JPH0156140B2 - - Google Patents
Info
- Publication number
- JPH0156140B2 JPH0156140B2 JP7907885A JP7907885A JPH0156140B2 JP H0156140 B2 JPH0156140 B2 JP H0156140B2 JP 7907885 A JP7907885 A JP 7907885A JP 7907885 A JP7907885 A JP 7907885A JP H0156140 B2 JPH0156140 B2 JP H0156140B2
- Authority
- JP
- Japan
- Prior art keywords
- sealing
- alloy
- oxide film
- alloy plate
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910045601 alloy Inorganic materials 0.000 claims description 79
- 239000000956 alloy Substances 0.000 claims description 79
- 238000007789 sealing Methods 0.000 claims description 58
- 239000002184 metal Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000002131 composite material Substances 0.000 claims description 10
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 239000003566 sealing material Substances 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 38
- 239000011521 glass Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 9
- 229910019589 Cr—Fe Inorganic materials 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 229910000640 Fe alloy Inorganic materials 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Description
【発明の詳細な説明】
利用産業分野
この発明は、封着用合金板、特に、デイスプレ
イ等の表示管用電極、等に使用される封着材料の
製造方法に係り、電極等の作製時における不要の
酸化被膜の徐去工程が省略できる封着材料の製造
方法に関する。[Detailed Description of the Invention] Field of Application The present invention relates to a method for manufacturing a sealing alloy plate, particularly a sealing material used for electrodes for display tubes, etc. The present invention relates to a method for manufacturing a sealing material that can omit the step of removing an oxide film.
背景技術
一般に、デイスプレイ等の表示管用電極に使用
される封着用合金は、
その熱膨脹係数が軟質ガラスの熱膨脹係数と
近似すること、
酸化被膜の素地との密着性が良好なること
打抜き性、加工性のすぐれていること、
等の特性を満足することが要求され、現在、封着
用合金としては、15〜30Cr−Fe合金や、40〜
48Ni−４〜8Cr−Fe合金が使用されている。BACKGROUND TECHNOLOGY In general, sealing alloys used for electrodes for display tubes, etc., have a coefficient of thermal expansion that is close to that of soft glass, and an oxide film that has good adhesion to the base material.Dampability and workability. Currently, sealing alloys include 15~30Cr-Fe alloy and 40~30Cr-Fe alloy.
48Ni-4 to 8Cr-Fe alloys are used.
この封着用合金は、所要板厚に圧延したのち、
所要寸法、形状に打抜き加工またはエツチング加
工後、例えば、表示管用電極を作製する場合は、
表示管のガラス部に封着されるリード部に、ガラ
スとの密着性を改善するために、封着用合金板
に、露点＋10℃〜＋40℃の湿潤H2雰囲気中で、
1000℃〜1250℃の予備酸化被膜処理を施すが、板
全面に酸化被膜が形成され、不要となる封入側リ
ード部及び外部リード部表面の酸化被膜を除去す
るため切削加工する必要がある。 After this sealing alloy is rolled to the required thickness,
After punching or etching into the required dimensions and shape, for example, when producing electrodes for display tubes,
In order to improve the adhesion to the glass of the display tube, the lead part is sealed with a sealing alloy plate in a humid H2 atmosphere with a dew point of +10°C to +40°C.
A preliminary oxidation film treatment is performed at 1000°C to 1250°C, but an oxide film is formed on the entire surface of the board, and cutting is required to remove the unnecessary oxide film on the surfaces of the encapsulating side lead part and the external lead part.
しかし、上記の合金板は極薄厚みであり、かつ
酸化被膜の組織が緻密で強固に被着していること
から、その切削加工には多大の工程と時間を要し
ていた。 However, since the above-mentioned alloy plate is extremely thin and has a dense and firmly adhered oxide film structure, cutting it requires a large amount of process and time.
発明の目的
この発明は、デイスプレイ等の表示管用電極、
あるいはブラウン管用支持板等に使用される封着
材料の製造方法を目的とし、電極等の作製時にお
ける不要酸化被膜の除去工程が省略できる封着材
料の製造方法を目的としている。Purpose of the Invention This invention relates to electrodes for display tubes such as displays,
Alternatively, the present invention aims at a method for manufacturing a sealing material used for a support plate for a cathode ray tube, etc., which can omit the step of removing an unnecessary oxide film when manufacturing an electrode or the like.
