JPH0146503B2 - - Google Patents

Info

Publication number
JPH0146503B2
JPH0146503B2 JP59172541A JP17254184A JPH0146503B2 JP H0146503 B2 JPH0146503 B2 JP H0146503B2 JP 59172541 A JP59172541 A JP 59172541A JP 17254184 A JP17254184 A JP 17254184A JP H0146503 B2 JPH0146503 B2 JP H0146503B2
Authority
JP
Japan
Prior art keywords
naphthalene
sulfur trioxide
sulfonation
sulfonic acid
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59172541A
Other languages
Japanese (ja)
Other versions
JPS6061560A (en
Inventor
Beere Horusuto
Ururitsuhi Buranku Haintsu
Keeraa Birufuriito
Myuraa Nikorausu
Shuneku Peetaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Publication of JPS6061560A publication Critical patent/JPS6061560A/en
Publication of JPH0146503B2 publication Critical patent/JPH0146503B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B45/00Formation or introduction of functional groups containing sulfur
    • C07B45/02Formation or introduction of functional groups containing sulfur of sulfo or sulfonyldioxy groups

Description

【発明の詳现な説明】 本発明は䞉酞化硫黄を甚いお芳銙族化合物類を
スルホン化するこずによる芳銙族スルホン酞類の
新芏な補造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel method for producing aromatic sulfonic acids by sulfonating aromatic compounds using sulfur trioxide.

䞉酞化硫黄を甚いる芳銙族化合物類のスルホン
化による芳銙族スルホン酞類の補造方法は公知で
ある䟋えばE.E.ギルバヌトGilbert、
Chemical Revue621962、549―589頁参照。
スルホン化剀ずしお䞉酞化硫黄を䜿甚するこずの
欠点は、䞉酞化硫黄の高い反応性のために陀去が
困難な盞圓量の望たしくない副生物類がこれらの
スルホン化反応䞭にしばしば補造されるこずであ
る。
Processes for the preparation of aromatic sulfonic acids by sulfonation of aromatic compounds using sulfur trioxide are known (e.g. EE Gilbert,
Chemical Revue 62 (1962), pp. 549-589).
A disadvantage of using sulfur trioxide as a sulfonating agent is that considerable amounts of undesirable by-products are often produced during these sulfonation reactions, which are difficult to remove due to the high reactivity of sulfur trioxide. It is.

䞉酞化硫黄ず゚ヌテル類、䟋えばゞオキサン、
タヌシダリヌ―アミン類、䟋えばピリゞン、たた
はカルボン酞アミド類、䟋えばゞメチルホルムア
ミド、ずの錯䜓補造により䞉酞化硫黄の反応性を
枛少させる堎合には、䞉酞化硫黄を甚いおも実質
的に比范的静かなスルホン化が埗られる。これら
の䞉酞化硫黄錯䜓類を甚いるスルホン化反応は実
質的に比范的遞択的に進行し、すなわち副生物類
の補造は比范的少ないが、それらは特に工業的芏
暡でのスルホン化反応甚にず぀おは、化孊量論的
量で埗られる錯化剀類を費甚および流出物の汚染
理由のために回収しなければならないこず、たた
はそれらを回収しない堎合には流出物の重倧な汚
染をもたらし、その結果䞉酞化硫黄を甚いるスル
ホン化がそれ自䜓で䟛する利点を少なくずも郚分
的に損なわせおしたうこず、ずいう倧きな欠点を
有する。
Sulfur trioxide and ethers, such as dioxane,
If the reactivity of sulfur trioxide is reduced by the preparation of complexes with tertiary amines, such as pyridine, or carboxylic acid amides, such as dimethylformamide, sulfur trioxide can be used as a relatively quiet compound. Sulfonation is obtained. Although the sulfonation reactions using these sulfur trioxide complexes proceed relatively selectively in nature, i.e. the production of relatively few by-products, they are particularly suitable for sulfonation reactions on an industrial scale. In some cases, the complexing agents obtained in stoichiometric amounts have to be recovered for cost and effluent contamination reasons, or their non-recovery results in significant contamination of the effluent; As a result, sulfonation using sulfur trioxide has the major drawback of at least partially detracting from the benefits it provides.

反応性䞉酞化硫黄の代わりにクロロスルホン酞
もすでにスルホン化剀ずしお䜿甚されおいる。䞉
酞化硫黄ず比べお匱いそれのスルホン化䜜甚のた
め、特に容易にスルホン化される芳銙族化合物類
のスルホン化においおは、クロロスルホン酞を甚
いるず、改良された遞択性およびその結果ずしお
の副生物類の補造の枛少が埗られる。しかしなが
ら、スルホン化剀ずしおクロロスルホン酞を䜿甚
するず化孊量論的量の塩化氎玠が副生物ずしお埗
られ、そしおこれらは分解しなければならず、す
なわち䞭和により無害にしなければならないずい
う倧きな欠点を有しおおり、その理由は再䜿甚を
組みこむず莫倧な技術的経費がかかるためそれら
をクロロスルホン酞の補造甚に再䜿甚できないか
らである。このこずは、クロロスルホン酞自䜓は
敏感な芳銙族化合物類甚の有利なスルホン化剀で
あるにもかかわらず、工業的なスルホン化反応甚
にそれを䜿甚するこずは、䞉酞化硫黄に比べ
お盞圓高いそれの䟡栌、およびスルホン化䞭
に等モル量で補造される塩化氎玠を無害化する際
に䌎う高い費甚により、劚げられおいる。
Instead of reactive sulfur trioxide, chlorosulfonic acid has also already been used as a sulfonating agent. Because of its weak sulfonating action compared to sulfur trioxide, the use of chlorosulfonic acid offers improved selectivity and consequent side effects, especially in the sulfonation of easily sulfonated aromatic compounds. A reduction in biological production is obtained. However, the use of chlorosulfonic acid as a sulfonating agent has the major drawback that stoichiometric amounts of hydrogen chloride are obtained as a by-product, and these must be decomposed, i.e. rendered harmless by neutralization. The reason for this is that they cannot be reused for the production of chlorosulfonic acid, since incorporating reuse would involve huge technical outlays. This means that although chlorosulfonic acid itself is an advantageous sulfonating agent for sensitive aromatic compounds, its use for industrial sulfonation reactions is limited by a) sulfur trioxide. This is hampered by its relatively high price, and b) by the high costs associated with detoxifying the hydrogen chloride produced in equimolar amounts during the sulfonation.

