JPH01284375A - Cfc liquid spraying type in-liquid cleaning device - Google Patents

Cfc liquid spraying type in-liquid cleaning device

Info

Publication number
JPH01284375A
JPH01284375A JP11181588A JP11181588A JPH01284375A JP H01284375 A JPH01284375 A JP H01284375A JP 11181588 A JP11181588 A JP 11181588A JP 11181588 A JP11181588 A JP 11181588A JP H01284375 A JPH01284375 A JP H01284375A
Authority
JP
Japan
Prior art keywords
liquid
cleaning
fluorocarbon
tank
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11181588A
Other languages
Japanese (ja)
Other versions
JPH0446635B2 (en
Inventor
Toshio Horimoto
堀本 利雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OTSUKA GIKEN KOGYO KK
Original Assignee
OTSUKA GIKEN KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OTSUKA GIKEN KOGYO KK filed Critical OTSUKA GIKEN KOGYO KK
Priority to JP11181588A priority Critical patent/JPH01284375A/en
Publication of JPH01284375A publication Critical patent/JPH01284375A/en
Publication of JPH0446635B2 publication Critical patent/JPH0446635B2/ja
Granted legal-status Critical Current

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  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE:To prevent the diffusion of a chlorofluorocarbon(CFC) liquid and to improve cleaning power by immersing a work into the CFC liquid in a cleaning tank and injecting the CFC liquid by injection nozzles to the cleaning part of the work. CONSTITUTION:A setting base 6 on which the work is set is lowered and the entire of the work is immersed into the CFC liquid R of the cleaning tank 3. The respective connecting ports on the rear surface of the setting base 6 and the respective liquid supply ports 21 in the bottom of the tank are connected. A pump for liquid injection is driven and the CFC liquid is supplied through a debris recovering tank to the supply ports 21 from which the liquid is supplied to respective liquid reservoirs. The CFC liquid is sprayed from the respective liquid injection nozzles disposed to the reservoir ports toward the cleaning part opposite to the respective cleaning parts of the work. The CFC liquid injected from the injection nozzles are concentrated without dispersing toward the cleaning part by this constitution, by which the CFC liquid is concentrated to the cleaning parts. The cleaning power is thus improved and the consumption of the CFC liquid is reduced.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 この発明は、例えば半導体や電子fil、或いはダイキ
ャスト部品等のワーク洗浄に利用されるフロン液吹付は
式の液中洗浄装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a submerged cleaning device of the fluorocarbon spray type used for cleaning workpieces such as semiconductors, electronic films, or die-cast parts.

(ロ)従来の技術 従来、上述のワークを洗浄するフロン液洗浄装置として
は、例えば、切削工程に於いてワーク内部やネジ孔等に
固着した切粉や研磨剤等を除去するために、フロン蒸気
を拡散した洗浄室中央部の洗浄位置にワークを供給し、
この洗浄位置側部に配設した噴射ノズルよりワーク内部
やネジ孔等に向けてフロン液を吹付け、このフロン液の
噴流によりワークに固着した切粉等を除去するフロン液
洗浄装置がある。
(B) Conventional technology Conventionally, the above-mentioned fluorocarbon cleaning equipment for cleaning workpieces has been used to remove fluorocarbon chips, abrasives, etc. that have adhered to the inside of the workpiece or screw holes during the cutting process. The workpiece is supplied to the cleaning position in the center of the cleaning chamber where the steam is diffused.
There is a fluorocarbon liquid cleaning device that sprays fluorocarbon liquid toward the inside of a workpiece, a screw hole, etc. from a spray nozzle disposed on the side of the cleaning position, and uses a jet of this fluorocarbon liquid to remove chips and the like stuck to the workpiece.

(ハ)発明が解決しようとする問題点 しかし、上述のフロン液洗浄装置は、洗浄室中央部のフ
ロン蒸気中でワークの洗浄処理を行うので、噴射ノズル
より噴射されるフロン液の一部が洗浄室内に拡散し、ワ
ークの洗浄部分に集中してフロン液を吹付けることが困
難であり、フロン液の噴流による洗浄能力が低下する。
(c) Problems to be Solved by the Invention However, since the above-mentioned fluorocarbon liquid cleaning device performs the cleaning process on the workpiece in the fluorocarbon vapor in the center of the cleaning chamber, a portion of the fluorocarbon liquid injected from the injection nozzle is The fluorocarbons diffuse into the cleaning chamber, making it difficult to spray the fluorocarbon solution concentrated on the cleaning portion of the workpiece, and the cleaning ability of the jet of fluorocarbon solution is reduced.

また、拡散による洗浄能力の低下を袖う為に大量のフロ
ン液を使用しなければならず、洗浄時に於けるフロン液
の消費量及び損失が大きく、コストアップとなる問題点
を有している。
In addition, a large amount of fluorocarbon liquid must be used to prevent the reduction in cleaning performance due to diffusion, which results in large consumption and loss of fluorocarbon liquid during cleaning, resulting in an increase in costs. .

この発明は、フロン液中でワークにフロン液を吹付けて
洗浄処理する特異な構成とすることで、ワークに強固に
固着した切粉や研磨剤等を確実に除去することができ、
しかも、フロン液の消費量及び損失を低減し、効率よく
洗浄処理が行えるフロン液吹付は式液中洗浄装置の提供
を目的とする。
This invention has a unique configuration in which the workpiece is cleaned by spraying the workpiece in a fluorocarbon solution, thereby making it possible to reliably remove chips, abrasives, etc. that are firmly attached to the workpiece.
Furthermore, the present invention aims to provide a submerged cleaning device for spraying a fluorocarbon solution that can reduce consumption and loss of the fluorocarbon solution and perform cleaning processing efficiently.

(ニ)問題点を解決するための手段 この発明のフロン液吹付は式液中洗浄装置は、ワークの
洗浄部分にフロン液を吹付けて洗浄処理するフロン液吹
付は式の洗浄装置であって、上記ワークを浸漬可能とす
る所定量のフロン液を貯留した洗浄槽と、該洗浄槽のフ
ロン液中に浸漬されたワークの洗浄部分に向けてフロン
液を噴射する液噴射ノズルとを備えた構成である。
(d) Means for Solving Problems The fluorocarbon liquid spraying type submerged cleaning device of the present invention is a fluorocarbon liquid spraying type cleaning device that sprays fluorocarbon liquid onto the cleaning portion of a workpiece for cleaning treatment. , comprising a cleaning tank storing a predetermined amount of fluorocarbon solution that allows the workpiece to be immersed, and a liquid injection nozzle that sprays the fluorocarbon solution toward the cleaning portion of the workpiece immersed in the fluorocarbon solution in the cleaning tank. It is the composition.

(ホ)作用 この発明は、洗浄槽に貯留されたフロン液中にワークを
浸漬した後、ワークの孔部やネジ孔等の洗浄部分に向け
て液噴射ノズルから噴射されるフロン液を吹付けること
で、フロン液がワークと切粉等との極微細な隙間に浸透
し、固着面に付着した研磨剤等を脱脂して相互を分離容
易な状態にし、且つ、フロン液の噴流による?J!j撃
及び振動を切粉等に付与・して分離除去し、この分配し
な切粉等をフロン液の噴流に沿ってワーク外部に研出す
る。
(E) Function This invention sprays a fluorocarbon liquid from a liquid injection nozzle toward cleaning parts such as holes and screw holes of the workpiece after immersing the workpiece in a fluorocarbon liquid stored in a cleaning tank. As a result, the fluorocarbon liquid penetrates into the microscopic gaps between the workpiece and chips, degreases the abrasives, etc. adhering to the fixed surface, and makes it easy to separate them from each other. J! Impact and vibration are applied to the chips, etc. to separate them and remove them, and the undistributed chips, etc. are polished out of the workpiece along the jet of fluorocarbon liquid.

(へ)発明の効果 この発明によれば、洗浄槽に貯留されたフロン液中でワ
ークにフロン液を吹付けるので、噴射ノズルより噴射さ
れるフロン液が拡散せず、ワークの孔部やネジ孔等の洗
浄部分に対してフロン液の噴流が集中して当るため、洗
浄時に於けるフロン液の消費量及び損失が極めて少なく
、しかも、ワークに固着した切粉等に対してフロン液の
噴流による衝撃及び振動が作用し、強固に固着しな切粉
や、ネジ孔に残った剥離容易なパリ等をも確実に分離除
去することができ、洗浄能力の向上が図れると共に、効
率のよい洗浄処理が行える。
(F) Effects of the Invention According to this invention, since the fluorocarbon liquid is sprayed onto the workpiece in the fluorocarbon liquid stored in the cleaning tank, the fluorocarbon liquid sprayed from the injection nozzle does not spread, preventing holes and screws in the workpiece. Since the jet of fluorocarbon liquid concentrates on the parts to be cleaned such as holes, consumption and loss of fluorocarbon liquid during cleaning are extremely small, and the jet of fluorocarbon liquid does not hit the parts to be cleaned such as holes, etc. Due to the impact and vibration caused by this, it is possible to reliably separate and remove chips that are not firmly attached and easily peeled off particles remaining in screw holes, improving cleaning ability and ensuring efficient cleaning. Can be processed.

(ト)発明の実施例 この発明の一実施例を以下図面に基づいて詳述する。(g) Examples of the invention An embodiment of the present invention will be described in detail below based on the drawings.

図面はフロン液吹付は式液中洗浄装置を示し、第1図に
於いて、このフロン液吹付は式の液中洗浄装置1は、気
密状態を保持された洗浄室2の内部に上面を開口した洗
浄槽3を配役し、この洗浄槽3には洗浄液としてフロン
液R(R113)を所定量貯留すると共に、ワーク4を
ワーク供給装置司5のセット台6にセットして洗浄槽3
のフロン液R中に浸漬し、このフロン液R中でワーク4
の洗i1部分にフロン液Rを吹付けて洗浄処理する。
The drawing shows a submerged cleaning device 1 that sprays fluorocarbon liquid, and in Fig. 1, this submerged cleaning device 1 that sprays fluorocarbon liquid has its upper surface opened into the inside of a cleaning chamber 2 that is maintained in an airtight state. A predetermined amount of fluorocarbon liquid R (R113) is stored in this cleaning tank 3 as a cleaning liquid, and a workpiece 4 is set on a setting table 6 of a workpiece supply device 5, and the cleaning tank 3 is equipped with a cleaning tank 3.
The workpiece 4 is immersed in the Freon liquid R of
Cleaning treatment is performed by spraying Freon solution R onto the cleaning i1 portion.

上述のワーク供給装置5は、洗浄槽3の内壁面に沿って
鉛直に立設した2本の各ガイド軸7.7にスライダ8を
摺動可能に係合している。
In the above-mentioned work supply device 5, the slider 8 is slidably engaged with each of two guide shafts 7.7 vertically arranged along the inner wall surface of the cleaning tank 3.

上述のスライダ8は、洗浄室2の天井部と洗浄槽3の液
面下壁面とに軸支された各スプロケット9.9間に昇降
用チェーン10を架設し、この昇降用チェーン10の一
端をスライダ8に固定すると共に、天井部のスプロケッ
ト9と同軸上に固定されたスプロケット11と、側部に
固定された駆動モータ12(減3!機付き)のスプロケ
ット13との間に駆動用チェーン14を架設して、この
駆動モータ12の駆動力により昇降用チェーン10を正
逆回動することで、スライダ8に固定されたセット台6
を洗浄槽3のフロン液R中に浸漬するワーク洗浄位置と
、洗浄槽3上部のワークセット位置とに昇降停止する。
The slider 8 described above has an elevating chain 10 installed between each sprocket 9 and 9 which are pivotally supported on the ceiling of the cleaning chamber 2 and the wall below the liquid level of the cleaning tank 3, and one end of the elevating chain 10 is A drive chain 14 is connected between a sprocket 11 fixed to the slider 8 and coaxially with the sprocket 9 on the ceiling, and a sprocket 13 of a drive motor 12 (with 3 motors) fixed to the side. The set table 6 fixed to the slider 8 can be moved by rotating the lifting chain 10 in the forward and reverse directions using the driving force of the drive motor 12.
It moves up and down to a workpiece cleaning position where it is immersed in the fluorocarbon solution R in the cleaning tank 3, and to a workpiece set position above the cleaning tank 3.

上述のスライダ8上部には、蓋体15を各ガイド軸7,
7上に摺動可能に係合し、この蓋体15は洗浄槽3上部
に立設したエアシリンダ16により、洗浄H!3上面の
1m0部に嵌合する下限密閉位置と、スライダ8の昇降
を許容する上限開放位置とに昇降停止する。
A cover body 15 is attached to the upper part of the slider 8 mentioned above, and each guide shaft 7,
The lid body 15 is slidably engaged on the top of the cleaning tank 3, and the lid body 15 is operated by an air cylinder 16 installed above the cleaning tank 3 to perform the cleaning H! The slider 8 moves up and down to a lower limit sealed position that fits into the 1m0 section of the upper surface of the slider 8, and an upper limit open position that allows the slider 8 to move up and down.

前述のセット台6は、スライダ8の正面側下部に軸支さ
れたテーブル17上に固定し、このテーブル17の上端
部に枢着された振動用エアシリンダ18により水平に保
持している。
The aforementioned set table 6 is fixed on a table 17 that is pivotally supported at the lower front side of the slider 8, and is held horizontally by a vibrating air cylinder 18 that is pivotally attached to the upper end of the table 17.

上述のセット台6には、第2図及び第3図にも示すよう
に、ワーク4(図中仮想線で示す)を」二面定位置にセ
ントすると共に、このワーク4の各面に対応してセット
台6上に固定しな各液溜り部19・・・に、ワーク4の
各面に向けて各液噴射ノズル20・・・を夫々配設して
いる。
As shown in FIGS. 2 and 3, on the above-mentioned setting table 6, the workpiece 4 (indicated by the imaginary line in the figure) is placed in a fixed position on two sides, and the workpiece 4 is placed in a fixed position on each side. Each liquid injection nozzle 20 is disposed in each liquid reservoir 19 fixed on the set table 6 so as to face each surface of the workpiece 4.

との各液噴射ノズル20・・・は、ワーク4の各面に開
口された孔部やネジ孔4a等の各洗浄部分の位置及び数
に対応して配設され、且つ、第5図のイに示すように、
各洗浄部分にノズル先端部を所定間隔に近接すると共に
、各洗浄部分の中心部に向けて噴射方向を設定している
The liquid jet nozzles 20 are arranged corresponding to the positions and numbers of cleaning parts such as holes and screw holes 4a opened on each surface of the workpiece 4, and are arranged in accordance with the positions and numbers of cleaning parts such as holes and screw holes 4a opened on each surface of the workpiece 4, and as shown in FIG. As shown in A,
The nozzle tip is placed close to each cleaning portion at a predetermined interval, and the spray direction is set toward the center of each cleaning portion.

上述の各液噴射ノズル20・・・は、洗浄槽3のワーク
洗浄位置にセット台6を降下することで、槽底部に立設
した各液供給ボート21・・・と、セット台6下面に各
液溜り部19・・・と連通して開口された各接続ボート
22・・・とが嵌合して接続される。
By lowering the set table 6 to the workpiece cleaning position of the cleaning tank 3, each of the above-mentioned liquid injection nozzles 20... is connected to each liquid supply boat 21 installed at the bottom of the tank and the lower surface of the set table 6. Each connection boat 22, which is opened in communication with each liquid reservoir 19, is fitted and connected.

前述の洗浄槽3の背部には、槽底部にヒータ23を配設
した蒸溜槽24を配設しており、この蒸溜槽24はヒー
タ23で貯留したフロン液Rを加熱して発生するフロン
蒸気を、洗浄槽3に貯留されたフロン液Rと、このフロ
ン液R上部の周壁に配設した冷却ジャゲット25とで形
成される蒸気槽26に供給する。
A distillation tank 24 with a heater 23 installed at the bottom of the tank is installed at the back of the cleaning tank 3 described above. is supplied to a steam tank 26 formed by the fluorocarbon liquid R stored in the cleaning tank 3 and a cooling jacket 25 disposed on the peripheral wall above the fluorocarbon liquid R.

前述の洗浄槽3fF1部には、第4図に示すように、切
粉等を回収するための切粉回収槽27を配設しており、
この切粉回収槽27と洗浄槽3との底部は切粉回収路2
8で連通して接続され、この切粉回収路28及び洗浄槽
3の底部には、切粉回収槽27側に向けて各切粉回収ノ
ズル29・・・を複数列配設している。
As shown in FIG. 4, the above-mentioned cleaning tank 3fF1 section is provided with a chip collection tank 27 for collecting chips, etc.
The bottoms of the chip collection tank 27 and the cleaning tank 3 are connected to the chip collection path 2.
8, and a plurality of rows of chip collection nozzles 29 are arranged at the bottom of the chip collection path 28 and the cleaning tank 3 toward the chip collection tank 27 side.

上述の切粉回収WI27は、筒状に形成されたフィルタ
30を槽内部に収納し、この切粉回収4!27に貯留さ
れるフロン液R上部の周壁には冷却ジャケット31を配
設すると共に、槽上面の開口部には菅体32を嵌合して
密閉している。
The above-mentioned chip collection WI27 houses a cylindrical filter 30 inside the tank, and a cooling jacket 31 is arranged on the peripheral wall above the fluorocarbon liquid R stored in the chip collection 4!27. A tube body 32 is fitted into the opening on the upper surface of the tank to seal it.

この切粉回収槽27に貯留されたフロンiRは、栖側部
にバルブ33を介して接続された循環路34を液噴射用
ポンプ35の吸入側に接続し、この液噴射用ポンプ35
の吐出側にはバルブ36を介してフィルタ37を接続す
ると共に、このフィルタ37にバルブ38を介して接続
された循環路39を、噴射切換ユニット40の各バルブ
41,42.43・・・を介して前述の各液供給ボート
21・・・に夫々接続している。
The fluorocarbon iR stored in this chip collection tank 27 is collected by connecting a circulation path 34 connected to the chamber side via a valve 33 to the suction side of a liquid injection pump 35.
A filter 37 is connected to the discharge side of the filter 37 via a valve 36, and a circulation path 39 connected to the filter 37 via a valve 38 is connected to each valve 41, 42, 43, etc. of the injection switching unit 40. The above-mentioned liquid supply boats 21 are respectively connected to each other via the above-mentioned liquid supply boats 21.

一方、上述の槽側部にバルブ44を介して接続された循
環路45は循環用ポンプ46の吸入側に接続し、この循
環用ポンプ46の吐出側には循環するフロン液Rを20
℃以下、望ましくは10〜15℃に保持するためにバル
ブ47を介して熱交換器48を接続すると共に、この熱
交換器48に接続された循環路49を複数本に分岐して
前述の各切粉回収ノズル29・・・に夫々接続している
On the other hand, the circulation path 45 connected to the tank side via the valve 44 is connected to the suction side of a circulation pump 46, and the circulating fluorocarbon liquid R is supplied to the discharge side of the circulation pump 46 at a rate of 20%.
A heat exchanger 48 is connected via a valve 47 to maintain the temperature below 10°C, preferably 10 to 15°C, and a circulation path 49 connected to this heat exchanger 48 is branched into a plurality of lines to maintain the temperature at 10 to 15°C. They are connected to the chip collection nozzles 29, respectively.

前述の蒸溜槽24の上部には、フロン蒸気を例えば12
〜0℃に冷却する冷却コイル50を前述の冷却ジャケッ
ト25の側部位置に配置している。
In the upper part of the above-mentioned distillation tank 24, for example, 12% of fluorocarbon vapor is added.
A cooling coil 50 for cooling to ~0° C. is disposed on the side of the cooling jacket 25 described above.

上述の各冷却ジャケット25.31及び冷却コイル50
は後述する冷凍機51の蒸発器52により構成されるが
、コイル表面温度を約12〜0゛Cに保持する装置であ
れば、冷凍機51に代えてチラー(冷水発生装置)を用
いてもよい。
Each cooling jacket 25, 31 and cooling coil 50 described above
is composed of an evaporator 52 of a refrigerator 51, which will be described later, but a chiller (chilled water generator) may be used instead of the refrigerator 51 as long as the coil surface temperature is maintained at approximately 12 to 0°C. good.

この冷凍機51は、冷奴にフロンR−11,R−12、
R−22等を用い、この冷凍機51は圧’1m tR5
3の吐出側に凝縮器54と、受液器55と、液電磁弁5
6と、膨張R構としての膨張弁57とを介して前述の蒸
発器52を接続し、この蒸発器52の後位をアキューム
レータ58を介して圧縮機53の吸引側に接続した冷凍
サイクルである。
This refrigerator 51 uses Freon R-11 and R-12 for cold tofu.
Using R-22 etc., this refrigerator 51 has a pressure of '1m tR5
A condenser 54, a liquid receiver 55, and a liquid solenoid valve 5 are installed on the discharge side of 3.
6 and the aforementioned evaporator 52 are connected through an expansion valve 57 as an expansion R mechanism, and the rear part of the evaporator 52 is connected to the suction side of a compressor 53 through an accumulator 58. .

前述の冷却コイル50で冷却されたフロン液Rは、コイ
ル下部の滴下槽59に滴下され、この滴下槽59底部に
はバルブ60を介して循環路61を接続し、この循環路
61は水分離槽62に接続している。
The fluorocarbon liquid R cooled by the cooling coil 50 mentioned above is dripped into a dripping tank 59 at the bottom of the coil, and a circulation path 61 is connected to the bottom of this dripping tank 59 via a valve 60, and this circulation path 61 is used for water separation. It is connected to the tank 62.

この水分離Wt62に供給されるフロン液Rは、フロン
液Rよりも比重の軽い水分が槽上部に浮上し、槽側部に
バルブ63を介して接続された排液路64より定期的に
排出され、槽底部に溜まったフロン液Rはオーバーフロ
ーして一旦予fiIff165に貯留された後、フロン
液Rの一部は槽側部に接続された循環路66を介して洗
浄槽3に戻され、この洗浄槽3のフロン液Rはオーバー
フローして蒸溜槽24に供給される。
In the fluorocarbon liquid R supplied to the water separation Wt62, water having a specific gravity lower than that of the fluorocarbon liquid R floats to the top of the tank and is periodically discharged from the drain passage 64 connected to the side of the tank via a valve 63. The fluorocarbon liquid R accumulated at the bottom of the tank overflows and is temporarily stored in the fiIff 165, and then a part of the fluorocarbon liquid R is returned to the cleaning tank 3 via the circulation path 66 connected to the side of the tank. The fluorocarbon liquid R in the cleaning tank 3 overflows and is supplied to the distillation tank 24.

また、フ17ン液Rの一部は予(iI槽65底部にバル
ブ67を介して接続された循環路68を循環用ポンプ6
9の吸入側に接続し、この循環用ポンプ69の吐出側に
はバルブ70を介して循環路71を接続すると共に、こ
の循環路71はバルブ72を介して蒸気槽26の蒸気洗
浄位置に配設した各仕上洗浄用ノズル73・・・に夫々
接続している。
In addition, a part of the liquid R in the air tank 17 is preliminarily pumped through a circulation path 68 connected to the bottom of the II tank 65 via a valve 67.
A circulation path 71 is connected to the discharge side of the circulation pump 69 via a valve 70, and this circulation path 71 is connected to the steam cleaning position of the steam tank 26 via a valve 72. It is connected to each finishing cleaning nozzle 73 . . . provided therein.

図示実施例は上記の如く構成するものとして以下作用動
作を説明する。
The operation of the illustrated embodiment will be described below assuming that it is constructed as described above.

先ず、洗浄槽3上部のワークセット位置に停止したセッ
ト台6にワーク4をセットした後、ワーク供給装置5を
駆動してセット台6を降下させ、洗浄槽3のフロン液R
中にワーク4全体を浸漬し、同時に、セット台6上面の
各接続ボート22・・・と槽底部の各液供給ボート21
・・・とを嵌合して接続する。
First, the workpiece 4 is set on the setting table 6 that is stopped at the workpiece setting position above the cleaning tank 3, and then the workpiece feeding device 5 is driven to lower the setting table 6, and the fluorocarbon liquid R in the cleaning tank 3 is removed.
The entire workpiece 4 is immersed in the tank, and at the same time each connection boat 22 on the top of the set table 6 and each liquid supply boat 21 on the bottom of the tank are immersed.
...and connect by fitting.

次に、液噴射用ボンダ35を駆動して切粉回収槽27よ
り吸出したフロン?&Rを、噴射切換ユニット40及び
循環路39を介して各液供給ボート21・・・に供給し
、セット台6の各液溜り部19・・・にフロン液Rを圧
入する。
Next, the liquid injection bonder 35 is driven to suck out the fluorocarbon from the chip collection tank 27. &R is supplied to each liquid supply boat 21 .

この各液溜り部に19・・・に供給されるフロン液Rは
、ワーク4の各洗浄部分に対向して配設した各液噴射ノ
ズル20・・・より噴出し、セット台6上のワーク4の
各洗浄部分に向けて吹付けられる。
The fluorocarbon liquid R supplied to each of the liquid reservoirs 19... is jetted from each liquid injection nozzle 20... arranged opposite to each cleaning portion of the workpiece 4, and It is sprayed towards each cleaning area of 4.

即ち、第5図のイに示すように、例えばワーク4のネジ
孔4aに向けてフロン液Rを吹付けることで、表面張力
の小さいフロン液Rがワーク4のネジ孔4aと切粉等と
の極微細な隙間に浸透し、固着面に付着した研磨剤等を
脱詣して相互を分だ容易な状態にし、且つ、フロン液R
の比重を利用して、フロン液Rの噴流による衝撃及び振
動を切粉等に付与するので、強固に固着した切粉等も簡
単に分離除去することができる。
That is, as shown in FIG. 5A, for example, by spraying the fluorocarbon liquid R toward the screw hole 4a of the workpiece 4, the fluorocarbon liquid R with a small surface tension will interact with the screw hole 4a of the workpiece 4 and chips, etc. Fluorocarbon liquid R penetrates into the ultra-fine gaps and removes abrasives etc. attached to the fixed surface, making it easy to separate from each other.
Since the impact and vibration caused by the jet of the fluorocarbon liquid R are applied to the chips by using the specific gravity of the fluorocarbon liquid R, even the chips and the like that are firmly stuck can be easily separated and removed.

また、ネジ孔4aに残った剥離容易なパリ等をもフロン
液Rの噴流により分離除去され、口に示すように、この
分離除去された切粉やパリ等はフロン液Rの噴流に沿っ
てネジ孔4aの外部より排出される。
In addition, easily peelable debris remaining in the screw hole 4a is separated and removed by the jet of fluorocarbon liquid R, and as shown in the figure, the separated and removed chips, debris, etc. are carried along the jet of fluorocarbon liquid R. It is discharged from the outside of the screw hole 4a.

次に、噴射切換ユニット40の切換動作により、ワーク
4の各面と対応する位置の各液噴射ノズル20・・・に
フロン液Rを順次切換供給して、ワ〜り4の各血筋に洗
浄処理を行う。
Next, by the switching operation of the injection switching unit 40, the Freon liquid R is sequentially switched and supplied to each liquid injection nozzle 20 at a position corresponding to each surface of the workpiece 4 to clean each blood line of the workpiece 4. Perform processing.

なお、ハに示すように、ワーク4のネジ孔4aと、液噴
射ノズル20の噴射位置とが若干位置すれしていても、
ネジ孔4a内部に向けてフロン液Rが吹付けられる状態
であれば、液噴射ノズル20より噴射されるフロン液R
の噴流は、ネジ孔4aを一方向に流動して固着した切粉
等を分離除去することができる。
Note that even if the screw hole 4a of the workpiece 4 and the injection position of the liquid injection nozzle 20 are slightly misaligned as shown in C,
If the fluorocarbon liquid R is sprayed toward the inside of the screw hole 4a, the fluorocarbon liquid R is injected from the liquid injection nozzle 20.
The jet flow can flow through the screw hole 4a in one direction to separate and remove stuck chips and the like.

液中での洗浄処理後は、ワーク供給装置5を駆動してセ
ット台6を上昇させつつ、セット台6にセットされたワ
ーク4を蒸気槽26に供給されるフロン蒸気中を通過さ
せて蒸気洗浄すると共に、仕上洗浄用ノズル73.73
より噴射されるフロン液Rの噴流により、ワーク4外面
に付着した切粉等を洗い落とす。
After the cleaning process in the liquid, the workpiece feeding device 5 is driven to raise the setting table 6, and the workpiece 4 set on the setting table 6 is passed through the fluorocarbon vapor supplied to the steam tank 26 to be steamed. Along with cleaning, finish cleaning nozzle 73.73
A jet of the fluorocarbon liquid R is sprayed to wash away chips and the like adhering to the outer surface of the workpiece 4.

次に、セット台6を洗浄槽3上部のワークセット位置に
停止後、振動用エアシリンダ18を駆動してセット台6
を振動させ、ワーク4やセット台6に付着したフロン液
Rを洗浄柳3に振い落とし、ワーク4は次工程へ供給す
る。
Next, after stopping the setting table 6 at the work setting position above the cleaning tank 3, the vibration air cylinder 18 is driven to
is vibrated to shake off the fluorocarbon solution R adhering to the workpiece 4 and the setting table 6 onto the cleaning willow 3, and the workpiece 4 is supplied to the next process.

このようにフロン液R中でワーク4の洗浄処理を行うの
で、各液噴射ノズル20・・・より噴射されるフロン液
Rが拡散せず、ワーク4のネジ孔4a等の洗浄部分に対
してフロン液Rの噴流が集中して当るなめ、洗浄時に於
けるフロン液Rの消:f!量及び損失が極めて少なく、
しかも、ワーク4に固着した切粉等に対してフロン液R
の噴流による衝撃及び振動が作用し、強固に固着した切
粉やネジ孔に残ったパリ等をも確実に分離除去すること
ができ、効率のよい洗浄処理が行える。
Since the workpiece 4 is cleaned in the fluorocarbon liquid R in this way, the fluorocarbon liquid R sprayed from each liquid injection nozzle 20 does not spread and is not applied to the cleaning parts such as the screw holes 4a of the workpiece 4. The jet stream of Freon liquid R concentrates on it, and the Freon liquid R disappears during cleaning: f! The amount and loss are extremely small.
Furthermore, the fluorocarbon liquid R
The impact and vibration caused by the jet flow can reliably separate and remove firmly adhered chips and debris remaining in the screw holes, resulting in efficient cleaning.

