JPH01286425A - Deposit eliminating method and its equipment - Google Patents

Deposit eliminating method and its equipment

Info

Publication number
JPH01286425A
JPH01286425A JP63114641A JP11464188A JPH01286425A JP H01286425 A JPH01286425 A JP H01286425A JP 63114641 A JP63114641 A JP 63114641A JP 11464188 A JP11464188 A JP 11464188A JP H01286425 A JPH01286425 A JP H01286425A
Authority
JP
Japan
Prior art keywords
liquid
sample
foreign matter
vicinity
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63114641A
Other languages
Japanese (ja)
Inventor
Takeoki Miyauchi
宮内 建興
Hiroshi Yamaguchi
博司 山口
Katsuro Mizukoshi
克郎 水越
Mikio Hongo
幹雄 本郷
Hirotani Saitou
啓谷 斉藤
Mitsuhiro Morita
光洋 森田
Yasuhiro Koizumi
古泉 裕弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63114641A priority Critical patent/JPH01286425A/en
Publication of JPH01286425A publication Critical patent/JPH01286425A/en
Pending legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE:To enable easily eliminating deposit foreign matter which can not be eliminated by ordinary cleaning by bringing the foreign matter attaching to a sample into contact with liquid in a vessel, converging and projecting laser light pulse on the liquid in the vicinity of interface between at least the vicinity of the foreign matter and the sample, and utilizing a force generated at the time of rapid vaporization expansion of the liquid. CONSTITUTION:A glass substrate 4 is mounted on the upper surface of a vessel 7; from a liquid feeding pipe 10, liquid is supplied in an inner chamber 8 until the liquid surface comes into contact with the glass substrate 4; from a laser oscillator 1', laser light 2' is projected and converged at a focus point 2a' in the vicinity of an interface between the liquid and the glass substrate 4 in the vicinity of the foreign matter 5a; the liquid 11 is rapidly heated by high power density of the Iaser light 2', rapidly vaporized, and expands in the explosive manner. By the effect of this force, the adjacent liquid 11 is impulsively pushed out, so that the foreign matter 5a is removed from the glass substrate 4 by the impulsive pushing force of the liquid 11.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は異物除去方法およびその装置に係り、とくにフ
ォトマスク上に付着した異物を取除くのに好適な付着物
除去方法およびその装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method and apparatus for removing foreign matter, and more particularly to a method and apparatus for removing foreign matter suitable for removing foreign matter adhered to a photomask.

〔従来の技術〕[Conventional technology]

従来、異物除去を行うには、たとえば実開昭51−75
795号公報に記載されかつ第2図に示すように、基板
ガラス4の被加工材料5を載物台6の開口端面に当て、
排気パイプ7から真空室6aの空気を排出して気圧の差
によυ被加工材料5を載物台6上に固定する。ついでレ
ーザ発振器1からのレーザ光2を対物レンズ3によシ集
光し、レーザ光に透明な基板ガラス4を透過して裏面の
被加工材料5に照射し、被加工材料5を真空雰囲気内で
レーザ加工するものが提案されている。
Conventionally, in order to remove foreign substances, for example,
As described in Japanese Patent No. 795 and shown in FIG. 2, the workpiece material 5 of the substrate glass 4 is applied to the open end surface of the stage 6
The air in the vacuum chamber 6a is exhausted from the exhaust pipe 7, and the workpiece material 5 is fixed on the stage 6 due to the difference in atmospheric pressure. Next, the laser beam 2 from the laser oscillator 1 is focused by the objective lens 3, and the laser beam passes through the transparent substrate glass 4 and is irradiated onto the workpiece 5 on the back side, and the workpiece material 5 is placed in a vacuum atmosphere. A laser processing method has been proposed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術にあっては、薄膜の除去は比較的困難なく
除去できるが、たとえば基板に強固に付着した球状の金
属材料や透明材料のように通常のスクラブ洗浄や酸、ア
ルカリを用いた洗浄でも除去できずに残留する付着異物
の場合には、除去することが困難であった。
With the above-mentioned conventional technology, thin films can be removed relatively easily, but for example, when cleaning spherical metal materials or transparent materials that are firmly attached to a substrate, normal scrub cleaning or cleaning using acid or alkali can also remove thin films. In the case of attached foreign matter that cannot be removed and remains, it is difficult to remove it.

