JPH0131280B2 - - Google Patents
Info
- Publication number
- JPH0131280B2 JPH0131280B2 JP58080960A JP8096083A JPH0131280B2 JP H0131280 B2 JPH0131280 B2 JP H0131280B2 JP 58080960 A JP58080960 A JP 58080960A JP 8096083 A JP8096083 A JP 8096083A JP H0131280 B2 JPH0131280 B2 JP H0131280B2
- Authority
- JP
- Japan
- Prior art keywords
- hollow cathode
- metal
- ion collector
- plasma
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 238000002844 melting Methods 0.000 claims description 28
- 230000008018 melting Effects 0.000 claims description 27
- 238000010894 electron beam technology Methods 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 21
- 229910052715 tantalum Inorganic materials 0.000 description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005275 alloying Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、プラズマ電子銃を利用したプラズ
マ電子ビーム溶解炉に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a plasma electron beam melting furnace using a plasma electron gun.
一般に、プラズマビーム溶解炉の電子ビーム発
生源であるプラズマ電子銃の陰極は、中空円筒状
となつており、タンタルやタングステンなどの高
融点金属が用いられている。プラズマ電子銃は、
中空陰極中にアルゴン、ヘリウム等の不活性ガス
を供給して、直流電圧を印加することによつて、
中空陰極中にガスプラズマを発生させ、そのガス
プラズマから電子ビームを取り出すようにされて
いる。
Generally, the cathode of a plasma electron gun, which is the electron beam generation source of a plasma beam melting furnace, has a hollow cylindrical shape and is made of a high melting point metal such as tantalum or tungsten. The plasma electron gun is
By supplying an inert gas such as argon or helium into the hollow cathode and applying a DC voltage,
A gas plasma is generated in a hollow cathode, and an electron beam is extracted from the gas plasma.
この種のプラズマ電子銃は、従来から高融点金
属の溶解や溶接等に用いられている熱電子放出型
の陰極を用いた高電圧電子ビームに比較して圧力
の高い領域で電子ビームを安定して発生すること
ができる。また一般に言われている作動圧力は、
高電圧電子ビームの場合には１×10-2Pa以下で
あるのに対して、プラズマ電子ビームの場合には
100Pa〜１×10-2Paの範囲である。 This type of plasma electron gun stabilizes the electron beam in high-pressure regions compared to high-voltage electron beams using thermionic-emitting cathodes, which are conventionally used for melting and welding high-melting point metals. can occur. In addition, the working pressure is generally said to be
In the case of a high-voltage electron beam, it is less than 1 × 10 -2 Pa, while in the case of a plasma electron beam,
It is in the range of 100Pa to 1×10 -2 Pa.
従つて、高電圧電子ビームの熱電子放出型電子
銃は、金属の溶解等のように作動中に多量のガス
放出があり、装置内圧力が大きく変動するような
用途に使用する場合には、処理室（例えば溶解
室）と、別個の真空排気装置を備えた電子銃室と
に分ける必要がでてくる。これに対してプラズマ
電子銃では、溶解室内に電子銃を設置することが
可能である。その結果、プラズマ電子ビーム溶解
炉は高電圧電子ビーム炉に比べて装置の構造を簡
単かつ安価にできる。 Therefore, when using a high-voltage electron beam thermionic emission electron gun in applications where a large amount of gas is released during operation, such as when melting metal, and where the internal pressure fluctuates greatly, It becomes necessary to separate the processing chamber (for example, the melting chamber) and the electron gun chamber with a separate evacuation device. On the other hand, with a plasma electron gun, it is possible to install the electron gun inside the melting chamber. As a result, a plasma electron beam melting furnace can have a simpler and cheaper device structure than a high voltage electron beam furnace.
しかしその反面プラズマ電子銃の中空陰極が被
溶解金属に対してむき出しとなるため、被溶解金
属より蒸発した蒸発物が中空陰極に付着し易く、
特に蒸発した金属原子がビームの衝撃により電離
され、プラスの電荷をもつ電離原子は中空陰極に
電気的に引き寄せられ付着することになる。
However, on the other hand, since the hollow cathode of the plasma electron gun is exposed to the metal to be melted, evaporated matter from the metal to be melted tends to adhere to the hollow cathode.
In particular, evaporated metal atoms are ionized by the impact of the beam, and the positively charged ionized atoms are electrically attracted to and adhere to the hollow cathode.
中空陰極は、通常タンタルやタングステン等の
ような高融点金属で構成されており、作動中は、
内部のガスプラズマによつて約2000℃〜22000℃
の温度に加熱される。従つて、低融点、高蒸気圧
の金属を溶解する場合には、それらの被溶解金属
の蒸気が中空陰極に蒸着しても、中空陰極の温度
が上述のように十分に高温であるので直に再蒸発
してしまい問題とならない。しかし被溶解金属が
ニオブ、モリブデン、タンタル、白金等の高融
点、低蒸気圧のものである場合には、中空陰極に
付着したこれら金属は再蒸発せずに除々に蓄積さ
れて、やがて陰極を形成しているタンタルやタン
グステン等と合金化することになる。その結果、
中空陰極材は、融点が低下して溶損することにな
つている。 The hollow cathode is usually constructed of a high melting point metal such as tantalum or tungsten, and during operation,
Approximately 2000℃~22000℃ due to internal gas plasma
heated to a temperature of Therefore, when melting metals with a low melting point and high vapor pressure, even if the vapor of the metal to be melted is deposited on the hollow cathode, the temperature of the hollow cathode is sufficiently high as described above, so it cannot be directly melted. It will not be a problem as it will re-evaporate. However, if the metal to be melted has a high melting point and low vapor pressure, such as niobium, molybdenum, tantalum, or platinum, these metals attached to the hollow cathode will not re-evaporate and will gradually accumulate, eventually leaving the cathode. It becomes alloyed with the tantalum, tungsten, etc. that are formed. the result,
The hollow cathode material is supposed to have a lower melting point and be damaged by melting.
そこで、この発明の目的は、上述のような欠点
を解消したプラズマ電子ビーム溶解炉を提供する
ことにある。 SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a plasma electron beam melting furnace that eliminates the above-mentioned drawbacks.
この目的を達成するに、この発明によるプラズ
マ電子ビーム溶解炉は、プラズマ電子銃の中空陰
極と被溶解金属との間で電子ビームを妨げない位
置にイオンコレクタを有し、このイオンコレクタ
が被溶解金属に対して中空陰極より十分大きな電
位の傾きをもつように構成したことを特徴として
いる。
To achieve this objective, the plasma electron beam melting furnace according to the present invention has an ion collector located between the hollow cathode of the plasma electron gun and the metal to be melted at a position that does not interfere with the electron beam, and the ion collector is located between the hollow cathode of the plasma electron gun and the metal to be melted. It is characterized by being constructed so that the potential gradient relative to the metal is sufficiently larger than that of a hollow cathode.
このように構成したこの発明の溶解炉では、イ
オンコレクタは中空陰極に対して同じ電位かまた
は低い電位に設定され、被溶解金属からの蒸発原
子は、電子ビーム衝撃によつて電離され、プラス
電荷に帯電する。こうして電離された原子は、電
位の傾きの大きいイオンコレクタに選択的に引き
寄せられ、中空陰極には到達しない。従つて中空
陰極には実質的な量の被溶解金属原子が付着する
のを防止できる。
In the melting furnace of the present invention configured in this way, the ion collector is set at the same potential or a lower potential with respect to the hollow cathode, and the evaporated atoms from the metal to be melted are ionized by electron beam bombardment and become positively charged. is charged with electricity. The ionized atoms are selectively attracted to the ion collector, which has a large potential gradient, and do not reach the hollow cathode. Therefore, a substantial amount of metal atoms to be dissolved can be prevented from adhering to the hollow cathode.
