JPH0196603A - Hollow optical waveguide - Google Patents
Hollow optical waveguideInfo
- Publication number
- JPH0196603A JPH0196603A JP62254403A JP25440387A JPH0196603A JP H0196603 A JPH0196603 A JP H0196603A JP 62254403 A JP62254403 A JP 62254403A JP 25440387 A JP25440387 A JP 25440387A JP H0196603 A JPH0196603 A JP H0196603A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- polymer resin
- waveguide
- optical waveguide
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 21
- 239000010409 thin film Substances 0.000 claims abstract description 18
- 239000002952 polymeric resin Substances 0.000 claims abstract description 14
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 14
- 230000010355 oscillation Effects 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 21
- 229920001721 polyimide Polymers 0.000 claims description 11
- 239000004642 Polyimide Substances 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- -1 fluoride compound Chemical class 0.000 claims description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 2
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 239000005387 chalcogenide glass Substances 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims 2
- 239000010410 layer Substances 0.000 claims 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims 1
- 229920002050 silicone resin Polymers 0.000 claims 1
- 239000002356 single layer Substances 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 abstract description 17
- 238000005452 bending Methods 0.000 abstract description 16
- 239000010408 film Substances 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 230000003044 adaptive effect Effects 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- 229910052759 nickel Inorganic materials 0.000 description 9
- 238000007747 plating Methods 0.000 description 7
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 239000001569 carbon dioxide Substances 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000012994 industrial processing Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000005422 blasting Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/032—Optical fibres with cladding with or without a coating with non solid core or cladding
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野１
本発明は誘電体を内装した中空光導波路に係り、特に低
損失でしかも可撓性のある中空光導波路に関するもので
、医療及び工業加工に使用される炭酸ガスレーザ光の伝
送に好適である。Detailed Description of the Invention [Industrial Application Field 1] The present invention relates to a hollow optical waveguide with a dielectric inside, and in particular to a low-loss and flexible hollow optical waveguide, and is suitable for medical and industrial processing. Suitable for transmitting carbon dioxide laser light used.
［従来の技術］
炭酸ガスレーザは、発振効率が高（大出力を得ることが
できるため、医療用のレーザメスや工業加工用の溶接、
切断等に広く用いられるようになってきている。しかし
、その発振波長が１０．６−という赤外領域にあるため
、従来の石英系光ファイバでは損失が大きく、炭酸ガス
レーザ光用導波路として用い゛ることはできない。従っ
て、現在炭酸ガスレーザ光を導く手段としては、数枚の
ミラーを用いた空中伝送方式が主に採用されているが、
これは操作性において極めて不利である。[Conventional technology] Carbon dioxide lasers have high oscillation efficiency (large output can be obtained), so they are used in laser scalpels for medical purposes, welding for industrial processing,
It has come to be widely used for cutting, etc. However, since its oscillation wavelength is in the infrared region of 10.6 -, conventional silica-based optical fibers have large losses and cannot be used as waveguides for carbon dioxide laser light. Therefore, currently the main method of guiding carbon dioxide laser light is an aerial transmission method using several mirrors.
This is extremely disadvantageous in terms of operability.
そこで、炭酸ガスレーザ光用導波路として赤外ファイバ
の開発が進められている。最近、より大きな電力伝達を
目的として誘電体を内装した金属中空光導波路が提案さ
れ、第３図に示すようなゲルマニウム内装ニッケツル中
空光導波路が試作されティる（Ｈ，Ｈｉｙａｇｉ、Ａ、
ｔｌｏｎｇｏ、’／、＾ｉｚａｗａ、ａｎｄ Ｓ、にａ
ｗａｋａｍｉ、 Ａｐｐｌ、Ｐｈｙｓ、Ｌｅｔｔ ４３
，４３０（１９８３） ） 。コの製造方法はまずエツ
チング可能な母材パイプの外面にゲルマニウム層３１を
スパッタリングにより形成し、さらにその外側にニッケ
ル層３２をめっきにより形成した後、母材パイプをエツ
チングによって除去して中空領域３３を形成し、ゲルマ
ニウム内装ニッケル中空光導波路を得るものである。Therefore, infrared fibers are being developed as waveguides for carbon dioxide laser light. Recently, a metal hollow optical waveguide with a dielectric inside has been proposed for the purpose of greater power transmission, and a germanium-incorporated nickel hollow optical waveguide as shown in Fig. 3 has been prototyped (H., Hiyagi, A.
