22 | 住友化学株式会社 | 反応容器の密閉構造、および基板処理装置 |
| JP2017197779A (ja) * | 2016-04-25 | 2017-11-02 | トヨタ自動車株式会社 | 成膜装置及び成膜方法 |
| US10385455B2 (en) | 2016-04-25 | 2019-08-20 | Toyota Jidosha Kabushiki Kaisha | Film forming apparatus and film forming method |
| US11251019B2 (en) | 2016-12-15 | 2022-02-15 | Toyota Jidosha Kabushiki Kaisha | Plasma device |
| CN107326340A (zh) * | 2017-08-29 | 2017-11-07 | 京东方科技集团股份有限公司 | 成膜设备 |
| CN107326340B (zh) * | 2017-08-29 | 2023-06-13 | 京东方科技集团股份有限公司 | 成膜设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH071789Y2 (ja) | 1995-01-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |