JPH01228181A - Semiconductor light emitting element - Google Patents
Semiconductor light emitting elementInfo
- Publication number
- JPH01228181A JPH01228181A JP63054627A JP5462788A JPH01228181A JP H01228181 A JPH01228181 A JP H01228181A JP 63054627 A JP63054627 A JP 63054627A JP 5462788 A JP5462788 A JP 5462788A JP H01228181 A JPH01228181 A JP H01228181A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- electrode
- light
- light emitting
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000605 extraction Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 abstract description 9
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000005530 etching Methods 0.000 abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000012530 fluid Substances 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000005253 cladding Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical class [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 241001446467 Mama Species 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Led Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光通信用モノシリツクレンズ型発光ダイオード
の構造に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a monosilicon lens type light emitting diode for optical communication.
(従来の技術)
光通信用面発光ダイオードは、半導体レーザに比べて低
価格、高倍転性という特徴を持ち、近中距離光通信用光
源として用いられている。発光ダイオードからの光はほ
とんど等方的に放射される。(Prior Art) Surface-emitting diodes for optical communication have the characteristics of lower cost and higher multiplication characteristics than semiconductor lasers, and are used as light sources for near- and medium-range optical communication. Light from light emitting diodes is emitted almost isotropically.
この広がった光を光ファイバの細いコアに効率よ<導り
ために、いろいろの結合方法が工夫されている。例えば
、第3図に示すように、面発光ダイオードの発光面にガ
ラス球レンズ(3)を樹脂(4)で接着することにより
結合効率を高める方法、および、第4図(a)、(b)
に示すように、半導体基板(1)にイオンエツチングな
どの手法により球状加工面(6)をつくり、モノシリン
クレンズとし、光ファイバの先端には溶融加工を施して
先球ファイバー(5)とする方法などがある。Various coupling methods have been devised to efficiently guide this spread light into the thin core of an optical fiber. For example, as shown in Fig. 3, there is a method of increasing the coupling efficiency by bonding a glass bulb lens (3) to the light emitting surface of a surface emitting diode with resin (4), and a method of increasing the coupling efficiency by bonding a glass bulb lens (3) to the light emitting surface of a surface emitting diode with resin (4); )
As shown in Figure 2, a spherical processed surface (6) is created on a semiconductor substrate (1) using a method such as ion etching to form a monocylindrical lens, and the tip of the optical fiber is melted to form a spherical fiber (5). There are ways to do this.
球状加工面は、例えば、直径約90−の円形をしており
、頂点は基板より約7μ高くなっている。The spherical processed surface has, for example, a circular shape with a diameter of approximately 90 mm, and the apex is approximately 7 microns higher than the substrate.
(発明が解決しようとする課題)
しかしながら、従来のモノシリツクレンズ型発光ダイオ
ードは、レンズの頂点が電橋面より高くなっているため
、レンズ加工後の電極形成が行いにくく、またボンディ
ング時にレンズ部表面を損傷するおそれがあった。さら
に、レンズ頂点が電極面より上方にあるため、!!g緘
的強度を強くする必要がある。そのために、基板を厚く
すると、発光部(7)とレンズ面の距離が長くなり、光
取出し効率が構造的に制約されるという問題があった。(Problems to be Solved by the Invention) However, in conventional monolithic lens type light emitting diodes, the apex of the lens is higher than the electric bridge surface, which makes it difficult to form electrodes after lens processing, and also makes it difficult to form electrodes on the lens part during bonding. There was a risk of damaging the surface. Furthermore, since the lens apex is above the electrode surface,! ! It is necessary to strengthen the physical strength. Therefore, if the substrate is made thicker, the distance between the light emitting section (7) and the lens surface becomes longer, which poses a problem in that the light extraction efficiency is structurally restricted.
本発明は以上のような点にかんがみてなされたもので、
その目的とするところは、モノシリツクレンズ型発光ダ
イオードのレンズ側の形状を改善して、電極形成および
ボンディングの作業能率をとげ、素子製作の歩留りを向
上させるとともに、素子の機械的強度を保持したまま、
発光部とレンズの距離をより短くして光取出し効率を高
めた半導体発光素子を提供することにより、その要旨は
半導体基板の一面が、その上に電極が形成されて光取り
出し面となり、前記半導体基板の他面が、その上に活性
層を有する面発光型発光ダイオードにおいて、光取り出
し面上に球レンズ形状が形成され、該レンズの半導体基
板と垂直方向の頂点の位置が、光取り出し面に形成され
た電極と同じ位置か、またはより活性層側に位置してい
ることを特徴とする半導体発光素子である。The present invention has been made in view of the above points.
