JPH01279894A - Novel cephem compound and production thereof - Google Patents
Novel cephem compound and production thereofInfo
- Publication number
- JPH01279894A JPH01279894A JP25057288A JP25057288A JPH01279894A JP H01279894 A JPH01279894 A JP H01279894A JP 25057288 A JP25057288 A JP 25057288A JP 25057288 A JP25057288 A JP 25057288A JP H01279894 A JPH01279894 A JP H01279894A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- alkyl group
- group
- salt
- amino group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 cephem compound Chemical class 0.000 title claims abstract description 63
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000003839 salts Chemical class 0.000 claims abstract description 32
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 30
- 125000003277 amino group Chemical group 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 16
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 6
- 238000000926 separation method Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 31
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 abstract description 8
- 241000894006 Bacteria Species 0.000 abstract description 4
- 239000003242 anti bacterial agent Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- HQOQSFITXGQQDM-SSDOTTSWSA-N methyl (6R)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound COC(=O)C1=CCS[C@@H]2CC(=O)N12 HQOQSFITXGQQDM-SSDOTTSWSA-N 0.000 abstract 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 125000005907 alkyl ester group Chemical group 0.000 description 5
- 230000000844 anti-bacterial effect Effects 0.000 description 5
- 150000002148 esters Chemical group 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229920001817 Agar Polymers 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 4
- 125000002252 acyl group Chemical group 0.000 description 4
- 239000008272 agar Substances 0.000 description 4
- 239000003638 chemical reducing agent Substances 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000010531 catalytic reduction reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000003814 drug Substances 0.000 description 3
- 229940079593 drug Drugs 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical class CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 3
- SYLOETQSLYHKPY-UHFFFAOYSA-N 2-methyl-3,4-dihydropyrazol-5-amine Chemical compound CN1CCC(N)=N1 SYLOETQSLYHKPY-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical class CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- HQKMJHAJHXVSDF-UHFFFAOYSA-L magnesium stearate Chemical compound [Mg+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O HQKMJHAJHXVSDF-UHFFFAOYSA-L 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000000825 pharmaceutical preparation Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000006188 syrup Substances 0.000 description 2
- 235000020357 syrup Nutrition 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- AMOYMEBHYUTMKJ-UHFFFAOYSA-N 2-(2-phenylethoxy)ethylbenzene Chemical compound C=1C=CC=CC=1CCOCCC1=CC=CC=C1 AMOYMEBHYUTMKJ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- GUBGYTABKSRVRQ-XLOQQCSPSA-N Alpha-Lactose Chemical compound O[C@@H]1[C@@H](O)[C@@H](O)[C@@H](CO)O[C@H]1O[C@@H]1[C@@H](CO)O[C@H](O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-XLOQQCSPSA-N 0.000 description 1
- 208000035143 Bacterial infection Diseases 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- 229920002261 Corn starch Polymers 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical class C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
- GUBGYTABKSRVRQ-QKKXKWKRSA-N Lactose Natural products OC[C@H]1O[C@@H](O[C@H]2[C@H](O)[C@@H](O)C(O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@H]1O GUBGYTABKSRVRQ-QKKXKWKRSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 235000019483 Peanut oil Nutrition 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000005236 alkanoylamino group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000006242 amine protecting group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940024606 amino acid Drugs 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001484 arginines Chemical class 0.000 description 1
- 125000003435 aroyl group Chemical group 0.000 description 1
- 150000007860 aryl ester derivatives Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 229940009098 aspartate Drugs 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 208000022362 bacterial infectious disease Diseases 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Inorganic materials [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 1
- HKNWKTRXBJXGMT-UHFFFAOYSA-N barium palladium Chemical compound [Pd].[Ba] HKNWKTRXBJXGMT-UHFFFAOYSA-N 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Inorganic materials [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000000649 benzylidene group Chemical group [H]C(=[*])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000002668 chloroacetyl group Chemical group ClCC(=O)* 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229940110456 cocoa butter Drugs 0.000 description 1
- 235000019868 cocoa butter Nutrition 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000008120 corn starch Substances 0.000 description 1
- 229940099112 cornstarch Drugs 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 125000004989 dicarbonyl group Chemical group 0.000 description 1
- 238000003113 dilution method Methods 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229930195712 glutamate Natural products 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005935 hexyloxycarbonyl group Chemical group 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000000338 in vitro Methods 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000008101 lactose Substances 0.000 description 1
- 235000015122 lemonade Nutrition 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 235000019359 magnesium stearate Nutrition 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 125000005905 mesyloxy group Chemical group 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XONPDZSGENTBNJ-UHFFFAOYSA-N molecular hydrogen;sodium Chemical compound [Na].[H][H] XONPDZSGENTBNJ-UHFFFAOYSA-N 0.000 description 1
- ACTNHJDHMQSOGL-UHFFFAOYSA-N n',n'-dibenzylethane-1,2-diamine Chemical class C=1C=CC=CC=1CN(CCN)CC1=CC=CC=C1 ACTNHJDHMQSOGL-UHFFFAOYSA-N 0.000 description 1
- 125000001038 naphthoyl group Chemical group C1(=CC=CC2=CC=CC=C12)C(=O)* 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000004006 olive oil Substances 0.000 description 1
- 235000008390 olive oil Nutrition 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- JQPTYAILLJKUCY-UHFFFAOYSA-N palladium(ii) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 description 1
- 238000007911 parenteral administration Methods 0.000 description 1
- 230000001717 pathogenic effect Effects 0.000 description 1
- 239000000312 peanut oil Substances 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000008363 phosphate buffer Substances 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- OCDPVICYFFZSFE-UHFFFAOYSA-N prop-1-enoxybenzene Chemical group CC=COC1=CC=CC=C1 OCDPVICYFFZSFE-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 150000003892 tartrate salts Chemical class 0.000 description 1
- RUPAXCPQAAOIPB-UHFFFAOYSA-N tert-butyl formate Chemical group CC(C)(C)OC=O RUPAXCPQAAOIPB-UHFFFAOYSA-N 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- 238000011200 topical administration Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野]
この発明の下記一般式(I)で示きれるセフェム化合物
およびその塩は抗菌活性を有し、医薬として有用である
。DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Fields" The cephem compounds of the present invention represented by the following general formula (I) and salts thereof have antibacterial activity and are useful as medicines.
1従来の技術」
セフェム化合物は数多く知られているが、この発明の下
記一般式(1)で示されるセフェム化合物は知られてい
ない。1. Prior Art Although many cephem compounds are known, the cephem compound represented by the following general formula (1) of the present invention is not known.