tlongo, '/, ^izawa, and S, nia
wakami, Appl, Phys, Lett 43
, 430 (1983)). This manufacturing method first forms a germanium layer 31 on the outer surface of an etched base material pipe by sputtering, further forms a nickel layer 32 on the outside by plating, and then removes the base material pipe by etching to form a hollow region 33. A germanium-incorporated nickel hollow optical waveguide is obtained.
金属層にしみ込む伝送パワーの深さ（スキンデプス）は
十分浅く、光学的には金属層の厚さは０．１ｐ程度あれ
ば十分である。すなわちニッケル層３２は伝送損失に関
与していると同時に機械的強度を保つ働きもしている。The depth (skin depth) of the transmitted power penetrating into the metal layer is sufficiently shallow, and optically it is sufficient if the thickness of the metal layer is about 0.1p. That is, the nickel layer 32 is involved in transmission loss and at the same time serves to maintain mechanical strength.
誘電体に接する金属層としでは、電気めっきによって容
易に厚膜の金属層が得られるという理由で、第３図の従
来例ではニッケルを材料として選んでいる。しかしなが
ら光学的には、金属層はその複索屈折率の絶対値が十分
大きいか、あるいは複素屈折率の虚数部が実数部に比較
し十分大ぎい材料を用いた方が伝送損失は小さくなる。In the conventional example shown in FIG. 3, nickel is selected as the material for the metal layer in contact with the dielectric because a thick metal layer can be easily obtained by electroplating. However, optically, the transmission loss will be smaller if the metal layer is made of a material whose absolute value of the complex refractive index is sufficiently large or whose imaginary part of the complex refractive index is sufficiently larger than the real part.
この点でニッケルよりも金、銀。Gold and silver than nickel in this regard.
あるいは銅を用いた方が有利である。囚に、波長１０．
６−における各金属複素屈折率はＮｔ ： ９．１−
ｊ３４．８．＾ｕ ： １７．１−ｊ５５．９． Ａｇ
： １３．５−ｊ７５．３． Ｃｕ：１４、１−ｊｓ
４．３である。Alternatively, it is more advantageous to use copper. Prisoner, wavelength 10.
The complex refractive index of each metal at 6- is Nt: 9.1-
j34.8. ＾u: 17.1-j55.9. Ag
: 13.5-j75.3. Cu: 14, 1-js
It is 4.3.
［発明が解決しようとする問題点］
第３図のように金属層を１００〜２００−の厚さでめっ
きによって形成した中空導波路では、めっき中に発生す
る残留応力のため中空導波路にランダムな曲がりが発生
しゃすく、伝送損失を十分低減することは難しい。また
、繰り返しの曲げに対して導波路が塑性変形を受けやす
く、特にニッケル層を無光沢めっきによって形成した導
波路ではわずかな曲がりでも塑性変形を受け、繰り返し
曲げを行った後では亀裂が発生したり元の直線状態に戻
らなくなる。一方、硬質の光沢めっきを用いた導波路で
は弾性変形の範囲内である程度の曲率で曲げることは可
能だが、曲げ半径が小さくなると破断しやすくなる。い
ずれにせよ金属層を厚く設けた中空光導波路では、十分
小さい曲げ半径でも曲げられる可撓性の優れた中空光導
波路を得ることは難しい。[Problems to be Solved by the Invention] As shown in Fig. 3, in a hollow waveguide formed by plating a metal layer with a thickness of 100 to 200 mm, random damage occurs in the hollow waveguide due to residual stress generated during plating. It is difficult to sufficiently reduce transmission loss because bending is likely to occur. In addition, waveguides are susceptible to plastic deformation due to repeated bending, and in particular, waveguides with a nickel layer formed by matte plating are subject to plastic deformation even with slight bending, and cracks may occur after repeated bending. or it will not return to its original straight line state. On the other hand, a waveguide using hard glossy plating can be bent to a certain degree of curvature within the range of elastic deformation, but the smaller the bending radius, the more likely it is to break. In any case, with a hollow optical waveguide provided with a thick metal layer, it is difficult to obtain a hollow optical waveguide with excellent flexibility that can be bent even with a sufficiently small bending radius.
