JPH01241086A - Magnetic bubble element - Google Patents

Magnetic bubble element

Info

Publication number
JPH01241086A
JPH01241086A JP63067396A JP6739688A JPH01241086A JP H01241086 A JPH01241086 A JP H01241086A JP 63067396 A JP63067396 A JP 63067396A JP 6739688 A JP6739688 A JP 6739688A JP H01241086 A JPH01241086 A JP H01241086A
Authority
JP
Japan
Prior art keywords
bubble
ion implantation
ion
detector
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63067396A
Other languages
Japanese (ja)
Inventor
Toshihiro Sato
敏浩 佐藤
Takashi Toyooka
孝資 豊岡
Masatoshi Takeshita
正敏 竹下
Makoto Suzuki
良 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63067396A priority Critical patent/JPH01241086A/en
Publication of JPH01241086A publication Critical patent/JPH01241086A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain stable detected signals in a wide bias magnetic field range by providing an isolated ion-implanted area at part of the elongated area where the bubble of a detector is extended. CONSTITUTION:An ion-implanted area 7 is provided at the end section of the hairpin type conductor 1 of a detector. The bubble of the detector is started to elongate by means of stretch pulses 4 and reaches the ion-implanted area 7. Thereafter, the bubble can easily maintain an elongated state between an ion-implanted transfer path 2 and the area 7 while pulses 5 are impressed. Moreover, since the ion-implanted area 7 is isolated, the end section of a stripe- like magnetic domain does not move until annihilator pulses 6 are impressed. Therefore, the magnetic domain is stably elongated until the annihilator pulses 6 are impressed and the leakage magnetic field from the magnetic domain is supplied to a detecting line 3. As a result, stable detected signals can be obtained by means of the magneto resistance effect of the detecting line.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、イオン打込み方式の磁気バブルメモリ素子に
係り、特に動作特性が良好で大きな検出出力を得るのに
好適な磁気バブル素子用検出器に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an ion implantation type magnetic bubble memory device, and in particular to a detector for a magnetic bubble device that has good operating characteristics and is suitable for obtaining a large detection output. Regarding.

〔従来の技術〕[Conventional technology]

従来のイオン打込み方式磁気バブル索子において、情報
を読み出す際に磁気バブルの有無を電気的な信号に変換
する機能部としては、特開昭58−70479に示され
たような、薄膜パーマロイパタンを用いた検出器が知ら
れている。また、この方式では検出信号が不十分である
ため特開昭59−77695に記載のような折れ曲り型
薄膜パーマロイバタンを用いた検出器が提案されている
In conventional ion implantation type magnetic bubble probes, the functional part that converts the presence or absence of magnetic bubbles into electrical signals when reading information uses a thin film permalloy pattern as shown in JP-A-58-70479. The detector used is known. Furthermore, since the detection signal is insufficient in this method, a detector using a bent thin film permalloybatan as described in Japanese Patent Laid-Open No. 59-77695 has been proposed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は、バイアス磁界の変化に伴なう検出信号
の変動という点について考慮されておらず、検出器を十
分なバイアス磁界マージンで動作させる上で問題があっ
た。
The above-mentioned conventional technology does not take into account the fluctuation of the detection signal due to changes in the bias magnetic field, and there is a problem in operating the detector with a sufficient bias magnetic field margin.

検出器においては第2図に示すように導体パタン1に電
流パルスを印加することによって、イオン打込み転送路
2上のバブルを一方向にバブル径の数十倍のストリップ
状磁区に引き伸ばし、この伸びた磁区から生じる漏洩磁
界で定電流を印加した薄膜パーマロイ3の磁気抵抗効果
を利用し、薄膜パーマロイ両端の電圧変化としてバブル
の有無を検出する。導体パタン1に印加する電流パルス
は、第3図に示すように2段階のパルスとすることで、
導体パタン1のパルスデューティ比を減少させ、導体の
寿命を伸ばすことができる。
In the detector, as shown in Fig. 2, by applying a current pulse to the conductor pattern 1, the bubble on the ion implantation transfer path 2 is stretched in one direction into a strip-shaped magnetic domain several tens of times the diameter of the bubble. Using the magnetoresistive effect of the thin film Permalloy 3 to which a constant current is applied due to the leakage magnetic field generated from the magnetic domains, the presence or absence of bubbles is detected as a voltage change across the thin film Permalloy. The current pulse applied to the conductor pattern 1 is a two-step pulse as shown in FIG.
It is possible to reduce the pulse duty ratio of the conductor pattern 1 and extend the life of the conductor.

第1のパルス4はイオン打込み転送路2上のバブルBを
イオン打込み境界を越えさせて、端部まで引き伸ばす働
きがある。第2のパルス5は、引き伸ばしたストリップ
状磁区を保持する働きがある。これ以外に第3のパルス
としてバブルを消去するためのパルス6が必要である。
The first pulse 4 serves to extend the bubble B on the ion implantation transfer path 2 beyond the ion implantation boundary to the end. The second pulse 5 has the function of holding the stretched strip-like magnetic domain. In addition to this, a third pulse 6 is required to eliminate bubbles.