発明の構成と効果
この発明は、Cr含有封着合金板の少なくとも
１主面の１部に、予備酸化被膜処理による酸化被
膜を生成しない金属層または合金層を設けた封着
用複合合金板を所要形状に打抜きあるいはエツチ
ング加工し、その後、露点＋10℃〜＋40℃の湿潤
H2雰囲気中で、1000℃〜1250℃の予備酸化被膜
処理を施し、前記封着リード部のCr含有封着合
金板表面に所要の酸化被膜を形成したことを特徴
とする封着材料の製造方法である。Structure and Effects of the Invention The present invention requires a composite alloy plate for sealing in which a metal layer or an alloy layer that does not form an oxide film by preliminary oxidation coating treatment is provided on a part of at least one main surface of a Cr-containing sealing alloy plate. Punched or etched into shape, then moistened with a dew point of +10°C to +40°C
Production of a sealing material, characterized in that a pre-oxidation film treatment is performed at 1000°C to 1250°C in an H 2 atmosphere to form a required oxide film on the surface of the Cr-containing sealing alloy plate of the sealing lead part. It's a method.
この発明による封着用複合合金は、封着を行な
う所要箇所の露出したCr含有封着合金面に、ガ
ラスとの密着性改善のための予備酸化被膜処理を
施すことにより、露出している所要の封着合金部
分のみに酸化被膜が形成されるため、従来不可避
であつた酸化被膜の除去や不要部分の切削加工工
程が省略でき、封着材料の製造工程の削減、簡略
化並びにコストの低減に多大の効果を有する。 The composite alloy for sealing according to the present invention is produced by applying a preliminary oxidation coating treatment to the exposed Cr-containing sealing alloy surface at the required points where sealing is to be performed to improve adhesion with glass. Since the oxide film is formed only on the sealing alloy part, the removal of the oxide film and the cutting process of unnecessary parts, which were unavoidable in the past, can be omitted, which reduces the manufacturing process of the sealing material, simplifies it, and reduces costs. It has a great effect.
したがつて、予備酸化被膜処理による酸化被膜
を生成しない金属層または合金層は、Cr含有封
着合金板表面において、少なくとも酸化被膜が生
成された際にこれを除去する必要のある箇所に設
ければよく、換言すれば、酸化被膜が生成されて
も除去する必要のない箇所や、後工程で切断除去
するような部分には設ける必要がなく、用途、使
用目的などに応じて、Cr含有封着合金板の両主
面または１主面の１部の如く、所要箇所にのみ、
該金属層または合金層を設ければよい。 Therefore, a metal layer or an alloy layer that does not produce an oxide film due to preliminary oxide film treatment should be provided on the surface of the Cr-containing sealing alloy plate at least in the locations where it is necessary to remove the oxide film when it is formed. In other words, there is no need to install Cr-containing seals in areas that do not need to be removed even if an oxide film is formed, or in areas that will be cut and removed in a later process. Only in the required places, such as both main surfaces or a part of one main surface of the bonded alloy plate,
The metal layer or alloy layer may be provided.
また、用途、使用目的などに応じて、この発明
による封着用複合合金において、片面あるいは両
面の封着部となる所要箇所にCr含有封着合金表
面を露出させるよう、予備酸化被膜処理により酸
化被膜を生成しない金属層または合金層を、Cr
含有封着合金の一部分に設けることにより、容易
に所要箇所並びに所要数の酸化被膜を有する封着
材料を製造できる利点がある。 In addition, depending on the application and purpose of use, the composite alloy for sealing according to the present invention may be coated with an oxide film by preliminary oxidation coating treatment so that the surface of the Cr-containing sealing alloy is exposed at the required locations that will become the sealing portion on one or both sides. Metal layer or alloy layer that does not produce Cr
By providing it on a portion of the containing sealing alloy, there is an advantage that it is possible to easily manufacture a sealing material having an oxide film in the required locations and in the required number.
また、所要の酸化被膜を設けたのちに、必要に
応じて表面に残存する金属または合金層を除去す
るには、例えば、表面層材質に応じた酸溶液など
に浸漬すれば、容易に除去でき、他のめつき層や
パターン等を設ける等の次工程に悪影響などを及
ぼすことがない利点もある。 In addition, after forming the required oxide film, if necessary, the remaining metal or alloy layer on the surface can be removed by immersing it in an acid solution suitable for the surface layer material. Another advantage is that it does not adversely affect subsequent steps such as providing other plating layers, patterns, etc.
