JPH0132868B2 - - Google Patents
Info
- Publication number
- JPH0132868B2 JPH0132868B2 JP57162280A JP16228082A JPH0132868B2 JP H0132868 B2 JPH0132868 B2 JP H0132868B2 JP 57162280 A JP57162280 A JP 57162280A JP 16228082 A JP16228082 A JP 16228082A JP H0132868 B2 JPH0132868 B2 JP H0132868B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- acrylate
- type epoxy
- component
- adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 13
- 229920003986 novolac Polymers 0.000 claims description 8
- 239000003822 epoxy resin Substances 0.000 claims description 7
- 229920000647 polyepoxide Polymers 0.000 claims description 7
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 3
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 3
- 229920001225 polyester resin Polymers 0.000 claims description 3
- 239000004645 polyester resin Substances 0.000 claims description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 3
- 239000005062 Polybutadiene Substances 0.000 claims description 2
- 229920002857 polybutadiene Polymers 0.000 claims description 2
- 239000000976 ink Substances 0.000 description 22
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 12
- -1 Pentyl glycol methacrylate Chemical compound 0.000 description 9
- 238000005476 soldering Methods 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 229930185605 Bisphenol Natural products 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229940042596 viscoat Drugs 0.000 description 3
- MRIKSZXJKCQQFT-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)COC(=O)C=C MRIKSZXJKCQQFT-UHFFFAOYSA-N 0.000 description 2
- RBGUKBSLNOTVCD-UHFFFAOYSA-N 1-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C RBGUKBSLNOTVCD-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004606 Fillers/Extenders Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- NALFRYPTRXKZPN-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane Chemical compound CC1CC(C)(C)CC(OOC(C)(C)C)(OOC(C)(C)C)C1 NALFRYPTRXKZPN-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- LSUMRGHRDAUBMF-UHFFFAOYSA-N 1,2-dimethylxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3OC2=C1 LSUMRGHRDAUBMF-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N 1,5-Pentadiol Natural products OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- XMWGTKZEDLCVIG-UHFFFAOYSA-N 1-(chloromethyl)naphthalene Chemical compound C1=CC=C2C(CCl)=CC=CC2=C1 XMWGTKZEDLCVIG-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- FTALTLPZDVFJSS-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl prop-2-enoate Chemical compound CCOCCOCCOC(=O)C=C FTALTLPZDVFJSS-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 description 1
- HRGCERQFEGGWFF-UHFFFAOYSA-N 2-(dioctylamino)benzoic acid Chemical compound CCCCCCCCN(CCCCCCCC)C1=CC=CC=C1C(O)=O HRGCERQFEGGWFF-UHFFFAOYSA-N 0.000 description 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- ARXVXVOLXMVYIT-UHFFFAOYSA-N 3-methylbutyl 2-(dimethylamino)benzoate Chemical compound CC(C)CCOC(=O)C1=CC=CC=C1N(C)C ARXVXVOLXMVYIT-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- RTANHMOFHGSZQO-UHFFFAOYSA-N 4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)C#N RTANHMOFHGSZQO-UHFFFAOYSA-N 0.000 description 1
