JPH0143944B2 - - Google Patents

Info

Publication number
JPH0143944B2
JPH0143944B2 JP56081817A JP8181781A JPH0143944B2 JP H0143944 B2 JPH0143944 B2 JP H0143944B2 JP 56081817 A JP56081817 A JP 56081817A JP 8181781 A JP8181781 A JP 8181781A JP H0143944 B2 JPH0143944 B2 JP H0143944B2
Authority
JP
Japan
Prior art keywords
liquid
layer
lamination
substrate
photosensitive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56081817A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5721892A (en
Inventor
Baanaado Kooen Aburahamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22548069&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH0143944(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5721892A publication Critical patent/JPS5721892A/ja
Publication of JPH0143944B2 publication Critical patent/JPH0143944B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/0038Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving application of liquid to the layers prior to lamination, e.g. wet laminating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/18Handling of layers or the laminate
    • B32B38/1866Handling of layers or the laminate conforming the layers or laminate to a convex or concave profile
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
JP8181781A 1980-05-27 1981-05-27 Laminating method Granted JPS5721892A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15363880A 1980-05-27 1980-05-27

Publications (2)

Publication Number Publication Date
JPS5721892A JPS5721892A (en) 1982-02-04
JPH0143944B2 true JPH0143944B2 (US06824948-20041130-C00029.png) 1989-09-25

Family

ID=22548069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8181781A Granted JPS5721892A (en) 1980-05-27 1981-05-27 Laminating method

Country Status (9)

Country Link
EP (1) EP0041639B1 (US06824948-20041130-C00029.png)
JP (1) JPS5721892A (US06824948-20041130-C00029.png)
AT (1) ATE18471T1 (US06824948-20041130-C00029.png)
BR (1) BR8103187A (US06824948-20041130-C00029.png)
CA (1) CA1168141A (US06824948-20041130-C00029.png)
DE (1) DE3173963D1 (US06824948-20041130-C00029.png)
HK (1) HK22991A (US06824948-20041130-C00029.png)
IE (1) IE51809B1 (US06824948-20041130-C00029.png)
ZA (1) ZA813575B (US06824948-20041130-C00029.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4698294A (en) * 1986-09-12 1987-10-06 E. I. Du Pont De Nemours And Company Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer
US4961803A (en) * 1988-04-04 1990-10-09 Somar Corporation Thin film laminating method and apparatus
US5102491A (en) * 1988-12-09 1992-04-07 Morton International, Inc. Wet lamination process and apparatus
JPH0651360B2 (ja) * 1989-06-04 1994-07-06 ソマール株式会社 薄膜の張付方法及びその装置
CN101430507A (zh) * 2007-08-27 2009-05-13 E.I.内穆尔杜邦公司 基片上的可光聚合干膜的湿层叠以及与湿层叠有关的组合物
JP5499013B2 (ja) * 2011-11-25 2014-05-21 株式会社フジクラ ラミネート装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681815A (en) * 1979-11-08 1981-07-04 Gretag Ag Device for increasing image strength
JPS5681816A (en) * 1979-11-05 1981-07-04 Xerox Corp Method for minimizing damage of refractive index of optical material

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB898871A (en) * 1959-07-20 1962-06-14 Koch Processes Ltd Improvements in or relating to printing
US3629036A (en) * 1969-02-14 1971-12-21 Shipley Co The method coating of photoresist on circuit boards
JPS4935448B1 (US06824948-20041130-C00029.png) * 1969-05-08 1974-09-21

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5681816A (en) * 1979-11-05 1981-07-04 Xerox Corp Method for minimizing damage of refractive index of optical material
JPS5681815A (en) * 1979-11-08 1981-07-04 Gretag Ag Device for increasing image strength

Also Published As

Publication number Publication date
IE51809B1 (en) 1987-04-01
CA1168141A (en) 1984-05-29
EP0041639A3 (en) 1982-02-17
HK22991A (en) 1991-04-04
BR8103187A (pt) 1982-02-09
EP0041639A2 (en) 1981-12-16
ZA813575B (en) 1983-01-26
ATE18471T1 (de) 1986-03-15
EP0041639B1 (en) 1986-03-05
DE3173963D1 (en) 1986-04-10
IE811158L (en) 1981-11-27
JPS5721892A (en) 1982-02-04

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