JPH01238664A - Constant-temperature constant-humidity spot chamber - Google Patents
Constant-temperature constant-humidity spot chamberInfo
- Publication number
- JPH01238664A JPH01238664A JP6654788A JP6654788A JPH01238664A JP H01238664 A JPH01238664 A JP H01238664A JP 6654788 A JP6654788 A JP 6654788A JP 6654788 A JP6654788 A JP 6654788A JP H01238664 A JPH01238664 A JP H01238664A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- humidity
- temperature
- constant
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000012545 processing Methods 0.000 claims abstract description 35
- 239000000428 dust Substances 0.000 claims abstract description 6
- 230000001105 regulatory effect Effects 0.000 claims description 2
- 238000011161 development Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 241001441724 Tetraodontidae Species 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 210000001835 viscera Anatomy 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は例えばフォトマスクの現像処理工程など、温度
、湿度の管理を要する装置に付随して設けることができ
る恒温恒湿スポットチャンバーに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a constant temperature and constant humidity spot chamber that can be provided in conjunction with an apparatus that requires temperature and humidity control, such as a photomask development process.
（従来の技術）
例えばフォトマスク処理工程において、ポジレジストの
現像時の温度、湿度の管理は現像条件の重要なポイント
となっている。従来、このような場合の温度および湿度
の管理はフォトマスク処理装置全体を恒温恒湿チャンバ
ー内に収容しておこなわれていた。(Prior Art) For example, in a photomask processing process, control of temperature and humidity during development of a positive resist is an important point in developing conditions. Conventionally, temperature and humidity in such cases have been controlled by housing the entire photomask processing apparatus in a constant temperature and humidity chamber.
（発明が解決しようとする課題）
しかし、このような従来の温度、湿度管理方式は管埋す
べき空間が大きくなり、管理をよシ困難なものとするだ
けでなく、フォトマスクの現像、焼成、エツチング、剥
膜などをインライン方式で処理するフォトマスク自動処
理装置等、装置の長さ等が著るしく大きくなる場合には
対応が極めて困廟となる。(Problem to be solved by the invention) However, such conventional temperature and humidity control methods not only require a large space to be filled with tubes, making management difficult, but also require a large amount of space during photomask development and baking. This becomes extremely difficult when the length of the equipment becomes significantly large, such as an automatic photomask processing equipment that performs in-line processes such as etching, film removal, etc.
（ｎ題を屏決するための手段）
本発明は温度、湿度について管理すべき空間を可及的に
小さくすることができ、装置全体が著るしく大きくなる
インライン方式の場合にも適用することができる恒温恒
湿スポットチャンバーを提供することを目的とする。(Means for determining n problems) The present invention can minimize the space that must be controlled with respect to temperature and humidity, and can also be applied to in-line systems where the entire device becomes significantly large. The purpose is to provide a constant temperature and constant humidity spot chamber.
この目的達成のため、本発明は以下の構成、即ち、上部
に配設された調節済みエアーを供給するエアー供給チャ
ンバーと、このエアー供給チャンバーの下方に除じんフ
ィルターを介して設けられ、温湿度制御を要する装＃を
部分を局部的に被冠、密閉する処理用チャンバーと、上
記エアー供給チャンバーに連設されたエアー吸い込み口
と、上記処理用チャンバーの下部に連設された排気口と
、一端が上記エアー吸い込み口と連通し、他端が温湿制
御装置と連通する第１のパイプ機構と、一端が上記排気
口と連通し、他端が上記温湿制御装置と連通ずる第２の
パイプ機構とを具備してなり、温度および湿度を所望レ
ベルに調節したエアーを循環させながら上記処理用チャ
ンバーに供給するようにした恒温恒湿スポットチャンバ
ーを提供する。To achieve this objective, the present invention has the following configuration: an air supply chamber disposed in the upper part for supplying regulated air; and a dust removal filter provided below the air supply chamber, a processing chamber that locally covers and seals the equipment that requires control; an air suction port connected to the air supply chamber; and an exhaust port connected to the lower part of the processing chamber; a first pipe mechanism having one end communicating with the air suction port and the other end communicating with the temperature/humidity control device; and a second pipe mechanism having one end communicating with the air exhaust port and the other end communicating with the temperature/humidity control device. To provide a constant temperature and constant humidity spot chamber, which is equipped with a pipe mechanism and is configured to circulate and supply air whose temperature and humidity are adjusted to desired levels to the processing chamber.