この発明において、芯材となるCr含有封着合
金板としては、15％〜30％Cr−Fe合金板、40％
〜48Ni−４％〜８％Cr−Fe合金板、が適してお
り、このCr含有封着合金板の少なくとも１主面
の１部に設ける金属層または合金層の材料には、
予備酸化被膜処理による酸化被膜を生成しなけれ
ば、いずれの金属または合金も適用でき、熱膨脹
係数、熱伝導度の整合性やコストの面からFe−
30％〜55％Ni合金板、Fe、Ni、Cuの金属板等が
望ましく、目的、用途に応じて適宜選定すればよ
く、例えば、材質を選定して酸化被膜処理後も除
去することなく、所要表面層として利用すること
もできる。 In this invention, the Cr-containing sealing alloy plate serving as the core material is 15% to 30% Cr-Fe alloy plate, 40% Cr-Fe alloy plate,
~48Ni-4%~8%Cr-Fe alloy plate is suitable, and the material of the metal layer or alloy layer provided on at least a part of the main surface of this Cr-containing sealing alloy plate includes:
Any metal or alloy can be applied as long as no oxide film is formed by preliminary oxide film treatment, and Fe-
30% to 55% Ni alloy plates, Fe, Ni, Cu metal plates, etc. are preferable, and can be selected appropriately depending on the purpose and application. It can also be used as a required surface layer.
また、金属または合金層の被着方法は、圧延ク
ラツド法、めつき法など、芯材材質や表面層材質
に応じて種々の方法が適用できる。また、金属層
または合金層の厚みは、後工程で除去する場合
は、できるだけ薄膜層とするのが好ましい。 In addition, various methods can be used to deposit the metal or alloy layer depending on the material of the core material and the material of the surface layer, such as a rolled clad method or a plating method. Further, the thickness of the metal layer or alloy layer is preferably as thin as possible when it is removed in a subsequent step.
この発明において、15％〜30％Cr−Fe合金板、
40％〜48Ni−４％〜８％Cr−Fe合金板を用いる
理由は、以下のとおりである。 In this invention, 15% to 30% Cr-Fe alloy plate,
The reason for using the 40% to 48Ni-4% to 8% Cr-Fe alloy plate is as follows.
15％〜30％Cr−Fe合金において、Crは15wt％
未満では熱膨脹係数が大きくなり、軟質ガラスの
熱膨脹係数との差が大きくなりすぎ、好ましくな
く、30wt％を越えると、加工性が劣化し、所定
形状に成形困難となるため、Crは15wt％から
30wt％とする。 In 15%~30%Cr-Fe alloy, Cr is 15wt%
If it is less than 30 wt%, the thermal expansion coefficient becomes large and the difference with the thermal expansion coefficient of soft glass becomes too large, which is undesirable. If it exceeds 30 wt%, the workability deteriorates and it becomes difficult to form into the desired shape, so Cr is from 15 wt%.
The content shall be 30wt%.
また、40％〜48Ni−４％〜８％Cr−Fe合金に
おいて、Niが40wt％未満では熱膨脹係数が小さ
くなり、軟質ガラスの熱膨脹係数との差が大きく
なりすぎてガラス封着が困難となり、48wt％を
越えると、熱膨脹係数が大きくなり、軟質ガラス
の熱膨脹係数との差が大きくなりすぎ、好ましく
なく、Crが4wt％未満では、熱膨脹係数が小さく
なり、軟質ガラスの熱膨脹係数との差が大きくな
りすぎると共に酸化被膜の合金素地との密着性が
悪くなり、8wt％を越えると熱膨脹係数が大きく
なり、軟質ガラスの熱膨脹係数との差が大きくな
りすぎ、好ましくない。 In addition, in a 40% to 48Ni-4% to 8% Cr-Fe alloy, if Ni is less than 40wt%, the coefficient of thermal expansion becomes small, and the difference with the coefficient of thermal expansion of soft glass becomes too large, making glass sealing difficult. If it exceeds 48wt%, the coefficient of thermal expansion becomes large and the difference with the coefficient of thermal expansion of soft glass becomes too large, which is undesirable.If the content of Cr is less than 4wt%, the coefficient of thermal expansion becomes small and the difference with the coefficient of thermal expansion of soft glass becomes too large. If it becomes too large, the adhesion of the oxide film to the alloy base deteriorates, and if it exceeds 8 wt%, the coefficient of thermal expansion becomes large and the difference with the coefficient of thermal expansion of soft glass becomes too large, which is not preferable.