このように従来の金属中空光導波路では、金属層が厚く
、そのため十分小さな曲げ半径で導波路を曲げることが
できないという欠点があった。As described above, conventional metal hollow optical waveguides have a drawback in that the metal layer is thick and therefore the waveguide cannot be bent with a sufficiently small bending radius.
本発明の目的は、前記した従来技術の欠点を解消し、小
さな曲げ半径でも自由に曲げることができる可撓性に優
れた中空光導波路を提供することにある。An object of the present invention is to eliminate the drawbacks of the prior art described above and to provide a hollow optical waveguide with excellent flexibility that can be freely bent even with a small bending radius.
［問題点を解決するための手段］
本発明の中空光導波路は、使用するレーザ光の発振波長
域で吸収の小さい少なくとも一層の誘電体薄膜の外側に
、さらに少なくとも一層の金属薄膜を設け、その外部に
導波路の機械的強度を保つ厚膜の高分子樹脂層を被覆し
たものである。[Means for Solving the Problems] The hollow optical waveguide of the present invention further includes at least one metal thin film provided on the outside of at least one dielectric thin film that has low absorption in the oscillation wavelength range of the laser beam used. The waveguide is coated with a thick polymer resin layer that maintains the mechanical strength of the waveguide.
炭酸ガスレーザの発振波長１０．６−において、吸収の
小さい好適な誘電体材料としてＧｅ、 ＺｎＳ 。Ge and ZnS are suitable dielectric materials with low absorption at the oscillation wavelength of 10.6 - for the carbon dioxide laser.
Ｚｎ５ｅ、 にＣ１，Ｈａ（Ｊｌ、 ＧａＡｓ、カル
コゲナイドカラス及びフッ化化合物等があげられる。赤
外波帯では電磁波の重要な伝送媒体となりうろこのよう
な物質は全て誘電体としてふるまう。この誘電体薄膜は
一層内装させただけでも伝送損失は何も内装していない
場合よりも２〜３桁程度低減されるが、屈折率の異なる
２種類の誘電体を交互に多層形成すればさらに伝送損失
は低減される。一方誘電体に接する金属層は前述したよ
うに複素屈折率の大きさが十分大きいかあるいは複素屈
折率の虚数部が実数部に比較し十分大きい材料を用いた
方が有利である。本発明では誘電体に接する金属層は薄
膜であるために、金、銀、銅等の好適な金属材料は全て
真空蒸着、スパッタリング、イオンブレーティング、め
っき等によって容易に形成することができる。また、高
分子樹脂の材料としては例えばポリエチレン、テフロン
、ポリイミド、シリコ−ン等の樹脂があげられる。Examples include Zn5e, C1, Ha(Jl, GaAs, chalcogenide glass, and fluoride compounds. In the infrared band, they become important transmission media for electromagnetic waves. All substances such as scales behave as dielectrics. This dielectric thin film Even if only one layer of dielectric material is installed, the transmission loss will be reduced by two to three orders of magnitude compared to the case where nothing is installed, but if two types of dielectric materials with different refractive indexes are alternately formed in multiple layers, the transmission loss will be further reduced. On the other hand, as described above, it is advantageous to use a material that has a sufficiently large complex refractive index or whose imaginary part is sufficiently large compared to the real part of the metal layer in contact with the dielectric. In the present invention, since the metal layer in contact with the dielectric is a thin film, any suitable metal material such as gold, silver, copper, etc. can be easily formed by vacuum evaporation, sputtering, ion blasting, plating, etc. Examples of the polymer resin material include resins such as polyethylene, Teflon, polyimide, and silicone.
［作 用］
機械的強度を保つために高分子樹脂を外部に被覆したの
で、繰り返しの曲げや曲率の小さな曲げが加えられても
、高分子樹脂は可撓性に富むため、そのような曲げに対
する適応力が高（、光学的にＮ膜で構成されている中空
光導波路でも極めて小さい曲げ半径で使用することが可
能となる。[Function] The exterior is coated with polymer resin to maintain mechanical strength, so even if repeated bending or bending with a small curvature is applied, polymer resin is highly flexible, so it can withstand such bending. It has a high adaptability to the bending radius (even hollow optical waveguides optically composed of N films can be used with extremely small bending radii).
一方、外部を高分子樹脂としたことで問題となる伝送損
失は、誘電体膜の外側に導波路壁としての金属ｎ１ｌＩ
を設けることによって低減している。On the other hand, the problem of transmission loss due to the use of polymer resin for the exterior is that metal n1lI as the waveguide wall is placed outside the dielectric film.
This is reduced by providing .
［実施例］
以下、本発明の実施例を第１図〜第２図を用いて説明す
る。[Example] Hereinafter, an example of the present invention will be described using FIGS. 1 and 2.
第１図はＧｅを内装した銀中空光導波路例である。FIG. 1 shows an example of a silver hollow optical waveguide containing Ge.
ここで中空領域１４を区画形成する０６層１１とその上
に設けたＡｇ層１２は光学的に導波路壁を構成している
。さらにその外側に高分子樹脂層として耐熱性に優れた
ポリイミド１１１３をコーティングしている。このポリ
イミド層１３は機械的強度を保つためのみの働きをして
おり、光学的には伝送特性に関与せず、光パワーの大部
分は中空領域１４に集中する。ＧｅＷｌｌｌとＡＯ１ｆ
ｆｉ１２はスパッタリングによって、またポリイミド層
１３は浸漬によって形成されている。中空領域１４は直
径１．５履で各層の膜厚はＧｅＪｌｌｌが０．５ＪＪＲ
，ＡＱ層１２が０、 ＩＪＩＩ 、ポリイミドＷ１１３
が１００−である。０６層１１の膜厚は伝送損失に太き
（影響し、伝送損失はＧｅの″膜厚の変化に従って周期
的に変化する。ＡｇＮ！ｇ１２の膜厚さは電磁界のしみ
込む深さ（スキンデプス）以上あれば、狭口的には伝送
損失に大きな影響を及ぼさないが、厚過ぎると曲げによ
って剥離する場合が生じるので０．１−程度が好ましい
。Here, the 06 layer 11 defining the hollow region 14 and the Ag layer 12 provided thereon optically constitute a waveguide wall. Furthermore, polyimide 1113, which has excellent heat resistance, is coated on the outside as a polymer resin layer. This polyimide layer 13 functions only to maintain mechanical strength and does not optically affect transmission characteristics, and most of the optical power is concentrated in the hollow region 14. GeWllll and AO1f
The fi 12 is formed by sputtering, and the polyimide layer 13 is formed by dipping. The hollow region 14 has a diameter of 1.5 mm and the thickness of each layer is GeJll of 0.5JJR.
, AQ layer 12 is 0, IJII, polyimide W113
is 100-. The film thickness of the 06 layer 11 has a large effect on the transmission loss, and the transmission loss changes periodically according to changes in the Ge film thickness.The film thickness of the AgN! ) or more does not have a large effect on transmission loss in a narrow sense, but if it is too thick, it may peel off due to bending, so a thickness of about 0.1 is preferable.
なお、第１図の実施例では金属層に内装される誘電体と
してＧｅのみを用いたが２１１類の誘電体、例えばＧｅ
とＺｎ５ｅを交互に冬目内装すればさらに低損失な導波
路を得ることができる。In the embodiment shown in FIG. 1, only Ge was used as the dielectric material included in the metal layer, but a dielectric material of class 211, such as Ge
If Zn5e and Zn5e are alternately coated, a waveguide with even lower loss can be obtained.
また、第１図においてへｇ層は０．１−と薄いためポリ
イミドｌ１１１３を浸漬によってコーティングするとき
０６層１１及びＡ４７層１２に傷がつく危険性がある。In addition, since the Heg layer in FIG. 1 is as thin as 0.1, there is a risk that the 06 layer 11 and the A47 layer 12 will be damaged when coating with polyimide 1113 by dipping.