「発明が解決しようとする問題点」
抗菌作用を有し、医薬として有用なセフェム化合物は数
多く知られているが、この発明はさらに優れた医薬品の
開発を意図してなきれたものである。"Problems to be Solved by the Invention" Many cephem compounds that have antibacterial effects and are useful as medicines are known, but this invention was developed with the intention of developing even better medicines.
r問題点を解決するための手段」 この発明は新規セフェム化合物およびその塩に関する。``Means for solving problems'' This invention relates to novel cephem compounds and salts thereof.
更に詳しくは、この発明は、抗菌活性を有する新規セフ
ェム化合物およびその塩およびそれらの製造法に関する
。More specifically, the present invention relates to novel cephem compounds and salts thereof having antibacterial activity and methods for producing them.
目的とするセフェム化合物は新規であり、下記一般式(
1)で示すことができる。The target cephem compound is new and has the following general formula (
1).
[式中、R1はアミノ基または保護されたアミン基、
R2は低級アルキル基、カルボキシ(低級)アルキル基
または保護されたカルボキシ(低級)アルキル基、
R3は低級アルキル基、
R4は水素、アミン基または保護きれたアミン基、
ZはNまたはCHを意味するコ。[In the formula, R1 is an amino group or a protected amine group, R2 is a lower alkyl group, a carboxy(lower) alkyl group, or a protected carboxy(lower) alkyl group, R3 is a lower alkyl group, R4 is hydrogen or an amine group or a protected amine group, Z means N or CH.
目的化合物(I)については下記の点を指摘しておく。Regarding the target compound (I), the following points should be pointed out.
すなわち、目的化合物(I)にはシン異性体、アンチ異
性体およびそれらの混合物が含まれる。シン異性体とは
下記式:
(式中、R1、R2およびZはそれぞれ前と同じ意味)
で示される部分構造を有する一つの幾何異性体を意味し
、アンチ異性体とは下記式:(式中、R1、R2および
Zはそれぞれ前と同じ意味)で示きれる部分構造を有す
る別の幾何異性体を意味し、そのような幾何異性体およ
びそれらの混合物はすべてこの発明の範囲内に包含され
る。That is, the target compound (I) includes a syn isomer, an anti isomer, and a mixture thereof. The syn isomer has the following formula: (wherein R1, R2 and Z each have the same meaning as before)
An anti-isomer means one geometric isomer having a partial structure represented by the following formula: (wherein R1, R2 and Z each have the same meanings as before) Isomers are meant, and all such geometric isomers and mixtures thereof are included within the scope of this invention.
この明細書においては、これらの幾何異性体およびそれ
らの混合物の部分構造は便宜上下記式:(式中、R1、
R2およびZはそれぞれ前と同じ意味)で示すことにす
る。In this specification, the partial structures of these geometric isomers and mixtures thereof are conveniently expressed by the following formula: (wherein R1,
R2 and Z each have the same meaning as before).
この発明のセフェム化合物(1)は下記反応式で示され
る製造法によって製造することができる。The cephem compound (1) of the present invention can be produced by the production method shown by the following reaction formula.
製is組上
またはその塩
(I[[)
またはその塩
またはその塩
製造法2
(Ia)
またはその塩
(Ib)
またはその塩
(式中、R1、R2、R3、R4およびzはそれぞれ前
と同じ意味であり、
Yは脱離基、
R1は保護されたアミン基を意味する)。or a salt thereof (I[[) or a salt thereof or a salt thereof manufacturing method 2 (Ia) or a salt thereof (Ib) or a salt thereof (wherein R1, R2, R3, R4 and z are respectively the preceding and have the same meaning, Y means a leaving group, and R1 means a protected amine group).
この明細書の以上および以下の記載における種々の定義
の好適な例を以下詳細に説明する。Preferred examples of the various definitions in the above and below descriptions of this specification will be explained in detail below.
「低級、とは、特に指示がなければ、炭素原子1個ない
し6個を意味するものとする。"Lower shall mean 1 to 6 carbon atoms, unless otherwise specified.
「保護きれたアミ7基、の好適な「保護基」としては、
後述のアシル基、例えばベンジリデン、ヒドロキシベン
ジリデン等の置換きれたまたは非置換アル(低級)アル
キリデン基、例えばベンジル、フェネチル、ベンズヒド
リル、トリチル等のモノまたはジまたはトリフェニル(
低級)アルキル基のようなアル(低級)アルキル基等が
挙げられる。A suitable "protecting group" for "unprotected amine 7 group" is
Acyl groups mentioned below, such as substituted or unsubstituted alkylidene groups such as benzylidene and hydroxybenzylidene, mono- or di- or triphenyl groups such as benzyl, phenethyl, benzhydryl, trityl, etc.
(lower) alkyl groups such as lower) alkyl groups, and the like.
好適な1アシル基」としては、例えばホルミル、アセチ
ル、プロピオニル、ヘキサノイル、ピバロイル停の低級
アルカノイル基、例えばクロロアセチル、トリフルオロ
アセチル等のモノ(またはジまたはトリ)ハロ(低級)
アルカノイル基、例えばメトキシカルボニル
三級ブトキシカルボニル、第三級ペンチル才キシカルボ
ニル、ヘキシルオキシカルボニル等の低級アルコキシカ
ルボニル基、カルバモイル基、例えばベンゾイル、トル
オイル、ナフトイル等のアロイル基、例えばフェニルア
セチル、フェニルプロピオニル等のアル(低級)アルカ
ノイル基、例えばフェノキシカルボニル
ル
フェノキシアセチル、フェノキシプロピ才二ル等のアリ
ールオキシ(低級)アルカノイル基、例えばフェニルグ
リオキシロイル、ナフチルグリオキシロイル等のアリー
ルグリオキシロイル基、例えばベンジルオキシカルボニ
ル、フェネチルオキシカルボニル、p−ニトロベンジル
オキシカルボニル等の適当な置換基を有していてもよい
アル(低級)アルフキジカルボニル基等が挙げられる。Suitable mono-acyl groups include, for example, formyl, acetyl, propionyl, hexanoyl, pivaloyl-terminated lower alkanoyl groups, such as mono(or di- or tri)halo(lower) such as chloroacetyl, trifluoroacetyl, etc.