また、上記いずれの封着合金においても、熱
間、冷間加工性を改善するため、Si、Mnの含有
は、それぞれ0.005wt％〜1.0wt％の含有が望まし
く、酸化被膜との密着性を向上させるため、Al、
Zr、Ti、Ｙあるいは希土類元素のうち少なくと
も１種を0.005wt％〜1.0wt％含有するのもよい。 In addition, in any of the above sealing alloys, in order to improve hot and cold workability, the content of Si and Mn is preferably 0.005wt% to 1.0wt%, respectively, and the adhesion with the oxide film is improved. To improve, Al,
It is also good to contain 0.005 wt% to 1.0 wt% of at least one of Zr, Ti, Y, or rare earth elements.
図面に基づく発明の開示
第１図と第２図はこの発明による封着用複合合
金を使用した表示管用電極の製造方法を示す説明
図である。DISCLOSURE OF THE INVENTION BASED ON DRAWINGS FIGS. 1 and 2 are explanatory diagrams showing a method of manufacturing an electrode for a display tube using a composite alloy for sealing according to the present invention.
表示管用電極を作製する場合は、まず、所要寸
法のCr含有封着合金板１の両主面に、ここでは、
ガラス封着部に相当する箇所を除く両主面の全面
に、予備酸化被膜処理による酸化被膜を生成しな
い金属層または合金層２を、圧延クラツド法やめ
つき法などの手段で被着させて封着用複合合金板
となし、ガラスと封着する所要箇所はCr含有封
着合金板の露出面としたのち、必要とする寸法形
状に、打抜き加工あるいはエツチング加工する。 When producing an electrode for a display tube, first, on both main surfaces of a Cr-containing sealing alloy plate 1 of the required dimensions, here,
A metal layer or alloy layer 2 that does not produce an oxide film by preliminary oxidation film treatment is applied to the entire surface of both main surfaces excluding the portion corresponding to the glass sealing part by means such as rolling cladding method or glazing method, and the glass is sealed. A wearable composite alloy plate is formed, and the necessary areas to be sealed with glass are exposed on the Cr-containing sealing alloy plate, and then punched or etched into the required dimensions and shape.
ついで、Cr含有封着合金板１表面に被着した
金属層または合金層２が、Fe−30％〜55％Ni合
金、Fe、Ni金属又は合金の場合は、露点＋10℃
〜＋40℃の湿潤H2雰囲気中で、1000℃〜1250℃
の予備酸化被膜処理を施し、金属層または合金層
２がCu金属またはCu合金の場合は、露点＋10℃
〜＋40℃の湿潤H2雰囲気中で、1000℃〜1050℃
の予備酸化被膜処理を施すことにより、封着リー
ド部となるCr含有封着合金板１の露出面に、厚
み1μｍ〜5μｍの酸化被膜３が形成される。 Next, if the metal layer or alloy layer 2 deposited on the surface of the Cr-containing sealing alloy plate 1 is Fe-30% to 55% Ni alloy, Fe, Ni metal or alloy, the dew point is +10°C.
~1000℃~1250℃ in humid H2 atmosphere at ~+40℃
If the metal layer or alloy layer 2 is Cu metal or Cu alloy, the dew point is +10℃.
In a humid H2 atmosphere at ~+40°C, 1000°C to 1050°C
By performing the preliminary oxide film treatment, an oxide film 3 having a thickness of 1 μm to 5 μm is formed on the exposed surface of the Cr-containing sealing alloy plate 1 that will become the sealing lead portion.
Cr含有封着合金板１の所要箇所に酸化被膜３
を設けたのちに、表面に残存する金属層または合
金層２を除去するには、例えば、金属層または合
金層材質に応じた酸溶液などに板全体を浸漬すれ
ば、金属層または合金層２を容易に溶解除去でき
る。 Oxide film 3 at required locations on Cr-containing sealing alloy plate 1
To remove the metal layer or alloy layer 2 remaining on the surface after forming the metal layer or alloy layer 2, for example, by immersing the entire plate in an acid solution depending on the material of the metal layer or alloy layer, the metal layer or alloy layer 2 can be removed. can be easily dissolved and removed.
この酸化被膜３が生成被着したCr含有封着合
金板１部にガラス４が封着される。 Glass 4 is sealed to a portion of the Cr-containing sealing alloy plate on which this oxide film 3 is formed and adhered.
