JPH01248339A - Production of substrate for optical recording medium - Google Patents
Production of substrate for optical recording mediumInfo
- Publication number
- JPH01248339A JPH01248339A JP7507988A JP7507988A JPH01248339A JP H01248339 A JPH01248339 A JP H01248339A JP 7507988 A JP7507988 A JP 7507988A JP 7507988 A JP7507988 A JP 7507988A JP H01248339 A JPH01248339 A JP H01248339A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- recording medium
- optical recording
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 106
- 230000003287 optical effect Effects 0.000 title claims description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 239000011347 resin Substances 0.000 claims abstract description 20
- 238000004140 cleaning Methods 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims description 14
- 239000004033 plastic Substances 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 238000003848 UV Light-Curing Methods 0.000 abstract 4
- 238000001723 curing Methods 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 8
- 238000005266 casting Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005672 polyolefin resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光ビームにより再生のみ、記録・再生または
消去・記録・再生を行うことが可能な光学的記録媒体に
用いられる基盤の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a substrate used in an optical recording medium that can perform only reproduction, recording/reproduction, or erasing/recording/reproduction using a light beam. Regarding.
より詳しくは2P (Photo Polymeri
zation)法と呼ばれる方法で案内溝及び/又はプ
リフォーマット信号の信号ピットを形成する光学的記録
媒体用基盤の製造方法に関する。For more details, please see 2P (Photo Polymeri
The present invention relates to a method for manufacturing an optical recording medium substrate in which guide grooves and/or signal pits for preformat signals are formed using a method called a zation method.
光学的記録媒体の基盤は高密度記録をするために基盤上
に光学的案内溝及びプリフォーマット信号の信号ピット
を形成しておく必要があり、その形成方法として従来か
らい(つかの方法が知られている。その1つの方法とし
て、案内溝及びプリフォーマット信号の信号ピットの形
状に対応する凹凸が設けられたスタンパと呼ばれる型の
上に硬化型の樹脂を塗布した後、この上に基盤を積置し
、次いて光照射等により樹脂を硬化させることにより、
案内溝を形成すると共にこの案内溝を基板に固着させる
、いわゆる2P法と呼ばれる方法がある。In order to perform high-density recording, it is necessary to form optical guide grooves and signal pits for preformatted signals on the base of an optical recording medium. One method is to apply a hardening resin onto a mold called a stamper, which has unevenness corresponding to the shape of the guide groove and the signal pit of the preformat signal, and then to place a substrate on top of this. By stacking and then curing the resin by light irradiation, etc.
There is a method called the 2P method, in which a guide groove is formed and the guide groove is fixed to the substrate.
〔発明が解決しようとしている問題点〕しかしながら、
上記のように2P法により光学的記録媒体用基盤を製造
する際に、基板としてプラスチック基板、即ちメタクリ
ル系樹脂基板、ポリカーボネート樹脂基板、ポリオレフ
ィン系樹脂基板。[Problem that the invention is trying to solve] However,
As mentioned above, when manufacturing an optical recording medium substrate by the 2P method, a plastic substrate, ie, a methacrylic resin substrate, a polycarbonate resin substrate, or a polyolefin resin substrate is used as the substrate.
スチレン系樹脂基板、エポキシ樹脂基板、アクリル系キ
ャスティング基板等を用いた場合、環境耐久試験後(7
0°C185%R’、H,2,000時間)に該基板よ
り2P層の剥離を生じるという問題があった。When using styrene resin substrate, epoxy resin substrate, acrylic casting substrate, etc., after environmental durability test (7
There was a problem in that the 2P layer peeled off from the substrate at 0°C, 185% R', H, 2,000 hours).
本発明の目的は、上記問題を解決し、基板と2P層の密
着性に優れた光学的記録媒体用基盤の製造方法を提供す
ることにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and provide a method for manufacturing a substrate for an optical recording medium that has excellent adhesion between the substrate and the 2P layer.
本発明の上記目的は、プラスチック基板上に案内溝及び
/又は信号ピットを有する硬化型樹脂層が設けられて成
る光学的記録媒体用基盤の製造方法において、前記基板
上に樹脂層を形成する前に、この基板表面にUV103
洗浄を施すことによって達成される。The above-mentioned object of the present invention is to provide a method for manufacturing a substrate for an optical recording medium, which comprises a curable resin layer having guide grooves and/or signal pits provided on a plastic substrate, before forming the resin layer on the substrate. Then, UV103 is applied to the surface of this board.
This is achieved by washing.
以下、本発明の実施例を図面を用いて詳細に説明する。 Embodiments of the present invention will be described in detail below with reference to the drawings.
本発明は、基板としてプラスチック基板、即ちメタクリ
ル系樹脂基板、ポリカーボネート樹脂基板、ポリオレフ
ィン系樹脂基板、スチレン系樹脂基板、エポキシ樹脂基
板、アクリル系キャスティング基板等を用いる場合、該
基板上に硬化型樹脂製の案内溝及び/又はプリフォーマ
ット信号の信号ピットを形成する前に、該プラスチック
基板表面にUV103洗浄を施すものである。When a plastic substrate such as a methacrylic resin substrate, a polycarbonate resin substrate, a polyolefin resin substrate, a styrene resin substrate, an epoxy resin substrate, an acrylic casting substrate, etc. is used as a substrate, the present invention provides a hardening resin substrate on the substrate. Before forming guide grooves and/or signal pits for preformat signals, the surface of the plastic substrate is subjected to UV103 cleaning.
UV103洗浄を行う際、UV103発生ランプとして
はUV波長185nm〜300nmの範囲の波長の遠紫
外線を放射するものを用いればよ(、特にUV波長20
0nm以下の遠紫外線を放射する低圧水銀ランプ、パル
スエキサイア−レーサー等が適している。該照射雰囲気
としては、空気中あるいは酸素雰囲気中で行われる。U
V103洗浄処理としては、プラスチック基板の該処理
表面において、低圧水銀ランプによる酸化性エツチング
の深さが200〜400A程度になるように処理を行う
ことが好ましい。When performing UV103 cleaning, it is recommended to use a UV103 generating lamp that emits deep ultraviolet rays with wavelengths in the range of 185 nm to 300 nm (in particular, UV wavelengths of 20 nm to 300 nm).
A low-pressure mercury lamp, a pulse excitation laser, etc. that emit deep ultraviolet light of 0 nm or less are suitable. The irradiation atmosphere is air or oxygen atmosphere. U
The V103 cleaning treatment is preferably performed so that the depth of oxidative etching using a low-pressure mercury lamp is approximately 200 to 400 A on the treated surface of the plastic substrate.
又、ここで用いられる硬化型樹脂としては、従来、2P
法で用いられている公知の樹脂組成物、例えば特開昭5
4−130902号、特開昭54−1384.06号。Furthermore, as the curable resin used here, conventionally 2P
Known resin compositions used in the method, such as JP-A-5
No. 4-130902, JP-A-54-1384.06.
特開昭57−88503号、特開昭57−94946号
。JP-A-57-88503, JP-A-57-94946.
特開昭57−500017号、特開昭58−15549
1号。JP-A-57-500017, JP-A-58-15549
No. 1.
特公昭61−29053号等に記載されているような不
飽和ポリエステル系、アクリル系、チオール・エン系等
のラジカル重合タイプのもの、スピロオルトエステル類
、スピロオルトカーボネート類のような開環重合タイプ
のものを用いる。Radical polymerization types such as unsaturated polyesters, acrylics, and thiol/ene systems as described in Japanese Patent Publication No. 61-29053, ring-opening polymerization types such as spiro-orthoesters and spiro-orthocarbonates. Use the one.
本発明の製造方法により光学的記録媒体用基盤を製造す
れば、環境耐久試験後の基板と2P層の剥離の発生がな
く、長期信頼性にすぐれた光学的記録媒体用基盤の製造
が可能である。If a substrate for an optical recording medium is manufactured by the manufacturing method of the present invention, there will be no peeling between the substrate and the 2P layer after an environmental durability test, and it will be possible to manufacture a substrate for an optical recording medium with excellent long-term reliability. be.
実JL例」2
基板として外周φ130 m m、内部周φ18 m
m 。Actual JL example 2 The outer circumference of the board is φ130 mm, and the inner circumference is φ18 m.
m.
厚み1 、 t m mのドーナツ状アクリルキャステ
ィング基板を用いて、第1図に示すように硬化型樹脂を
設けるべき基板1の表面に矢印で示したUV103洗浄
処理2(低圧水銀灯4.50 W / c m、照射距
離25 m m 。Using a doughnut-shaped acrylic casting substrate with a thickness of 1 mm and a thickness of 1 mm, as shown in FIG. cm, irradiation distance 25 mm.
1分間照射、03の条件(254nm光照度で該基板表
面上80 m W / c屑))を施した。Irradiation for 1 minute, conditions of 03 (80 m W/c debris on the substrate surface at 254 nm light intensity)) were applied.
