JPH02101531U - - Google Patents
Info
- Publication number
- JPH02101531U JPH02101531U JP1989008592U JP859289U JPH02101531U JP H02101531 U JPH02101531 U JP H02101531U JP 1989008592 U JP1989008592 U JP 1989008592U JP 859289 U JP859289 U JP 859289U JP H02101531 U JPH02101531 U JP H02101531U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor manufacturing
- manufacturing apparatus
- temperature
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Control Of Temperature (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989008592U JPH02101531U (enExample) | 1989-01-27 | 1989-01-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989008592U JPH02101531U (enExample) | 1989-01-27 | 1989-01-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02101531U true JPH02101531U (enExample) | 1990-08-13 |
Family
ID=31214606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989008592U Pending JPH02101531U (enExample) | 1989-01-27 | 1989-01-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02101531U (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998032060A1 (en) * | 1997-01-21 | 1998-07-23 | Komatsu Ltd. | Fluid temperature control device and method therefor |
-
1989
- 1989-01-27 JP JP1989008592U patent/JPH02101531U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998032060A1 (en) * | 1997-01-21 | 1998-07-23 | Komatsu Ltd. | Fluid temperature control device and method therefor |