- IYHIFXGFKVJNBB-UHFFFAOYSA-N 5-chloro-2-[(2-hydroxynaphthalen-1-yl)diazenyl]-4-methylbenzenesulfonic acid Chemical compound C1=C(Cl)C(C)=CC(N=NC=2C3=CC=CC=C3C=CC=2O)=C1S(O)(=O)=O IYHIFXGFKVJNBB-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- BVRHRDSTZCANPZ-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(COCCOCCO)O Chemical compound C(C(=C)C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(COCCOCCO)O BVRHRDSTZCANPZ-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- KJVBXWVJBJIKCU-UHFFFAOYSA-N [hydroxy(2-hydroxyethoxy)phosphoryl] prop-2-enoate Chemical compound OCCOP(O)(=O)OC(=O)C=C KJVBXWVJBJIKCU-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Natural products CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- PZTQVMXMKVTIRC-UHFFFAOYSA-L chembl2028348 Chemical compound [Ca+2].[O-]S(=O)(=O)C1=CC(C)=CC=C1N=NC1=C(O)C(C([O-])=O)=CC2=CC=CC=C12 PZTQVMXMKVTIRC-UHFFFAOYSA-L 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- BSVQJWUUZCXSOL-UHFFFAOYSA-N cyclohexylsulfonyl ethaneperoxoate Chemical compound CC(=O)OOS(=O)(=O)C1CCCCC1 BSVQJWUUZCXSOL-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- JPJNCYZKRJFVAK-UHFFFAOYSA-N dodecyl 2-(dimethylamino)benzoate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1N(C)C JPJNCYZKRJFVAK-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 235000010187 litholrubine BK Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- CYTJMBLSQUBVMS-UHFFFAOYSA-N n-[[2-cyanopropan-2-yl(formyl)amino]hydrazinylidene]formamide Chemical compound N#CC(C)(C)N(C=O)NN=NC=O CYTJMBLSQUBVMS-UHFFFAOYSA-N 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
Description
本発明は光硬化型インキ組成物に係り、殊にプ
リント配線板の製造に際してソルダーレジストや
メツキ用マスク等の永久保護マスクを形成するた
めに使用されるスクリーン印刷用の光硬化型イン
キ組成物に係る。
プリント配線板の製造に際して、従来では、ソ
ルダーレジストやメツキ用の永久保護マスクは、
エポキシ樹脂、尿素樹脂、アルキツド樹脂、メラ
ミン樹脂又はこれらの変性樹脂を主成分とするイ
ンキ組成物をスクリーン印刷法により塗布し、加
熱硬化させることにより形成されて来た。
これらのインキ組成物は有機溶剤を5乃至50%
程度含有しており、更に変性樹脂の場合には縮
合、重合に際してホルムアルデヒドを副生するた
めに、臭気、作業者の健康に及ぼす影響を無視し
得ず、更には大気汚染をもたらす虞れがある。し
かも硬化処理に際しては120乃至160℃の高温と10
乃至40分間の加熱時間とを必要とするために生産
性が低く、加えてプリント配線板の収縮、反り発
生及び特性劣化が生じる可能性がある。
これら欠陥を克服するために、ビスフエノール
A型エポキシアクリレートやノボラツク型エポキ
シアクリレートのプレポリマーを主成分とする光
硬化型インキ組成物がソルダーレジストインキと
して開発され、プリント配線板の製造に際して実
用化されるに至つた。
しかしながら、これらのソルダーレジストイン
キは耐熱性、密着性及び耐薬品性に問題がある。
即ち電子部品挿入後の半田付工程でレジストの膨
れや剥離が発生し易く、又メツキの永久保護マス
クとして使用した場合にはメツキ後に剥れを生じ
易いのが実情である。
従つて、本発明の目的は、無溶剤タイプのもの
であつて、耐熱性、密着性、耐薬品性及び電気的
特性において優れており、ソルダーレジストやメ
ツキ用の永久保護マスクを形成するのに適してい
る光硬化型インキ組成物を提供することにある。
本発明によれば、この目的は、
(a) ビスマレイミド/トリアジン樹脂をアクリレ
ート化或いはメタアクリレート化した樹脂の少
なくとも1種から成るA成分と、
(b) ビスフエノールA型エポキシ樹脂、ノボラツ
ク型エポキシ樹脂、ウレタン樹脂、ポリエステ
ル樹脂又はポリブタジエン樹脂をアクリレート
化或いはメタアクリレート化した樹脂の少なく
とも1種から成るB成分と、
(c) 少なくとも1種の光重合性単量体から成るC
成分
とを主成分とし且つこれら諸成分の重量比が
A:B=5:95乃至95:5
(A+B):C=10:90乃至70:30