Alkanoyl groups, such as methoxycarbonyl, lower alkoxycarbonyl groups such as tertiary butoxycarbonyl, tertiary pentyloxycarbonyl, hexyloxycarbonyl, carbamoyl groups, such as aroyl groups such as benzoyl, toluoyl, naphthoyl, etc., such as phenylacetyl, phenylpropionyl, etc. an aryloxy(lower)alkanoyl group such as phenoxycarbonyllphenoxyacetyl, phenoxypropylene, arylglyoxyloyl group such as phenylglyoxyloyl, naphthylglyoxyloyl, e.g. benzyl Examples thereof include al (lower) alkyl dicarbonyl groups which may have appropriate substituents such as oxycarbonyl, phenethyloxycarbonyl, and p-nitrobenzyloxycarbonyl.
好適な低級アルキル基ならびにrカルボキシ(低級)ア
ルキル基」および「保護されたカルボキシ(低級)アル
キル基」の好適な「低級アルキル部分,としては、メチ
ル、エチル、プロピル、イソプロピル、ブチル、イソブ
チル、第三級ブチル、ペンチル、ヘキシル等のような直
鎖または分枝鎖アルキル基が挙げられる。Suitable lower alkyl groups and lower alkyl moieties of rcarboxy(lower)alkyl groups and protected carboxy(lower)alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, Mention may be made of straight or branched alkyl groups such as tertiary butyl, pentyl, hexyl and the like.
「保護されたカルボキシ(低級)アルキル基」の好適な
1保護されたカルボキシ部分」としては、エステル化さ
れたカルボキシ基等が挙げられ、前記エステル化された
カルボキシ基のエステル部分の具体例としては、適当な
置換基を有していてもよい例えばメチルエステル、エチ
ルエステル、プロピルエステル、イソプロピルエステル
、ブチルエステル、イソブチルエステル、第三級ブチル
エステル、ペンチルエステル、ヘキシルエステル等の低
級アルキルエステル、その例として、例えばアセトキシ
メチルエステル、プロピオニルオキシメチルエステル、
ブチリルオキシメチルエステル、バレリルオキシメチル
エステル、ピバロイルオキシメチルエステル、1−アセ
トキシエチルエステル、1−プロピオニルオキシエチル
エステル、ピバロイルオキシエチルエステル、2−プロ
ピオニルオキシエチルエステル、ヘキサノイルオキジメ
チルエステル等の低級アルカノイルオキシ(低級)アル
キルエステル、例えば2−メシルエチルエステル等の低
級アルカンスルホニル(低級)アルキルエステルまたは
例えば2−ヨウドエチルエステル,2.2.2−トリク
ロロエチルエステル等のモノ(またはジまたはトリ)ハ
ロ(低級)アルキルエステル;例えばビニルエステル、
アリルエステル等の低級アルケニルエステル;例えばエ
チニルエステル、プロピニルエステル等の低級アルキニ
ルエステル;例えばベンジルエステル、4−メトキシベ
ンジルエステル、4−ニトロベンジルエステル、フェネ
チルエステル、トリプルエステル、ベンズヒドリルエス
テル、ビス(メトキシフェニル)メチルエステル、3.
4−ジメトキシベンジルエステル、4−ヒドロキシ−3
。Examples of the "preferable 1-protected carboxy moiety of the protected carboxy (lower) alkyl group" include esterified carboxy groups, and specific examples of the ester moiety of the esterified carboxy group include: , lower alkyl esters which may have appropriate substituents, such as methyl ester, ethyl ester, propyl ester, isopropyl ester, butyl ester, isobutyl ester, tertiary butyl ester, pentyl ester, hexyl ester, etc. For example, acetoxymethyl ester, propionyloxymethyl ester,
Butyryloxymethyl ester, valeryloxymethyl ester, pivaloyloxymethyl ester, 1-acetoxyethyl ester, 1-propionyloxyethyl ester, pivaloyloxyethyl ester, 2-propionyloxyethyl ester, hexanoyloxyethyl ester Lower alkanoyloxy (lower) alkyl esters such as esters, lower alkanesulfonyl (lower) alkyl esters such as 2-mesylethyl ester, or mono(or di- or tri)halo(lower) alkyl esters; e.g. vinyl esters;
Lower alkenyl esters such as allyl ester; lower alkynyl esters such as ethynyl ester and propynyl ester; such as benzyl ester, 4-methoxybenzyl ester, 4-nitrobenzyl ester, phenethyl ester, triple ester, benzhydryl ester, bis(methoxyphenyl ) methyl ester, 3.
4-dimethoxybenzyl ester, 4-hydroxy-3
.
5−ジ第三級ブチルベンジルエステル等の適当な置換基
を有していてもよいアル(低級)アルキルエステル;例
えばフェニルエステル、4−クロロフェニルエステル、
トリルエステル、4−第Eaブチルフェニルエステル、
キシリルエステル、メシチルエステル、クメニルエステ
ル等の適当な置換基を有していてもよいアリールエステ
ル等のようなものが挙げられる。Al (lower) alkyl esters which may have suitable substituents such as 5-ditertiary butylbenzyl ester; for example, phenyl esters, 4-chlorophenyl esters,
tolyl ester, 4-Ea butylphenyl ester,
Examples include aryl esters which may have appropriate substituents, such as xylyl esters, mesityl esters, and cumenyl esters.
好適なr脱離基,としては、例えば塩素、臭素、沃素等
のハロゲン、例えばベンゼンスルホニルオキジ、トシル
オキシ、メシルオキシ等のスルホニルオキシ基、例えば
アセチルオキシ、プロピオニルオキシ等の低級アルカノ
イルオキシ基等が挙げられる。Suitable r-leaving groups include, for example, halogens such as chlorine, bromine, and iodine, sulfonyloxy groups such as benzenesulfonyloxy, tosyloxy, and mesyloxy, and lower alkanoyloxy groups such as acetyloxy and propionyloxy. It will be done.
目的化合物(1)の好適な塩は常用の無毒性塩であり、
例えばナトリウム塩、カリウム塩等のアルカリ金属塩お
よび例えばカルシウム塩、マグネシウム塩等のアルカリ
土金属塩のような金属塩、アンモニウム塩、例えばトリ
メチルアミン塩、トリエチルアミン塩、ピリジン塩、ピ
コリン塩、ジシクロヘキシルアミン塩、N.N’ −ジ
ベンジルエチレンジアミン塩等の有機塩基塩、例えばギ
酸塩、酢酸塩、トリフルオロ酢酸塩、マレイン酸塩、酒
石酸塩、メタンスルホン酸塩、ベンゼンスルホン酸塩、
トルエンスルホン酸塩等の有機酸塩、例えば塩酸塩、臭
化水素酸塩、硫酸塩、燐酸塩等の無機酸塩、例えばアル
ギニン塩、アスパラギン酸塩、グルタミン酸塩等のアミ
ノ酸との塩等が挙げられる。Suitable salts of the target compound (1) are commonly used non-toxic salts,
Metal salts such as alkali metal salts such as sodium salts, potassium salts and alkaline earth metal salts such as calcium salts, magnesium salts, ammonium salts such as trimethylamine salts, triethylamine salts, pyridine salts, picoline salts, dicyclohexylamine salts, N. Organic base salts such as N'-dibenzylethylenediamine salts, such as formates, acetates, trifluoroacetates, maleates, tartrates, methanesulfonates, benzenesulfonates,
Examples include organic acid salts such as toluene sulfonate, inorganic acid salts such as hydrochloride, hydrobromide, sulfate, and phosphate, and salts with amino acids such as arginine salt, aspartate, and glutamate. It will be done.
目的化合物(1)の好ましい実施態様は下記のとおりで
ある。Preferred embodiments of the target compound (1) are as follows.
R1の好ましい実施態様はアミノ基またはアシルアミノ
基(さらに好ましくは低級アルカノイルアミノ基)、
R2の好ましい実施態様は低級アルキル基[さらに好ま
しくは(C1−C4)アルキル基]またはカルボキシ(
低級)アルキル基[さらに好ましくけカルボキシ(C1
−C4)アルキル基コ、R3の好ましい実施態様は低級
アルキル基[きらに好ましくは(C1−C4)アルキル
基]、R4の好ましい実施態様は水素またはアミノ基、
Zの好ましい実施態様はNまたはCIである。A preferred embodiment of R1 is an amino group or an acylamino group (more preferably a lower alkanoylamino group), and a preferred embodiment of R2 is a lower alkyl group [more preferably a (C1-C4) alkyl group] or a carboxy (
(lower) alkyl group [more preferably carboxy (C1
-C4) alkyl group, a preferred embodiment of R3 is a lower alkyl group [preferably a (C1-C4) alkyl group], a preferred embodiment of R4 is hydrogen or an amino group, a preferred embodiment of Z is N or CI It is.
この発明の目的化合物の製造法を以下詳細に述べる。The method for producing the object compound of this invention will be described in detail below.
製造法1
化合物(1)またはその塩は、化合物(I[)またはそ
の塩を化合物(I[[)またはその塩と反応きせること
により製造することができる。Production method 1 Compound (1) or a salt thereof can be produced by reacting compound (I[) or a salt thereof with compound (I[[) or a salt thereof.
化合物(II)の好適な塩については、化合物(I)に
ついて例示した塩を参照すればよい。For suitable salts of compound (II), refer to the salts exemplified for compound (I).
化合物(Ift)の好適な塩については、化合物(I)
について例示した酸付加塩を参照すればよい。For suitable salts of compound (Ift), compound (I)
Reference may be made to the acid addition salts exemplified for.
この反応は水、燐酸塩緩衝液、アセトン、クロロホルム
、アセトニトリル、塩化メチレン、塩化エチレン、ホル
ムアミド、N、N−ジメチルホルムアミド、メタノール
、エタノール、ジエチルエーテル、テトラヒドロフラン
、ジメチルスルホキシドのような溶媒中で行えばよいが
、反応に悪影響を及ぼさない溶媒であればその他のいか
なる有機溶媒中で反応を行ってもよい、溶媒中、親水性
溶媒は水との混合物として使用してもよい、化合物(I
[[)が液体であればそれを溶媒として使用することも
できる。This reaction can be carried out in solvents such as water, phosphate buffer, acetone, chloroform, acetonitrile, methylene chloride, ethylene chloride, formamide, N,N-dimethylformamide, methanol, ethanol, diethyl ether, tetrahydrofuran, dimethyl sulfoxide. However, the reaction may be carried out in any other organic solvent as long as it does not adversely affect the reaction. Among the solvents, hydrophilic solvents may be used as a mixture with water.
If [[) is a liquid, it can also be used as a solvent.
反応温度は特に限定きれないが、通常は冷却下、常温ま
たは加温下に反応が行われる。Although the reaction temperature is not particularly limited, the reaction is usually carried out under cooling, room temperature, or heating.
1盗羞1
化合物(Ib)またはその塩は、化合物(Ia)または
その塩をアミン保護基の脱離反応に付すことにより製造
することができる。1 Compound (Ib) or a salt thereof can be produced by subjecting Compound (Ia) or a salt thereof to an elimination reaction of the amine protecting group.
こ反応は加水分解、還元等のような常法に従って行うこ
とができる。This reaction can be carried out according to conventional methods such as hydrolysis, reduction, etc.
加水分解は塩基、または#(ルイス酸も含む)の存在下
に行うのが好ましい。Hydrolysis is preferably carried out in the presence of a base or # (including Lewis acids).
好適な塩基としては、例えばナトリウム、カリウム等の
アルカリ金属、例えばマグネシウム、カルシウム等のア
ルカリ土金属、それらの金属の水酸化物または炭酸塩ま
たは炭酸水素塩、例えばトリメチルアミン、トリエチル
アミン等のトリアルキルアミン、ピコリン、1.5−ジ
アザビシクロ[4,3,0コノン−5−エン、1.4−
ジアザビシクロC2,2,2コオクタン、1.8−ジア
ザビシクロ[5,4,0]ウンデク−7−エン等が挙げ
られる。Suitable bases include, for example, alkali metals such as sodium and potassium, alkaline earth metals such as magnesium and calcium, hydroxides or carbonates or bicarbonates of these metals, trialkylamines such as trimethylamine, triethylamine, etc. Picoline, 1,5-diazabicyclo[4,3,0conon-5-ene, 1,4-
Examples include diazabicycloC2,2,2-cooctane, 1,8-diazabicyclo[5,4,0]undec-7-ene, and the like.
好適な酸としては、例えばギ酸、酢酸、プロピオン酸、
トリクロロ酢酸、トリフルオロ酢酸等の有機酸および例
えば塩酸、臭化水素酸、硫酸、塩化水素、臭化水素等の
無機酸が挙げられる。Suitable acids include, for example, formic acid, acetic acid, propionic acid,
Examples include organic acids such as trichloroacetic acid and trifluoroacetic acid, and inorganic acids such as hydrochloric acid, hydrobromic acid, sulfuric acid, hydrogen chloride, and hydrogen bromide.
例えばトリクロロ酢酸、トリフルオロ酢酸等のトリハロ
酢酸等のようなルイス酸を使用する脱離は、例えばアニ
ソール、フェノール等の陽イオン捕捉剤の存在下に行う
のが好ましい。Desorption using a Lewis acid such as a trihaloacetic acid such as trichloroacetic acid, trifluoroacetic acid, etc. is preferably carried out in the presence of a cation scavenger such as anisole, phenol, etc.
反応は通常、水、例えばメタノーノ呟エタノール等のア
ルコール、塩化メチレン、テトラヒドロフランのような
溶媒、それらの混合物中で行われるが、反応に悪影響を
及ぼきない溶媒であれば、その他のいかなる溶媒中でも
反応を行うことができる。液状の塩基または酸も溶媒と
して使用することができる。The reaction is usually carried out in water, an alcohol such as ethanol, methylene chloride, a solvent such as tetrahydrofuran, or a mixture thereof, but the reaction may be carried out in any other solvent as long as it does not adversely affect the reaction. It can be performed. Liquid bases or acids can also be used as solvents.
反応温度は特に限定されないが、通常は冷却下ないし加
温下に反応が行われる。Although the reaction temperature is not particularly limited, the reaction is usually carried out under cooling or heating.
脱離反応に適用きれうる還元法としては、化学的還元お
よび接触還元が挙げられる。Reduction methods applicable to the elimination reaction include chemical reduction and catalytic reduction.
化学的還元に使用きれる好適な還元剤は、例えばスズ、
亜鉛、鉄等の金属または例えば塩化クロム、酢酸クロム
等の金属化合物と、例えばギ酸、酢酸、プロピオン酸、
トリフルオロ酢酸、p−トルエンスルホン酸、塩酸、臭
化水素酸等の有機酸または無機酸との組合わせである。Suitable reducing agents that can be used for chemical reduction include, for example, tin,
Metals such as zinc and iron or metal compounds such as chromium chloride and chromium acetate, and formic acid, acetic acid, propionic acid,
It is a combination with an organic or inorganic acid such as trifluoroacetic acid, p-toluenesulfonic acid, hydrochloric acid, or hydrobromic acid.
接触還元に使用される好適な触媒は例えば白金板、白金
海綿、白金黒、コロイド白金、酸化白金、白金線等の白
金触媒、例えばパラジウム海綿、パラジウム黒、酸化パ
ラジウム、パラジウム−炭素、コロイドパラジウム、パ
ラジウム−硫酸バリウム、パラジウム−炭酸バリウム等
のパラジウム触媒、例えば還元ニッケル、酸化ニッケル
、ラネーニッケル等のニッケル触媒、例えば還元コバル
ト、ラネーコバルト等のコバルト触媒、例えば還元鉄、
ラネー鉄等の鉄触媒、例えば還元鋼、ラネー銅、ウルマ
ン鋼等の銅触媒等のような常用の触媒である。Suitable catalysts used for catalytic reduction include platinum catalysts such as platinum plates, platinum sponges, platinum black, colloidal platinum, platinum oxide, platinum wires, such as palladium sponges, palladium black, palladium oxide, palladium-carbon, colloidal palladium, Palladium catalysts such as palladium-barium sulfate and palladium-barium carbonate; nickel catalysts such as reduced nickel, nickel oxide, and Raney nickel; cobalt catalysts such as reduced cobalt and Raney cobalt; reduced iron;
Commonly used catalysts include iron catalysts such as Raney iron, copper catalysts such as reduced steel, Raney copper, Ullmann steel, and the like.
還元は通常、水、メタノール、エタノール、プロパツー
ル、N、N−ジメチルホルムアミドのような反応に悪影
密を及ぼさない常用の溶媒、またはそれらの混合物中で
行われる。きらに化学的還元に使用される上記酸が液体
である場合には、それらを溶媒として使用することもで
きる。きらにまた接触還元に使用する好適な溶媒として
は、上記溶媒のほかジエチルエーテル、ジオキサン、テ
トラヒドロフラン等のような常用の溶媒またはそれらの
混合物が挙げられる。The reduction is usually carried out in conventional solvents that do not adversely affect the reaction, such as water, methanol, ethanol, propatool, N,N-dimethylformamide, or mixtures thereof. If the acids used in the chemical reduction are liquids, they can also be used as solvents. Suitable solvents for use in the catalytic reduction include, in addition to the above-mentioned solvents, conventional solvents such as diethyl ether, dioxane, tetrahydrofuran, etc., or mixtures thereof.
この還元の反応温度は特に限定されないが、通常は冷却
下ないし加温下に反応が行われる。The reaction temperature for this reduction is not particularly limited, but the reaction is usually carried out under cooling or heating.
目的化合物(I)およびその塩は新規であり、強い抗菌
作用を発揮してダラム陽性菌およびダラム陰性菌を含む
広汎な病原菌の生育を阻止し、抗菌薬として有用である
。The target compound (I) and its salts are novel, exhibit strong antibacterial activity, inhibit the growth of a wide range of pathogenic bacteria including Durum-positive bacteria and Durum-negative bacteria, and are useful as antibacterial agents.
こ\に、目的化合物(I)の有用性を示すために、この
発明の代表化合物のMIC(最小発育阻止濃度)に関す
る試験M果を以下に示す。In order to demonstrate the usefulness of the target compound (I), the results of Test M regarding the MIC (minimum inhibitory concentration) of the representative compound of this invention are shown below.
試験法
下記の寒天板倍数希釈法によって試験管内抗菌活性を測
定した。Test method In vitro antibacterial activity was measured by the agar plate multiple dilution method described below.
試験菌株をトリプトケース ソイブロス中、−夜培養し
てその1白金耳(生菌数106個/戒)を各濃度段階の
試験化合物を含むハート インフュージョン寒天()I
I寒天)に接種し、37℃で20時間培養した後、最小
発育阻止濃度(MIC)を< / mQで表わした。The test bacterial strain was cultured overnight in trypto-case soy broth, and one platinum loop (106 viable bacteria/Kai) was added to Heart Infusion Agar (2018) containing the test compound at each concentration level.
After inoculating on I agar) and culturing at 37°C for 20 hours, the minimum inhibitory concentration (MIC) was expressed as < / mQ.
試験化合物
7β−[2−(5−アミノ−1,2,4−チアジアゾー
ル−3−イル)−2−(1−カルボキシ−1−メチルエ
トキシイミノ)アセトアミド]−3−(1−メチル−3
−アミノ−4,5−ジヒドロ−1−ピラゾリオ)メチル
−3−セフェム−4−カルボキシラード(シン異性体)
(以下化合物Aと略称)。Test compound 7β-[2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(1-carboxy-1-methylethoxyimino)acetamide]-3-(1-methyl-3
-amino-4,5-dihydro-1-pyrazolio)methyl-3-cephem-4-carboxilade (syn isomer)
(hereinafter abbreviated as compound A).
K慧呈り
治療のためにこの発明の目的化合物(1)およびその塩
は、経口投与、非纒口投与および外用投与に適した有機
もしくは無機固体状もしくは液状賦形剤のような医薬と
して許容される担体と混合して、前記化合物を有効成分
として含有する常用の医薬製剤の形として使用される。The object compound (1) of this invention and its salts for the treatment of K. aureus can be prepared in a pharmaceutically acceptable form such as an organic or inorganic solid or liquid excipient suitable for oral, parenteral and topical administration. The compound is used in the form of a conventional pharmaceutical preparation containing the compound as an active ingredient in admixture with a carrier.
医薬製剤は錠剤、顆粒、粉剤、カプセルのような固体状
であっても、溶液、懸濁液、シロップ、エマルジョン、
レモネード等のような液状であってもよい。Pharmaceutical preparations may be in solid form such as tablets, granules, powders, or capsules, or may be solutions, suspensions, syrups, emulsions,
It may be in liquid form such as lemonade.
必要に応じて上記製剤中に助剤、安定剤、湿潤剤および
乳糖、クエン酸、酒石酸、ステアリン酸、ステアリン酸
マグネシウム、白土、しょ糖、コーンスターチ、タルク
、ゼラチン、寒天、ペクチン、落花生油、オリーブ油、
カカオ脂、エチレングリフール等のようなその他の通常
使用される添加剤が含まれていてもよい。If necessary, auxiliaries, stabilizers, wetting agents, lactose, citric acid, tartaric acid, stearic acid, magnesium stearate, clay, sucrose, cornstarch, talc, gelatin, agar, pectin, peanut oil, olive oil,
Other commonly used additives such as cocoa butter, ethylene glyfur, etc. may also be included.
化合物(Hの投与量は患者の年齢、条件、疾患の種類、
適用する化合物(I)の種類等によって変化する。一般
的には1mgと約4000mgとの間の量もしくはそれ
以上を1日当り患者に投与すればよい、病原菌感染症治
療には、この発明の目的化合物(I)を平均1回約50
mg、100mg、 250mg、500mg、100
0mg、2000nngの投与量で使用すればよい。The dose of compound (H) depends on the patient's age, condition, type of disease,
It varies depending on the type of compound (I) to be applied. In general, an amount between 1 mg and about 4000 mg or more may be administered to a patient per day, and for the treatment of pathogenic bacterial infections, an average of about 50
mg, 100mg, 250mg, 500mg, 100
It may be used in dosages of 0 mg and 2000 nng.
以下、この発明を実施例に従ってきらに詳細に説明する
。Hereinafter, the present invention will be explained in detail according to examples.
X箆■]
7β−[2−(5−アミノ−1,2,4−チアジアゾー
ル−3−イル)−2−(1−カルボキシ−1−メチルエ
トキシイミノ)アセトアミド]−3−クロロメチル−3
−セフェム−4−カルボン酸・トリフルオロ酢酸塩(シ
ン異性体)(1,24g)のN、N−ジメチルホルムア
ミド(201111)溶液に1−メチル−3−アミノ−
4,5−ジヒドロピラゾール(0,79g、)を水冷下
に加える。混合物を0℃で1時間、室温で30分間攪拌
する6反応混合物を酢酸エチル(200mQ )中に注
ぐ、沈殿を濾取し、減圧Ti酸化燐で乾燥する。乾燥し
た粉末を水に溶解し、IN塩酸でpH3にlll!する
。溶液を1ダイヤイオンHP−20J(商標、三菱化成
社製)のカラムを通過させ、イソプロピルアルコールで
溶出する。目的化合物を含む両分を合わせ、イソプロピ
ルアルコールを留去し、凍結乾燥して、7β−[2−(
5−アミノ−1,2,4−チアジアゾール−3−イル)
−2−(1−カルボキシ−1−メチルエトキシイミノ)
アセトアミトコ−3−(1−メチル−3−アミノ−4,
5−ジヒドロ−1−ピラゾリオ)メチル−3−セフェム
−4−カルボキシラード(シン異性体)(0,28g)
を得る。7β-[2-(5-Amino-1,2,4-thiadiazol-3-yl)-2-(1-carboxy-1-methylethoxyimino)acetamide]-3-chloromethyl-3
1-Methyl-3-amino-
4,5-dihydropyrazole (0.79 g) is added under water cooling. The mixture is stirred for 1 hour at 0° C. and 30 minutes at room temperature. 6. The reaction mixture is poured into ethyl acetate (200 mQ), the precipitate is filtered and dried over Ti phosphorous oxide under reduced pressure. Dissolve the dried powder in water and adjust to pH 3 with IN hydrochloric acid! do. The solution is passed through a column of 1 Diaion HP-20J (trademark, manufactured by Mitsubishi Kasei Corporation) and eluted with isopropyl alcohol. Both parts containing the target compound were combined, the isopropyl alcohol was distilled off, and lyophilized to give 7β-[2-(
5-amino-1,2,4-thiadiazol-3-yl)
-2-(1-carboxy-1-methylethoxyimino)
Acetamitoc-3-(1-methyl-3-amino-4,
5-dihydro-1-pyrazolio)methyl-3-cephem-4-carboxilade (syn isomer) (0,28 g)
get.
IR(スジむ−ル) : 3300. 1760.
1590−1630゜1510 am−1
NMR(D20.δ)=1.60 (6H,s)、 3
.19.3.28(総計3H1それぞれs)、 3.1
0−4.50 (88゜m)、 5.30.5.32
(総計IH,それぞれd。IR: 3300. 1760.
1590-1630°1510 am-1 NMR (D20.δ) = 1.60 (6H, s), 3
.. 19.3.28 (Total 3H1 each s), 3.1
0-4.50 (88゜), 5.30.5.32
(Total IH, each d.
J=5Hz)、 5.84 (LH,d、J:5Hz)
衷夏贋ニ
アβ−C2−C2−ホルムアミドチアゾール−4−イル
)−2−エトキシイミノアセトアミトコ−3−クロロメ
チル−3−セフェム−4−カルボン酸(シン異性体)(
2g)のN、N−ジメチルホルムアミド(30mQ )
溶液に、1−メチル−4゜5−ジヒドロピラゾール(1
,78g)を水冷下に加える。混合物を室温で1時間攪
拌する1反応混合物を酢酸エチル(300m1l )中
に注ぐ、沈殿を濾取して酢酸エチルで洗浄し、減圧Ti
酸化燐で乾燥して、7β−[2−(2−ホルムアミドチ
アゾール−4−イル)−2−エトキシイミノアセトアミ
ド]−3−(1−メチル−4,5−ジヒドロ−1−ピラ
ゾリオ)メチル−3−セフェム−4−カルボキシラード
(シン異性体) (1,80g )を得る。J=5Hz), 5.84 (LH, d, J:5Hz)
β-C2-C2-formamidothiazol-4-yl)-2-ethoxyiminoacetamitoco-3-chloromethyl-3-cephem-4-carboxylic acid (syn isomer)
2g) of N,N-dimethylformamide (30mQ)
Add 1-methyl-4゜5-dihydropyrazole (1
, 78 g) was added under water cooling. The mixture was stirred at room temperature for 1 hour. 1. The reaction mixture was poured into ethyl acetate (300 ml). The precipitate was collected by filtration, washed with ethyl acetate, and incubated under reduced pressure with Ti.
Dry with phosphorous oxide to give 7β-[2-(2-formamidothiazol-4-yl)-2-ethoxyiminoacetamido]-3-(1-methyl-4,5-dihydro-1-pyrazolio)methyl-3 -cephem-4-carboxilade (syn isomer) (1,80 g) is obtained.
犬農廻1 実施例1および2と同様にして下記化合物を得る。dog farm 1 The following compounds are obtained in the same manner as in Examples 1 and 2.
7β−[2−(5−アミノ−1,2,4−チアジアゾー
ル−3−イル)−2−(1−カルボキシ−1−メチルエ
トキシイミノ)アセトアミド]−3−(1−メチル−4
,5−ジヒドロ−1−ピラゾリオ)メチル−3−セフェ
ム−4−カルボキシラード(シン異性体)。7β-[2-(5-amino-1,2,4-thiadiazol-3-yl)-2-(1-carboxy-1-methylethoxyimino)acetamide]-3-(1-methyl-4
,5-dihydro-1-pyrazolio)methyl-3-cephem-4-carboxilade (syn isomer).
IR(スジ9−ル) : 3300. 1790.
1690. 1630 am−’NMR(D O”
NaHCO3,S ) ’ 1.53 (6H1s)、
2.90(3H,s)、 3.03−4.35 (8
H,m)、 5.28 (IH,d。IR (Streak 9-L): 3300. 1790.
1690. 1630 am-'NMR(D O"
NaHCO3,S)' 1.53 (6H1s),
2.90 (3H, s), 3.03-4.35 (8
H, m), 5.28 (IH, d.
J=5Hz)、5.86 (IH,d、J=5Hz)
、8.16 (LH,s)火】d1±
7β−[2−(2−ホルムアミドデアゾール−4−イル
)−2−エトキシイミノアセトアミド]−3−クロロメ
チル−3−セフェム−4−カルボン#(シン異性体)(
Ig)のN、N−ジメチルホルムアミド(15fflQ
) 溶液に、1−メチル−3−アミノ−4,5−ジヒ
ドロピラゾール(0,628g)を水冷下に加える。混
合物を室温で2時間攪拌する0反応混合物を酢酸エチル
(15011111)中に注ぐ、粉末を濾取し、減圧T
i酸化燐で乾燥して黄色粉末を得る。上記粉末のメタノ
ール(10fflQ )溶液に、濃塩酸(0,7m11
)を室温で加える。混合物を同条件で3時間攪拌する0
反応混合物を炭酸水素ナトリウム飽和水溶液でpH7に
調整し、酢酸エチルで洗浄する。水泗を6N塩酸でpH
2に調整し、1ダイヤイオンHP −20Jのカラムを
通過させ、5%イソプロピルアルコールで溶出する。目
的化合物を含む両分を合わせ、イソプロピルアルコール
を留去し、凍結乾燥して、7β−[2−(2−アミノデ
アゾール−4−イル)−2−エトキシイミノアセトアミ
ド]−3−(1−メチル−3−アミノ−4,5−ジヒド
ロ−1−ピラゾリオ)メチル−3−セフェム−4−カル
ボキシラード(シン異性体) (0,32g )を得る
。J=5Hz), 5.86 (IH, d, J=5Hz)
, 8.16 (LH,s) Tue] d1± 7β-[2-(2-formamidodeazol-4-yl)-2-ethoxyiminoacetamide]-3-chloromethyl-3-cephem-4-carvone # (Syn isomer) (
Ig) of N,N-dimethylformamide (15fflQ
) 1-Methyl-3-amino-4,5-dihydropyrazole (0,628 g) is added to the solution under water cooling. The mixture is stirred at room temperature for 2 hours.The reaction mixture is poured into ethyl acetate (15011111).The powder is filtered and vacuum T
i Dry over phosphorous oxide to obtain a yellow powder. A methanol (10fflQ) solution of the above powder was added with concentrated hydrochloric acid (0.7mlQ).
) at room temperature. Stir the mixture under the same conditions for 3 hours.
The reaction mixture is adjusted to pH 7 with saturated aqueous sodium bicarbonate solution and washed with ethyl acetate. pH the water syrup with 6N hydrochloric acid
2, pass through a column of 1 Diaion HP-20J, and elute with 5% isopropyl alcohol. Both fractions containing the target compound were combined, the isopropyl alcohol was distilled off, and lyophilized to give 7β-[2-(2-aminodeazol-4-yl)-2-ethoxyiminoacetamide]-3-(1- Methyl-3-amino-4,5-dihydro-1-pyrazolio)methyl-3-cephem-4-carboxilade (syn isomer) (0,32 g) is obtained.
IR(スジ碌−ル) : 3150−3400.
1770. 1590−1670 cm−’
NMR(D20.8 ) : 1.40 (3H1t、
J=6Hz)、3−23.3−33(総計IH,それぞ
れs)、 2.98−3.70 (4H。IR: 3150-3400.
1770. 1590-1670 cm-' NMR (D20.8): 1.40 (3H1t,
J=6Hz), 3-23.3-33 (total IH, each s), 2.98-3.70 (4H.
m)、 3.55.3.90 (2H,ABq、J=1
8Hz)、 3.70−4.50 (2H,m)、 5
.33.5.36 (LH,d、J=5Hz)。m), 3.55.3.90 (2H, ABq, J=1
8Hz), 3.70-4.50 (2H, m), 5
.. 33.5.36 (LH, d, J=5Hz).