次に、第2図に示すように所望の案内溝形状及び/又は
信号ピットに対応した凹凸を設けたスタンパ−3の上に
紫外線硬化型樹脂MRA−5000(三菱レイヨン(株
)製エポキシアクリレ−1・系樹脂組成物)をスピンコ
ードした。この紫外線硬化型樹脂層4の上に、前記UV
103洗浄処理を施した基板1を載置し、この基板を通
して波長365nmのUV光て該基板表面上をUV照度
233mW/crrrで1分間照射し、紫外線硬化型樹
脂を硬化させた。Next, as shown in FIG. 2, an ultraviolet curable resin MRA-5000 (epoxy acrylic resin manufactured by Mitsubishi Rayon Co., Ltd.) is placed on the stamper 3 provided with unevenness corresponding to the desired guide groove shape and/or signal pit. -1-based resin composition) was spin-coded. On this ultraviolet curable resin layer 4, the UV
The substrate 1 which had been subjected to the No. 103 cleaning treatment was placed on the substrate, and the surface of the substrate was irradiated with UV light with a wavelength of 365 nm for 1 minute at a UV illumination intensity of 233 mW/crrr to cure the ultraviolet curable resin.
その後、第3図に示すようにスタンパより剥離し、基板
1上に紫外線硬化型樹脂製の案内溝6及び/又は信号ピ
ットが形成された基盤を得た。Thereafter, as shown in FIG. 3, it was peeled off from the stamper to obtain a substrate 1 on which guide grooves 6 and/or signal pits made of ultraviolet curable resin were formed.
次に、基板と2P層との密着性を評価するため、基盤目
試験(J I S 54. OO)を行ったところ、評
価点数10という結果で、これらの間の密着性は良好て
あった。Next, in order to evaluate the adhesion between the board and the 2P layer, we conducted a board test (JIS 54.OO), and the result was an evaluation score of 10, indicating that the adhesion between them was good. .
丸胤舅」
基板として、アクリルキャスティング基板を用いる代わ
りに、ポリカーボネート射出成形基板を用いる以外は、
実施例1と同様に基盤を作成し、評価を行った。Except for using a polycarbonate injection molded substrate instead of an acrylic casting substrate as the substrate,
A base was created and evaluated in the same manner as in Example 1.
その結果、実施例1と同様に基板と2P層の密着性は良
好であった。As a result, as in Example 1, the adhesion between the substrate and the 2P layer was good.
丸剋上」
基板として、アクリルキャスティング基板を用いる代わ
りに、エポキシ系樹脂基板を用いる以外は、実施例1と
同様に基盤を作成し、評価を行った。A substrate was prepared and evaluated in the same manner as in Example 1, except that an epoxy resin substrate was used as the substrate instead of the acrylic casting substrate.
その結果、実施例1と同様に基板と2P層の密着性は良
好であった。As a result, as in Example 1, the adhesion between the substrate and the 2P layer was good.
支衡L」
基板として、アクリルキャスティング基板を用いる代わ
りに、ポリオレフィン系樹脂基板を用いる以外は、実施
例1と同様に基盤を作成し、評価を行った。Balance L'' A substrate was prepared and evaluated in the same manner as in Example 1, except that a polyolefin resin substrate was used instead of the acrylic casting substrate.
その結果、実施例1と同様に基板と2P層の密着性は良
好であった。As a result, as in Example 1, the adhesion between the substrate and the 2P layer was good.
!LJL[5
基板として、アクリルキャスティング基板を用いる代わ
りに、アクリル樹脂射出成形基板を用いる以外は、実施
例1と同様に基盤を作成し、評価を行った。! LJL[5 A substrate was prepared and evaluated in the same manner as in Example 1, except that an acrylic resin injection molded substrate was used as the substrate instead of an acrylic casting substrate.
その結果、実施例1と同様に基板と2P層の密着性は良
好であった。As a result, as in Example 1, the adhesion between the substrate and the 2P layer was good.
比較例1
基板としてアクリルキャスティング基板を用い、この基
板の表面にUv103洗浄処理を施さない以外は、実施
例1と同じ方法にて基盤を作成した。Comparative Example 1 A substrate was created in the same manner as in Example 1, except that an acrylic casting substrate was used as the substrate and the surface of this substrate was not subjected to Uv103 cleaning treatment.
この基盤の基板と2P層との密着性を基盤目試験J I
354.00で評価した結果、評価点数2で密着性は
よくなかった。The adhesion between the substrate and the 2P layer of this substrate was tested by the substrate eye test JI.
As a result of evaluation at 354.00, the evaluation score was 2, indicating that the adhesion was not good.
ル較舅」
基板としてボリカーホネート射出成形基板を用いて、こ
の基板の表面にUV/O3洗浄処理を施さない以夕Iは
、実施例1と同じ方法にて基盤を作成し、評価を行った
。A polycarbonate injection molded substrate was used as the substrate, and the surface of the substrate was not subjected to UV/O3 cleaning treatment.In the following, a substrate was prepared and evaluated in the same manner as in Example 1.