であることを特徴とする、光硬化型インキ組成物
により達成される。
A、B及びC成分の特定の配合比率は、これら
成分として選択された物質の性質を考慮して決定
されるが、主としてA成分は耐熱性、耐薬品性及
び電気特性の向上に寄与し、B成分は光硬化性及
び密着性に寄与し、又C成分は光硬化性、密着性
及び印刷適性化のための粘度調整に寄与する。
A成分の内のアクリレート化或いはメタアクリ
レート化したビスマレイミド/トリアジン樹脂
(「BTレジン」と称されている)としては、「BT
−3401」、「BT−3109」なる商品名で市販されて
いるもの等を使用することができる。
B成分の内のアクリレート化或いはメタアクリ
レート化したビスフエノールA型エポキシ樹脂と
しては、「SP−1506」、「SP−1507」、「SP−
1509」、「V−5502」、「VR−60X」、「VR−77X」、
「VR−90X」、「UE−8200」、「X−63−101」なる
商品名で市販されているもの等を使用することが
でき、アクリレート化或いはメタアクリレート化
したボラツク型エポキシ樹脂としては、「SP−
4010」、「SP−4050」、「UE・EXP250」、「スミフ
ラツシユA」、「スミフラツシユB」なる商品名で
市販されているもの等を使用することができ、ア
クリレート化或いはメタアクリレート化したウレ
タン樹脂としては、「W−896」、「#783」、
「#893」、「XP−7000B」、「XP−4200B」、「M−
1100X」、「KKS−1010」、「EXP−1570A」、
「EXP−1572A」、「#6008」、「#6173」、「B−
3672−40」、「TS−3552−5」、「ULB−20GA」
なる商品名で市販されているもの等を使用するこ
とができ、アクリレート化或いはメタアクリレー
ト化したポリエステル樹脂としては、「アトラツ
ク382A」、「ビスコート2000」、「ビスコート
3000」、「EBECRYL510」、「EBECRYL550」、
「EBECRYL810」、「フオトマ−5007」なる商品
名で市販されているもの等を使用することがで
き、又アクリレート化或いはメタアクリレート化
したポリブタジエン樹脂としては、「R−
45ACR」、「クインビーム101」なる商品名で市販
されているもの等を使用することができる。
C成分である光重合性単量体としては、エチレ
ングリコールジアクリレート、エチレングリコー
ルジメタアクリレート、ポリエチレングリコール
アクリレート、ポリエチレングリコールメタアク
リレート、ポリエチレングリコールジアクリレー
ト、ポリエチレングリコールジメタアクリレー
ト、ネオペンチルグリコールアクリレート、ネオ
ペンチルグリコールメタアクリレート、1,6−
ヘキサンジオールジアクリレート、トリメチロー
ルプロパントリアクリレート、トリメチロールプ
ロパントリメタアクリレート、ペンタエリスリト
ールテトラアクリレート、ジペンタエリスリトー
ルヘキサアクリレート、β−ヒドロキシアルキル
アクリレート、β−ヒドロキシアルキルメタアク
リレート、トリアリルシアヌレート、トリアリル
イソシアヌレート、ジアリルフタレート、ジアリ
ルイソフタレート、メラミンアクリレート、ブト
キシエチルアクリレート、ステアリルアクリレー
ト、ラウリルアクリレート、テトラヒドロキシア
クリレート、テトラヒドロキシメタアクリレー
ト、アミノアルキルアクリレート、アミノアルキ
ルメタアクリレート、トリエチレングリコールジ
アクリレート、トリエチレングリコールジメタア
クリレート、ジプロピレングリコールジアクリレ
ート、ペンタエリスリトールトリアクリレート、
ペンタエリスリトールトリメタアクリレート、
1,5−ペンタジオールジアクリレート、イソボ
ルニルアクリレート、グリセロールジアクリレー
ト、グリセロールジメタアクリレート、グリセロ
ールアクロキシジメタアクリレート、エチルカル
ビトールアクリレート、メチルトリグリコールア
クリレート、2−ヒドロキシエチルアクリロイル
ホスフエート、N−ビニル−2−ピロリドン、ア
クリルアマイド、N−メチロールアクリルアマイ
ド、N−n−ブトキシメチルアクリルアマイド、
N−(1,1−ジメチル−3−オキソブチル)ア
クリルアマイド及びイタコン酸等のエチレン性不
飽和化合物を使用することができる。
本発明によるインキ組成物は上記A、B及びC
成分の外に、光で硬化させるための光増感剤とし
てチオキサントン、ベンゾイン、ベンゾインアル
キルエーテル、キサントン、ジメチルキサント
ン、ベンゾフエノン、アントラセン、2,2−ジ
エトキシアセトフエノン、ベンジルジメチルケタ
ール、ベンジル、ジフエニルジスルフイド、アン
トラキノン、1−クロルアントラキノン、2−エ
チルアントラキノン、2−t−ブチルアントラキ
ノン、メチルアントラキノン、1−クロルメチル
ナフタリン、N,N′−テトラエチル−4,4′−ジ
アミノベンゾフエノン、ジベンゾスバロン及び
1,1−ジクロロアセトフエノン等を単独で或い
は又複数種類組合せて含有しており、これ等の光
増感剤は0.2乃至8重量部(インキ組成物全体を
100重量部とした場合)の割合で使用することが
できる。
硬化促進のために、トリエタノールアミン、2
−ジメチルアミノエタノール、ジメチルアミノ安
息香酸、ジメチルアミノ安息香酸イソアミル、ジ
オクチルアミノ安息香酸、ジメチルアミノ安息香
酸ラウリル等の第三級アミン類を0.05乃至3重量
部(インキ組成物全体を100重量部とした場合)
の割合で使用することができる。
更に厚膜の場合等のように光だけでは硬化所要
時間が長くなつたり硬化不充分となることが想定
される場合には、熱線にて硬化を促進させるため
に、アゾビスブチルニトリル、フエニルアゾトリ
フエニルメタン、1,1−アゾビス−1−シクロ
ヘキサンニトリル、アゾビスイソブチルアミジ
ン、2−シアノ−2−プロピルアゾホルムアマイ
ド、アゾビス−2−4−ジメチルバレロニトリ
ル、1,1−アゾビスキユメン、及びアゾビス−
4−メトキシ−2,4−ジメチルバレロニトリル
等のアゾ化合物或るいはメチルエチルケトンパー
オキサイド、シクロヘキサンパーオキサイド、
3,3,5−トリメチルシクロヘキサンパーオキ
サイド、アセチルアセトンパーオキサイド、t−
ブチルハイドロパーオキサイド、キユメンハイド
ロパーオキサイド、ジキユミルパーオキサイド、
アセチルパーオキサイド、アセチルシクロヘキシ
ルスルフオニルパーオキサイド、1,1−ビス
(t−ブチルパーオキシ)3,3,5−トリメチ
ルシクロヘキサン及びt−ブチルパーオキシベン
ゾエート等の有機過酸化物を0.1乃至5重量部
(インキ組成物全体を100重量部とした場合)の割
合で使用することができる。しかしながら、これ
らの感熱硬化促進剤を使用する場合には、インキ
