JPH02102723U - - Google Patents

Info

Publication number
JPH02102723U
JPH02102723U JP1182989U JP1182989U JPH02102723U JP H02102723 U JPH02102723 U JP H02102723U JP 1182989 U JP1182989 U JP 1182989U JP 1182989 U JP1182989 U JP 1182989U JP H02102723 U JPH02102723 U JP H02102723U
Authority
JP
Japan
Prior art keywords
edge
partition wall
exchange chamber
substrate exchange
seal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1182989U
Other languages
English (en)
Japanese (ja)
Other versions
JPH071789Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989011829U priority Critical patent/JPH071789Y2/ja
Publication of JPH02102723U publication Critical patent/JPH02102723U/ja
Application granted granted Critical
Publication of JPH071789Y2 publication Critical patent/JPH071789Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP1989011829U 1989-02-03 1989-02-03 縦型気相成長装置 Expired - Fee Related JPH071789Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989011829U JPH071789Y2 (ja) 1989-02-03 1989-02-03 縦型気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989011829U JPH071789Y2 (ja) 1989-02-03 1989-02-03 縦型気相成長装置

Publications (2)

Publication Number Publication Date
JPH02102723U true JPH02102723U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-08-15
JPH071789Y2 JPH071789Y2 (ja) 1995-01-18

Family

ID=31220726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989011829U Expired - Fee Related JPH071789Y2 (ja) 1989-02-03 1989-02-03 縦型気相成長装置

Country Status (1)

Country Link
JP (1) JPH071789Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016039174A (ja) * 2014-08-05 2016-03-22 住友化学株式会社 反応容器の密閉構造、および基板処理装置
JP2017197779A (ja) * 2016-04-25 2017-11-02 トヨタ自動車株式会社 成膜装置及び成膜方法
CN107326340A (zh) * 2017-08-29 2017-11-07 京东方科技集团股份有限公司 成膜设备
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190327A (ja) * 1987-02-03 1988-08-05 Toshiba Corp 気相成長装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190327A (ja) * 1987-02-03 1988-08-05 Toshiba Corp 気相成長装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016039174A (ja) * 2014-08-05 2016-03-22 住友化学株式会社 反応容器の密閉構造、および基板処理装置
JP2017197779A (ja) * 2016-04-25 2017-11-02 トヨタ自動車株式会社 成膜装置及び成膜方法
US10385455B2 (en) 2016-04-25 2019-08-20 Toyota Jidosha Kabushiki Kaisha Film forming apparatus and film forming method
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
CN107326340A (zh) * 2017-08-29 2017-11-07 京东方科技集团股份有限公司 成膜设备
CN107326340B (zh) * 2017-08-29 2023-06-13 京东方科技集团股份有限公司 成膜设备

Also Published As

Publication number Publication date
JPH071789Y2 (ja) 1995-01-18

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