これを避ｓするため第２ＷＪに示すように、０６層２１
上の＾ＱＦＩＪ２２とポリイミドｗ３２４との間に、例
えばｎｔ層２３を介在させると効果的である。Ｘｉ層２
３は無電解めっきあるいは＾ＱＦＩＡ２２を電極として
用いた電気めっきによって容易に形成できる。To avoid this, as shown in the second WJ, 06 layer 21
It is effective to interpose, for example, the nt layer 23 between the upper QFIJ 22 and the polyimide w 324. Xi layer 2
3 can be easily formed by electroless plating or electroplating using QFIA22 as an electrode.
めっきによって形成された１層２３はＡｇ層２２に極め
て強靭に付着し、ポリイミドをコーティングするとき、
＾ＱＷＪ２２及びＧｅｆｆ ２１を保護する。但しこの
場合、あまり厚すぎると可撓性を損うのでｘ＋ｍ ２３
の膜厚は数ｐ程度にする必要がある。なお、２５は中空
領域である。One layer 23 formed by plating adheres extremely strongly to the Ag layer 22, and when coating with polyimide,
^Protect QWJ22 and Geff 21. However, in this case, if it is too thick, the flexibility will be lost, so x + m 23
It is necessary to make the film thickness of about several micrometers. Note that 25 is a hollow area.
［発明の効果］ 本発明によれば次のような優れた効果が得られる。[Effect of the invention] According to the present invention, the following excellent effects can be obtained.
（１） 薄膜で構成した導波路の外部に高分子樹脂を
用いて機械的強度をもたせているため、光導波路は可撓
性に富み、際めで小さい曲げ半径でも曲げることができ
る。(1) Since a polymer resin is used on the outside of the thin film waveguide to provide mechanical strength, the optical waveguide is highly flexible and can be bent even with a small bending radius.
■） また、誘電体膜薄膜上に導波路壁としての金属層
を薄く形成しているため、可撓性を損うことなく、伝送
損失を低減することができる。特に金属層を金、銀、銅
で形成すれば、伝送損失を一層低減できる。(2) Furthermore, since a thin metal layer is formed as a waveguide wall on the thin dielectric film, transmission loss can be reduced without impairing flexibility. In particular, if the metal layer is made of gold, silver, or copper, transmission loss can be further reduced.
第１図は本発明の一実施例を示すポリイミド樹脂によっ
て゛被覆されたゲルマニウム内装銀中空先導波路の横断
面図、第２図は本発明の他の実施例を示し、銀層とポリ
イミド層との間にニッケル層を介在させたゲルマニウム
内装銀中空光導波路の横断面図、第３図は従来のゲルマ
ニウム内装ニッケル中空先導波路の横断面図である。
図中、１１．２１はＧｅ１ｌ （誘電体１１１１）、１
２．２２はＡＱ層（金ａ薄１５１）、２３はＸｉ層、１
３．２４Ｇ；Ｌポリイミド１１２１（１ｅ分子樹脂層）
、１４．２５は中空領域である。FIG. 1 is a cross-sectional view of a germanium-incorporated silver hollow guiding waveguide coated with polyimide resin, showing one embodiment of the present invention, and FIG. FIG. 3 is a cross-sectional view of a conventional germanium-equipped nickel hollow optical waveguide with a nickel layer interposed therebetween. FIG. In the figure, 11.21 is Ge1l (dielectric 1111), 1
2.22 is AQ layer (gold a thin 151), 23 is Xi layer, 1
3.24G; L polyimide 1121 (1e molecular resin layer)
, 14.25 is a hollow region.
Claims (4)
電体薄膜が中空領域を区画形成し、上記誘電体薄膜の外
方に金属薄膜を設け、その外部に導波路の機械的強度を
保つ厚膜の高分子樹脂層を有することを特徴とする中空
光導波路。(1) A dielectric thin film with low absorption in the oscillation wavelength range of the laser beam to be used defines a hollow region, and a metal thin film is provided outside the dielectric thin film to maintain the mechanical strength of the waveguide. A hollow optical waveguide characterized by having a thick polymer resin layer.