その結果、比較例1と同様に基板と2P層の密着性はよ
(なかった。As a result, as in Comparative Example 1, the adhesion between the substrate and the 2P layer was good (not good).
埼較鷹」
基板としてエポキシ樹脂基板を用いて、この基板の表面
にUV/O3洗浄処理を施さない以外は、実施例1と同
じ方法にて基盤を作成し、評価を行った。A substrate was prepared and evaluated in the same manner as in Example 1, except that an epoxy resin substrate was used as the substrate and the surface of this substrate was not subjected to UV/O3 cleaning treatment.
その結果、比較例1と同様に基板と2P層の密着性はよ
くなかった。As a result, as in Comparative Example 1, the adhesion between the substrate and the 2P layer was not good.
比11例」
基板として、ポリオレフィン系樹脂基板を用いて、この
基板の表面にUv103洗浄処理を施さない以外は、実
施例1と同じ方法にて基盤を作成し、評価を行った。そ
の結果、比較例1と同様に基板と2P層の密着性はよく
なかった。Comparison Example 11 A substrate was prepared and evaluated in the same manner as in Example 1, except that a polyolefin resin substrate was used as the substrate, and the surface of this substrate was not subjected to Uv103 cleaning treatment. As a result, as in Comparative Example 1, the adhesion between the substrate and the 2P layer was not good.
之救上」
基板として、アクリル樹脂射出成形基板を用いて、この
基板の表面にUv103洗浄処理を施さない以外は、実
施例1と同じ方法にて基盤を作成し、評価を行った。そ
の結果、比較例1と同様に基板と2P層の密着性はよく
なかった。A substrate was prepared and evaluated in the same manner as in Example 1, except that an acrylic resin injection molded substrate was used as the substrate, and the surface of this substrate was not subjected to Uv103 cleaning treatment. As a result, as in Comparative Example 1, the adhesion between the substrate and the 2P layer was not good.
前記実施例1. 2. 3. 4. 5及び比較例1,
2゜3、4.5て作成した基盤の環境耐久試験(70°
C185%R、H、2、000時間)後の基板と2P層
との剥離を評価した結果を表−1に示した。Said Example 1. 2. 3. 4. 5 and Comparative Example 1,
Environmental durability test (70°
Table 1 shows the results of evaluating the peeling between the substrate and the 2P layer after C185%R, H, 2,000 hours).
表1から明らかなように、本発明によって製造された基
盤を用いた光学的記録媒体では、環境耐久試験後も基盤
と2P層の剥離は発生しなかった。As is clear from Table 1, in the optical recording medium using the substrate manufactured according to the present invention, no peeling between the substrate and the 2P layer occurred even after the environmental durability test.
以上説明したように、本発明の光学的記録媒体用基盤の
製造方法によって、基板と2P層が強固に密着し、高信
頼性の光学的記録媒体用基盤の製造が可能となった。As explained above, the method for manufacturing an optical recording medium substrate of the present invention allows the substrate and the 2P layer to be firmly adhered to each other, making it possible to manufacture a highly reliable optical recording medium substrate.
第1図乃至第3図は夫々本発明の光学的記録媒体用基盤
の製造方法の各工程を説明する模式図である。FIGS. 1 to 3 are schematic diagrams illustrating each step of the method for manufacturing an optical recording medium substrate of the present invention.
Claims (1)
トを有する硬化型樹脂層が設けられて成る光学的記録媒
体用基盤の製造方法において、前記基板上に樹脂層を形
成する前に、この基板表面にUV/O_3洗浄を施すこ
とを特徴とする光学的記録媒体用基盤の製造方法。(1) In a method for manufacturing an optical recording medium substrate in which a curable resin layer having guide grooves and/or signal pits is provided on a plastic substrate, before forming the resin layer on the substrate, A method of manufacturing a substrate for an optical recording medium, which comprises subjecting the surface to UV/O_3 cleaning.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7507988A JPH01248339A (en) | 1988-03-28 | 1988-03-28 | Production of substrate for optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7507988A JPH01248339A (en) | 1988-03-28 | 1988-03-28 | Production of substrate for optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01248339A true JPH01248339A (en) | 1989-10-03 |
Family
ID=13565818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7507988A Pending JPH01248339A (en) | 1988-03-28 | 1988-03-28 | Production of substrate for optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01248339A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6613396B1 (en) * | 1998-01-09 | 2003-09-02 | Sony Corporation | Optical disc and method for manufacturing same |
-
1988
- 1988-03-28 JP JP7507988A patent/JPH01248339A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6613396B1 (en) * | 1998-01-09 | 2003-09-02 | Sony Corporation | Optical disc and method for manufacturing same |
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