組成物のポツトライフが短かくなる場合があるの
で、この点に留意する必要性がある。
本発明によるインキ組成物は更に体質顔料や着
色顔料を含有していることができ、体質顔料とし
ては硫酸バリウム、タルク、炭酸カルシウム、ベ
ントナイト、微細シリカ、クレー、カオリン、ア
スベスト、ケイソウ土等を使用することができ、
又着色顔料としてはフタロシアニングリーン、フ
タロシアニンブルー、酸化チタン、チタンイエロ
ー、ビスアゾイエロー、、黄鉛、ハンザイエロー、
レーキレツドC、ブリリアントカーミン6B、バ
ルカンオレンジ、クロムパーミリオン、カーボン
ブラツク等の有機又は無機顔料を使用することが
できる。
更に尚、本発明によるインキ組成物には重合抑
制剤、増粘剤、チクソ性付与剤、レベリング剤、
消泡剤及び密着性付与剤等の添加剤を自体公知の
態様で使用することができる。
実施例及び参考例
(A) インキ組成物の調整
下記表1及び2に示される配合比で諸成分を
三本ロールミルを使用し室温で常法により均斎
分散させて調製された。
(B) 硬化被膜の形成
エツチングにより回路を形成したプリント配
線板(150×250mm)を対象とし、下記表1及び
2に示される実施例及び参考例で得られた各イ
ンキ組成物を用い300メツシユスクリーン版に
よりスクリーン印刷し、80W3灯式高圧水銀灯
にて照射距離25cmで且つ3m/分のコンベアス
ピードで処理して印刷被膜を硬化させた。
(C) 硬化被膜の硬化試験方法
(i) 密着性
日本工業規格D−0202による。
1mm間隔でクロスカツト後にテープ剥離試
験を行ない、被膜残存面積で結果を示す。
(ii) 鉛筆硬度
日本工業規格K−5400による。
鉛筆硬度試験機を用いて行われた荷重1Kg
時の硬度を示す。
(iii) 半田付後の膨れ
ポストフラツクスを塗布した試料面を260
℃の半田浴に20秒間フロートさせ、半田付処
理し、次いでトリクロロエタンによりポスト
フラツクス残渣を洗除し、粘着テープを貼布
し、該テープを直角方向に急激に剥離し銅表
面上の被膜を検査して剥離個所の数で示す
(試料数10枚での合計数)。
(iv) 半田付後の密着性
上記第(iii)項に記載の態様で半田付及び洗浄
を行なつた後の、上記第(i)項による密着性試
験の結果を示す。
(v) 耐塩酸性
40℃の10容量%塩酸水溶液中に試料を1時
間浸漬し、取出し、水洗し、乾燥した後にな
された上記第(i)項による密着性試験結果を示
す。
(vi) 耐水酸化ナトリウム性
40℃の5重量%水酸化ナトリウム水溶液に
試料を30分間浸漬し、取出し、水洗し、乾燥
した後になされた上記第(i)項による密着性試
験結果を示す。
(vii) 耐アセトン性
40℃のアセトン溶液中に試料を2時間浸漬
し、取出し、乾燥した後になされた第(i)項に
よる密着性試験結果を示す。
(viii) 絶縁抵抗
日本工業規格Z3197による。
G−10銅張積層板で製作したくし型電極に
印刷法で塗布し硬化させた後にタケダ理研製
絶縁抵抗計TR−8601を用いて測定した結果
を示す。
(ix) 誘電正接
上記第(viii)項に記載の試料につき、横河ヒユ
ーレツトパツカード製オートマチツクキヤパ
シタンスブリツジ4270Aを用いて測定した結
果を示す。
尚、実施例及び参考例で用いられた各プレポリ
マーは市販のものであり次の通りであつた。
実施例 1
ビスフエノール型エポキシアクリレート
SP−1507
ウレタンアクリレート EXP−1572A
実施例 2
ノボラツク型エポキシアクリレート SP−4050
ポリエステルアクリレート ビスコート2000
参考例 1
ビスフエノール型エポキシアクリレート
VR−90X
参考例 2
ノボラツク型エポキシアクリレート SP−4010
参考例 3
ビスフエノール型エポキシアクリレート
VR−90X
ノボラツク型エポキシアクリレート SP−4010
ウレタンアクリレート EXP−1572A
The present invention relates to a photocurable ink composition, and in particular to a photocurable ink composition for screen printing used to form permanent protective masks such as solder resists and plating masks in the production of printed wiring boards. It depends. When manufacturing printed wiring boards, conventionally, permanent protective masks for solder resist and plating were used.
It has been formed by applying an ink composition containing an epoxy resin, a urea resin, an alkyd resin, a melamine resin, or a modified resin thereof as a main component by a screen printing method, and then heating and curing the ink composition. These ink compositions contain 5 to 50% organic solvent.
Furthermore, in the case of modified resins, formaldehyde is produced as a by-product during condensation and polymerization, so the odor and impact on the health of workers cannot be ignored, and there is a risk of air pollution. . Moreover, during the hardening process, high temperatures of 120 to 160℃ and 10%