この方式の問題点は、第2パルス5を印加する間に、伸
びたバブルが徐々に収縮したり、伸びたバブルの端部が
移動することによって、バブルからの漏洩磁束が減少し
、検出出力の低下を生じることである。
The problem with this method is that while the second pulse 5 is applied, the elongated bubble gradually contracts or the end of the elongated bubble moves, resulting in a decrease in leakage magnetic flux from the bubble, and the detection output This results in a decrease in

この問題を解決する一方法として、特開昭58−704
79号に示されているように、第1のイオン打込み転送
路上から伸長したストリップ磁区の先端を第2のイオン
打込み転送路に吸引させる方法が提案されている。ただ
し、この方法では、回転磁界の方向が変わると、第2の
イオン打込み転送路の吸引磁極が移動するために、スト
リップ磁区が移動してしまうため、十分な効果を得るこ
とができない。
As one way to solve this problem,
As shown in No. 79, a method has been proposed in which the tip of a strip magnetic domain extending from a first ion implantation transfer path is attracted to a second ion implantation transfer path. However, in this method, when the direction of the rotating magnetic field changes, the attracting magnetic pole of the second ion implantation transfer path moves, causing the strip magnetic domain to move, so that a sufficient effect cannot be obtained.

本発明の目的は、イオン打込み方式の磁気バブル素子に
おいて、広いバイアス磁界範囲において安定に検出信号
が得られる検出器を提供することにある。
An object of the present invention is to provide a detector that can stably obtain a detection signal in a wide bias magnetic field range in an ion implantation type magnetic bubble element.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、検出器のバブルが伸びる細長い領域の一部
に孤立したイオン打込み領域を設けることにより達成さ
れる。
The above object is achieved by providing an isolated ion implantation region in a portion of the elongated region over which the detector bubble extends.

〔作用〕[Effect]

本発明の検出器ではバブルは第1図のヘアピン型コンダ
クタパタン1にパルス電流が印加されるとヘアピンパタ
ン1の内部で引き伸ばされ、伸びたストライプ状の磁区
の端部は、ヘアピンパタン1の内側に設けた孤立するイ
オン打込み領域7に入り込む、これによってストライプ
状磁区はメジャライン上のカスプからこのイオン打込み
領域7にまたがった状態となる。従来の検出器では伸び
たニドライブ状磁区の一力の端部が自由に移動できたの
で2段階ストレッチパルスを印加した場合。
In the detector of the present invention, the bubble is stretched inside the hairpin pattern 1 when a pulse current is applied to the hairpin conductor pattern 1 shown in FIG. The striped magnetic domain enters the isolated ion implantation region 7 provided in the ion implantation region 7, thereby causing the striped magnetic domain to extend from the cusp on the major line to the ion implantation region 7. In conventional detectors, the end of one force of the stretched Nidrive-like magnetic domain could move freely, so when a two-step stretch pulse was applied.

ストライプ状磁区の収縮が生じやすかったが、本発明で
はイオン打込み境界の吸引力によって強制的にこれを保
持できるので収縮することはない。
Striped magnetic domains tend to shrink, but in the present invention, they can be forcibly held by the attractive force of the ion implantation boundary, so they do not shrink.

また、イオン打込み領域7は孤立しているので、ストラ
イプ状磁区の端部が第3図に示す如きアナイアレートパ
ルス6を印加するまでに移動することはない。したがっ
てストライプ状磁区はアナイアレートパルス6が印加さ
れるまで安定に伸びており、6J&区からの漏洩磁界が
検出線に供給され、検出線の磁気抵抗効果によって安定
な検出信号を得ることができる。
Furthermore, since the ion implantation region 7 is isolated, the ends of the striped magnetic domains do not move until the annihilation pulse 6 as shown in FIG. 3 is applied. Therefore, the striped magnetic domain stably extends until the annihilation pulse 6 is applied, and the leakage magnetic field from the 6J& area is supplied to the detection line, and a stable detection signal can be obtained due to the magnetoresistive effect of the detection line.

〔実施例〕〔Example〕

以下、本発明の実施例を第1図、第4〜5図により説明
する。
Embodiments of the present invention will be described below with reference to FIG. 1 and FIGS. 4 and 5.

第1の実施例は第1図に示すように検出器のヘアピン型
コンダクタ1の端部にイオン打込み領域7を設けた構造
である。バブルは、ストレッチパルス4によって伸びは
じめイオン打込み領域7に達する。この後パルス5が印
加されている間は。
The first embodiment has a structure in which an ion implantation region 7 is provided at the end of a hairpin conductor 1 of the detector, as shown in FIG. The bubble begins to stretch due to the stretch pulse 4 and reaches the ion implantation region 7. While pulse 5 is being applied after this.

