JPH01243256A - Production of magneto-optical recording medium - Google Patents
Production of magneto-optical recording mediumInfo
- Publication number
- JPH01243256A JPH01243256A JP6938788A JP6938788A JPH01243256A JP H01243256 A JPH01243256 A JP H01243256A JP 6938788 A JP6938788 A JP 6938788A JP 6938788 A JP6938788 A JP 6938788A JP H01243256 A JPH01243256 A JP H01243256A
- Authority
- JP
- Japan
- Prior art keywords
- magneto
- film
- ammonia
- sputtering
- optical recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 9
- 239000012298 atmosphere Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 abstract description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 12
- 238000004544 sputter deposition Methods 0.000 abstract description 11
- 230000001681 protective effect Effects 0.000 abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 4
- 229910052786 argon Inorganic materials 0.000 abstract description 3
- 239000012300 argon atmosphere Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- -1 TbFeCo Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、レーザー光を用いて記録・再生・消去を行う
光磁気記録において、特にディスク等の記録媒体の長寿
命化・高信頼性化に好適な光磁気記録媒体の製造方法に
関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to magneto-optical recording in which recording, reproduction, and erasing are performed using laser light, and in particular to extending the lifespan and increasing reliability of recording media such as disks. The present invention relates to a method of manufacturing a magneto-optical recording medium suitable for.
高度情報化社会の進展にともない、高密度でかつ大容量
のファイルメモリに対するニーズが高まっている。これ
に応えるファイルとして、光メモリーが注目されており
、中でも光磁気記録は最も実用化に近い段階にある。2. Description of the Related Art With the development of an advanced information society, the need for high-density and large-capacity file memory is increasing. Optical memory is attracting attention as a file that can meet this demand, and magneto-optical recording is at the closest stage to practical application.
現在、光磁気記録材料として最も有望なものに希土類−
鉄族元素よりなる非晶質合金があり、中でもＴ ｂ −
Ｆ ｅ −Ｃｏ系非晶質合金はその中心にある。しかし
ながら、これら希土類−鉄族非晶質合金は耐候性に問題
があり、空気中の水や酸素と容易に反応して酸化物や水
酸化物を形成する。そのため、磁気特性の変動ひいては
ディスク特性の低下をきたしていた。それに対する処置
として、腐食抑制効果のある元素を添加したり、保護膜
で覆う等が行なわれており、これに関する公知例として
特開昭６１−１８８７６０ 、特開昭６２−１１２２５
７をあげることができる。Currently, rare earths are the most promising materials for magneto-optical recording materials.
There are amorphous alloys made of iron group elements, among which T b -
The Fe--Co amorphous alloy is at its core. However, these rare earth-iron group amorphous alloys have problems in weather resistance and easily react with water and oxygen in the air to form oxides and hydroxides. This has resulted in fluctuations in magnetic properties and, in turn, deterioration in disk properties. As countermeasures against this, there have been measures such as adding elements with a corrosion inhibiting effect or covering with a protective film.Known examples of this are JP-A No. 61-188760 and JP-A No. 62-11225.
I can give you a 7.
光磁気記録膜に窒化層を設ける場合、保護効果は窒化度
に依存していることから、従来技術ではイオンビーム等
を用い窒素の活性を高めて上記窒化層の形成を行なって
いた。この方法は量産性を考慮すると必ずしも好ましい
方法であるとはいえなかった。When a nitride layer is provided on a magneto-optical recording film, the protective effect depends on the degree of nitridation, so in the prior art, the nitride layer was formed by increasing the activity of nitrogen using an ion beam or the like. This method could not necessarily be said to be a preferable method in consideration of mass productivity.
本発明の目的は、化学的に安定な窒化物を容易に形成で
き、量産性に適した光磁気記録媒体の製造方法を提供す
ることにある。An object of the present invention is to provide a method for manufacturing a magneto-optical recording medium that can easily form a chemically stable nitride and is suitable for mass production.
上記目的は、窒素源にアンモニアを用い、好ましくはこ
れをプラズマ化して用いることにより達成される。The above object is achieved by using ammonia as a nitrogen source, preferably by converting it into plasma.
窒素源にＮ２ガスを用いたとき、これをプラズマ化或い
はイオンビーム化しても、最も活性なＮ＋イオンになる
確率は著しく低く、多くはＮａ＋イオンとなる。しかし
、窒素源としてアンモニアを用いると、容易に分解して
Ｎ＋イオンとなり、金属と反応して窒化物を形成する。When N2 gas is used as a nitrogen source, even if it is turned into plasma or an ion beam, the probability of it becoming the most active N+ ion is extremely low, and most of it becomes Na+ ions. However, when ammonia is used as a nitrogen source, it easily decomposes into N+ ions, which react with metals to form nitrides.