Since it requires a heating time of 40 minutes to 40 minutes, productivity is low, and in addition, there is a possibility that shrinkage, warping, and characteristic deterioration of the printed wiring board may occur. In order to overcome these deficiencies, photocurable ink compositions containing prepolymers of bisphenol A type epoxy acrylate and novolak type epoxy acrylate as main components were developed as solder resist inks and have been put to practical use in the production of printed wiring boards. I have reached the point where However, these solder resist inks have problems in heat resistance, adhesion, and chemical resistance.
That is, the actual situation is that the resist tends to bulge or peel off during the soldering process after inserting electronic components, and when used as a permanent protective mask for plating, it tends to peel off after plating. Therefore, an object of the present invention is to provide a solvent-free type product that is excellent in heat resistance, adhesion, chemical resistance, and electrical properties, and that is suitable for forming permanent protective masks for solder resists and plating. An object of the present invention is to provide a suitable photocurable ink composition. According to the present invention, this object is achieved by: (a) component A consisting of at least one resin obtained by acrylating or methacrylating bismaleimide/triazine resin; and (b) bisphenol A type epoxy resin, novolak type epoxy resin. Component B consisting of at least one resin, urethane resin, polyester resin, or acrylated or methacrylated resin, and (c) component C consisting of at least one photopolymerizable monomer.
A photo-curable ink, the main component of which is A:B=5:95 to 95:5 (A+B):C=10:90 to 70:30. This is achieved by the composition. The specific blending ratio of components A, B, and C is determined by considering the properties of the substances selected as these components, but component A mainly contributes to improving heat resistance, chemical resistance, and electrical properties. Component B contributes to photocurability and adhesion, and component C contributes to photocurability, adhesion, and viscosity adjustment for printability. The acrylated or methacrylated bismaleimide/triazine resin (referred to as "BT resin") in component A is "BT
-3401" and "BT-3109" can be used. Among the B components, acrylated or methacrylated bisphenol A type epoxy resins include "SP-1506", "SP-1507", "SP-
1509”, “V-5502”, “VR-60X”, “VR-77X”,
Those commercially available under the trade names "VR-90X", "UE-8200", "X-63-101", etc. can be used, and as acrylated or methacrylated volac type epoxy resins, “SP-
4010'', ``SP-4050'', ``UE・EXP250'', ``SumiFlash A'', and ``SumiFlash B'' can be used, and acrylated or methacrylated urethane resins can be used. For example, "W-896", "#783",
"#893", "XP-7000B", "XP-4200B", "M-
1100X”, “KKS-1010”, “EXP-1570A”,
"EXP-1572A", "#6008", "#6173", "B-
3672-40”, “TS-3552-5”, “ULB-20GA”
As acrylated or methacrylated polyester resins, commercially available products can be used, such as "Atrazku 382A", "Viscoat 2000", "Viscoat", etc.