（作用）
本発明の恒温恒湿スヂットチャンパーは温湿度制御を必
要とする処理装置部分のみを局部的に被冠、密閉し、こ
れと別に分離して設けられた温湿制御装置と連通させる
ことにより、温度、湿度について予め調節されたエアー
を上記処理装置部分に絶えず供給することが可能となる
。(Function) The constant temperature and humidity switch chamber of the present invention locally covers and seals only the portion of the processing equipment that requires temperature and humidity control, and communicates with a temperature and humidity control device that is provided separately. By doing so, it becomes possible to constantly supply air whose temperature and humidity have been adjusted in advance to the processing equipment section.
（実施例） 以下、本発明を図示の実施例を参照して説明する。(Example) Hereinafter, the present invention will be explained with reference to the illustrated embodiments.
第１図は視像処理機構、焼成機構、エツチング機構、剥
膜機構等をインライン方式で接続してなるフォトマスク
自動処理装置１０の一部、即ち現像処理機構１部分を示
すものであって、この視像処理機構１の上部に本発明の
恒温恒湿ヌボットチャンパー２が載置、固定されている
。即ち、この恒温恒湿スポットチャンバー２は視像処理
機構１の処理部３及び被加工物供給部４を局部的に被冠
、密閉した状態で固定されている。FIG. 1 shows a part of an automatic photomask processing apparatus 10, in which a visual processing mechanism, a baking mechanism, an etching mechanism, a film peeling mechanism, etc. are connected in an in-line manner, that is, a part of a developing processing mechanism. A constant temperature and constant humidity Nubot chamberer 2 of the present invention is placed and fixed on top of this visual image processing mechanism 1. That is, the constant temperature and constant humidity spot chamber 2 is fixed in a state where the processing section 3 and the workpiece supply section 4 of the visual image processing mechanism 1 are locally covered and sealed.
この恒温恒湿スＩットチャンパー２は第１図及び第２図
から明らかなように、天井部分に温度、湿度について予
め調節されたエアーを供給するためのエアー供給チャン
バー６と、このエアー供給チャンバー６の下方に除じん
フィルター７を介して連通ずる処理用チャンバー８とか
らなって−る。As is clear from FIGS. 1 and 2, this constant temperature and constant humidity switch chamber 2 includes an air supply chamber 6 for supplying air whose temperature and humidity have been adjusted in advance to the ceiling, and It consists of a processing chamber 8 which communicates with the lower part of the chamber through a dust removal filter 7.
この処理用チャンバー８には温湿度センサ−９が設けら
れていて、処理用チャンバ−８内部の温度、湿度に関す
る情報を絶えず、後述する温湿制御装置に伝達し、所望
レベルに温度及び湿度調節されたエアーがこの処理用チ
ャンバー８に供給されるようになっている。This processing chamber 8 is equipped with a temperature and humidity sensor 9, which constantly transmits information regarding the temperature and humidity inside the processing chamber 8 to a temperature and humidity control device to be described later, and adjusts the temperature and humidity to a desired level. The air is supplied to the processing chamber 8.
エアー供給チャンバー６の一側には第２図に示す如くエ
アー吸い込み口１１が設けられていて、これに温湿制御
装置に接続されている・９イブ１２（第１のパイプ機構
）の一端が接続されている・処理用チャンバー８の下部
にも排気口１３が設けられていて、これに温湿制御装置
に接続されている・９イグＪ４（第２のパイｆ機構）の
一端が接続されている。除じんフィルター７としてはメ
ソシュタイプのものなど公知のものを適宜使用し得る。An air suction port 11 is provided on one side of the air supply chamber 6 as shown in FIG. - An exhaust port 13 is also provided at the bottom of the processing chamber 8, and is connected to the temperature/humidity control device. - One end of the 9ig J4 (second pi-f mechanism) is connected. ing. As the dust removal filter 7, a known filter such as a mesh type filter may be used as appropriate.
