JPH0154431B2 - - Google Patents
Info
- Publication number
- JPH0154431B2 JPH0154431B2 JP16316285A JP16316285A JPH0154431B2 JP H0154431 B2 JPH0154431 B2 JP H0154431B2 JP 16316285 A JP16316285 A JP 16316285A JP 16316285 A JP16316285 A JP 16316285A JP H0154431 B2 JPH0154431 B2 JP H0154431B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- magnet
- target body
- annular
- magnetron sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005291 magnetic effect Effects 0.000 claims description 22
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 11
- 239000000696 magnetic material Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 description 12
- 238000004544 sputter deposition Methods 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000011949 advanced processing technology Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16316285A JPS6223980A (ja) | 1985-07-24 | 1985-07-24 | マグネトロンスパツタリング用タ−ゲツト |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16316285A JPS6223980A (ja) | 1985-07-24 | 1985-07-24 | マグネトロンスパツタリング用タ−ゲツト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6223980A JPS6223980A (ja) | 1987-01-31 |
| JPH0154431B2 true JPH0154431B2 (enrdf_load_stackoverflow) | 1989-11-17 |
Family
ID=15768408
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16316285A Granted JPS6223980A (ja) | 1985-07-24 | 1985-07-24 | マグネトロンスパツタリング用タ−ゲツト |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6223980A (enrdf_load_stackoverflow) |
-
1985
- 1985-07-24 JP JP16316285A patent/JPS6223980A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6223980A (ja) | 1987-01-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |