JPH01271939A - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JPH01271939A JPH01271939A JP63099304A JP9930488A JPH01271939A JP H01271939 A JPH01271939 A JP H01271939A JP 63099304 A JP63099304 A JP 63099304A JP 9930488 A JP9930488 A JP 9930488A JP H01271939 A JPH01271939 A JP H01271939A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- recording medium
- thin film
- optical information
- information recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000010409 thin film Substances 0.000 claims abstract description 24
- 229920000515 polycarbonate Polymers 0.000 claims description 11
- 239000004417 polycarbonate Substances 0.000 claims description 11
- 238000005260 corrosion Methods 0.000 abstract description 21
- 230000007797 corrosion Effects 0.000 abstract description 17
- 238000006243 chemical reaction Methods 0.000 abstract description 14
- 239000004431 polycarbonate resin Substances 0.000 abstract description 6
- 229920005668 polycarbonate resin Polymers 0.000 abstract description 6
- 230000005855 radiation Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 36
- 239000000460 chlorine Substances 0.000 description 16
- 239000010408 film Substances 0.000 description 16
- 229910052801 chlorine Inorganic materials 0.000 description 15
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 238000011282 treatment Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 238000005809 transesterification reaction Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- KEDZHEBRXSZWAZ-UHFFFAOYSA-N [4-[2-(4-phenoxycarbonyloxyphenyl)propan-2-yl]phenyl] phenyl carbonate Chemical compound C=1C=C(OC(=O)OC=2C=CC=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC(=O)OC1=CC=CC=C1 KEDZHEBRXSZWAZ-UHFFFAOYSA-N 0.000 description 1
- 238000000516 activation analysis Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- ROORDVPLFPIABK-UHFFFAOYSA-N diphenyl carbonate Chemical compound C=1C=CC=CC=1OC(=O)OC1=CC=CC=C1 ROORDVPLFPIABK-UHFFFAOYSA-N 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- RPACBEVZENYWOL-XFULWGLBSA-M sodium;(2r)-2-[6-(4-chlorophenoxy)hexyl]oxirane-2-carboxylate Chemical compound [Na+].C=1C=C(Cl)C=CC=1OCCCCCC[C@]1(C(=O)[O-])CO1 RPACBEVZENYWOL-XFULWGLBSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
Landscapes
- Polyesters Or Polycarbonates (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光情報記録媒体に係り、特に、基板上に形成さ
れる記録層または反射層の防蝕手段に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an optical information recording medium, and particularly to a means for preventing corrosion of a recording layer or a reflective layer formed on a substrate.
従来より、樹脂製基板の信号パターン形成面に反射膜や
記録膜などの薄膜層を形成した光情報記録媒体が知られ
ている。例えば、コンパクトディスクを例にとって説明
すると、ポリカーボネート製基板の信号パターン形成面
にアルミニウム反射膜が形成され、さらに、このアルミ
ニウム反射膜上にウレタンアクリレート系の光硬化性樹
脂から成る保護膜が積層されている。2. Description of the Related Art Conventionally, optical information recording media have been known in which a thin film layer such as a reflective film or a recording film is formed on a signal pattern forming surface of a resin substrate. For example, taking a compact disc as an example, an aluminum reflective film is formed on the signal pattern forming surface of a polycarbonate substrate, and a protective film made of a urethane acrylate photocurable resin is further laminated on top of this aluminum reflective film. There is.
前記コンパクトディスクの場合、前記基板に全くアルミ
ニウム反射膜に防蝕処理を行わない場合には、60℃×
90%RHの雰囲気中に放置して加速環境試験を行った
とき、200〜300時間でアルミニウム反射膜が腐蝕
し、反射率が低下して情報の読み出しが困難になる。In the case of the compact disc, if no anti-corrosion treatment is applied to the aluminum reflective film on the substrate, the temperature is 60°C.
When an accelerated environmental test is performed by leaving the device in an atmosphere of 90% RH, the aluminum reflective film corrodes in 200 to 300 hours, and the reflectance decreases, making it difficult to read information.
以上、アルミニウム反射膜を有するコンパクトディスク
を例にとって説明したが、他の物質から成る反射層ある
いは記録層を有する全ての光情報記録媒体について同様
の問題がある。Although the above description has been made using a compact disc having an aluminum reflective film as an example, similar problems exist with all optical information recording media having a reflective layer or recording layer made of other materials.
従来、この種の薄膜層の腐蝕は、基板や保護膜を通して
浸透する水が原因であると認識されており、薄膜層の表
面に防水性の被膜を形成したり。Conventionally, it has been recognized that this type of corrosion of thin film layers is caused by water penetrating through the substrate or protective film, forming a waterproof film on the surface of the thin film layer.
あるいはその薄膜層が金属製である場合には、当該金属
の酸化被膜を形成する等の耐食処理が提案されている(
特開昭62−62445号)。Alternatively, if the thin film layer is made of metal, corrosion-resistant treatments such as forming an oxide film of the metal have been proposed (
JP-A No. 62-62445).
このような防水処理あるいは耐食処理が施された光情報
記録媒体は、何らこのような処理が施されていない光情
報記録媒体に比べて、延命効果が認められる。例えばコ
ンパクトディスクの場合、アルミニウム反射膜の表層部
にアルミナ層を形成すると、前記と同様の条件下で加速
環境試験を行ったとき、アルミニウム反射膜の腐蝕開始
時間が約1500時間程度まで延長される。An optical information recording medium that has been subjected to such waterproofing or corrosion-resistant treatment has a longer lifespan effect than an optical information recording medium that has not been subjected to any such treatment. For example, in the case of a compact disc, if an alumina layer is formed on the surface layer of the aluminum reflective film, when an accelerated environmental test is conducted under the same conditions as above, the corrosion start time of the aluminum reflective film will be extended to about 1500 hours. .
然るに、この種の光情報記録媒体においては、より長寿
命であることが要求されるのであって。However, this type of optical information recording medium is required to have a longer lifespan.
従来の防蝕手段では未だ不充分である。Conventional corrosion protection measures are still insufficient.
本願出願人は、研究の結果、薄膜層の腐蝕について以下
の事実を知得した。As a result of research, the applicant of the present application has learned the following facts regarding corrosion of thin film layers.
■薄膜層は高温高湿雰囲気中で腐蝕し易く、高温低湿雰
囲気中ではほとんど腐蝕しない。但し、ガラス基板を用
いると高温高湿の雰囲気中でも薄膜層が腐蝕しにくい。■The thin film layer is easily corroded in a high temperature and high humidity atmosphere, but hardly corroded in a high temperature and low humidity atmosphere. However, when a glass substrate is used, the thin film layer is less likely to corrode even in a high temperature and high humidity atmosphere.
■分析の結果、腐蝕した薄膜層は水酸化物になっている
ことが確認された。■As a result of analysis, it was confirmed that the corroded thin film layer was composed of hydroxide.
■腐蝕した薄膜層からは塩素、イオウ、フッ素などの腐
蝕性元素が検出される。■Corrosive elements such as chlorine, sulfur, and fluorine are detected in the corroded thin film layer.
■薄膜層の腐蝕は、基板との界面から起る。■Corrosion of thin film layers occurs from the interface with the substrate.
■樹脂基板中には塩素、イオウ、フッ素などの腐蝕性元
素が検出される。■Corrosive elements such as chlorine, sulfur, and fluorine are detected in the resin substrate.
これらの事実から、薄膜層の腐蝕メカニズムは、以下の
通りであると推定される。From these facts, it is estimated that the corrosion mechanism of the thin film layer is as follows.
まず、樹脂製基板中に含まれる腐蝕性元素が薄膜層材料
と化学反応を起す。腐蝕性元素が塩素(CI)である場
合を例にとってこの化学反応を化学式にて説明すると、
以下の通りである。First, corrosive elements contained in the resin substrate cause a chemical reaction with the thin film layer material. Taking the case where the corrosive element is chlorine (CI) as an example, this chemical reaction is explained using a chemical formula:
It is as follows.
M(薄膜材料)+ 4 C1−−+MC1−−+ 3
e −・・・・・(1)
次に、この反応によって生成されたMC14−と保護膜
を通して外部から侵入してきた水分が下記の化学反応を
起す。M (thin film material) + 4 C1--+MC1--+ 3
e - (1) Next, the MC14- produced by this reaction and the moisture that has entered from the outside through the protective film cause the following chemical reaction.
MC14−+3820
→M(OH) 3+38” +4C1−・・・(2)゛
さらに、この反応によって生成されたCI−が再び前記
第(1)式の化学反応を生じ、腐蝕が連続的に進行する
。MC14-+3820 → M(OH) 3+38" +4C1-...(2) ゛Furthermore, CI- generated by this reaction again causes the chemical reaction of formula (1) above, and corrosion progresses continuously. .
従って、薄膜層の腐蝕は、腐蝕性元素および水分のうち
少なくともいずれか一方の侵入を防止することによって
防止することができる。然るに、樹脂製基板は多少とも
透水性があり、これを完全に止めることは困難で、その
ための処理を施すと。Therefore, corrosion of the thin film layer can be prevented by preventing the intrusion of at least one of corrosive elements and moisture. However, resin substrates have some degree of water permeability, and it is difficult to completely prevent this, so treatment is required.
光情報記録媒体が大幅にコスト高になる。一方、基板材
料である各種樹脂のうちポリカーボネート樹脂は、比較
的容易に前記腐蝕性元素の含有率が低いものを作製する
ことができる。The cost of optical information recording media will increase significantly. On the other hand, among various resins that are substrate materials, polycarbonate resin can be relatively easily produced with a low content of the corrosive element.
本発明は、かかる知見に基づいてなされたものであって
、基板中に含まれる腐蝕性元素の総量を減じることによ
って薄膜層の腐蝕を抑制し、もって長寿命の光情報記録
媒体を提供することを目的とするものである。The present invention has been made based on this knowledge, and has an object to suppress corrosion of a thin film layer by reducing the total amount of corrosive elements contained in a substrate, thereby providing a long-life optical information recording medium. The purpose is to
本発明は、前記の目的を達成するため、光情報記録媒体
の樹脂製基板として、腐蝕性元素の含有率が35PPM
以下に調整されたポリカーボネート基板を用いたことを
特徴とするものである。In order to achieve the above object, the present invention provides a resin substrate for an optical information recording medium with a corrosive element content of 35 PPM.
It is characterized by using a polycarbonate substrate adjusted as follows.
腐蝕性元素の含有率が35PPM以下のポリカーボネー
ト基板を用いると、腐蝕性元素の総量が少ないため薄膜
層と腐蝕性元素との反応が全く起らないか、起ってもそ
の進行速度が実用上問題とならない程度まで遅くなる。When a polycarbonate substrate with a content of corrosive elements of 35 PPM or less is used, the total amount of corrosive elements is small, so the reaction between the thin film layer and the corrosive elements either does not occur at all, or even if it does occur, the rate of reaction is slow enough to be practical. It slows down to the point where it's not a problem.
よって、耐食性に優れた長寿命の光情報記録媒体を提供
することができる。Therefore, it is possible to provide an optical information recording medium with excellent corrosion resistance and long life.
まず1本発明に係る光情報記録媒体の概略構成について
説明する。First, the schematic structure of the optical information recording medium according to the present invention will be explained.
第1図は本発明に係る光情報記録媒体の代表的な一例を
示す要部断面図であって、基板1の信号パターン形成面
に記録層または反射層3が積層されている。FIG. 1 is a sectional view of a main part showing a typical example of an optical information recording medium according to the present invention, in which a recording layer or a reflective layer 3 is laminated on a signal pattern forming surface of a substrate 1. As shown in FIG.
基板1は、腐蝕性元素の含有率が35PPM以下に調整
されたポリカーボネート樹脂によって形成されており、
その片面に、記録/再生用放射線ビーム(例えば、レー
ザビーム)を記録トラックに沿って案内するプリグルー
プ4やアドレス信号を信号変調したプリピット5等の信
号パターンが凹凸の形で形成されている。これらの信号
パターン4,5は、基板lを射出成形する際、金型内に
配置されたスタンパと呼称される原盤より転写される。The substrate 1 is made of polycarbonate resin whose content of corrosive elements is adjusted to 35 PPM or less,
On one side thereof, a signal pattern such as a pre-group 4 for guiding a recording/reproducing radiation beam (for example, a laser beam) along a recording track and a pre-pit 5 for signal modulating an address signal is formed in the form of an uneven shape. These signal patterns 4 and 5 are transferred from a master called a stamper placed in a mold when injection molding the substrate 1.
以下、腐蝕性元素含有率の低いポリカーボネートの製造
方法を説明する。Hereinafter, a method for producing polycarbonate with a low content of corrosive elements will be explained.
ポリカーボネートの製造方法には、大別して、ホスゲン
法とエステル交換法とがある。Methods for producing polycarbonate can be broadly classified into the phosgene method and the transesterification method.
ホスゲン法は下式に示すように、ビスフェノールAのナ
トリウム塩のアルカリ水溶液または懸濁液に溶媒として
ジクロロメタンを加え、かきまぜながらホスゲンを吹き
込む方法である。The phosgene method is a method in which dichloromethane is added as a solvent to an alkaline aqueous solution or suspension of sodium salt of bisphenol A, and phosgene is blown into the solution while stirring, as shown in the following formula.
ビスフェノールAのNa塩 ホスゲン上式
から明らかなように、ホスゲン法によると、基板中に多
量の塩化ナトリウムが含有され、この塩化ナトリウム中
の塩素が薄膜層の腐蝕に関与する。また、溶媒である塩
化メチレンや未反応のホスゲンが樹脂中に残留し、その
後の基板成形時の加熱により分解して生じた塩素が薄膜
層の腐蝕に関与している可能性もある。Na Salt of Bisphenol A Phosgene As is clear from the above equation, according to the phosgene method, a large amount of sodium chloride is contained in the substrate, and chlorine in this sodium chloride is involved in the corrosion of the thin film layer. It is also possible that methylene chloride as a solvent and unreacted phosgene remain in the resin, and chlorine generated by decomposition during subsequent heating during substrate molding is involved in the corrosion of the thin film layer.
しかしながら、前記の過程によって生成されたペースト
を沸騰水中に細流にして注ぐと、電解質が除かれると同
時に、CHz Cl 2を回収することができる。よっ
て、このさらし工程の時間、ペースト細流の直径等を調
整することによって、塩素含有率の異なるポリカーボネ
ートを作製することができる。However, if the paste produced by the above process is trickled into boiling water, the electrolyte can be removed and at the same time the CHz Cl 2 can be recovered. Therefore, by adjusting the time of this exposure step, the diameter of the paste trickle, etc., polycarbonates with different chlorine contents can be produced.
また、エステル交換法は、下式に示すように、ビスフェ
ノールAとジフェニルカーボネートを混合し、溶媒を用
いず加熱溶融し、高温減圧下でエステル交換反応により
重縮合し、ポリマーを得る方法である。Moreover, the transesterification method is a method in which bisphenol A and diphenyl carbonate are mixed, heated and melted without using a solvent, and polycondensed by transesterification at high temperature and reduced pressure to obtain a polymer, as shown in the following formula.
ビスフェノールA ジフェニルカーボネートポ
リカーボネート
上式から明らかなように、エステル交換法によると、塩
素を含有しないポリカーボネートを得ることができる。Bisphenol A Diphenyl Carbonate Polycarbonate As is clear from the above formula, chlorine-free polycarbonate can be obtained by the transesterification method.
このようにして作製された種々のポリカーボネート樹脂
から塩素含有率の異なる5種類のものを選択し、射出成
形法によって、片面に所望の信号パターンが形成された
ポリカーボネート基板を作製した。各ポリカーボネート
基板の塩素含有率は第1表に示す通りである。なお、塩
素含有率の測定は、放射化分析によって行った。Five types of polycarbonate resins with different chlorine contents were selected from the various polycarbonate resins produced in this way, and a polycarbonate substrate with a desired signal pattern formed on one side was produced by injection molding. The chlorine content of each polycarbonate substrate is shown in Table 1. Note that the chlorine content was measured by activation analysis.
第1表
次に、これらの基板の信号パターン面にアルミニウム反
射層を成膜した。アルミニウム反射層の成膜条件は、ア
ルミニウムインゴットの純度が5N、到達真空度が6.
67X10−’Pa以下、基板温度が25℃、成膜速度
がlnm7秒、膜厚が約1100nである。Table 1 Next, an aluminum reflective layer was formed on the signal pattern surface of these substrates. The conditions for forming the aluminum reflective layer are that the purity of the aluminum ingot is 5N, and the ultimate vacuum is 6.
The substrate temperature was 25° C., the film formation rate was 1 nm 7 seconds, and the film thickness was about 1100 nm.
最後に、前記アルミニウム反射層上にウレタンアクリレ
ート系光硬化性樹脂の保護層を積層した。Finally, a protective layer of urethane acrylate photocurable resin was laminated on the aluminum reflective layer.
こうして得られた光情報記録媒体を60℃×90%RH
雰囲気中に放置して、加速環境試験を行った。第2図に
、本実施例に係る光情報記録媒体の加速環境試験結果を
示す。このグラフの横軸には試験時間が、また縦軸には
反射層の反射率が目盛られており、本発明に係る光情報
記録媒体のデータが実線で、何ら防蝕処理がなされてい
ない光情報記録媒体のデータが2点鎖線で示されている
。The optical information recording medium thus obtained was heated at 60°C x 90%RH.
An accelerated environmental test was conducted by leaving the sample in an atmosphere. FIG. 2 shows the results of an accelerated environmental test of the optical information recording medium according to this example. The horizontal axis of this graph is the test time, and the vertical axis is the reflectance of the reflective layer.The solid line represents the data of the optical information recording medium according to the present invention, and the optical information that has not been subjected to any anti-corrosion treatment. Data on the recording medium is indicated by a two-dot chain line.
但し、測定光は波長が780nmのレーザを用い、測定
結果を示す線は、3枚の同種の試料の平均値を示した。However, a laser with a wavelength of 780 nm was used as the measurement light, and the line indicating the measurement results was the average value of three samples of the same type.
このグラフから明らかなように、塩素含有率が170p
pmの基板(E)を用いた光情報記録媒体は、約200
時間経過した段階で反射率が急速に低下しはじめ、30
00時間経過後には1反射率が約15%まで低下する。As is clear from this graph, the chlorine content is 170p.
The optical information recording medium using the pm substrate (E) is approximately 200 yen
As time passes, the reflectance begins to decrease rapidly, and 30
After 00 hours have elapsed, the 1 reflectance decreases to about 15%.
また、塩素含有率が90ppmの基板(D)を用いた光
情報記録媒体は、約300時間経過した段階で反射率が
低下しはじめ、3000時間経過後には1反射率が約1
5%まで低下する。In addition, in the optical information recording medium using the substrate (D) with a chlorine content of 90 ppm, the reflectance starts to decrease after about 300 hours, and after 3000 hours, the reflectance decreases to about 1.
It drops to 5%.
これに対し、塩素含有率が35ppmの基板(C)を用
いた光情報記録媒体、および塩素含有率が28 P P
mの基板(B)を用いた光情報記録媒体は、2000時
間経過後まで反射率が低下せず、顕著な防蝕効果が認め
られる。In contrast, an optical information recording medium using a substrate (C) with a chlorine content of 35 ppm and an optical information recording medium using a substrate (C) with a chlorine content of 28 ppm
In the optical information recording medium using the substrate (B), the reflectance did not decrease until after 2000 hours had passed, and a remarkable anticorrosion effect was observed.
さらに、塩素を含有率しない基板(A)を用いた光情報
記録媒体は、3000時間経過後も全く反射率が低下せ
ず、特に有効であることが判る。Furthermore, the optical information recording medium using the substrate (A) containing no chlorine showed no decrease in reflectance at all even after 3000 hours had passed, proving to be particularly effective.
なお、前記実施例においては、防蝕すべき薄膜層として
アルミニウム反射層を例にとって説明したが、ヒートモ
ード用記録材料についても同様の効果がある。In the above embodiments, an aluminum reflective layer was used as an example of a thin film layer to be corrosion-protected, but the same effect can be obtained for a heat mode recording material.
本発明の要旨は、腐蝕性元素の含有率の低い樹脂材料を
用いて基板を形成することにあるが、これに加えて、他
の防蝕処理を組合せることは任意に行い得る。他の防蝕
処理としては、■基板に、酸素プラズマ、スパッタエッ
チ、グロー放電、電子ビーム、紫外線などのエネルギを
照射する、■基板と記録層または反射層との間にM触性
元素を透過しにくい材料をもって中間層を形成する。■
基板にベーキング処理を施す、といった手段がある。The gist of the present invention is to form a substrate using a resin material with a low content of corrosive elements, but in addition to this, other anti-corrosion treatments can be optionally performed in combination. Other anti-corrosion treatments include: 1) irradiating the substrate with energy such as oxygen plasma, sputter etching, glow discharge, electron beam, or ultraviolet rays; 2) transmitting an M-contact element between the substrate and the recording layer or reflective layer. Form the intermediate layer using a material that is difficult to use. ■
There is a method of baking the substrate.
以上説明したように、本発明によると、樹脂製基板に含
有される腐蝕性元素の総量が少ないため、高温高湿雰囲
気中に放置しても薄膜層と腐蝕性元素との化学反応が起
らないか、あるいはこれらの化学反応の進行速度が遅く
なり、光情報記録媒体の寿命を格段に延長することがで
きる。As explained above, according to the present invention, since the total amount of corrosive elements contained in the resin substrate is small, chemical reactions between the thin film layer and the corrosive elements do not occur even when left in a high temperature and high humidity atmosphere. Otherwise, the speed of progress of these chemical reactions is slowed down, and the life of the optical information recording medium can be significantly extended.
第1図は本発明に係る光情報記録媒体の概略構成を示す
要部断面図、第2図は本発明の詳細な説明するグラフで
ある。
に基板、3:記録層または反射層、4ニブリグルーブ、
5:プリピット。FIG. 1 is a sectional view of a main part showing a schematic structure of an optical information recording medium according to the present invention, and FIG. 2 is a graph explaining the present invention in detail. 3: recording layer or reflective layer; 4: nibli groove;
5: Prepit.
Claims (1)
ずれか一方を含む薄膜層を形成して成る光情報記録媒体
において、前記基板として、腐蝕性元素の含有率が35
PPM以下に調整されたポリカーボネート製基板を用い
たことを特徴とする光情報記録媒体。An optical information recording medium comprising a thin film layer including at least one of a recording layer and a reflective layer formed on one side of a substrate, wherein the substrate has a content of a corrosive element of 35%.
An optical information recording medium characterized by using a polycarbonate substrate adjusted to PPM or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63099304A JPH01271939A (en) | 1988-04-23 | 1988-04-23 | Optical information recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63099304A JPH01271939A (en) | 1988-04-23 | 1988-04-23 | Optical information recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01271939A true JPH01271939A (en) | 1989-10-31 |
Family
ID=14243889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63099304A Pending JPH01271939A (en) | 1988-04-23 | 1988-04-23 | Optical information recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01271939A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6397627A (en) * | 1986-10-14 | 1988-04-28 | Sony Corp | Optical information recording medium |
JPS63257933A (en) * | 1987-04-15 | 1988-10-25 | Sony Corp | Optical information recording medium |
JPS6424829A (en) * | 1987-07-21 | 1989-01-26 | Mitsubishi Gas Chemical Co | Polycarbonate molding material for optical disc |
-
1988
- 1988-04-23 JP JP63099304A patent/JPH01271939A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6397627A (en) * | 1986-10-14 | 1988-04-28 | Sony Corp | Optical information recording medium |
JPS63257933A (en) * | 1987-04-15 | 1988-10-25 | Sony Corp | Optical information recording medium |
JPS6424829A (en) * | 1987-07-21 | 1989-01-26 | Mitsubishi Gas Chemical Co | Polycarbonate molding material for optical disc |
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