次に、上記恒温恒湿スポットチャンバー２に供給するエ
アーの温度及び湿度をＮ節するための温湿制御装置につ
いての説明する。Next, a temperature and humidity control device for controlling the temperature and humidity of the air supplied to the constant temperature and constant humidity spot chamber 2 will be explained.
第３図は温湿制御装置の一例を示す断面図でおって、第
１のハウジング１５と第２のハウジング１６とから構成
され、第１のハウジング１５内にはその底部に冷凍機１
６が配設されていて、その上方に冷却コイル１７、加湿
機１８、ヒータ１９および送風ファン２０が設けられて
いる。送風ファン２０は第１のハウジング１５の上部１
１１１面に設けられた吹出し口２１と連設されていて、
温度及び湿度について調節されたエアーをノやイブ１２
を介して恒温恒湿スポットチャンバー２内に導入するよ
うＫなっている。上記／−４，Ｅｌコイル１７よシやや
下方の側壁にもエアー吸い込み口２２が設けられていて
、パイｆｌ ４ｆ介して恒温恒湿スポットチャンバー２
の排気口１３と連通している。FIG. 3 is a sectional view showing an example of a temperature and humidity control device, which is composed of a first housing 15 and a second housing 16, and inside the first housing 15 is a refrigerator 1 at the bottom.
A cooling coil 17, a humidifier 18, a heater 19, and a blower fan 20 are provided above the cooling coil 6. The blower fan 20 is mounted on the upper part 1 of the first housing 15.
It is connected to the air outlet 21 provided on the 111th surface,
Air that has been adjusted for temperature and humidity 12
K is introduced into the constant temperature and constant humidity spot chamber 2 through the. Above /-4, an air suction port 22 is also provided on the side wall slightly below the El coil 17, and air is passed through the constant temperature and constant humidity spot chamber 2 through the pi fl 4f.
It communicates with the exhaust port 13 of.
第２のハウジング２３内には除湿機２４が設けられてい
て、第１のハウジング１５内のエアーを・母イブ２４に
よシ導入し、この除湿機２３に導いて除湿したのち、こ
れを／？イブ２５を介して再び第１のハウジング１５内
に戻すようになっている。A dehumidifier 24 is provided in the second housing 23, and the air in the first housing 15 is introduced into the mother plate 24, guided to the dehumidifier 23 to be dehumidified, and then dehumidified. ? It is returned to the first housing 15 via the tube 25.
次に、この恒温恒湿スポットチャンバー２を操作につい
て説明すると、まず、その内部に設けられた温湿センサ
ー９により検出きれたエアーの温度、湿度についての情
報が温湿制御装置の制御機Ｉ１ｍ（図示しない）に伝達
され、これに基づいて、温湿制御装置のヒータ１９又は
冷ｉ！［機１６が作動し、同時に除湿機２４又は加湿機
１８が働き、第１のハウジング１５内のエアーの温度、
湿度が適当レベルに調節され、これが送風ファン２０に
より、・マイプ１２を介して恒温恒湿スポットチャンバ
ー２のエアー供給チャンバー６内に送られ、さらにフィ
ルター７により除じんされたのち、処理用チャンバー８
内に導入され、さらに排気口１３、・母イブ１４′ｔ−
介して再び第１の）・ウジフグ１５内に戻される。この
ようなエアー循環サイクルによって、現像処理機構１の
処理１６５３及び被加工物供給部４は常に一定の温湿度
ならびに清浄度に維持されることになる。Next, to explain the operation of this constant temperature and constant humidity spot chamber 2, first, information about the temperature and humidity of the air detected by the temperature and humidity sensor 9 installed inside the chamber 2 is transmitted to the controller I1m ( (not shown), and based on this, the heater 19 of the temperature/humidity control device or the cold i! [The dehumidifier 24 or the humidifier 18 operates at the same time as the unit 16 operates, and the temperature of the air in the first housing 15 decreases.
