JPH0135465B2 - - Google Patents

Info

Publication number
JPH0135465B2
JPH0135465B2 JP58044616A JP4461683A JPH0135465B2 JP H0135465 B2 JPH0135465 B2 JP H0135465B2 JP 58044616 A JP58044616 A JP 58044616A JP 4461683 A JP4461683 A JP 4461683A JP H0135465 B2 JPH0135465 B2 JP H0135465B2
Authority
JP
Japan
Prior art keywords
ion
ions
ion source
plasma chamber
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58044616A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58216351A (ja
Inventor
Jon Kuomo Jeroomu
Richaado Kaufuman Harorudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS58216351A publication Critical patent/JPS58216351A/ja
Publication of JPH0135465B2 publication Critical patent/JPH0135465B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/143—Hall-effect ion sources with closed electron drift
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP58044616A 1982-06-01 1983-03-18 イオン発生装置 Granted JPS58216351A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38391982A 1982-06-01 1982-06-01
US383919 1982-06-01

Publications (2)

Publication Number Publication Date
JPS58216351A JPS58216351A (ja) 1983-12-16
JPH0135465B2 true JPH0135465B2 (en, 2012) 1989-07-25

Family

ID=23515298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58044616A Granted JPS58216351A (ja) 1982-06-01 1983-03-18 イオン発生装置

Country Status (3)

Country Link
EP (1) EP0095879B1 (en, 2012)
JP (1) JPS58216351A (en, 2012)
DE (1) DE3373162D1 (en, 2012)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4862032A (en) * 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3388291A (en) * 1964-08-31 1968-06-11 Electro Optical Systems Inc Annular magnetic hall current accelerator
US3969646A (en) * 1975-02-10 1976-07-13 Ion Tech, Inc. Electron-bombardment ion source including segmented anode of electrically conductive, magnetic material
JPS583577B2 (ja) * 1975-07-09 1983-01-21 株式会社東芝 イオンハツセイソウチ
US4361472A (en) * 1980-09-15 1982-11-30 Vac-Tec Systems, Inc. Sputtering method and apparatus utilizing improved ion source

Also Published As

Publication number Publication date
EP0095879B1 (en) 1987-08-19
DE3373162D1 (en) 1987-09-24
JPS58216351A (ja) 1983-12-16
EP0095879A2 (en) 1983-12-07
EP0095879A3 (en) 1984-11-07

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