驚くべきこずに、ハロゲン化氎玠が䞉酞化硫黄
の反応性を枛少させるための優れた薬剀であるこ
ずを芋出した。䞉酞化硫黄の反応性はハロゲン化
氎玠により、容易にスルホン化しやすいために静
かなスルホン化が必芁である敏感な芳銙族化合物
類でも䞉酞化硫黄を甚いお顕著な収率で集合的に
スルホン化できるような皋床にたで、枛じられる
ずいうこずを芋出した。䞉酞化硫黄の反応性は、
反応混合物䞭である皮のハロゲン化氎玠濃床を制
定するこずにより、スルホン化しようずする芳銙
族化合物類の易スルホン化性ず適合させ埗るこず
を芋出した。
Surprisingly, we have found that hydrogen halides are excellent agents for reducing the reactivity of sulfur trioxide. Due to the reactivity of sulfur trioxide, it is easily sulfonated by hydrogen halides, so even sensitive aromatic compounds, which require quiet sulfonation, can be collectively sulfonated with sulfur trioxide in remarkable yields. I have found that it can be reduced to the extent that it is possible. The reactivity of sulfur trioxide is
It has been found that by establishing a certain hydrogen halide concentration in the reaction mixture, it is possible to match the sulfonability of the aromatic compounds to be sulfonated.

埓぀お、本発明はスルホン化をハロゲン化氎玠
の存圚䞋で実斜するこずを特城ずする芳銙族化合
物類を有機溶媒類䞭で䞉酞化硫黄を甚いおスルホ
ン化するこずにより芳銙族スルホン酞類を補造す
る方法に関するものである。
Therefore, the present invention is characterized in that the sulfonation is carried out in the presence of hydrogen halide.Aromatic sulfonic acids are produced by sulfonating aromatic compounds using sulfur trioxide in an organic solvent. It's about how to do it.

塩化氎玠がハロゲン化氎玠ずしお奜適に䜿甚さ
れる。ハロゲン化氎玠はスルホン化混合物にその
たたで、䟋えば気䜓状の塩化氎玠ずしお、たたは
反応混合物䞭で反応条件䞋でハロゲン化氎玠を攟
出もしくは生成する化合物類の圢状で、加えるこ
ずができる。反応混合物䞭で反応条件䞋でハロゲ
ン化氎玠塩化氎玠を生成するそのような化合
物の䟋はクロロスルホン酞である。
Hydrogen chloride is preferably used as hydrogen halide. The hydrogen halide can be added neat to the sulfonation mixture, for example as gaseous hydrogen chloride, or in the form of compounds which liberate or generate hydrogen halide under the reaction conditions in the reaction mixture. An example of such a compound that produces hydrogen halide (hydrogen chloride) in the reaction mixture under the reaction conditions is chlorosulfonic acid.

䞉酞化硫黄を加える前にたたは䞉酞化硫黄ず同
時に、ハロゲン化氎玠をスルホン化しようずする
化合物に加えるこずができる。
Hydrogen halide can be added to the compound to be sulfonated before or simultaneously with the addition of sulfur trioxide.

ハロゲン化氎玠の脱掻性化効果はそれの䜿甚量
に䟝存しおおり、ハロゲン化氎玠の量が倚くなれ
ばなるほど䞉酞化硫黄の脱掻性化が倧きくなる。
その結果、容易にスルホン化される特に敏感な芳
銙族化合物類のスルホン化においおはスルホン化
するのがそれより容易でない比范的敏感床の䜎い
芳銙族化合物類のスルホン化におけるよりも倧量
のハロゲン化氎玠が䜿甚される。特に敏感な芳銙
族化合物類のスルホン化甚には、モルの䞉酞化
硫黄圓たりモル以䞊のハロゲン化氎玠を䜿甚す
るこずが適しおいる。しかしながら、䞉酞化硫黄
の望たしい脱掻性化甚には䞀般に䞉酞化硫黄を
基にしお化孊量論的䞍足量sub―
stoichometric amountsのハロゲン化氎玠を、
䟋えばモルの䞉酞化硫黄圓たり0.01―0.9モル
の、奜適には0.1―0.8モルの、そしお特に0.25―
0.75モルの、ハロゲン化氎玠を、䜿甚するこずで
充分である。
The deactivation effect of hydrogen halide depends on the amount used, and the greater the amount of hydrogen halide, the greater the deactivation of sulfur trioxide.
As a result, more halogenation occurs in the sulfonation of particularly sensitive aromatic compounds that are easily sulfonated than in the sulfonation of relatively less sensitive aromatic compounds that are less easily sulfonated. Hydrogen is used. For the sulfonation of particularly sensitive aromatic compounds, it is suitable to use more than 1 mol of hydrogen halide per mol of sulfur trioxide. However, for the desired deactivation of sulfur trioxide, there is generally a sub-stoichiometric deficit (based on sulfur trioxide).
stoichometric amounts) of hydrogen halide,
For example 0.01-0.9 mol, preferably 0.1-0.8 mol and especially 0.25- mol per mol of sulfur trioxide.
It is sufficient to use 0.75 mol of hydrogen halide.

本発明に埓う方法は容易にスルホン化される芳
銙族化合物類、䟋えばナフタレン、―メチルナ
フタレン、―ヒドロキシナフタレンおよびゞフ
゚ニル、の遞択的モノスルホン化甚に特に適しお
いる。これらの化合物は本発明に埓う方法により
高い収率で遞択的にスルホン化されお、ナフタレ
ン――スルホン酞、―メチルナフタレン―
―スルホン酞、―ヒドロキシナフタレン――
スルホン酞およびゞプニル――スルホン酞を
䞎える。
The process according to the invention is particularly suitable for the selective monosulfonation of easily sulfonated aromatic compounds, such as naphthalene, 1-methylnaphthalene, 2-hydroxynaphthalene and diphenyl. These compounds can be selectively sulfonated with high yields by the process according to the invention to give naphthalene-1-sulfonic acid, 1-methylnaphthalene-4
-Sulfonic acid, 2-hydroxynaphthalene-1-
Gives sulfonic acid and diphenyl-4-sulfonic acid.

