JPH0170328U - - Google Patents
Info
- Publication number
- JPH0170328U JPH0170328U JP1987164731U JP16473187U JPH0170328U JP H0170328 U JPH0170328 U JP H0170328U JP 1987164731 U JP1987164731 U JP 1987164731U JP 16473187 U JP16473187 U JP 16473187U JP H0170328 U JPH0170328 U JP H0170328U
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- processing
- processing tank
- liquid
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 4
- 239000011148 porous material Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 238000012993 chemical processing Methods 0.000 claims 2
- 238000001914 filtration Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本考案の処理装置の一実施例の概要構
造図、第２図は従来の薬液処理装置の概略構造図
である。
１……処理槽、２……外槽、３……ポンプ、４
……フイルター、５……ゴミ、６……細孔、７…
…上端面。
FIG. 1 is a schematic structural diagram of an embodiment of the processing apparatus of the present invention, and FIG. 2 is a schematic structural diagram of a conventional chemical liquid processing apparatus. 1... Processing tank, 2... Outer tank, 3... Pump, 4
...Filter, 5...Garbage, 6...Pore, 7...
...Top end surface.
Claims (1)
理する半導体基板の薬液処理装置において、処理
槽外壁に細孔を設け、処理槽上部からのオーバー
フロー液と共に処理槽外壁に設けた細孔よりの排
出液をフイルタリング機構を介して循還せしめる
構造を有することを特徴とする半導体基板の薬液
処理装置。 In a chemical processing device for semiconductor substrates in which a semiconductor substrate is immersed in a chemical solution in a processing tank for chemical processing, pores are provided in the outer wall of the processing tank, and the overflow liquid from the top of the processing tank is collected through the pores provided in the outer wall of the processing tank. A chemical liquid processing apparatus for semiconductor substrates, characterized by having a structure in which a discharged liquid is circulated through a filtering mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987164731U JPH0170328U (en) | 1987-10-27 | 1987-10-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987164731U JPH0170328U (en) | 1987-10-27 | 1987-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0170328U true JPH0170328U (en) | 1989-05-10 |
Family
ID=31450585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987164731U Pending JPH0170328U (en) | 1987-10-27 | 1987-10-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0170328U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03296477A (en) * | 1990-04-16 | 1991-12-27 | Haneda Seisakusho:Kk | Ultrasonic cleaning tank |
-
1987
- 1987-10-27 JP JP1987164731U patent/JPH0170328U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03296477A (en) * | 1990-04-16 | 1991-12-27 | Haneda Seisakusho:Kk | Ultrasonic cleaning tank |