また、第２図に示す如く、Cr含有封着合金板
１の両面に、３枚の金属層または合金層２部分を
クラツドあるいはめつき法にて被着して、各主面
に２条のCr含有封着合金板１の封着部に相当す
るCr含有封着合金板１表面を露出させたのち、
プレス加工で所要形状になし、予備酸化被膜処理
を行ない、表面金属層または合金層２を除去する
ことなく、封着合金板１の封着部をガラス容器５
にて封着することもできる。 In addition, as shown in Fig. 2, three metal layers or two parts of the alloy layer are applied to both sides of the Cr-containing sealing alloy plate 1 by cladding or plating, and two strips are formed on each main surface. After exposing the surface of the Cr-containing sealing alloy plate 1 corresponding to the sealing portion of the Cr-containing sealing alloy plate 1,
The sealing part of the sealing alloy plate 1 is formed into the desired shape by press processing, and subjected to preliminary oxide coating treatment, without removing the surface metal layer or alloy layer 2.
It can also be sealed.
所要のCr含有封着合金板１部分のみに酸化被
膜３が形成されるため、従来不可避であつた外部
リード部６及び封入側リード部７表面の酸化被膜
の除去工程が不要となり、表示管電極の製造工程
の削減、簡素化、コスト低減に極めて有効であ
る。 Since the oxide film 3 is formed only on one part of the required Cr-containing sealing alloy plate, the process of removing the oxide film on the surfaces of the external lead part 6 and the encapsulating lead part 7, which was unavoidable in the past, is no longer necessary, and the display tube electrode It is extremely effective in reducing the manufacturing process, simplifying it, and reducing costs.
また、従来は、封入側リード部７の酸化被膜
は、内部電極間に高電圧をかけて封入ガスをイオ
ン化し、そのイオン放射により酸化膜を除去する
ため、厚い酸化被膜は除去できず、薄い酸化被膜
を設ける必要があり、封着強度低下を招来してい
たが、この発明では、厚い酸化被膜を設けること
ができ、封着強度の向上が著しく、また酸化被膜
の厚み調整も可能である。 In addition, conventionally, the oxide film on the encapsulating side lead part 7 was removed by applying a high voltage between the internal electrodes to ionize the encapsulated gas and using the ion radiation, so a thick oxide film could not be removed; It was necessary to provide an oxide film, which resulted in a decrease in sealing strength, but with this invention, a thick oxide film can be provided, the sealing strength is significantly improved, and the thickness of the oxide film can also be adjusted. .
実施例
実施例 １
板厚0.1mm×幅100mm寸法のCr18wt％−Feの封
着合金の両主面の両端部より幅40mm部分に、冷間
圧接法にて、板厚0.05mmのNi42wt％−Feの２条
の合金層を形成し、中央部に幅20mmの封着合金の
露出面を有するこの発明による封着用複合合金を
得た。Examples Example 1 A 42wt% Ni plate with a thickness of 0.05mm was applied to a 40mm wide portion from both ends of both main surfaces of a Cr18wt%-Fe sealing alloy with a plate thickness of 0.1mm x width of 100mm using a cold pressure welding method. A composite alloy for sealing according to the present invention was obtained by forming two alloy layers of Fe and having an exposed surface of the sealing alloy with a width of 20 mm in the center.
つぎに、この封着複合合金板を、リード部長さ
80mm、リード部幅2.0mm、リード部ピツチ3.0mm、
リード部10条、一方端に幅20mmのリード連結部を
有する形状に打抜き加工した。 Next, this sealed composite alloy plate is attached to the lead length.
80mm, lead width 2.0mm, lead pitch 3.0mm,
It was punched into a shape with 10 lead sections and a 20 mm wide lead connection section at one end.
つぎに、露点＋30℃の湿潤H2雰囲気中で、
1150℃、１時間の予備酸化被膜処理を施し、上記
の露出面に厚み3μｍのCr酸化物を主体とした酸
化被膜を設けた。 Next, in a humid H2 atmosphere with a dew point of +30°C,
A preliminary oxide film treatment was performed at 1150°C for 1 hour, and a 3 μm thick oxide film mainly composed of Cr oxide was provided on the exposed surface.
さらに、加工材を塩化第二鉄溶液中に浸漬し、
表面の合金層を溶解除去し、所要箇所にのみ酸化
被膜を設けた表示管用電極素材を得た。 Furthermore, the processed material is immersed in a ferric chloride solution,
The alloy layer on the surface was dissolved and removed to obtain an electrode material for display tubes with an oxide film provided only at required locations.