以下、添附図面を参照してこの発明の好ましい
実施例についてさらに説明する。
Hereinafter, preferred embodiments of the present invention will be further described with reference to the accompanying drawings.
図面にはこの発明を実施しているプラズマ電子
ビーム溶解炉を慨略的に示し、１は炉本体で、そ
の内部は図示してない適当な真空排気装置に接続
されている。炉本体１内には図示したように、被
溶解金属を入れる水冷銅ルツボ２が、支持体３に
よつて固定してまたは可動に支持されており、支
持体３と炉本体１の壁との間には電気絶縁および
真空シール４が施されている。また５は電子銃を
構成している水冷銅電極で、この電極５は、ルツ
ボ２に対向した位置に固定してまたは可動に設け
られている。この電極５はその先端に中空陰極６
を備え、また内部にはヘリウムやアルゴンのよう
な不活性ガス供給通路７を備えている。８は直流
電源（例えば20V〜150V）で、その正端子はル
ツボ２の支持体３に接続され、また負端子は電極
５に接続されている。９はイオンコレクタで、中
空陰極６と、ルツボ２との間で電子ビームを阻害
しない位置に図示してない支持体によつて配置さ
れ、そしてスイツチ１０を介して直流電源８の負
端子に接続されている。イオンコレクタ９は導電
性材料から成り、そして溶融金属からの輻射熱、
中空陰極からの輻射熱、イオン電流によりジユー
ル発熱によつて熱せられるので、高温にさらさら
ても形状および支持体からの電気絶縁を十分に保
持できるように構成されるべきである。一般には
イオンコレクタ９は水冷を施した銅またはステン
レス鋼から成ることができ、水冷を施さない場合
には高温に耐えしかも機械強度の強い材料を使用
し、容易に変形しないようにする。このような条
件を満たす材料としては、具体的にはニオブ、モ
リブテン、タンタル等を挙げることができる。イ
オンコレクタ９の支持体としては、高温にされさ
れても十分な機械的強度と電気絶縁性とをもつア
ルミナ等の耐火性碍子を用いることができる。 The drawing schematically shows a plasma electron beam melting furnace in which the present invention is implemented, and 1 is a furnace body, the inside of which is connected to a suitable vacuum evacuation device (not shown). As shown in the figure, inside the furnace body 1, a water-cooled copper crucible 2 containing the metal to be melted is fixedly or movably supported by a support 3, and there is a gap between the support 3 and the wall of the furnace body 1. An electrical insulation and vacuum seal 4 is provided between them. Reference numeral 5 denotes a water-cooled copper electrode constituting the electron gun, and this electrode 5 is fixedly or movably provided at a position facing the crucible 2. This electrode 5 has a hollow cathode 6 at its tip.
The inside thereof is provided with an inert gas supply passage 7 such as helium or argon. 8 is a DC power source (for example, 20 V to 150 V), the positive terminal of which is connected to the support 3 of the crucible 2, and the negative terminal of which is connected to the electrode 5. Reference numeral 9 denotes an ion collector, which is placed between the hollow cathode 6 and the crucible 2 by means of a support (not shown) at a position where the electron beam is not obstructed, and is connected to the negative terminal of a DC power source 8 via a switch 10. has been done. The ion collector 9 is made of a conductive material and receives radiant heat from the molten metal.
Since it is heated by radiant heat from the hollow cathode and ion current due to Joule heat generation, it should be constructed so that it can sufficiently maintain its shape and electrical insulation from the support even when exposed to high temperatures. In general, the ion collector 9 can be made of water-cooled copper or stainless steel; if not water-cooled, a material that can withstand high temperatures and has high mechanical strength is used so that it does not easily deform. Specific examples of materials that meet these conditions include niobium, molybdenum, tantalum, and the like. As the support for the ion collector 9, a refractory insulator such as alumina, which has sufficient mechanical strength and electrical insulation even when exposed to high temperatures, can be used.