クロロスルホン酞を甚いる芳銙族化合物類のス
ルホン化で埗られるスルホン化混合物類の凊理に
おいおは反応䞭に生成した等モルの塩化氎玠を費
甚のかかる方法により分解させるかたたはさらに
䜿甚するこずのできる玔粋な塩化氎玠もしくは玔
粋な塩酞たたはクロロスルホン酞に転化しなけれ
ばならないが、本発明に埓う方法で埗られたハロ
ゲン化氎玠―含有スルホン化混合物類は、ハロゲ
ン化氎玠は損倱されないが䟋えば有機溶媒類ず䞀
緒に回収されそしお次のバツチで再䜿甚されるよ
うな方法で、凊理される。
In the treatment of the sulfonated mixtures obtained by the sulfonation of aromatic compounds with chlorosulfonic acid, the equimolar amount of hydrogen chloride formed during the reaction is either decomposed by expensive methods or made pure for further use. The hydrogen halide-containing sulfonated mixtures obtained by the process according to the invention can be converted into pure hydrogen chloride or pure hydrochloric acid or chlorosulfonic acid without loss of hydrogen halide but with e.g. They are processed in such a way that they are collected together and reused in the next batch.

本発明に埓う方法は回収するかたたは無害にし
なければならない䟋えば錯化剀類たたは塩化氎玠
の劂き他の化合物類をスルホン化䞭に遊離もしく
は生成するこずなく䞉酞化硫黄を甚いお敏感な芳
銙族化合物類の遞択的スルホン化を可胜にするた
め、非垞に工業的重芁性を有する。垌望する芳銙
族スルホン酞類および無芖できるほど少量の副生
物類の他には、党く他の化合物類は本発明に埓う
補造䞭に生成されない。ハロゲン化氎玠は回収さ
れそしお次のバツチで再䜿甚される。
The process according to the invention uses sulfur trioxide to treat sensitive aromatic compounds without liberating or forming during the sulfonation complexing agents or other compounds such as hydrogen chloride, which must be recovered or rendered harmless. It is of great industrial importance because it allows selective sulfonation of species. Apart from the desired aromatic sulfonic acids and negligible amounts of by-products, no other compounds are produced during the preparation according to the invention. The hydrogen halide is recovered and reused in the next batch.

本発明に埓う方法甚に適しおいる䞍掻性有機溶
媒類は、反応条件䞋で䞉酞化硫黄ず反応しないか
たたは少なくずも目に぀くほどの皋床たで反応せ
ずしかも同時にハロゲン化氎玠甚の良奜な溶解力
を有する溶媒類である。そのような溶媒類の䟋は
脂肪族ハロゲノ炭化氎玠類、䟋えばテトラクロロ
゚タン、―ゞクロロ゚タンおよび―
ゞクロロプロパンである。塩化メチレンが特に適
しおいるず蚌明されおいる。
Inert organic solvents which are suitable for the process according to the invention do not react with the sulfur trioxide under the reaction conditions, or at least do not react to an appreciable extent, and at the same time have a good dissolving power for the hydrogen halide. These are solvents with Examples of such solvents are aliphatic halogenohydrocarbons such as tetrachloroethane, 1,2-dichloroethane and 1,2-
It is dichloropropane. Methylene chloride has proven particularly suitable.

本発明に埓う方法は−40〜20℃の、奜適には
−30〜10℃の、そしお特に−20〜℃の、枩床
においお実斜される。
The process according to the invention is carried out at temperatures of -40 to +20°C, preferably -30 to +10°C and especially -20 to 0°C.

䞉酞化硫黄は本発明に埓う方法においおは液䜓
もしくは気䜓状でたたは䞍掻性有機溶媒䞭溶液の
圢で䜿甚できる。適宜䟋えば窒玠の劂き䞍掻性気
䜓で垌釈されおいおもよい気䜓状の䞉酞化硫黄、
たたは䞉酞化硫黄の塩化メチレン䞭溶液類が奜適
に䜿甚される。
Sulfur trioxide can be used in the process according to the invention in liquid or gaseous form or in the form of a solution in an inert organic solvent. gaseous sulfur trioxide, optionally diluted with an inert gas such as nitrogen;
Alternatively, solutions of sulfur trioxide in methylene chloride are preferably used.

本発明に埓うスルホン化方法は皮々の方法で実
斜できる。䟋えばナフタレンの劂きスルホン化し
ようずする芳銙族化合物を䟋えば塩化メチレンの
劂き䞍掻性有機溶媒䞭に溶解たたは懞濁させ、そ
しお䟋えば塩化氎玠の劂きハロゲン化氎玠を該溶
液たたは懞濁液䞭に溶液たたは懞濁液が垌望する
量のハロゲン化氎玠を吞収するたで通すこずによ
り䟋えば該方法を実斜するこずができる。次に䞉
酞化硫黄を加える。スルホン化は垞圧䞋たたは加
圧䞋で実斜できる。䞉酞化硫黄の添加䞭に、圧力
および枩床芁玠䞊びにハロゲン化氎玠甚の望たし
い溶解力を有する䞍掻性有機溶媒を適圓に遞択す
るこずにより反応混合物䞭で皮々の䞀定のハロゲ
ン化氎玠濃床を制定できる。
The sulfonation process according to the invention can be carried out in various ways. The aromatic compound to be sulfonated, e.g. naphthalene, is dissolved or suspended in an inert organic solvent, e.g. methylene chloride, and a hydrogen halide, e.g. hydrogen chloride, is dissolved or suspended in the solution or suspension. The process can be carried out, for example, by passing the suspension until it has absorbed the desired amount of hydrogen halide. Then add sulfur trioxide. Sulfonation can be carried out under normal pressure or under elevated pressure. During the addition of sulfur trioxide, various constant hydrogen halide concentrations can be established in the reaction mixture by appropriate selection of pressure and temperature factors and an inert organic solvent with the desired dissolving power for the hydrogen halide.

他の態様は、スルホン化しようずする芳銙族化
合物の有機溶媒䞭溶液たたは懞濁液にハロゲン化
氎玠および䞉酞化硫黄を同時に加えるこずからな
぀おいる。
Another embodiment consists in simultaneously adding hydrogen halide and sulfur trioxide to a solution or suspension in an organic solvent of the aromatic compound to be sulfonated.