3000”, “EBECRYL510”, “EBECRYL550”,
Those commercially available under the trade names "EBECRYL810" and "Fotomer 5007" can be used, and as the acrylated or methacrylated polybutadiene resin, "R-
45ACR" and "Quinbeam 101" can be used. The photopolymerizable monomer that is component C includes ethylene glycol diacrylate, ethylene glycol dimethacrylate, polyethylene glycol acrylate, polyethylene glycol methacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, neopentyl glycol acrylate, and neopentyl glycol acrylate. Pentyl glycol methacrylate, 1,6-
Hexanediol diacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, β-hydroxyalkyl acrylate, β-hydroxyalkyl methacrylate, triallyl cyanurate, triallyl isocyanate Nurate, diallyl phthalate, diallyl isophthalate, melamine acrylate, butoxyethyl acrylate, stearyl acrylate, lauryl acrylate, tetrahydroxy acrylate, tetrahydroxy methacrylate, aminoalkyl acrylate, aminoalkyl methacrylate, triethylene glycol diacrylate, triethylene glycol diacrylate Methacrylate, dipropylene glycol diacrylate, pentaerythritol triacrylate,
pentaerythritol trimethacrylate,
1,5-pentadiol diacrylate, isobornyl acrylate, glycerol diacrylate, glycerol dimethacrylate, glycerol acroxy dimethacrylate, ethyl carbitol acrylate, methyl triglycol acrylate, 2-hydroxyethyl acryloyl phosphate, N- Vinyl-2-pyrrolidone, acrylamide, N-methylol acrylamide, N-n-butoxymethyl acrylamide,
Ethylenically unsaturated compounds such as N-(1,1-dimethyl-3-oxobutyl)acrylamide and itaconic acid can be used. The ink composition according to the present invention includes the above A, B and C.
In addition to the ingredients, thioxanthone, benzoin, benzoin alkyl ether, xanthone, dimethylxanthone, benzophenone, anthracene, 2,2-diethoxyacetophenone, benzyl dimethyl ketal, benzyl, diphthalate are used as photosensitizers for curing with light. enyl disulfide, anthraquinone, 1-chloroanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, methylanthraquinone, 1-chloromethylnaphthalene, N,N'-tetraethyl-4,4'-diaminobenzophenone, It contains dibenzosbalone, 1,1-dichloroacetophenone, etc. singly or in combination, and these photosensitizers are contained in an amount of 0.2 to 8 parts by weight (based on the entire ink composition).
100 parts by weight). To accelerate curing, triethanolamine, 2
- 0.05 to 3 parts by weight of tertiary amines such as dimethylaminoethanol, dimethylaminobenzoic acid, isoamyl dimethylaminobenzoate, dioctylaminobenzoic acid, and lauryl dimethylaminobenzoate (based on the total ink composition as 100 parts by weight) case)
It can be used at a rate of Furthermore, in cases where it is expected that the curing time will be longer or the curing will be insufficient with light alone, such as in the case of thick films, azobisbutylnitrile or phenyl may be used to accelerate curing with heat rays. Azotriphenylmethane, 1,1-azobis-1-cyclohexanenitrile, azobisisobutyramidine, 2-cyano-2-propylazoformamide, azobis-2-4-dimethylvaleronitrile, 1,1-azobisquiumene, and azobis −
Azo compounds such as 4-methoxy-2,4-dimethylvaleronitrile, methyl ethyl ketone peroxide, cyclohexane peroxide,
3,3,5-trimethylcyclohexane peroxide, acetylacetone peroxide, t-
Butyl hydroperoxide, quinene hydroperoxide, diquinyl peroxide,
Organic peroxides such as acetyl peroxide, acetylcyclohexylsulfonyl peroxide, 1,1-bis(t-butylperoxy)3,3,5-trimethylcyclohexane, and t-butylperoxybenzoate in an amount of 0.1 to 5% by weight parts (when the entire ink composition is 100 parts by weight). However, when using these heat-sensitive curing accelerators, the pot life of the ink composition may be shortened, so it is necessary to pay attention to this point. The ink composition according to the present invention may further contain an extender pigment or a colored pigment, and the extender pigments include barium sulfate, talc, calcium carbonate, bentonite, fine silica, clay, kaolin, asbestos, diatomaceous earth, etc. can,
Color pigments include phthalocyanine green, phthalocyanine blue, titanium oxide, titanium yellow, bisazo yellow, yellow lead, Hansa yellow,
Organic or inorganic pigments such as Lake Red C, Brilliant Carmine 6B, Vulcan Orange, Chrome Permillion, Carbon Black, etc. can be used. Furthermore, the ink composition according to the present invention may contain a polymerization inhibitor, a thickener, a thixotropic agent, a leveling agent,
Additives such as antifoaming agents and adhesion agents can be used in a manner known per se. Examples and Reference Examples (A) Preparation of Ink Compositions Ink compositions were prepared by uniformly dispersing various components at the compounding ratios shown in Tables 1 and 2 below using a three-roll mill at room temperature in a conventional manner. (B) Formation of a cured film A printed wiring board (150 x 250 mm) on which a circuit was formed by etching was coated with each ink composition obtained in the examples and reference examples shown in Tables 1 and 2 below. Screen printing was performed using a Tsushi screen plate, and the printed film was cured by processing with an 80W triple-lamp high-pressure mercury lamp at an irradiation distance of 25 cm and a conveyor speed of 3 m/min. (C) Curing test method for cured film (i) Adhesion Based on Japanese Industrial Standard D-0202. A tape peeling test was performed after cross-cutting at 1 mm intervals, and the results are expressed as the remaining area of the film. (ii) Pencil hardness According to Japanese Industrial Standard K-5400. Load 1Kg done using pencil hardness tester
Indicates the hardness of time. (iii) Bulging after soldering The sample surface coated with post flux was
Float for 20 seconds in a solder bath at °C for soldering, then wash the post-flux residue with trichloroethane, apply adhesive tape, and peel off the tape sharply in the right angle direction to remove the film on the copper surface. Inspect and indicate the number of peeled areas (total number of 10 samples). (iv) Adhesion after soldering The results of the adhesion test according to item (i) above after soldering and cleaning in the manner described in item (iii) above are shown. (v) Hydrochloric acid resistance The results of the adhesion test according to the above item (i) are shown after immersing the sample in a 10% by volume aqueous hydrochloric acid solution at 40°C for 1 hour, taking it out, washing it with water, and drying it. (vi) Sodium hydroxide resistance The results of the adhesion test according to item (i) above are shown after immersing the sample in a 5% by weight aqueous sodium hydroxide solution at 40°C for 30 minutes, taking it out, washing it with water, and drying it. (vii) Acetone resistance The results of the adhesion test according to item (i) are shown after immersing the sample in an acetone solution at 40°C for 2 hours, taking it out, and drying it. (viii) Insulation resistance According to Japanese Industrial Standard Z3197. The results are shown below, which were measured using an insulation resistance meter TR-8601 manufactured by Takeda Riken after being coated on a comb-shaped electrode made of a G-10 copper-clad laminate using a printing method and cured. (ix) Dielectric dissipation tangent The following is the result of measurement of the sample described in item (viii) above using an automatic capacitance bridge 4270A manufactured by Yokogawa Huret Packard. The prepolymers used in Examples and Reference Examples were commercially available and were as follows. Example 1 Bisphenol type epoxy acrylate