イオンコレクタ９の形状は、電子ビームの断面
形状に相応した形状であるのが好ましく、一般に
電子ビームの流れの方向に対して直角方向の断面
形状は円形であるので、イオンコレクタの形状は
円筒状にすることができる。しかし当然イオンコ
レクタ９は、例えば平板状や棒状でもよい。重要
なことは、陽極を成す被溶解金属に対して、イオ
ンコレクタ９が中空陰極６より十分に大きな電位
の傾きをもつような形状と位置に設けることにあ
る。 The shape of the ion collector 9 is preferably a shape corresponding to the cross-sectional shape of the electron beam. Generally, the cross-sectional shape in the direction perpendicular to the flow direction of the electron beam is circular, so the shape of the ion collector is cylindrical. It can be done. However, the ion collector 9 may of course be shaped like a flat plate or a rod, for example. What is important is that the ion collector 9 is provided in such a shape and position that it has a sufficiently larger potential gradient than the hollow cathode 6 with respect to the metal to be melted that forms the anode.
図示実施例では、イオンコレクタ９の電源は電
子ビーム供給用の直流電源８に並列に接続して共
用しているが、より効率よく作用させるためには
点線で示すように直流電源８より電圧の高いイオ
ンコレクタ専用の直流電源１１を用いてもよい。 In the illustrated embodiment, the power source for the ion collector 9 is connected in parallel to the DC power source 8 for supplying the electron beam, but in order to work more efficiently, the voltage is lowered from the DC power source 8 as shown by the dotted line. A DC power supply 11 dedicated to high ion collectors may be used.
動作においてイオンコレクタ９は、電子ビーム
が安定に発生した後スイツチ１０を投入して電圧
印加するようにされている。 In operation, the ion collector 9 is configured such that after an electron beam is stably generated, a switch 10 is turned on to apply a voltage.
被溶解金属からの蒸発原子は、電子ビーム衝撃
によつて電離され、プラス電荷に帯電する。こう
して電離された原子は、電位の傾きの大きいイオ
ンコレクタ９に選択的に引き寄せられ、中空陰極
６は到達しない。従つて中空陰極６には実質的な
量の被溶解金属原子は付着しなくなり、合金化が
生じないため、中空陰極６は溶損することがなく
なる。 The evaporated atoms from the metal to be melted are ionized by electron beam bombardment and become positively charged. The ionized atoms are selectively attracted to the ion collector 9, which has a large potential gradient, and do not reach the hollow cathode 6. Therefore, a substantial amount of metal atoms to be dissolved do not adhere to the hollow cathode 6, and alloying does not occur, so that the hollow cathode 6 is not damaged by melting.
また蒸発した原子の全てが電離してプラスの電
荷をもつのではなく、電離しない原子は電気的に
は中性であるので、イオンコレクタ９に選択的に
引き寄せられることはない。実際、中空陰極６に
蒸着する原子もあるが、これは、被溶解金属に対
して中空陰極６の成す立体角によつて決定され
る。通常のプラズマ電子ビーム溶解炉の場合、被
溶解金属と中空陰極６との距離は200mm〜1000mm
程度であり、このような距離では、中空陰極６が
被溶解金属に対して成す立体角は小さく、中空陰
極への中性原子の蒸着は少なく、その障害はほと
んど無視できる。 Further, not all of the evaporated atoms are ionized and have a positive charge, but atoms that are not ionized are electrically neutral and are not selectively attracted to the ion collector 9. In fact, some atoms are deposited on the hollow cathode 6, but this is determined by the solid angle formed by the hollow cathode 6 with respect to the metal to be melted. In the case of a normal plasma electron beam melting furnace, the distance between the metal to be melted and the hollow cathode 6 is 200 mm to 1000 mm.