第䞉の方法は、本発明に埓う方法甚に必芁なハ
ロゲン化氎玠を反応混合物䞭で盎接、䟋えば芳銙
族化合物を䞍掻性溶媒䞭でクロロスルホン酞を甚
いお郚分的にスルホン化し、その際生成した塩化
氎玠反応が混合物䞭に残存しおいるこずに泚意を
払い、そしお次に完党なスルホン化甚に必芁な量
の䞉酞化硫黄を加えるこずによりスルホン化を完
了させるこずにより、補造するこずからな぀おい
る。この態様においおは開始時に党おのクロロス
ルホン酞を加える代わりに、最初に䞀郚分だけの
クロロスルホン酞を加え、そしおこれが反応しお
塩化氎玠を生成したずきに残りの量のクロロスル
ホン酞をスルホン化甚に必芁な量の䞉酞化硫黄ず
同時に蚈量添加するこずもできる。
A third method is to obtain the hydrogen halides required for the process according to the invention directly in the reaction mixture, for example by partially sulfonating the aromatic compounds with chlorosulfonic acid in an inert solvent, in which case the hydrogen halides produced are From the preparation, note that the hydrogen chloride reaction remains in the mixture, and then complete the sulfonation by adding the amount of sulfur trioxide required for complete sulfonation. ing. In this embodiment, instead of adding all of the chlorosulfonic acid at the beginning, only a portion of the chlorosulfonic acid is added initially, and as this reacts to form hydrogen chloride, the remaining amount of chlorosulfonic acid is used for sulfonation. It can also be metered in at the same time as the required amount of sulfur trioxide.

本発明に埓う方法により埗られるスルホン酞
類、䟋えばナフタレン――スルホン酞、―ヒ
ドロキシナフタレン――スルホン酞およびゞフ
゚ニル――スルホン酞、は染料類、怍物保護剀
類および乳化剀類の補造甚の重芁な先駆䜓類およ
び䞭間生成物類である䟋えばりルマンス・゚ン
チクロペデむヌ・デル・テクニツシ゚ン・ヘミ
ヌ、版、17巻、117―94頁および18巻、219頁参
照。
The sulfonic acids obtained by the process according to the invention, such as naphthalene-1-sulfonic acid, 2-hydroxynaphthalene-1-sulfonic acid and diphenyl-4-sulfonic acid, are useful for the production of dyes, plant protection agents and emulsifiers. They are important precursors and intermediates (see, for example, Ullmann's Encyclopédie der Technissien Chemie, 4th edition, Vol. 17, pp. 117-94 and Vol. 18, p. 219).

実斜䟋  リツトルのスルホン化装眮䞭で、64.1
0.5モルのナフタレンを250mlの無氎塩化メチ
レン䞭に溶解させた。溶液を−20℃に冷华した。
生成した懞濁液䞭に9.20.25モルの塩化氎
玠気䜓を最初に玄30分間にわた぀お撹拌しながら
通した。次に400.5モルの気䜓状䞉酞化硫
黄を撹拌されおいるナフタレン塩化メチレン懞
濁液の衚面䞊に也燥窒玠を甚いお時間にわた぀
おこれも撹拌しながら−20℃においお通した。反
応混合物を次に−20℃で時間撹拌し、その埌
500の氷䞀氎混合物䞭に泚入した。
Example 1 In a 1 liter sulfonation apparatus, 64.1 g
(0.5 mol) of naphthalene was dissolved in 250 ml of anhydrous methylene chloride. The solution was cooled to -20°C.
9.2 g (0.25 mol) of hydrogen chloride gas were first passed into the resulting suspension with stirring for about 30 minutes. 40 g (0.5 mol) of gaseous sulfur trioxide was then passed over the surface of the stirred naphthalene/methylene chloride suspension using dry nitrogen for 1 hour at -20°C, also with stirring. . The reaction mixture was then stirred at −20 °C for 2 h, then
Pour into 500g of ice-water mixture.

塩化メチレン盞を分離し、それぞれ250mlの氎
で回抜出し、そしお真空䞭で濃瞮也固した。ガ
スクロマトグラフむによる分析に埓うず、残枣
5.9は73.2重量のナフタレン䜿甚した
ナフタレンの6.7を含有しおいた。
The methylene chloride phase was separated, extracted twice with 250 ml of water each time and concentrated to dryness in vacuo. According to analysis by gas chromatography, the residue (5.9 g) contained 73.2% by weight of naphthalene (=6.7% of the naphthalene used).

䞀緒にした氎盞を真空䞭で初期蒞留に短時間か
けお、塩化メチレンの残枣を陀去し、氎盞をリ
ツトル枬定甚フラスコに移しそしおリツトルた
でにした。
The combined aqueous phases were subjected to a brief initial distillation in vacuo to remove the methylene chloride residue, and the aqueous phases were transferred to a 1 liter measuring flask and made up to 1 liter.

この溶液の高圧液䜓クロマトグラフむ
HPLCは䞋蚘の含有量のナフタレン―スルホ
ン酞類を瀺した89.0のナフタレン――スル
ホン酞、䜿甚したナフタレンを基にしお理論
倀の85反応したナフタレンを基にしお理論
倀の91.8、6.2のナフタレン――スルホン
酞、䜿甚したナフタレンを基にしお理論倀の
6.0反応したナフタレンを基にしお理論倀
の6.5、および0.4のナフタレン―ゞスルホ
ン酞類䜿甚したナフタレンを基にしお理論倀
の0.28反応したナフタレンを基にしお理論
倀の0.3。
High pressure liquid chromatography (HPLC) of this solution showed the following content of naphthalene-sulfonic acids: 89.0 g of naphthalene-1-sulfonic acid, (=85% of theory based on the naphthalene used: = 91.8% of theory based on naphthalene reacted), 6.2 g naphthalene-2-sulfonic acid, (= 91.8% of theory based on naphthalene used)
6.0%: = 6.5% of theory, based on reacted naphthalene) and 0.4 g of naphthalene-disulfonic acids (= 0.28% of theory, based on naphthalene used: = theory, based on reacted naphthalene). 0.3% of the value).