イオン打込み転送路2と領域7の間でバブル引き伸ばさ
れた状態を容易に保持できる。このため検出器信号の変
動はなくなる。
The expanded state of the bubble between the ion implantation transfer path 2 and the region 7 can be easily maintained. This eliminates fluctuations in the detector signal.

第2の実施例は第4図に示すように薄膜パーマロイの検
出線3を折れ曲がり型とはせずに直線型とし、かつバブ
ルが伸びる部分の非イオン打込みパタン8を細くしてイ
オン打込み領域7を設けた例である。これにより低バイ
アス磁界側でバブルの不要な動きがなくなり検出信号が
安定する。−第3の実施例は第5図に示すように検出線
3を折れ曲がり型としてイオン打込み領域7を設けさら
にバブルが伸びる大部分の領域にもイオン打込み領域9
を設けた構造である。この構造では、検出信号強度がわ
ずかに低下するがバイアス磁界の変化に対する信号変動
に対してはイオン打込み領域9の側面に生じる吸引力に
よって、より効果的である。
In the second embodiment, as shown in FIG. 4, the detection line 3 of the thin film permalloy is not bent but is linear, and the non-ion implantation pattern 8 in the portion where the bubble extends is made thinner to form the ion implantation region 7. This is an example where . This eliminates unnecessary bubble movement on the low bias magnetic field side and stabilizes the detection signal. - In the third embodiment, as shown in FIG. 5, the detection line 3 is bent and an ion implantation area 7 is provided, and the ion implantation area 9 is also provided in most of the area where the bubble extends.
It has a structure with In this structure, although the detection signal strength is slightly reduced, the attraction force generated on the side surface of the ion implantation region 9 is more effective against signal fluctuations due to changes in the bias magnetic field.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、イオン打込み方式磁気バブル素子にお
いて、バイアス磁界の変化に対して変動の少ない検出器
が構成できるので、素子の信頼性をより向上できる効果
がある。
According to the present invention, in an ion implantation type magnetic bubble device, a detector can be configured that has little variation with respect to changes in a bias magnetic field, so that the reliability of the device can be further improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の第1の実施例を示した素子の平面図、
第2図は従来の検出器の一例を示した平面図、第3図は
検出器の動作パルス波形図、第4図、第5図は本発明の
他の実施例を示した素子の平面図である。 1・・・磁気バブル引き伸ばし用コンダクタパタン、2
・・・イオン打込み転送路、3・・・検出線、4・・・
第1のバブル引き伸ばし用電流パルス、5・・・第2の
バブル引き伸ばし用電流パルス、6・・・バブル消去用
電流パルス、7・・・イオン打込み領域、8・・・非イ
オン打込みバタン、9・・・イオン打込み領域。 メl 2 $2図         第3図 (、Q)(b)
FIG. 1 is a plan view of an element showing a first embodiment of the present invention;
FIG. 2 is a plan view showing an example of a conventional detector, FIG. 3 is a diagram of operating pulse waveforms of the detector, and FIGS. 4 and 5 are plan views of elements showing other embodiments of the present invention. It is. 1... Conductor pattern for magnetic bubble expansion, 2
...Ion implantation transfer path, 3...Detection line, 4...
1st bubble stretching current pulse, 5... 2nd bubble stretching current pulse, 6... bubble erasing current pulse, 7... ion implantation region, 8... non-ion implantation slam, 9 ...Ion implantation area. Mel 2 $2 Figure Figure 3 (, Q) (b)

Claims (1)

【特許請求の範囲】[Claims] 1、選択的にイオンを打込んで形成したイオン打込み転
送路と該イオン打込み転送路と交叉を有するヘアピン型
のコンダクタパタンと磁性薄膜で形成した検出線とを含
む磁気バブル検出器において、ヘアピン型コンダクタ近
傍の磁性ガーネット膜の一部に、少なくても1つ以上の
イオン打込み領域を設けたことを特徴とする磁気バブル
素子。
1. In a magnetic bubble detector that includes an ion implantation transfer path formed by selectively implanting ions, a hairpin-shaped conductor pattern that intersects with the ion implantation transfer path, and a detection line formed of a magnetic thin film, the hairpin type A magnetic bubble element characterized in that at least one or more ion implantation region is provided in a part of a magnetic garnet film near a conductor.
JP63067396A 1988-03-23 1988-03-23 Magnetic bubble element Pending JPH01241086A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63067396A JPH01241086A (en) 1988-03-23 1988-03-23 Magnetic bubble element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63067396A JPH01241086A (en) 1988-03-23 1988-03-23 Magnetic bubble element

Publications (1)

Publication Number Publication Date
JPH01241086A true JPH01241086A (en) 1989-09-26

Family

ID=13343768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63067396A Pending JPH01241086A (en) 1988-03-23 1988-03-23 Magnetic bubble element

Country Status (1)

Country Link
JP (1) JPH01241086A (en)

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