窒化度が上ると得られる窒化層は緻密になり、保護効果
が上昇する。As the degree of nitridation increases, the resulting nitrided layer becomes denser and the protective effect increases.
以下、本発明の詳細を実施例を説明する。 Hereinafter, the details of the present invention will be explained with reference to examples.
［実施例１］
第１図は本発明の実施例により作成した光磁気ディスク
の断面構造模式図である。このディスクは、インライン
型スパッタ装置を用い、次に述べる手順で作成した。[Example 1] FIG. 1 is a schematic cross-sectional structural diagram of a magneto-optical disk prepared according to an example of the present invention. This disk was produced using an in-line sputtering device according to the procedure described below.
案内溝を有するディスク基板］上に先ず、窒化シリコン
下地膜２を形成した。引き続き窒化層３を有する光磁気
記録膜４を上記スパッタリングによって形成した。First, a silicon nitride base film 2 was formed on a disk substrate having guide grooves. Subsequently, a magneto-optical recording film 4 having a nitride layer 3 was formed by the above sputtering.
スパッタターゲットには、希土類−鉄金糸の非晶質合金
、例えばＴｂＦｅＣｏのような合金、あるいは上記合金
に耐食性を向上させるための添加物を含む合金を用いた
。The sputter target used was an amorphous rare earth-iron-gold thread alloy, such as TbFeCo, or an alloy containing additives to improve corrosion resistance.
この記録膜形成工程において、スパッタリング時のガス
雰囲気を時間の経過とともに変化させた。In this recording film forming step, the gas atmosphere during sputtering was changed over time.
最初はアンモニアを５％含むアルゴンガス雰囲気中で約
４０秒間スパッタ行い、約１００人の窒化膜３の形成を
行った。引き続き、雰囲気をアルゴンガスのみにして約
３分間放電を継続し、８００人の記録膜４を形成した。At first, sputtering was performed for about 40 seconds in an argon gas atmosphere containing 5% ammonia, and about 100 people formed the nitride film 3. Subsequently, the atmosphere was changed to argon gas only, and discharge was continued for about 3 minutes to form recording films 4 for 800 people.
そして角びアンモニアを５％含有せしめたアルゴン雰囲
気のもとてスパッタリングを続行し、記録膜４上に窒素
化物層３を形成した。そして、最後に再び窒化シリコン
保護膜５を１００人の膜厚で形成し、光磁気ディスクと
した。Then, sputtering was continued in an argon atmosphere containing 5% ammonia chloride to form a nitride layer 3 on the recording film 4. Finally, a silicon nitride protective film 5 was formed again to a thickness of 100 mm to obtain a magneto-optical disk.
このディスクの寿命試験を行なった。手法は、８０’Ｃ
−９５％ＲＨ（気温８０℃、相対湿度９５％）中にディ
スクを放置したときの欠陥レー１〜の経時変化を測定し
た。その結果は第２図に示すとおりである。比較例とし
て、この窒化物層（３）を形成しないで作製したディス
クを用いた。その結果、゛本発明を用いたディスクの欠
陥レートは、３０００時間放置後もまったく増加しない
のに対して、比較例では約４倍に増加した。この欠陥レ
ートの増加の原因は、記録膜に発生する孔食であった。A life test was conducted on this disk. The method is 80'C
When the disks were left in -95% RH (temperature: 80° C., relative humidity: 95%), changes over time in defective lines 1 to 1 were measured. The results are shown in Figure 2. As a comparative example, a disk manufactured without forming this nitride layer (3) was used. As a result, the defect rate of the disk using the present invention did not increase at all even after being left for 3000 hours, whereas it increased about four times in the comparative example. The cause of this increase in defect rate was pitting corrosion occurring in the recording film.
一方、窒化物層３の形成をＮ２ガスを含むガスを放電ガ
スに用いて、スパッタした窒化膜と比較した。その結果
、基板側から下地膜及び窒化膜を介して測定したカー回
転角は、本発明の手法を用いて作製した場合が０ｈ＝０
．５７°であったが、窒素を放電ガスに用いて作製する
とＢ ｋ＝０．４１− ’と約７０％に低下していた。On the other hand, the formation of the nitride layer 3 was compared with a nitride film sputtered using a gas containing N2 gas as a discharge gas. As a result, the Kerr rotation angle measured from the substrate side through the base film and nitride film was 0 h = 0 when fabricated using the method of the present invention.