なお、この発明は、上述の実施例の構成のみに限定され
るものではない。
Note that the present invention is not limited to the configuration of the above-described embodiment.

例えば、洗浄槽3のフロン液R中に配設した液噴射ノズ
ル20の噴射位置と対向するワーク洗浄位置に、洗浄す
るワーク4を一旦停止又は移動させながらフロン液Rを
順次吹付けて洗浄処理を行うもよい。
For example, while temporarily stopping or moving the workpiece 4 to be cleaned, the fluorocarbon liquid R is sequentially sprayed to the workpiece cleaning position opposite to the injection position of the liquid injection nozzle 20 disposed in the fluorocarbon liquid R in the cleaning tank 3, and the cleaning process is performed. You may also do this.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はこの発明の一実施例を示し、 第1図はフロン液吹付は式液中洗浄装置の縦断側面図、 第2図は液中洗浄装置の系統図、 第3図はセット台の拡大平面図、 第4図は第3図に示すセット台の縦断側面図、第5図の
イ〜ハはワークの洗δ説明図である。 R・・・フロン液   1・・・液中洗浄装置2・・・
洗浄室    3・・・洗浄槽4・・・ワーク    
4a・・・ネジ孔5・・・ワーク供給装置6・・・セン
ト台20・・・液噴射ノズル21・・・液供給ポート2
2・・・接続ボート R・フロン液              第1 医1
 ・液中所霧ト毛冨 2・・セ宜 力  2b 白    n αトq( DU−(N へ(ト)(へ)
The drawings show an embodiment of the present invention. Fig. 1 is a longitudinal cross-sectional side view of a submerged cleaning device for spraying fluorocarbon liquid, Fig. 2 is a system diagram of the submerged cleaning device, and Fig. 3 is an enlarged plan view of the set table. FIG. 4 is a longitudinal sectional side view of the setting table shown in FIG. 3, and FIG. R... Freon liquid 1... Submerged cleaning device 2...
Cleaning room 3...Cleaning tank 4...Work
4a...Screw hole 5...Work supply device 6...Scent stand 20...Liquid injection nozzle 21...Liquid supply port 2
2...Connection boat R/Freon liquid 1st doctor 1
・Liquid Sokori Kirito Keto 2...Seikiriki 2b White n αtoq (DU-(N へ(ト)(へ)

Claims (1)

【特許請求の範囲】[Claims] (1)ワークの洗浄部分にフロン液を吹付けて洗浄処理
するフロン液吹付け式の洗浄装置で あつて、 上記ワークを浸漬可能とする所定量のフロ ン液を貯留した洗浄槽と、 該洗浄槽のフロン液中に浸漬されたワーク の洗浄部分に向けてフロン液を噴射する液 噴射ノズルとを備えた フロン液吹付け式液中洗浄装置。
(1) A fluorocarbon spray type cleaning device that sprays a fluorocarbon solution onto the cleaning portion of a workpiece for cleaning, comprising: a cleaning tank storing a predetermined amount of fluorocarbon solution in which the workpiece can be immersed; and the cleaning device. A fluorocarbon liquid spray type submerged cleaning device equipped with a liquid injection nozzle that sprays fluorocarbon liquid toward a cleaning part of a workpiece immersed in a fluorocarbon liquid in a tank.
JP11181588A 1988-05-09 1988-05-09 Cfc liquid spraying type in-liquid cleaning device Granted JPH01284375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11181588A JPH01284375A (en) 1988-05-09 1988-05-09 Cfc liquid spraying type in-liquid cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11181588A JPH01284375A (en) 1988-05-09 1988-05-09 Cfc liquid spraying type in-liquid cleaning device

Publications (2)

Publication Number Publication Date
JPH01284375A true JPH01284375A (en) 1989-11-15
JPH0446635B2 JPH0446635B2 (en) 1992-07-30

Family

ID=14570851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11181588A Granted JPH01284375A (en) 1988-05-09 1988-05-09 Cfc liquid spraying type in-liquid cleaning device

Country Status (1)

Country Link
JP (1) JPH01284375A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023177801A (en) * 2022-06-03 2023-12-14 ジャパン・フィールド株式会社 Decompression cleaning device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023177801A (en) * 2022-06-03 2023-12-14 ジャパン・フィールド株式会社 Decompression cleaning device

Also Published As

Publication number Publication date
JPH0446635B2 (en) 1992-07-30

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