ｌ、ＮａＣｌ、ＧａＡｓ、カルコゲナイドガラス、フッ
化化合物のいずれかよりなる１層構造の薄膜、またはこ
れらの任意の組合わせよりなる多層構造の薄膜である特
許請求の範囲第１項記載の中空光導波路。(2) The above dielectric thin film is made of Ge, ZnS, ZnSe, KC.
The hollow optical waveguide according to claim 1, which is a single-layer structure thin film made of any one of L, NaCl, GaAs, chalcogenide glass, or a fluoride compound, or a multilayer structure thin film made of any combination thereof. .
膜は、金、銀、銅のいずれかよりなる特許請求の範囲１
項又は第２項記載の中空光導波路。(3) Among the metal thin films, the metal thin film in contact with the dielectric thin film is made of gold, silver, or copper as claimed in claim 1.
The hollow optical waveguide according to item 1 or 2.
リイミド、シリコーンの樹脂のいずれかよりなる特許請
求の範囲第１項、第２項又は第３項記載の中空光導波路
。(4) The hollow optical waveguide according to claim 1, 2, or 3, wherein the polymer resin layer is made of polyethylene, Teflon, polyimide, or silicone resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62254403A JP2633866B2 (en) | 1987-10-08 | 1987-10-08 | Hollow optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62254403A JP2633866B2 (en) | 1987-10-08 | 1987-10-08 | Hollow optical waveguide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0196603A true JPH0196603A (en) | 1989-04-14 |
| JP2633866B2 JP2633866B2 (en) | 1997-07-23 |
Family
ID=17264492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62254403A Expired - Lifetime JP2633866B2 (en) | 1987-10-08 | 1987-10-08 | Hollow optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2633866B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03184003A (en) * | 1989-12-14 | 1991-08-12 | Hitachi Cable Ltd | Dielectric-containing metallic hollow optical waveguide |
| JP2003021782A (en) * | 2001-07-06 | 2003-01-24 | Marumo Denki Kk | Projection lens device and spot light equipped therewith |
| JP2009524835A (en) * | 2006-01-30 | 2009-07-02 | ザ ユニバーシティ オブ シドニー | Fiber optic dosimeter |
| JP2017146357A (en) * | 2016-02-15 | 2017-08-24 | 住友電気工業株式会社 | Hollow optical fiber, endoscope device, and method of manufacturing hollow optical fiber |
| EP3534194A4 (en) * | 2016-11-30 | 2020-07-01 | Pioneer Corporation | Electromagnetic wave transmission cable |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61217005A (en) * | 1985-03-18 | 1986-09-26 | コヒーレント・インコーポレイテッド | Hollow waveguide |
| JPS61206903U (en) * | 1985-06-17 | 1986-12-27 |
-
1987
- 1987-10-08 JP JP62254403A patent/JP2633866B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61217005A (en) * | 1985-03-18 | 1986-09-26 | コヒーレント・インコーポレイテッド | Hollow waveguide |
| JPS61206903U (en) * | 1985-06-17 | 1986-12-27 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03184003A (en) * | 1989-12-14 | 1991-08-12 | Hitachi Cable Ltd | Dielectric-containing metallic hollow optical waveguide |
| JP2003021782A (en) * | 2001-07-06 | 2003-01-24 | Marumo Denki Kk | Projection lens device and spot light equipped therewith |
| JP2009524835A (en) * | 2006-01-30 | 2009-07-02 | ザ ユニバーシティ オブ シドニー | Fiber optic dosimeter |
| JP2017146357A (en) * | 2016-02-15 | 2017-08-24 | 住友電気工業株式会社 | Hollow optical fiber, endoscope device, and method of manufacturing hollow optical fiber |
| EP3534194A4 (en) * | 2016-11-30 | 2020-07-01 | Pioneer Corporation | Electromagnetic wave transmission cable |
| US11018403B2 (en) | 2016-11-30 | 2021-05-25 | Pioneer Corporation | Electromagnetic wave transmission cable including a hollow dielectric tube surrounded by a foamed resin member having different expansion ratios at different regions therein |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2633866B2 (en) | 1997-07-23 |
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