䞊蚘のスルホン化を繰り返したが、唯䞀の差異
は塩化氎玠を通さなか぀たこずである。この堎合
のナフタレンスルホン酞類の収率反応したナフ
タレンを基にした理論倀のは、76.0のナフ
タレン――スルホン酞、8.4のナフタレン―
―スルホン酞、0.4のナフタレン――
ゞスルホン酞、10.4のナフタレン――ゞ
スルホン酞、2.7のナフタレン――ゞス
ルホン酞および0.6のナフタレン――ゞ
スルホン酞であ぀た。
The sulfonation described above was repeated, the only difference being that it was not permeable to hydrogen chloride. The yield of naphthalene sulfonic acids in this case (% of theoretical value based on reacted naphthalene) is 76.0% naphthalene-1-sulfonic acid, 8.4% naphthalene-1-sulfonic acid.
2-sulfonic acid, 0.4% naphthalene-1,3-
disulfonic acid, 10.4% naphthalene-1,5-disulfonic acid, 2.7% naphthalene-1,6-disulfonic acid and 0.6% naphthalene-1,7-disulfonic acid.

実斜䟋  実斜した工皋は実斜䟋䞭に蚘されおいる劂く
であ぀たが、䜆し塩化氎玠および䞉酞化硫黄を同
時に蚈量添加した。
Example 2 The process carried out was as described in Example 1, except that hydrogen chloride and sulfur trioxide were metered in simultaneously.

ナフタレンスルホン酞類の収率反応したナフ
タレンを基にした理論倀のは、90.0のナフ
タレン――スルホン酞、7.3のナフタレン―
―スルホン酞および0.3のナフタレン―ゞス
ルホン酞類であ぀た。
The yield of naphthalene sulfonic acids (% of theory based on reacted naphthalene) was 90.0% naphthalene-1-sulfonic acid, 7.3% naphthalene-1-sulfonic acid,
2-sulfonic acid and 0.3% naphthalene-disulfonic acids.

実斜䟋  実斜した工皋は実斜䟋䞭に蚘されおいる劂く
であ぀たが、䜆し反応をそれより垌釈された溶液
䞭で実斜した64.1のナフタレンを500mlの塩
化メチレン䞭に溶解させた。
Example 3 The steps carried out were as described in Example 1, except that the reaction was carried out in a more dilute solution (64.1 g of naphthalene was dissolved in 500 ml of methylene chloride). ).

この工皋では、ナフタレンスルホン酞類の収率
反応したナフタレンを基にした理論倀のは、
89.9のナフタレン――スルホン酞、9.8の
ナフタレン――スルホン酞および0.5のナフ
タレン―ゞスルホン酞類であ぀た。
In this process, the yield of naphthalene sulfonic acids (% of theory based on reacted naphthalene) is:
It was 89.9% naphthalene-1-sulfonic acid, 9.8% naphthalene-2-sulfonic acid and 0.5% naphthalene-disulfonic acids.

実斜䟋  25.60.2モルのナフタレンの250mlの也燥
塩化メチレン䞭溶液を実斜䟋䞭に蚘されおいる
スルホン化装眮䞭で−20℃に冷华した。也燥塩化
氎玠を溶液䞭にリツトル時の速床で通し、そ
しお同時に−10℃に冷华されおいる160.2モ
ルの䞉酞化硫黄の150mlの塩化メチレン䞭溶液
を−20℃においお時間にわた぀お冷华および撹
拌しながら加えた。
Example 4 A solution of 25.6 g (0.2 mol) of naphthalene in 250 ml of dry methylene chloride was cooled to -20 DEG C. in the sulfonation apparatus described in Example 1. Dry hydrogen chloride is passed through the solution at a rate of 8 liters/hour, and a solution of 16 g (0.2 mol) of sulfur trioxide in 150 ml of methylene chloride, which has been simultaneously cooled to -10°C, is heated at -20°C for 2 hours. Add with cooling and stirring.

反応混合物をその埌−20℃で時間撹拌し、そ
しお次に実斜䟋䞭に蚘されおいる劂く凊理し
た。
The reaction mixture was then stirred at -20°C for 2 hours and then processed as described in Example 1.

HPLCに埓うず、ナフタレンスルホン酞類の収
率反応したナフタレンを基にした理論倀の
は、89.0のナフタレン――スルホン酞、10.0
のナフタレン――スルホン酞、0.6のナフ
タレン――ゞスルホン酞および0.2のナ
フタレン――ゞスルホン酞であ぀た。
Yield of naphthalene sulfonic acids (% of theory based on reacted naphthalene) according to HPLC
is 89.0% naphthalene-1-sulfonic acid, 10.0
% naphthalene-2-sulfonic acid, 0.6% naphthalene-1,5-disulfonic acid and 0.2% naphthalene-1,6-disulfonic acid.

実斜䟋  実斜䟋䞭に蚘されおいるスルホン化装眮䞭
で、25.60.2モルのナフタレンの250の也
燥塩化メチレン䞭溶液を−20℃に冷华した。−20
℃においお撹拌しながら、180.15モルのク
ロロスルホン酞の50の也燥塩化メチレン䞭溶液
を最初に10分間にわた぀お加え、そしお−10℃に
冷华されおいる0.05モルの䞉酞化硫黄の
50の也燥塩化メチレン䞭溶液を次に20分間にわ
た぀お加えた。反応混合物を−20℃においお時
間撹拌し、そしお次に実斜䟋䞭に蚘されおいる
劂く凊理した。
Example 5 In the sulfonation apparatus described in Example 1, a solution of 25.6 g (0.2 mol) naphthalene in 250 g dry methylene chloride was cooled to -20°C. −20
While stirring at °C, a solution of 18 g (0.15 mol) of chlorosulfonic acid in 50 g of dry methylene chloride is first added over 10 minutes, and 4 g (0.05 mol) of trioxide, which has been cooled to -10 °C. of sulfur
A solution of 50 g of dry methylene chloride was then added over 20 minutes. The reaction mixture was stirred at -20°C for 2 hours and then worked up as described in Example 4.

HPLCに埓うず、ナフタレンスルホン酞類の収
率反応したナフタレンを基にした理論倀の
は、91.0のナフタレン――スルホン酞、8.6
のナフタレン――スルホン酞、0.1のナフ
タレン――ゞスルホン酞および0.1のナ
フタレン――ゞスルホン酞であ぀た。
Yield of naphthalene sulfonic acids (% of theory based on reacted naphthalene) according to HPLC
is 91.0% naphthalene-1-sulfonic acid, 8.6
% naphthalene-2-sulfonic acid, 0.1% naphthalene-1,5-disulfonic acid and 0.1% naphthalene-1,6-disulfonic acid.