実施例 ２
板厚0.15×幅100mm寸法mmのNi42wt％−Cr6wt
％−Feの封着合金の両主面に、めつき法にて、
封着合金の両主面の両端部より幅15mm部分及び中
央部に幅40mm部分に、板厚0.01mmのNi合金層を形
成し、幅15mmの２条の封着合金の露出面を有する
この発明による封着用複合合金を得た。Example 2 Ni42wt%-Cr6wt with plate thickness 0.15 x width 100mm dimensions mm
%-Fe sealing alloy by plating method on both main surfaces of the sealing alloy.
A Ni alloy layer with a thickness of 0.01 mm is formed on a 15 mm wide part from both ends of both main surfaces of the sealing alloy and a 40 mm wide part in the center, and there are two exposed surfaces of the sealing alloy with a width of 15 mm. A composite alloy for sealing according to the invention was obtained.
その後第２図ｂ図の如く、所要形状に打抜き加
工し、さらに、露点＋30℃の湿潤H2雰囲気中で、
1100℃、0.5時間の予備酸化被膜処理を施した。
その結果、Cr含有封着合金板表面にのみ、厚み
2μｍのCr酸化物を主体とした酸化被膜が形成さ
れた。 After that, as shown in Figure 2b, it is punched into the desired shape, and then in a humid H2 atmosphere with a dew point of +30℃.
A preliminary oxidation coating treatment was performed at 1100°C for 0.5 hours.
As a result, the thickness was increased only on the surface of the Cr-containing sealing alloy plate.
A 2 μm thick oxide film mainly composed of Cr oxide was formed.
酸化被膜部分に低融点ガラスペーストを塗布
し、ガラス容器にて素材を両面から挟み、窒素ガ
ス雰囲気中で500℃、10分間加熱して封着を完了
した。 A low-melting glass paste was applied to the oxide film, the material was sandwiched from both sides between glass containers, and the material was heated at 500°C for 10 minutes in a nitrogen gas atmosphere to complete the sealing.
封入側に酸化被膜がないため、この発明では、
封着部にのみ厚い酸化被膜を設けることができ、
封着強度が著しく向上した。 Since there is no oxide film on the encapsulating side, in this invention,
A thick oxide film can be provided only on the sealing area,
Sealing strength was significantly improved.
第１図と第２図はこの発明による封着用複合合
金を使用した表示管用電極の製造方法を示す説明
図である。
１……Cr含有封着合金板、２……金属層また
は合金層、３……酸化被膜、４……ガラス、５…
…ガラス容器、６……外部リード部、７……封入
側リード部。
FIGS. 1 and 2 are explanatory diagrams showing a method of manufacturing an electrode for a display tube using the composite alloy for sealing according to the present invention. 1... Cr-containing sealing alloy plate, 2... Metal layer or alloy layer, 3... Oxide film, 4... Glass, 5...
...Glass container, 6...External lead part, 7...Enclosed side lead part.
Claims (1)
部に、予備酸化被膜処理による酸化被膜を生成し
ない金属層または合金層を設けた封着用複合合金
板を所要形状に打抜きあるいはエツチング加工
し、その後、露点＋10℃〜＋40℃の湿潤H2雰囲
気中で、1000℃〜1250℃の予備酸化被膜処理を施
し、前記封着リード部のCr含有封着合金板表面
に所要の酸化被膜を形成したことを特徴とする封
着材料の製造方法。1 of at least one main surface of the Cr-containing sealing alloy plate
A composite alloy plate for sealing is provided with a metal layer or alloy layer that does not produce an oxide film through preliminary oxide film treatment, and is punched or etched into the desired shape, and then processed in a humid H 2 atmosphere with a dew point of +10°C to +40°C. A method for manufacturing a sealing material, characterized in that a pre-oxidation film treatment is performed at 1000°C to 1250°C to form a required oxide film on the surface of the Cr-containing sealing alloy plate of the sealing lead portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60079078A JPS61238950A (en) | 1985-04-12 | 1985-04-12 | Manufacture of seal bonding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60079078A JPS61238950A (en) | 1985-04-12 | 1985-04-12 | Manufacture of seal bonding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61238950A JPS61238950A (en) | 1986-10-24 |
| JPH0156140B2 true JPH0156140B2 (en) | 1989-11-29 |
Family
ID=13679855
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60079078A Granted JPS61238950A (en) | 1985-04-12 | 1985-04-12 | Manufacture of seal bonding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61238950A (en) |
-
1985
- 1985-04-12 JP JP60079078A patent/JPS61238950A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61238950A (en) | 1986-10-24 |
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