The humidity is adjusted to an appropriate level, and the air is sent by the blower fan 20 to the air supply chamber 6 of the constant temperature and humidity spot chamber 2 via the air filter 12, and further removed by the filter 7, after which it is sent to the processing chamber 8.
In addition, the exhaust port 13, the mother eve 14't-
It is then returned to the first maggot pufferfish 15 through the process. Through such an air circulation cycle, the processing 1653 of the developing processing mechanism 1 and the workpiece supply section 4 are always maintained at constant temperature, humidity, and cleanliness.
なお、上記実施例においてはフォトマスクの現像工程に
本発明の装置を適用した場合について説明したが、これ
に限らず、その他局部的に温度、湿度についての管理に
必要な装置に対しても適用し得ることは明らかであろう
。又、本発明の恒温恒湿スポットチャンバーと連通して
用いられる温湿制御装置についても上記実施例のものに
限らず、任意のものを利用することができよう。In addition, in the above embodiment, the case where the apparatus of the present invention is applied to the photomask development process has been described, but the application is not limited to this, but can also be applied to other apparatuses required for locally controlling temperature and humidity. It is obvious that it can be done. Further, the temperature and humidity control device used in communication with the constant temperature and constant humidity spot chamber of the present invention is not limited to the one in the above embodiments, and any other device may be used.
ところで、上記恒温恒湿スポットチャンバー２はメンテ
ナンス上の便宜を図るため、その側面、前面、又は背面
を臓状に開閉自在にしてもよい。Incidentally, the constant temperature and constant humidity spot chamber 2 may be configured such that its side, front, or back can be opened and closed like a viscera for convenience in maintenance.
（発明の効果）
以上祥述したように本発明の恒温恒湿スポットチャンバ
ーは温湿制御を必要とする部分のみ囲繞し、その内部の
温湿度の制御をおこなうよう圧したから、管理すべき空
間を可及的に小さくすることが可能となり、制御性、コ
ストの面で従来のものと比較して著るしく有利となるほ
か、インライン方式の大型の自動処理装置に対しても容
易に適応させることが可能となる。第１、第２チヤンバ
ーは一体型にしても効果は同じなので、スペース等の余
裕があれば一体型にしてもよい。(Effects of the Invention) As described above, the constant temperature and constant humidity spot chamber of the present invention surrounds only the area that requires temperature and humidity control, and pressure is applied to control the temperature and humidity inside the chamber. This makes it possible to make it as small as possible, which is significantly advantageous compared to conventional methods in terms of controllability and cost, and it can also be easily adapted to large in-line automatic processing equipment. becomes possible. The effect is the same even if the first and second chambers are integrated, so if there is sufficient space, they may be integrated.
第１図は本発明罠係わる恒温恒温スポットチャンバ〜を
フォトマスクの現像処理装置罠適用した例を示す一部切
欠断面図、第２図は第１図のものを側方から見た場合の
状態を示す断面図、第３図は本発明の恒温恒湿スポット
チャンバーと連通させて用いられる温湿制御装置の一例
を示す断面図である。
図中、１・・・現像処理機構、２・・・恒温恒湿スポッ
トチャンバー、３・・・処理部、４・・・被加工物供給
部、６・・・エアー供給チャンバー、７・・・除じんフ
ィルター、８・・・処理用チャンバー、９・・・＠湿セ
ンサー、１１・・・吸い込み口、１２．１４・・・パイ
プ、１３・・・排気口、１５・・・第１のハウジング、
１６・・・第２のハウジング、１７・・・冷却コイル、
１８・・・加湿機、１９・・・ヒータ、２０・・・送風
ファン、２１・・・吸出し口、２２・・・吸い込み口、
２３・・・第２のノ＼ウジング、２４・・・除湿機。Fig. 1 is a partially cutaway sectional view showing an example in which a thermostatic spot chamber according to the present invention is applied to a photomask development processing device trap, and Fig. 2 is a side view of the one in Fig. 1. FIG. 3 is a sectional view showing an example of a temperature and humidity control device used in communication with the constant temperature and humidity spot chamber of the present invention. In the figure, 1... development processing mechanism, 2... constant temperature and constant humidity spot chamber, 3... processing section, 4... workpiece supply section, 6... air supply chamber, 7... Dust removal filter, 8...Processing chamber, 9...@humidity sensor, 11...Suction port, 12.14...Pipe, 13...Exhaust port, 15...First housing ,
16... Second housing, 17... Cooling coil,
18... humidifier, 19... heater, 20... ventilation fan, 21... suction port, 22... suction port,
23...Second nozzing, 24...Dehumidifier.