本発明の目的は、通常の洗浄で除去できない付着異物を
容易に除去することが可能な付着物除去方法とその装置
を提供することKある。
An object of the present invention is to provide a method and apparatus for removing deposits that can easily remove deposits that cannot be removed by ordinary cleaning.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するため、本発明の付着物除去方法にお
いては、試料に付着する異物を容器内の液体に接触させ
、レーザ光のパルスを少くとも異物近傍で試料との境界
面近傍の液体に集束照射し、液体の急速な気化膨張のさ
いに発生する力を利用して異物を試料から除去するもの
である。
In order to achieve the above object, in the deposit removal method of the present invention, the foreign matter attached to the sample is brought into contact with the liquid in the container, and a pulse of laser light is applied to the liquid near the interface with the sample at least in the vicinity of the foreign matter. It uses focused irradiation and the force generated during rapid vaporization and expansion of liquid to remove foreign substances from the sample.

また容器内の液体の液面を調整する手段を有するもので
ある。
It also has means for adjusting the liquid level within the container.

また本発明の付着物除去装置においては、上面に内部を
密閉するように試料を載置し、内部に液体供給管に接続
し、試料に付着する異物に接触する液体を貯溜する容器
と、液体供給管に設置され液体の液面を調整する液体調
整手段と、レーザ光のパルスを試料を透過して少なくと
も異物近傍で試料との境界面近傍の液体に集束照射する
レーザ光照射手段とを設けたものである。
Further, in the deposit removal device of the present invention, a sample is placed on the upper surface so as to seal the inside, a container is connected to a liquid supply pipe inside, and stores a liquid that comes into contact with foreign matter adhering to the sample; A liquid adjustment means installed in the supply pipe adjusts the liquid level of the liquid, and a laser beam irradiation means that transmits pulses of laser light through the sample and focuses and irradiates the liquid at least near the foreign object and near the interface with the sample. It is something that

〔作用〕[Effect]

上記のような方法による異物除去方法においては、異物
近傍で試料との境界面近傍の液体がレーザ光の高いパワ
ー密度のパルスの集束照射によって瞬時に気化膨張し、
そのさいの衝撃で強固に付着していた異物を機械的にも
ぎ取るように除去するので、従来除去困難であった異物
を容易に試料から除去することができる。
In the foreign matter removal method using the method described above, the liquid in the vicinity of the foreign matter and near the interface with the sample is instantaneously vaporized and expanded by focused irradiation with high power density pulses of laser light.
At that time, the impact causes the firmly attached foreign matter to be removed by mechanically peeling it off, making it possible to easily remove foreign matter from the sample, which was previously difficult to remove.

また液体の液面を調整可能にしたので、試料から異物を
除去したのち、液体の液面を低下して試料に異物の付着
を防止することができる。
Furthermore, since the level of the liquid can be adjusted, after removing foreign matter from the sample, the level of the liquid can be lowered to prevent foreign matter from adhering to the sample.

また内部に液体を貯溜する容器の上面に試料を載置して
いるので、試料を液面に容易に接触させることができ、
これによって液体中の爆発現象を容易に利用することが
できる。
In addition, since the sample is placed on top of the container that stores liquid inside, the sample can be easily brought into contact with the liquid surface.
This allows the explosion phenomenon in liquid to be easily utilized.

また液体調整手段によって液体の液面を試料に接触させ
たシ、低下させたシすることができるので、液体が容器
内から洩れるのを防止することができる。
Further, since the liquid level can be brought into contact with the sample or lowered by the liquid adjusting means, it is possible to prevent the liquid from leaking from inside the container.

〔実施例〕〔Example〕

以下、本発明の一実施例を示す第1図について説明する
Hereinafter, FIG. 1 showing an embodiment of the present invention will be described.

第1図に示すように、容器7の上面には、その内部室8
を密閉するようにQ IJング9を介して、ガラス基板
4を載置し、かつ内部室8内に液体11を供給するため
の液体供給管10と、この液体供給管10に設置され内
部室8内の液体11の液面の高さを調整する液体調整手
段12とを有している。
As shown in FIG. 1, the upper surface of the container 7 has an inner chamber 8
A liquid supply pipe 10 for placing the glass substrate 4 and supplying the liquid 11 into the internal chamber 8 through the QIJing 9 so as to seal the internal chamber; It has a liquid adjusting means 12 for adjusting the height of the liquid level of the liquid 11 in the liquid 8.