5.85 (18,d、J=5Hz>、 7.00 (
LH,s)哀1遭1
7β−[2−(2−ホルムアミドチアゾール−4−イル
)−2−エトキシイミノアセトアミド]−3−(1−メ
チル−4,5−ジヒドロ−1−ピラゾリオ)メチル−3
−セフェム−4−カルボキシラード(シン異性体)(1
,7g)のメタノール(17+IIQ )溶液に、濃塩
酸(Q、9mM)を加える。混合物を室温で2.5時間
攪拌する。反応混合物を次酸水素ナトリウム飽和水溶液
でpH4,5に調整し、メタノールを留去する。残渣を
IN塩酸でpH2,5に調整し、′ダイヤイオンHP−
20」のカラムを通過許せ、5%イソプロピルアルコー
ルで溶出する。目的化合物を含む画分を合わせ、イソプ
ロピルアルコールを留去し、凍結乾燥して、7β−[2
−(2−アミノデアゾール−4−イル)−2−エトキシ
イミノアセトアミトコ−3−(1−メチル−4,5−ジ
ヒドロ−1−ビラゾリオ)メチル−3−セフェム−4−
カルボキシラード(シン異性体)(0,5g)を得る。5.85 (18, d, J=5Hz>, 7.00 (
LH, s) 1 encounter 1 7β-[2-(2-formamidothiazol-4-yl)-2-ethoxyiminoacetamide]-3-(1-methyl-4,5-dihydro-1-pyrazolio)methyl- 3
-cephem-4-carboxilade (syn isomer) (1
, 7g) in methanol (17+IIQ) is added concentrated hydrochloric acid (Q, 9mM). The mixture is stirred at room temperature for 2.5 hours. The reaction mixture was adjusted to pH 4.5 with a saturated aqueous solution of sodium hydrogen suboxide, and methanol was distilled off. The residue was adjusted to pH 2.5 with IN hydrochloric acid, and then diluted with 'Diaion HP-
20" column and eluted with 5% isopropyl alcohol. The fractions containing the target compound were combined, the isopropyl alcohol was distilled off, and lyophilized to give 7β-[2
-(2-aminodeazol-4-yl)-2-ethoxyiminoacetamitoco-3-(1-methyl-4,5-dihydro-1-virazolio)methyl-3-cephem-4-
Carboxilad (syn isomer) (0.5 g) is obtained.
IR(スジシール) : 3350. 1770.
1650. 1610゜1530 cm’
NMR(D20.l; ) ’ 1.28 (3H1t
、J=6Hz>、2−87(3H,s)、 2.95−
4.00 (8H,m)、 4.24 (2H,q。IR (striped seal): 3350. 1770.
1650. 1610°1530 cm' NMR (D20.l; )' 1.28 (3H1t
, J=6Hz>, 2-87(3H,s), 2.95-
4.00 (8H, m), 4.24 (2H, q.
に6Hz)、 5.23 (LH,d、J:5Hz)、
5.81 (IH,d。6Hz), 5.23 (LH, d, J: 5Hz),
5.81 (IH, d.
Claims (3)
基または保護されたカルボキシ(低級)アルキル基、 R^3は低級アルキル基、 R^4は水素、アミノ基または保護されたアミノ基、 ZはNまたはCHを意味する]で示される新規セフェム
化合物およびその塩。(1) General formula: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R^1 is an amino group or a protected amino group, and R^2 is a lower alkyl group, a carboxy (lower) alkyl group, or a protected amino group. a carboxy (lower) alkyl group, R^3 is a lower alkyl group, R^4 is hydrogen, an amino group or a protected amino group, and Z means N or CH] and salts thereof.
基または保護されたカルボキシ(低級)アルキル基、 ZはNまたはCH、 Yは脱離基を意味する]で示される化合物またはその塩
を、一般式: ▲数式、化学式、表等があります▼ (式中、R^3は低級アルキル基、 R^4は水素、アミノ基または保護されたアミノ基を意
味する)で示される化合物またはモの塩と反応させて、
一般式: ▲数式、化学式、表等があります▼ (式中、R^1、R^2、R^3、R^4およびZはそ
れぞれ前と同じ意味)で示される新規セフェム化合物ま
たはその塩を得ることを特徴とする新規セフェム化合物
の製造法。(2) General formula: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ [In the formula, R^1 is an amino group or a protected amino group, and R^2 is a lower alkyl group, a carboxy (lower) alkyl group, or a protected amino group. a carboxy (lower) alkyl group, Z is N or CH, Y is a leaving group], or its salt is represented by the general formula: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R ^3 means a lower alkyl group, R^4 means hydrogen, an amino group or a protected amino group) or a salt thereof,
General formula: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R^1, R^2, R^3, R^4 and Z each have the same meaning as before) A new cephem compound or its salt A method for producing a novel cephem compound, characterized in that it obtains.
級アルキル基、カルボキシ(低級)アルキル基または保
護されたカルボキシ(低級)アルキル基、 R^3は低級アルキル基、 R^4は水素、アミノ基または保護されたアミノ基、 ZはNまたはCHを意味する]で示される化合物または
その塩をアミノ保護基の脱離反応に付して、一般式: ▲数式、化学式、表等があります▼ (式中、R^2、R^3、R^4およびZはそれぞれ前
と同じ意味)で示される新規セフェム化合物またはその
塩を得ることを特徴とする新規セフェム化合物の製造法
。(3) General formula: ▲ Numerical formula, chemical formula, table, etc. ▼ [In the formula, R^1_a is a protected amino group, R^2 is a lower alkyl group, a carboxy (lower) alkyl group, or a protected (lower) alkyl group, R^3 is a lower alkyl group, R^4 is hydrogen, an amino group or a protected amino group, Z means N or CH] or a salt thereof, by removing the amino-protecting group. For the separation reaction, a new cephem compound represented by the general formula: ▲Mathematical formula, chemical formula, table, etc.▼ (In the formula, R^2, R^3, R^4 and Z each have the same meaning as before) A method for producing a novel cephem compound, characterized by obtaining a cephem compound or a salt thereof.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB878723720A GB8723720D0 (en) | 1987-10-09 | 1987-10-09 | Cephem compounds |
GB8723720 | 1987-10-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01279894A true JPH01279894A (en) | 1989-11-10 |
Family
ID=10625038
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25057288A Pending JPH01279894A (en) | 1987-10-09 | 1988-10-04 | Novel cephem compound and production thereof |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH01279894A (en) |
GB (1) | GB8723720D0 (en) |
-
1987
- 1987-10-09 GB GB878723720A patent/GB8723720D0/en active Pending
-
1988
- 1988-10-04 JP JP25057288A patent/JPH01279894A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
GB8723720D0 (en) | 1987-11-11 |
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