クロロスルホン酞溶液および䞉酞化硫黄溶液を
同時に加えたずきには、ナフタレンスルホン酞類
の収率反応したナフタレンを基にした理論倀の
は、89.7のナフタレン――スルホン酞、
9.2のナフタレン――スルホン酞、0.7のナ
フタレン――ゞスルホン酞および0.3の
ナフタレン――ゞスルホン酞であ぀た。
When the chlorosulfonic acid solution and the sulfur trioxide solution were added simultaneously, the yield of naphthalenesulfonic acids (% of theory based on reacted naphthalene) was 89.7% naphthalene-1-sulfonic acid,
They were 9.2% naphthalene-2-sulfonic acid, 0.7% naphthalene-1,5-disulfonic acid and 0.3% naphthalene-1,6-disulfonic acid.

実斜䟋  実斜した工皋は実斜䟋䞭に蚘されおいる劂く
であ぀たが、䜆し120.1モルのクロロスル
ホン酞およびdl0.1モルの䞉酞化硫黄の各
堎合ずも50の塩化メチレン䞭溶液を実斜䟋䞭
で䜿甚されおいるクロロスルホン酞および䞉酞化
硫黄の代りにそれぞれ30分間および90分間にわた
぀お滎々添加した。
Example 6 The process carried out was as described in Example 5, except that in each case 50 g of methylene chloride were added to 12 g (0.1 mol) of chlorosulfonic acid and 8 dl (0.1 mol) of sulfur trioxide. The medium solution was added dropwise over 30 and 90 minutes, respectively, in place of the chlorosulfonic acid and sulfur trioxide used in Example 5.

HPLCに埓うず、ナフタレンスルホン酞類の収
率反応したナフタレンを基にした理論倀の
は、89.0のナフタレン――スルホン酞、10.0
のナフタレン――スルホン酞、0.6のナフ
タレン――ゞスルホン酞および0.2のナ
フタレン――ゞスルホン酞であ぀た。
Yield of naphthalene sulfonic acids (% of theory based on reacted naphthalene) according to HPLC
is 89.0% naphthalene-1-sulfonic acid, 10.0
% naphthalene-2-sulfonic acid, 0.6% naphthalene-1,5-disulfonic acid and 0.2% naphthalene-1,6-disulfonic acid.

実斜䟋  リツトルのスルホン化装眮䞭で1541.00
モルのゞプニルを1000mlの無氎塩化メチレ
ン䞭に溶解させた。7.30.20モルの塩化氎
玠気䜓を溶液䞭に−10℃においお撹拌しながら通
した。次に770.96モルの気䜓状䞉酞化硫黄
をゞプニルおよび塩化氎玠の塩化メチレン䞭溶
液の衚面䞊に時間にわた぀おこれも−10℃で撹
拌しながら通した。反応混合物をその埌−10℃に
おいお時間撹拌した。スルホン化混合物を実斜
䟋䞭に蚘されおいる劂くしお凊理した。
Example 7 154 g (1.00 g) in a 2 liter sulfonator
mol) of diphenyl was dissolved in 1000 ml of anhydrous methylene chloride. 7.3 g (0.20 mol) of hydrogen chloride gas was passed into the solution at -10 DEG C. with stirring. 77 g (0.96 mol) of gaseous sulfur trioxide was then passed over the surface of the solution of diphenyl and hydrogen chloride in methylene chloride for 2 hours, also at -10 DEG C., with stirring. The reaction mixture was then stirred at -10°C for 1 hour. The sulfonation mixture was treated as described in Example 1.

HPLCに埓うず、ゞプニルスルホン酞類の収
率反応したゞプニルを基にした理論倀の
は、99.4のゞプニル――スルホン酞および
0.5のゞプニル―4′―ゞスルホン酞であ
぀た。
Yield of diphenyl sulfonic acids (% of theory based on reacted diphenyl) according to HPLC
is 99.4% diphenyl-4-sulfonic acid and
It was 0.5% diphenyl-4,4'-disulfonic acid.

実斜䟋  30.80.2モルのゞプニルの也燥塩化メ
チレン䞭溶液を、実斜䟋䞭に蚘されおいる劂く
しお、−10℃に冷华されおいる160.2モルの
䞉酞化硫黄の也燥塩化メチレン䞭溶液ず、玄リ
ツトル時の也燥塩化氎玠を通しながら、反応さ
せた。
Example 8 A solution of 30.8 g (0.2 mol) of diphenyl in dry methylene chloride is added to a solution of 16 g (0.2 mol) of sulfur trioxide cooled to -10°C as described in Example 4. The reaction was carried out with a solution in dry methylene chloride while passing about 8 liters/hour of dry hydrogen chloride.

HPLCに埓うず、ゞプニルスルホン酞類の収
率反応したゞプニルを基にした理論倀の
は、98.3のゞプニル――スルホン酞および
0.7のゞプニル―4′―ゞスルホン酞であ
぀た。
Yield of diphenyl sulfonic acids (% of theory based on reacted diphenyl) according to HPLC
is 98.3% diphenyl-4-sulfonic acid and
It was 0.7% diphenyl-4,4'-disulfonic acid.

実斜䟋  実斜䟋䞭に蚘されおいるスルホン化装眮䞭
で、28.80.2モルの―ヒドロキシナフタ
レンを也燥塩化メチレン䞭に40℃においお溶解さ
せた。溶液を−20℃に冷华した。也燥塩化氎玠を
生成した懞濁液䞭にリツトル時の速床におい
お均䞀に通し、そしお同時に−10℃に冷华されお
いる160.2モルの䞉酞化硫黄の50の也燥
塩化メチレン䞭溶液を−20℃においお玄時間に
わた぀お冷华および撹拌しながら加えた。反応混
合物を次に−20℃で時間撹拌し、その埌枩床を
20℃以䞋に保ちながら玄100の氷―氎混合物䞭
に泚いだ。この方法で埗られた二盞反応混合物䞭
では、50匷床氎酞化ナトリりム溶液の添加によ
りのPH倀が制定されおいた。塩化メチレン盞を
分離した埌に、真空䞭での初期蒞留により溶媒残
枣を陀去し、それを蚈量フラスコに移し、そしお
氎でリツトルたでにした。
Example 9 In the sulfonation apparatus described in Example 1, 28.8 g (0.2 mol) of 2-hydroxynaphthalene were dissolved in dry methylene chloride at 40°C. The solution was cooled to -20°C. A solution of 16 g (0.2 mol) of sulfur trioxide in 50 g of dry methylene chloride is passed uniformly at a rate of 8 liters/hour into the suspension that produced dry hydrogen chloride and is simultaneously cooled to -10°C. Added with cooling and stirring at -20°C over approximately 1 hour. The reaction mixture was then stirred at -20°C for 2 hours, after which the temperature was allowed to rise.
Pour into approximately 100 g of ice-water mixture while keeping the temperature below 20°C. In the two-phase reaction mixture obtained in this way, a PH value of 7 was established by addition of 50% strength sodium hydroxide solution. After separating the methylene chloride phase, solvent residues were removed by initial distillation in vacuo, which was transferred to a weighing flask and made up to 1 liter with water.