Claims (1)
給チャンバーと、このエアー供給チャンバーの下方に除
じんフィルターを介して設けられ、温湿度制御を要する
装置部分を局部的に被冠、密閉する処理用チャンバーと
、上記エアー供給チャンバーに連設されたエアー吸い込
み口と、上記処理用チャンバーの下部に連設された排気
口と、一端が上記エアー吸い込み口と連通し、他端が温
湿制御装置と連通する第１のパイプ機構と、一端が上記
排気口と連通し、他端が上記温湿制御装置と連通する第
２のパイプ機構とを具備してなり、温度および湿度を所
望レベルに調節したエアーを循環させながら上記処理用
チャンバーに供給するようにした恒温恒湿スポットチャ
ンバー。An air supply chamber located at the top that supplies regulated air, and a dust filter installed below this air supply chamber to locally cover and seal the parts of the device that require temperature and humidity control. an air suction port connected to the air supply chamber, an exhaust port connected to the bottom of the processing chamber, one end communicating with the air suction port, and the other end communicating with a temperature/humidity control device. and a second pipe mechanism, one end of which communicates with the exhaust port and the other end of which communicates with the temperature/humidity control device, to adjust the temperature and humidity to a desired level. A constant-temperature and constant-humidity spot chamber in which air is circulated and supplied to the processing chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63066547A JP2615784B2 (en) | 1988-03-18 | 1988-03-18 | Processing apparatus having a development processing mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63066547A JP2615784B2 (en) | 1988-03-18 | 1988-03-18 | Processing apparatus having a development processing mechanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01238664A true JPH01238664A (en) | 1989-09-22 |
| JP2615784B2 JP2615784B2 (en) | 1997-06-04 |
Family
ID=13319039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63066547A Expired - Lifetime JP2615784B2 (en) | 1988-03-18 | 1988-03-18 | Processing apparatus having a development processing mechanism |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2615784B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097943A (en) * | 1986-02-05 | 1992-03-24 | Nisshinbo Industries, Inc. | Bobbin transfer appartaus in spinning processes |
| CN113467197A (en) * | 2021-07-02 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Novel spin coating developing machine |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102618152B1 (en) * | 2021-07-29 | 2023-12-27 | 채원식 | Workpiece stored and released equipment |
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| JPS6313332A (en) * | 1986-07-04 | 1988-01-20 | Canon Inc | Device for manufacturing semiconductor |
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1988
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|---|---|---|---|---|
| JPS57152129A (en) * | 1981-03-13 | 1982-09-20 | Sanyo Electric Co Ltd | Developing method of resist |
| JPS58199349A (en) * | 1982-05-17 | 1983-11-19 | Toshiba Corp | In-line device of photoetching |
| JPS60116236U (en) * | 1984-01-13 | 1985-08-06 | 関西日本電気株式会社 | semiconductor manufacturing equipment |
| JPS6127238U (en) * | 1984-07-19 | 1986-02-18 | ソニー株式会社 | Dust-free constant temperature device |
| JPS61169323U (en) * | 1985-04-05 | 1986-10-21 | ||
| JPS62252938A (en) * | 1986-03-14 | 1987-11-04 | Daikin Ind Ltd | Resist developing apparatus |
| JPS6313332A (en) * | 1986-07-04 | 1988-01-20 | Canon Inc | Device for manufacturing semiconductor |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097943A (en) * | 1986-02-05 | 1992-03-24 | Nisshinbo Industries, Inc. | Bobbin transfer appartaus in spinning processes |
| CN113467197A (en) * | 2021-07-02 | 2021-10-01 | 宁波润华全芯微电子设备有限公司 | Novel spin coating developing machine |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2615784B2 (en) | 1997-06-04 |
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