At such a distance, the solid angle formed by the hollow cathode 6 with respect to the metal to be melted is small, and the deposition of neutral atoms on the hollow cathode is small, so that the disturbance can be almost ignored.
以上説明してきたようにこの発明ではプラズマ
電子銃を利用した溶解炉において、プラズマ電子
銃と被溶解金属との間にイオンコレクタを設け、
このイオンコレクタを被溶解金属に対してプラズ
マ電子銃の中空陰極より十分大きな電位の傾きを
もつようにしているので、被溶解金属から発生す
る陽イオンを吸着して、中空陰極へ付着するのを
防止でき、中空陰極の溶損を防ぐことができる。
As explained above, in this invention, in a melting furnace using a plasma electron gun, an ion collector is provided between the plasma electron gun and the metal to be melted,
This ion collector is designed to have a sufficiently larger potential gradient with respect to the metal to be melted than the hollow cathode of the plasma electron gun, so that it adsorbs cations generated from the metal to be melted and prevents them from adhering to the hollow cathode. This can prevent the hollow cathode from melting.
図面はこの発明の一実施例を示す概略図であ
る。
２……ルツボ、６……中空陰極、８……直流電
源、９……イオンコレクタ。
The drawings are schematic diagrams showing one embodiment of the present invention. 2... Crucible, 6... Hollow cathode, 8... DC power supply, 9... Ion collector.
Claims (1)
を印加することによつて、中空陰極中にガスプラ
ズマを発生させ、そのガスプラズマから電子ビー
ムを取り出すように構成したプラズマ電子銃を利
用した溶解炉において、プラズマ電子銃の中空陰
極と被溶解金属との間で電子ビームを妨げない位
置にイオンコレクタを設け、このイオンコレクタ
が被溶解金属に対して中空陰極より十分大きな電
位の傾きをもつように構成したことを特徴とする
プラズマ電子銃を利用した溶解炉。 ２ イオンコレクタが冷却手段を備えている特許
請求の範囲第１項に記載の溶解炉。 ３ イオンコレクタが溶解炉の電子ビーム供給用
直流電源より電圧の高い別の直流電源に接続され
る特許請求の範囲第１項に記載の溶解炉。[Claims] 1. A gas plasma is generated in the hollow cathode by supplying an inert gas into the hollow cathode and applying a DC voltage, and an electron beam is extracted from the gas plasma. In a melting furnace using a plasma electron gun, an ion collector is installed between the hollow cathode of the plasma electron gun and the metal to be melted at a position where it does not interfere with the electron beam, and this ion collector has a more effective surface area than the hollow cathode for the metal to be melted. A melting furnace using a plasma electron gun characterized by being configured to have a large potential gradient. 2. The melting furnace according to claim 1, wherein the ion collector is provided with a cooling means. 3. The melting furnace according to claim 1, wherein the ion collector is connected to another DC power source having a higher voltage than the DC power source for supplying electron beams of the melting furnace.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8096083A JPS59207600A (en) | 1983-05-11 | 1983-05-11 | Electron gun for plasma electron beam melting furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8096083A JPS59207600A (en) | 1983-05-11 | 1983-05-11 | Electron gun for plasma electron beam melting furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59207600A JPS59207600A (en) | 1984-11-24 |
| JPH0131280B2 true JPH0131280B2 (en) | 1989-06-23 |
Family
ID=13733076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8096083A Granted JPS59207600A (en) | 1983-05-11 | 1983-05-11 | Electron gun for plasma electron beam melting furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59207600A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3923012B2 (en) * | 2002-12-25 | 2007-05-30 | 日本電子工業株式会社 | Method and apparatus for high-temperature heat treatment of substances |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4859793A (en) * | 1971-11-26 | 1973-08-22 |
-
1983
- 1983-05-11 JP JP8096083A patent/JPS59207600A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4859793A (en) * | 1971-11-26 | 1973-08-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59207600A (en) | 1984-11-24 |
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