HPLCに埓うず、―ヒドロキシナフタレンス
ルホン酞類の収率反応した―ヒドロキシナフ
タレンを基にした理論倀のは、92.8の―
ヒドロキシナフタレン――スルホン酞、0.5
の―ヒドロキシナフタレン――スルホン酞、
0.5の―ヒドロキシナフタレン――スルホ
ン酞、3.0の―ヒドロキシナフタレン――
スルホン酞および0.6の―ヒドロキシナフタ
レン――ゞスルホン酞であ぀た。
According to HPLC, the yield of 2-hydroxynaphthalenesulfonic acids (% of theory based on reacted 2-hydroxynaphthalene) was 92.8% 2-hydroxynaphthalenesulfonic acids.
Hydroxynaphthalene-1-sulfonic acid, 0.5%
2-hydroxynaphthalene-5-sulfonic acid,
0.5% 2-hydroxynaphthalene-6-sulfonic acid, 3.0% 2-hydroxynaphthalene-8-
sulfonic acid and 0.6% 2-hydroxynaphthalene-1,6-disulfonic acid.

他の―ヒドロキシナフタレン―スルホン酞類
は反応混合物䞭で怜出されなか぀た。
No other 2-hydroxynaphthalene-sulfonic acids were detected in the reaction mixture.

䞊蚘の―ヒドロキシナフタレンのスルホン化
を塩化氎玠の䞍存圚䞋で実斜した堎合には、―
ヒドロキシナフタレンスルホン酞類の䞋蚘の収率
反応した―ヒドロキシナフタレンを基にした
理論倀のが埗られた83.5の―ヒドロキ
シナフタレン――スルホン酞、2.1の―ヒ
ドロキシナフタレン――スルホン酞、0.4の
―ヒドロキシナフタレン――スルホン酞、
6.9の―ヒドロキシナフタレン――スルホ
ン酞、1.0の―ヒドロキシナフタレン―
―ゞスルホン酞および0.4の―ヒドロキシ
ナフタレン――ゞスルホン酞。
When the above sulfonation of 2-hydroxynaphthalene is carried out in the absence of hydrogen chloride, 2-
The following yields of hydroxynaphthalene sulfonic acids (% of theory based on reacted 2-hydroxynaphthalene) were obtained: 83.5% 2-hydroxynaphthalene-1-sulfonic acid, 2.1% 2-hydroxynaphthalene. -5-sulfonic acid, 0.4% 2-hydroxynaphthalene-6-sulfonic acid,
6.9% 2-hydroxynaphthalene-8-sulfonic acid, 1.0% 2-hydroxynaphthalene-1,
6-disulfonic acid and 0.4% 2-hydroxynaphthalene-6,8-disulfonic acid.

実斜䟋 10 底郚出口を備えおおりこの出口の頂郚にはガラ
スフリツトが加えられおあるようなリツトルの
スルホン化甚ビヌカヌ䞭で、64.10.5モル
のナフタレンの250mlの無氎塩化メチレン䞭溶液
を−20℃に冷华した。生成した懞濁液䞭に也燥塩
化氎玠を−20℃においお、飜和が埗られるたで
すなわち玄15のHClが吞収されるたで通し
た。次に400.5モルの䞉酞化硫黄を塩化氎
玠含有塩化メチレン䞭のナフタレン懞濁液の衚面
䞊に玄1.5時間にわた぀お撹拌しながら−20℃に
おいお通した。反応混合物を次に−20℃で玄1.5
時間にわた぀お撹拌しながら加えた。反応混合物
を次に−20℃で時間撹拌した埌に、塩化氎玠含
有母液から、母液をフリツトおよび底郚出口を通
しお第二の同様な装眮を備えおいるリツトルの
スルホン化甚ビヌカヌ䞭に也燥窒玠により匷制加
入させるこずにより沈柱を単離し、そしおフリツ
ト䞊の沈殿を50mlの也燥塩化メチレンで掗浄し
た。
Example 10 In a 1 liter sulfonation beaker equipped with a bottom outlet and a glass frit added to the top of this outlet, 64.1 g (0.5 mol)
of naphthalene in 250 ml of anhydrous methylene chloride was cooled to -20°C. Dry hydrogen chloride was passed through the resulting suspension at −20° C. until saturation was obtained (ie, until approximately 15 g of HCl had been absorbed). 40 g (0.5 mol) of sulfur trioxide was then passed over the surface of the naphthalene suspension in methylene chloride containing hydrogen chloride for about 1.5 hours at -20 DEG C. with stirring. The reaction mixture was then heated to -20°C for approximately 1.5
Added with stirring over a period of time. The reaction mixture was then stirred for 2 hours at −20° C. and then transferred from the hydrogen chloride-containing mother liquor with dry nitrogen through a frit and a bottom outlet into a 1 liter sulfonation beaker equipped with a second similar apparatus. The precipitate was isolated by force addition and the precipitate on the frit was washed with 50 ml of dry methylene chloride.

吞匕濟別された塩化メチレン―湿最生成物の組
成をHPLCにより枬定した。それは91.6重量の
ナフタレン――スルホン酞、2.3重量のナフ
タレン――スルホン酞および0.6重量のナフ
タレン―ゞスルホン酞類であ぀た。
The composition of the methylene chloride-wet product filtered off with suction was determined by HPLC. It was 91.6% by weight naphthalene-1-sulfonic acid, 2.3% by weight naphthalene-2-sulfonic acid and 0.6% by weight naphthalene-disulfonic acids.

