JPH0197189U - - Google Patents
Info
- Publication number
- JPH0197189U JPH0197189U JP19198687U JP19198687U JPH0197189U JP H0197189 U JPH0197189 U JP H0197189U JP 19198687 U JP19198687 U JP 19198687U JP 19198687 U JP19198687 U JP 19198687U JP H0197189 U JPH0197189 U JP H0197189U
- Authority
- JP
- Japan
- Prior art keywords
- test chamber
- chamber
- test
- temperature
- cooling disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012360 testing method Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 6
- 239000003507 refrigerant Substances 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 238000011056 performance test Methods 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
Description
第１図は本考案の実施例にかかる試験装置の構
成を示す概略縦断面図、第２図は同水平断面図、
第３図は第２図―線に沿うクーリングデイス
クの拡大断面図である。
１……テストチヤンバ、１２……同チヤンバの
搬入口、１３……同搬出口、４……ＩＣデバイス
、５……ＩＣテスタのヘツド、８……クーリング
デイスク、８ｄ……クーリングデイスクの冷媒通
路、１１……クーリングデイスクおよびテストチ
ヤンバ内に冷媒としての液体窒素および窒素ガス
を供給する液体窒素タンク、１４……前処理室、
１５……後処理室、１６……両処理室に低温乾燥
ガスとしての窒素ガスを供給する窒素ガスタンク
。
FIG. 1 is a schematic vertical sectional view showing the configuration of a test device according to an embodiment of the present invention, FIG. 2 is a horizontal sectional view of the same,
FIG. 3 is an enlarged sectional view of the cooling disk taken along the line of FIG. 2. 1... Test chamber, 12... Inlet of the chamber, 13... Outlet of the chamber, 4... IC device, 5... Head of IC tester, 8... Cooling disk, 8d... Refrigerant passage of cooling disk, 11... Liquid nitrogen tank that supplies liquid nitrogen and nitrogen gas as a refrigerant into the cooling disk and test chamber, 14... Pretreatment chamber,
15... Post-processing chamber, 16... Nitrogen gas tank that supplies nitrogen gas as a low-temperature drying gas to both processing chambers.
Claims (1)
搬入口および搬出口を備え内部にＩＣデバイスが
収容されるテストチヤンバと、このテストチヤン
バ内において上記ＩＣデバイスに接触または近接
してこのＩＣデバイスを冷却するクーリングデイ
スクと、これらテストチヤンバ内およびクーリン
グデイスクに冷媒を供給してこれらを冷却する冷
媒供給手段と、上記テストチヤンバにおける上記
搬入口側に隣接して設けられた前処理室と、テス
トチヤンバにおける上記搬出口側に隣接して設け
られた後処理室と、これら両処理室に低温乾燥ガ
スを供給して両処理室を上記テストチヤンバ内よ
りは高温で常温よりは低温の乾燥状態に保持する
ガス供給手段とを具備してなることを特徴とする
ＩＣデバイスの低温試験装置。 A test chamber having an inlet and an outlet for an IC device to be subjected to a performance test and in which the IC device is housed, and a cooling disk that cools the IC device in contact with or in close proximity to the IC device within the test chamber. a refrigerant supply means for supplying refrigerant to the inside of the test chamber and the cooling disk to cool them; a pretreatment chamber provided adjacent to the loading port side of the test chamber; and a pretreatment chamber adjacent to the loading port side of the test chamber. and a gas supply means for supplying low-temperature drying gas to both processing chambers to maintain both processing chambers in a dry state at a temperature higher than that inside the test chamber and lower than room temperature. A low-temperature testing device for IC devices characterized by:
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19198687U JPH0197189U (en) | 1987-12-17 | 1987-12-17 | |
| US07/284,547 US4918928A (en) | 1987-12-17 | 1988-12-15 | Apparatus for testing IC devices at low temperature and cooling bag for use in testing IC devices at low temperature |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19198687U JPH0197189U (en) | 1987-12-17 | 1987-12-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0197189U true JPH0197189U (en) | 1989-06-28 |
Family
ID=31482868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19198687U Pending JPH0197189U (en) | 1987-12-17 | 1987-12-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0197189U (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54115189A (en) * | 1978-02-28 | 1979-09-07 | Toshiba Corp | Low temperature conveyor unit |
| JPS5717871A (en) * | 1980-07-04 | 1982-01-29 | Mitsubishi Electric Corp | Environment test device |
| JPS5759450B2 (en) * | 1975-12-17 | 1982-12-15 | Sumitomo Electric Industries |
-
1987
- 1987-12-17 JP JP19198687U patent/JPH0197189U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5759450B2 (en) * | 1975-12-17 | 1982-12-15 | Sumitomo Electric Industries | |
| JPS54115189A (en) * | 1978-02-28 | 1979-09-07 | Toshiba Corp | Low temperature conveyor unit |
| JPS5717871A (en) * | 1980-07-04 | 1982-01-29 | Mitsubishi Electric Corp | Environment test device |
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