JPH0162651U - - Google Patents

Info

Publication number
JPH0162651U
JPH0162651U JP1987157101U JP15710187U JPH0162651U JP H0162651 U JPH0162651 U JP H0162651U JP 1987157101 U JP1987157101 U JP 1987157101U JP 15710187 U JP15710187 U JP 15710187U JP H0162651 U JPH0162651 U JP H0162651U
Authority
JP
Japan
Prior art keywords
section
ion beam
extraction electrode
filament
measurement section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987157101U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987157101U priority Critical patent/JPH0162651U/ja
Publication of JPH0162651U publication Critical patent/JPH0162651U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例のブロツク図、第2
図は本考案の一実施例に用いられる比較処理部の
一例のブロツク図、第3図は従来のイオン注入装
置のブロツク図である。 1……フイラメント、2……フイラメント電源
、3……アークチヤンバー、4……アーク電源、
5……積算タイマー、6……絶縁碍子、7……ソ
ースガス、8……引き出し電極用電源、9……引
き出し電極、10……加速・減速電極用電源、1
1……加速・減速電極、12……真空容器、13
……測定部、14……比較処理部、15……表示
部。
Fig. 1 is a block diagram of an embodiment of the present invention;
The figure is a block diagram of an example of a comparison processing section used in an embodiment of the present invention, and FIG. 3 is a block diagram of a conventional ion implantation apparatus. 1... Filament, 2... Filament power supply, 3... Arc chamber, 4... Arc power supply,
5...Integration timer, 6...Insulator, 7...Source gas, 8...Power source for extraction electrodes, 9...Extraction electrode, 10...Power source for acceleration/deceleration electrodes, 1
1...Acceleration/deceleration electrode, 12...Vacuum container, 13
...Measurement section, 14...Comparison processing section, 15...Display section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 熱電子を発生させるためのフイラメントと該フ
イラメントからの熱電子によりソースガスのイオ
ンを作るアークチヤンバーと該ソースガスのイオ
ンビームの引き出しの高効率化及びイオンビーム
の絞り込みを行なう加速・減速電極とイオンビー
ムの引き出しを行なう引き出し電極とから構成さ
れるイオン注入装置であつて、前記引出し電極に
電位を与える引出し電極用電源に接続されその電
流を測定する測定部と、前記測定部で測定した電
流値と設定電流値とを比較しその差が規定値以上
の場合表示部に信号を送出する比較処理部と、前
記比較処理部からの信号により装置の異常を表示
する表示部とを有することを特徴とするイオン注
入装置。
A filament for generating hot electrons, an arc chamber for generating source gas ions using the hot electrons from the filament, and an acceleration/deceleration electrode for highly efficient extraction of the source gas ion beam and narrowing down of the ion beam. An ion implantation device comprising an extraction electrode for extracting an ion beam, a measurement section connected to an extraction electrode power supply that applies a potential to the extraction electrode and measures the current, and a measurement section for measuring the current measured by the measurement section. and a set current value, and a comparison processing section that sends a signal to a display section if the difference is greater than or equal to a specified value, and a display section that displays an abnormality in the device based on the signal from the comparison processing section. Features of ion implantation equipment.
JP1987157101U 1987-10-13 1987-10-13 Pending JPH0162651U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987157101U JPH0162651U (en) 1987-10-13 1987-10-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987157101U JPH0162651U (en) 1987-10-13 1987-10-13

Publications (1)

Publication Number Publication Date
JPH0162651U true JPH0162651U (en) 1989-04-21

Family

ID=31436248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987157101U Pending JPH0162651U (en) 1987-10-13 1987-10-13

Country Status (1)

Country Link
JP (1) JPH0162651U (en)

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