第二のスルホン化ビヌカヌ䞭で䞀緒にされた濟
液の溶液および掗浄溶液を−20℃に冷华し、そし
お64.10.5モルの埮现粉末状のナフタレン
を加えた。也燥塩化氎玠を、飜和が埗られるたで
ここでは玄のHClが必芁であ぀た再び懞
濁液䞭に通した。次に撹拌されおいる塩化氎玠含
有塩化メチレン䞭のナフタレン懞濁液の衚面䞊に
䞉酞化硫黄を通すこずによりスルホン化を前のバ
ツチ䞭の劂くしお実斜した。反応が終了したずき
に、母液を再び第䞀のスルホン化ビヌカヌ䞭に也
燥窒玠を甚いお匷制加入させ、そしおフリツト䞊
の生成物を新しい也燥塩化メチレンで掗浄した。
The combined filtrate solution and wash solution in a second sulfonation beaker were cooled to -20°C and 64.1 g (0.5 mole) of finely powdered naphthalene was added. Dry hydrogen chloride was again passed through the suspension until saturation was obtained (approximately 4 g of HCl was required here). Sulfonation was then carried out as in the previous batch by passing sulfur trioxide over the surface of the stirred suspension of naphthalene in methylene chloride containing hydrogen chloride. When the reaction was complete, the mother liquor was again forced into the first sulfonation beaker with dry nitrogen and the product on the frit was washed with fresh dry methylene chloride.

塩化メチレン―湿最生成物の組成をHPLCによ
り枬定した。それは86.4重量のナフタレン―
―スルホン酞、4.1重量のナフタレン――ス
ルホン酞および0.3重量のナフタレン―ゞスル
ホン酞類であ぀た。
The composition of the methylene chloride-wet product was determined by HPLC. It is 86.4% by weight naphthalene-1
-sulfonic acid, 4.1% by weight naphthalene-2-sulfonic acid and 0.3% by weight naphthalene-disulfonic acids.

この半―連続的工皋においおは、母液䞭で各ス
ルホン酞類に察しお飜和濃床が制定された埌の、
すなわち第バツチ埌の、スルホン酞類の収率
反応したナフタレンを基にした理論倀のは
バツチ圓たり、91.7のナフタレン――スル
ホン酞、6.2のナフタレン――スルホン酞お
よび0.3のナフタレン―ゞスルホン酞類であ぀
た。
In this semi-continuous process, after a saturation concentration has been established for each sulfonic acid in the mother liquor,
That is, the yield of sulfonic acids (% of theoretical value based on reacted naphthalene) after the fifth batch was 91.7% naphthalene-1-sulfonic acid, 6.2% naphthalene-2-sulfonic acid and It was 0.3% naphthalene-disulfonic acids.

Claims (1)

【特蚱請求の範囲】  スルホン化をハロゲン化氎玠の存圚䞋で実斜
するこずを特城ずする、芳銙族化合物類を有機溶
媒類䞭で䞉酞化硫黄を甚いおスルホン化するこず
により芳銙族スルホン酞類を補造する方法。  ハロゲン化氎玠をモルの䞉酞化硫黄圓たり
0.01〜0.9モルの量で䜿甚するこずを特城ずする
特蚱請求の範囲第項蚘茉の方法。  塩化氎玠をハロゲン化氎玠ずしお䜿甚するこ
ずを特城ずする特蚱請求の範囲第たたは項に
蚘茉の方法。  スルホン化を−40℃〜20℃の枩床においお
実斜するこずを特城ずする特蚱請求の範囲第〜
項の䜕れかに蚘茉の方法。  塩化メチレンを有機溶媒ずしお䜿甚するこず
を特城ずする特蚱請求の範囲第〜項の䜕れか
に蚘茉の方法。
[Scope of Claims] 1. Aromatic sulfonic acids by sulfonating aromatic compounds with sulfur trioxide in an organic solvent, characterized in that the sulfonation is carried out in the presence of hydrogen halide. How to manufacture. 2 Hydrogen halide per mole of sulfur trioxide
A method according to claim 1, characterized in that it is used in an amount of 0.01 to 0.9 mol. 3. The method according to claim 1 or 2, characterized in that hydrogen chloride is used as the hydrogen halide. 4. Claims 1 to 4, characterized in that the sulfonation is carried out at a temperature of -40°C to +20°C.
The method described in any of Section 3. 5. The method according to any one of claims 1 to 4, characterized in that methylene chloride is used as the organic solvent.
JP59172541A 1983-08-23 1984-08-21 Sulfonation of aromatic compounds with sulfur trioxide Granted JPS6061560A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833330334 DE3330334A1 (en) 1983-08-23 1983-08-23 METHOD FOR SULFONING AROMATIC COMPOUNDS WITH SULFUR TRIOXIDE
DE3330334.7 1983-08-23

Publications (2)

Publication Number Publication Date
JPS6061560A JPS6061560A (en) 1985-04-09
JPH0146503B2 true JPH0146503B2 (en) 1989-10-09

Family

ID=6207193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59172541A Granted JPS6061560A (en) 1983-08-23 1984-08-21 Sulfonation of aromatic compounds with sulfur trioxide

Country Status (4)

Country Link
US (1) US4859372A (en)
EP (1) EP0141928B1 (en)
JP (1) JPS6061560A (en)
DE (2) DE3330334A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4007603A1 (en) * 1990-03-09 1991-09-12 Henkel Kgaa METHOD FOR PRODUCING NAPHTHALINE SULPHONIC ACIDS
US20080139840A1 (en) * 2006-11-03 2008-06-12 Matthew Thomas Anderson Process for preparing alkyl aryl sulphonic acids and alkyl aryl sulphonates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3155716A (en) * 1961-09-29 1964-11-03 American Cyanamid Co Preparation of pure alpha-naphthalene sulfonic acid and alpha-naphthol
CH439265A (en) * 1964-07-16 1967-07-15 Sandoz Ag Process for the preparation of α-naphthalenesulfonic acid
GB1434020A (en) * 1972-10-30 1976-04-28 Koebner A Sulphonation of aromatic compounds in the presence of solvents
DE2728070A1 (en) * 1977-06-22 1979-01-11 Bayer Ag CONTINUOUS PRODUCTION OF NAPHTHALIN-1-SULPHONIC ACID AND 1,5-DISULPHONIC ACID

Also Published As

Publication number Publication date
EP0141928B1 (en) 1987-01-14
JPS6061560A (en) 1985-04-09
DE3330334A1 (en) 1985-03-14
EP0141928A1 (en) 1985-05-22
US4859372A (en) 1989-08-22
DE3462034D1 (en) 1987-02-19

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