またガラス基板4の上方位置には、レーザ発振器1′か
ら出射したレーザ光2′を対物レンズ37によって集光
し、その集光点2 a’がガラス基板4を透過して異物
5aの近傍でガラス基板4との境界面近傍に集束照射す
るレーザ光照射手段12を有している。
Further, at a position above the glass substrate 4, the laser beam 2' emitted from the laser oscillator 1' is focused by an objective lens 37, and the focused point 2a' is transmitted through the glass substrate 4 and near the foreign object 5a. It has a laser beam irradiation means 12 that focuses and irradiates the vicinity of the interface with the glass substrate 4.

つぎにその動作について説明する。Next, its operation will be explained.

まず、ガラス基板4を容器7の上面に載置し、液体供給
管10から内部室8内に液面が基板ガラス4に接触する
まで供給したのち、レーザ発振器1′からレーザ光2′
が異物5aの近傍でガラス基板4との境界面近傍に集光
点2 a’に集光すると、液体11がレーザ光2′の高
いパワー密度(可視光域近傍で10’ W / ct1
以上)で急激に加熱され、急速に気化し、爆発的に膨張
する。この力で近傍の液体11が衝撃的に押し出すので
、ガラス基板4に付着する異物5aは、液体11の衝撃
的な押し出し力を受けてガラス基板4から離脱する。し
かるのち、液体調整手段12が動作して内部室8の液体
11の液面が低下すると、ガラス基板4を容器7の上面
から取り外して動作が終了する。
First, the glass substrate 4 is placed on the upper surface of the container 7, and after the liquid is supplied from the liquid supply pipe 10 into the internal chamber 8 until the liquid surface contacts the substrate glass 4, a laser beam 2' is emitted from the laser oscillator 1'.
When the liquid 11 is focused on the converging point 2a' near the interface with the glass substrate 4 in the vicinity of the foreign object 5a, the liquid 11 emits the high power density of the laser beam 2'(10' W/ct1 near the visible light range).
(above), it heats up rapidly, vaporizes rapidly, and expands explosively. This force causes the nearby liquid 11 to be pushed out impulsively, so that the foreign matter 5a adhering to the glass substrate 4 is detached from the glass substrate 4 due to the impulsive extrusion force of the liquid 11. Thereafter, when the liquid adjusting means 12 operates to lower the level of the liquid 11 in the internal chamber 8, the glass substrate 4 is removed from the upper surface of the container 7, and the operation is completed.

〔発明の効果〕〔Effect of the invention〕

本発明は上玉説明したように構成されているので、以下
に記載されるような効果を奏する。
Since the present invention is configured as described above, it produces the effects described below.

従来、容易に取り除くことが困難であった試料に付着す
る異物を容易に除去することができる。
Foreign matter adhering to a sample, which was conventionally difficult to remove, can be easily removed.

また異物を除去した試料を取外すさい容器内の液体を液
面を低下するので、試料に異物が付着するのを防止する
ことができる。
Furthermore, since the level of the liquid in the container is lowered when removing the sample from which foreign matter has been removed, it is possible to prevent foreign matter from adhering to the sample.

また、容器内から液体が洩れるのを防止することができ
る。
Further, it is possible to prevent liquid from leaking from inside the container.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す付着物除去装置の説明
図、第2図は従来の付着物除去装置の説明図である。 1′・・・・・・レーザ発振器、   2′・・・・・
・レーザ光、3′・・・・・・対物レンズ、    4
・・・・・・ガラス基板、7・・・・・・容器、   
    8・・・・・・内部室、9・・・・・・0リン
グ、    10・・・・・・液体供給管、11・・・
・・・液体、     12・・・・・・液体調整手段
。 1′・・ し−サ゛づご主艮名44−・ガラス基4反 
  10.= ン(イ1本イ五糸a管2′・・ し−づ
九     5八・・・ F、  物     11.
・ )(3′・ j【4才し〉、ヌζ°  7・・昼各
      12・・・シ4蔓、41本、1り糎qi巳
;H之。
FIG. 1 is an explanatory diagram of a deposit removing device showing an embodiment of the present invention, and FIG. 2 is an explanatory diagram of a conventional deposit removing device. 1'... Laser oscillator, 2'...
・Laser beam, 3'...Objective lens, 4
...Glass substrate, 7...Container,
8...Internal chamber, 9...0 ring, 10...Liquid supply pipe, 11...
...Liquid, 12...Liquid adjustment means. 1'...Shi-Saizugo main name 44--Glass base 4 pieces
10. = N (A 1 A 5 thread a tube 2'... Shizu 9 58... F, Thing 11.
・ ) (3′・j [4 years old], nu ζ° 7... daytime each 12...shi 4 vines, 41 vines, 1 lily; H.