SP-1507 Urethane acrylate EXP-1572A Example 2 Novolac type epoxy acrylate SP-4050 Polyester acrylate Viscoat 2000 Reference example 1 Bisphenol type epoxy acrylate
VR-90X Reference example 2 Novolac type epoxy acrylate SP-4010 Reference example 3 Bisphenol type epoxy acrylate
VR-90X Novolac type epoxy acrylate SP-4010 Urethane acrylate EXP-1572A
【表】【table】
【表】【table】
【表】【table】
【表】
前記表から判断されるように、プレポリマーと
してビスフエノール型エポキシアクリレートを単
独で用いれば(参考例1)、得られる被膜の密着
性は良好であるが、半田耐熱性や耐薬品性に問題
が生じ、電気特性も悪い。一方ノボラツク型エポ
キシアクリレートを単独で用いれば(参考例2)、
半田耐熱性や耐薬品性は良好であるが密着性が悪
い。そこでノボラツク型エポキシアクリレートに
ビスフエノール型エポキシアクリレートとウレタ
ンアクリレートとを併用すれば(参考例3)、密
着性に改善はもたらされるが、半田耐熱性は若干
低下してしまう。換言すれば、公知処方のインキ
組成物では密着性と他の特性殊に半田耐熱性との
両立が困難である。これに対し、本発明によるイ
ンキ組成物によれば(実施例1〜2)、BTレジ
ンのアクリレート化物を併用することにより、密
着性を損うことなしに耐熱性、耐薬品性及び電気
特性に優れた被膜を形成し得ることが判る。[Table] As judged from the above table, if bisphenol type epoxy acrylate is used alone as the prepolymer (Reference Example 1), the adhesion of the resulting film is good, but the soldering heat resistance and chemical resistance are poor. problems occur, and the electrical characteristics are also poor. On the other hand, if novolac type epoxy acrylate is used alone (Reference Example 2),
Good solder heat resistance and chemical resistance, but poor adhesion. Therefore, if a bisphenol type epoxy acrylate and a urethane acrylate are used in combination with the novolac type epoxy acrylate (Reference Example 3), the adhesion is improved, but the soldering heat resistance is slightly lowered. In other words, it is difficult for ink compositions with known formulations to achieve both adhesion and other properties, particularly soldering heat resistance. On the other hand, according to the ink composition of the present invention (Examples 1 to 2), heat resistance, chemical resistance, and electrical properties can be improved without impairing adhesion by using an acrylate of BT resin. It can be seen that an excellent film can be formed.
Claims (1)
リレート化或はメタアクリレート化した樹脂の
少なくとも1種から成るA成分と、 (b) ビスフエノールA型エポキシ樹脂、ノボラツ
ク型エポキシ樹脂、ウレタン樹脂、ポリエステ
ル樹脂又はポリブタジエン樹脂をアクリレー化
或はメタアクリレート化した樹脂の少なくとも
1種から成るB成分と、 (c) 少なくとも1種の光重合性単量体から成るC
成分 とを主成分とし且つこれら諸成分の重量比が A:B=5:95乃至95:5 (A+B):C=10:90乃至70:30 であることを特徴とする、光硬化型インキ組成
物。[Scope of Claims] 1 (a) A component consisting of at least one resin obtained by acrylating or methacrylating a bismaleimide/triazine resin; (b) a bisphenol A type epoxy resin, a novolac type epoxy resin, (c) Component B consisting of at least one type of resin obtained by acrylating or methacrylating urethane resin, polyester resin, or polybutadiene resin, and (c) component C consisting of at least one type of photopolymerizable monomer.
A photo-curable ink, the main component of which is A:B=5:95 to 95:5 (A+B):C=10:90 to 70:30. Composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57162280A JPS5951962A (en) | 1982-09-20 | 1982-09-20 | Photocurable ink composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57162280A JPS5951962A (en) | 1982-09-20 | 1982-09-20 | Photocurable ink composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5951962A JPS5951962A (en) | 1984-03-26 |
JPH0132868B2 true JPH0132868B2 (en) | 1989-07-10 |
Family
ID=15751469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57162280A Granted JPS5951962A (en) | 1982-09-20 | 1982-09-20 | Photocurable ink composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5951962A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0770361B2 (en) * | 1985-09-09 | 1995-07-31 | ソニー株式会社 | Printed resistor board |
JPS62290705A (en) * | 1986-06-10 | 1987-12-17 | Mitsubishi Chem Ind Ltd | Photopolymerizable composition |
CN107652779B (en) * | 2017-11-15 | 2021-07-02 | 江门市鸿叶化工有限公司 | Preparation method of high-temperature-resistant UV (ultraviolet) curing ink for 3D printing |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5872140A (en) * | 1981-10-26 | 1983-04-30 | Hitachi Chem Co Ltd | Photosetting resin composition |
-
1982
- 1982-09-20 JP JP57162280A patent/JPS5951962A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5872140A (en) * | 1981-10-26 | 1983-04-30 | Hitachi Chem Co Ltd | Photosetting resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS5951962A (en) | 1984-03-26 |
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