．． However, when nitrogen was used as the discharge gas, B k was 0.41-', which was about 70%.
これは、窒素膜による光吸収が生じたためであると考え
られる。これは、窒素を含むガスを放電ガスに用いると
発光スペクトル分析においてＮ２＋のスペクトルが中心
となっているが、アンモニアを用いた場合にはＮまたは
Ｎ＋のスペクトルが観測されたことによっても説明でき
る。以上の如く窒化度を上げるためには窒素原子イオン
もしくは窒素原子が有効であり、これにより光学的に透
明度の高い金属窒化膜を得ることができた。This is considered to be due to light absorption by the nitrogen film. This can also be explained by the fact that when a gas containing nitrogen is used as the discharge gas, the spectrum of N2+ is centered in the emission spectrum analysis, but when ammonia is used, the spectrum of N or N+ is observed. As described above, nitrogen atom ions or nitrogen atoms are effective for increasing the degree of nitridation, and it has been possible to obtain a metal nitride film with high optical transparency.
［実施例２］
第３図は第２の実施例により作製した光磁気ディスクの
断面構造を示す模式図である。まず、案内溝を有するデ
ィスク基板１上に、窒化シリコン下地膜２屈折率：ｎ＝
＝２．３０．膜厚：ｔ＝６５０人）をスパッタ法により
形成した。ターゲットにＳｉ、放電ガスにＡ ｒ ／
Ｎ ２ ＝ ９５ ／ ５混合ガスを使用した。スパッ
タの条件は、ガス圧＝１×１０”−２（Ｔｏｒｒ）、投
入ＲＦ電カニ ４．５ （Ｗ／ｃｎＹ）基板回転数２Ｏ
ｒｐｍで１５分である。ひきつづき、光磁気記録膜４を
スパッタ法により形成した。ターゲラ１〜はＴ ｂｚａ
Ｆ ｅ４ｘ、５ｃ ０２ＯＮ ｂ８．５Ｐ ｔ７合金を
用い、放電ガスにはＡ、 ｒを使用した。まず８００人
の記録膜層を形成したところで、放電を停止することな
く放電ガスをＮ Ｈ５を５％含むＡｒガスに切り換えて
窒化物層６のスパッタを行ない、２００人の膜厚に窒化
物層を積層した。[Example 2] FIG. 3 is a schematic diagram showing the cross-sectional structure of a magneto-optical disk manufactured according to the second example. First, a silicon nitride base film 2 with refractive index: n=
=2.30. Film thickness: t=650 persons) was formed by sputtering method. Si target, Ar/discharge gas
A N2=95/5 mixed gas was used. The sputtering conditions are: gas pressure = 1 x 10"-2 (Torr), input RF electric crab 4.5 (W/cnY), substrate rotation speed 20
15 minutes at rpm. Subsequently, a magneto-optical recording film 4 was formed by sputtering. Tagera 1~ is T bza
Fe4x, 5c02ON b8.5Pt7 alloy was used, and A and r were used as discharge gases. First, when a recording film layer of 800 layers was formed, the discharge gas was switched to Ar gas containing 5% NH5 without stopping the discharge, and the nitride layer 6 was sputtered to form a nitride layer 6 with a thickness of 200 layers. were laminated.
このように作製した光磁気ディスクの再生出力のレーザ
ーパワー依存性は、第４図に示すとおりである。４．０
ｍＷから記録可能であり、著しく記録感度の高いディス
クであることがわかる。比較のために、本実施例で作製
した記録膜上にさらに５１ｇＮａ保護膜１５００人形成
したディスクの特性を第４図の点線で示した。この時の
記録条件は半径４５ｍｎ上で回転数：１８００ｒｐｍ、
記録層波数： ２．２２ＭＨｚ 、レンズのＮＡ＝０
．５３゜パルス幅１１０ ｎ ｓである。その結果、記
録できる立上りのレーザー出力をみると、本実施例によ
り作製したディスクは４． 、５ ｍ Ｗであり、比較
例の６．０ｍＷ と比べ著しく記録感度が向上している
ことがわかる。The laser power dependence of the reproduction output of the magneto-optical disk produced in this manner is as shown in FIG. 4.0
It can be seen that the disc can record from mW and has extremely high recording sensitivity. For comparison, the characteristics of a disk in which 1,500 51 g Na protective films were further formed on the recording film prepared in this example are shown by dotted lines in FIG. The recording conditions at this time were a radius of 45 mm, rotation speed: 1800 rpm,
Recording layer wave number: 2.22MHz, lens NA=0
．． The 53° pulse width was 110 ns. As a result, when we look at the laser output at the rising edge that can be recorded, the disc manufactured according to this example was 4. , 5 mW, which shows that the recording sensitivity is significantly improved compared to 6.0 mW in the comparative example.
また、このディスクの寿命試験を実施例１と同様の方法
にて行なった。比較例として、Ｎ Ｈｓの代わりにＮ２
ガスを用いて作製した窒化層を用いたディスクを示す。Further, a life test of this disk was conducted in the same manner as in Example 1. As a comparative example, N2 instead of N Hs
A disk using a nitride layer fabricated using a gas is shown.
８０℃−９５％ＲＨ中にディスクを放置したときの欠陥
レートの経時変化を測定した。結果は第５図に示すとお
りで、本発明の実施例ではこの環境中に３０００時間デ
ィスクを放置しても欠陥レートの増加はみられなかった
。The change in defect rate over time was measured when the disk was left at 80° C. and 95% RH. The results are as shown in FIG. 5, and in the example of the present invention, no increase in the defect rate was observed even if the disk was left in this environment for 3000 hours.
これに対して、比較例のディスクでは、３０００時間後
の欠陥レートが作製直後の約２倍に増大した。これは、
表面に形成した窒化物層の緻密さに違いがあるためで、
窒素を用いるよりＮ Ｈａを用いた方が、化学量論組成
に近くしかも緻密な窒化膜が形成できるため、保護性能
を著るしく高めることができたものである。On the other hand, in the disk of the comparative example, the defect rate after 3000 hours increased to about twice that immediately after fabrication. this is,
This is due to the difference in the density of the nitride layer formed on the surface.
By using N 2 Ha, a dense nitride film having a composition closer to the stoichiometric composition can be formed than by using nitrogen, so that the protective performance can be significantly improved.
本発明により形成した窒化物層は、化学量論組成でかつ
緻密な金属窒化物層を形成できるので、光磁気記録膜の
腐食を効果的に抑制でき、高信頼性の光磁気ディスク等
光磁気記録媒体を得ることができる。Since the nitride layer formed according to the present invention has a stoichiometric composition and can form a dense metal nitride layer, it can effectively suppress corrosion of the magneto-optical recording film, and can be used for highly reliable magneto-optical disks, etc. A recording medium can be obtained.
第１図及び第３図は本発明の実施例になる光磁気ディス
クの断面構造模式図、第２図及び第５図は本発明の実施
例と従来例のディスクの曲線図、第４図は光磁気ディス
クのレーザ出力依存性を示す特性図である。1 and 3 are schematic cross-sectional structural diagrams of magneto-optical disks according to embodiments of the present invention, FIGS. 2 and 5 are curve diagrams of disks according to the embodiment of the present invention and conventional disks, and FIG. FIG. 3 is a characteristic diagram showing the laser output dependence of a magneto-optical disk.
Claims (1)
光磁気記録媒体の製造方法において、情報記録膜のいず
れか一方あるいは両方の界面の近傍に窒素含有層を設け
るのに、アンモニアを含有する雰囲気にて、さらに優位
にはプラズマ化或いはイオン化した雰囲気にて作製した
ことを特徴とする光磁気記録媒体の製造方法。 ２、作製雰囲気を制御することにより多層構造の情報記
録媒体を形成したことを特徴とする請求項第１項記載の
光磁気記録媒体の製造方法。[Claims] 1. In a method for manufacturing a magneto-optical recording medium using an alloy having perpendicular magnetic anisotropy as an information recording film, a nitrogen-containing layer is provided near the interface of one or both of the information recording films. 1. A method for producing a magneto-optical recording medium, characterized in that the production is carried out in an atmosphere containing ammonia, more preferably in a plasma or ionized atmosphere. 2. The method for manufacturing a magneto-optical recording medium according to claim 1, wherein the information recording medium having a multilayer structure is formed by controlling the manufacturing atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6938788A JPH01243256A (en) | 1988-03-25 | 1988-03-25 | Production of magneto-optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6938788A JPH01243256A (en) | 1988-03-25 | 1988-03-25 | Production of magneto-optical recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01243256A true JPH01243256A (en) | 1989-09-27 |
Family
ID=13401130
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6938788A Pending JPH01243256A (en) | 1988-03-25 | 1988-03-25 | Production of magneto-optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01243256A (en) |
-
1988
- 1988-03-25 JP JP6938788A patent/JPH01243256A/en active Pending
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