Claims (1)

【特許請求の範囲】 1、試料に付着する異物を容器内の液体に接触させ、レ
ーザ光のパルスを少なくとも異物近傍で試料との境界面
近傍の液体に集束照明し、液体の急速な気化膨張のさい
に発生する力を利用して異物を試料から除去する付着物
除去方法。 2、容器内の液体の液面を調整する手段を有する請求項
1記載の付着物除去方法。 3、上面に内部を密閉するように試料を載置し、内部を
液体供給管に接続し、試料に付着する異物に接触する液
体を貯溜する容器と、液体供給管に設置され、液体の液
面を調整する液体調整手段とレーザ光のパルスを試料を
透過して少なくとも異物近傍で試料との境界面近傍の液
体に集束照明するレーザ光照明手段とを設けた付着物除
去装置。
[Claims] 1. A foreign substance attached to a sample is brought into contact with a liquid in a container, and a pulse of laser light is focused and illuminated at least in the vicinity of the foreign substance and the liquid near the interface with the sample, so that the liquid rapidly vaporizes and expands. A method for removing foreign matter from a sample by using the force generated during the process. 2. The method for removing deposits according to claim 1, further comprising means for adjusting the level of the liquid in the container. 3. Place the sample on the top surface so that the inside is sealed, and connect the inside to the liquid supply tube. What is claimed is: 1. A deposit removal device comprising a liquid adjusting means for adjusting a surface and a laser beam illumination means for transmitting pulses of laser light through a sample and focusing illumination on a liquid near a boundary surface with the sample at least in the vicinity of a foreign object.
JP63114641A 1988-05-13 1988-05-13 Deposit eliminating method and its equipment Pending JPH01286425A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63114641A JPH01286425A (en) 1988-05-13 1988-05-13 Deposit eliminating method and its equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63114641A JPH01286425A (en) 1988-05-13 1988-05-13 Deposit eliminating method and its equipment

Publications (1)

Publication Number Publication Date
JPH01286425A true JPH01286425A (en) 1989-11-17

Family

ID=14642889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63114641A Pending JPH01286425A (en) 1988-05-13 1988-05-13 Deposit eliminating method and its equipment

Country Status (1)

Country Link
JP (1) JPH01286425A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH047071A (en) * 1990-04-24 1992-01-10 Ebara Res Co Ltd Washing method
WO1999030865A1 (en) * 1997-12-16 1999-06-24 Unique Technology International Pte Ltd. Method and apparatus for laser surface cleaning
WO2003061861A1 (en) 2002-01-24 2003-07-31 Proanalysis As Laser-based cleaning method and system
WO2009115203A1 (en) * 2008-03-19 2009-09-24 Khs Ag Device and method for creating a flow and/or turbulence in a treatment or cleaning liquid and cleaning machine for cleaning bottles or similar containers with at least one such device
JP2014209595A (en) * 2013-03-28 2014-11-06 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
CN112495943A (en) * 2020-11-12 2021-03-16 厦门华联电子股份有限公司 Automatic focusing method of laser cleaning machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH047071A (en) * 1990-04-24 1992-01-10 Ebara Res Co Ltd Washing method
WO1999030865A1 (en) * 1997-12-16 1999-06-24 Unique Technology International Pte Ltd. Method and apparatus for laser surface cleaning
WO2003061861A1 (en) 2002-01-24 2003-07-31 Proanalysis As Laser-based cleaning method and system
WO2009115203A1 (en) * 2008-03-19 2009-09-24 Khs Ag Device and method for creating a flow and/or turbulence in a treatment or cleaning liquid and cleaning machine for cleaning bottles or similar containers with at least one such device
JP2014209595A (en) * 2013-03-28 2014-11-06 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
CN112495943A (en) * 2020-11-12 2021-03-16 厦门华联电子股份有限公司 Automatic focusing method of laser cleaning machine

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