The purpose of this is to improve the shape of the lens side of monosilicon lens type light emitting diodes, increase the work efficiency of electrode formation and bonding, improve the yield of device manufacturing, and maintain the mechanical strength of the device. Mama,
By providing a semiconductor light-emitting element in which the distance between the light-emitting part and the lens is shortened to improve light extraction efficiency, the gist of the device is that one surface of the semiconductor substrate is formed with an electrode thereon and becomes a light-extraction surface, and the semiconductor In a surface-emitting light emitting diode on which the other surface of the substrate has an active layer, a spherical lens shape is formed on the light extraction surface, and the position of the apex of the lens in the direction perpendicular to the semiconductor substrate is on the light extraction surface. This is a semiconductor light emitting device characterized by being located at the same position as the formed electrode or closer to the active layer side.
〔作用]
光取り出し面の電極面が球レンズ面よりも上方にあるた
め、電極形成およびボンディング作業が容易に行われる
。また、球レンズ面が電極面よりも半導体基板内部に位
置し、活性層のある発光部に近くなっているため、光取
り出し効率が向上する。[Function] Since the electrode surface of the light extraction surface is located above the spherical lens surface, electrode formation and bonding operations are easily performed. Furthermore, since the spherical lens surface is located inside the semiconductor substrate and closer to the light emitting section where the active layer is located than the electrode surface, light extraction efficiency is improved.
以下開面に示した実施例に基づいて本発明を説明する。 The present invention will be described below based on embodiments shown in the open view.
第1図(a)、Cb)は本発明による一実施例の要部断
面図であり、n−1nP基板(11)上にn−1nPク
ラッド層Q7J、 p −1nGaAs P活性層側、
p−InPクラッド層04)、P”−1nGaAsPキ
ャップ層0ωを順次エピタキシャル成長させた後、電流
狭搾用にSiO□膜06)を形成し、電流注入用の窓あ
けをフォトリソグラフィー技術により行う。FIGS. 1(a) and 1Cb) are cross-sectional views of essential parts of an embodiment according to the present invention, in which an n-1nP cladding layer Q7J is formed on an n-1nP substrate (11), a p-1nGaAs P active layer side,
After a p-InP cladding layer 04) and a P''-1nGaAsP cap layer 0ω are epitaxially grown in sequence, a SiO□ film 06) is formed for current confinement, and a window for current injection is formed by photolithography.
次に全面にp−電極0ηを形成し、ポンディングのため
A u −P H308)を積層する。Next, a p-electrode 0η is formed on the entire surface, and A u -P H308) is laminated for bonding.
第2図は球レンズの形成プロセスの説明図であり、第2
図(a)に示すように、光取り出し面側には、n−電極
θ9)をn−1nP基板θ1)上に光取り出し用の窓部
を除いてリフトオフ法により形成する。次に5iftま
たはTiO□などの誘電体膜r20を同様に窓部を残し
て形成する0次に、レンズ) (21)により光取り出
し部を円形状に、また誘電体膜QG上を被い、230°
C以上に加熱して、第2図b)に示すように、レジスト
をダレさせた形状にする0次に、イオンビームエツチン
グ法により、レジストが消失するまでエツチングを行う
と、第2図(C)に示すようにn−1nPjJ板01)
上に、頂点がn−電極09)より高くない球レンズ形状
を得る。球レンズは直径約120−の円形をしており、
その頂点の高さは約161M、頂点は基板面より約30
−低くなっている。最後に、誘電体膜QIを除去する。Figure 2 is an explanatory diagram of the process of forming a spherical lens.
As shown in Figure (a), on the light extraction surface side, an n-electrode θ9) is formed on the n-1nP substrate θ1) by a lift-off method except for a window portion for light extraction. Next, a dielectric film r20 such as 5ift or TiO 230°
The resist is heated to a temperature higher than C to form a sagging shape as shown in Fig. 2b).Next, etching is performed by ion beam etching until the resist disappears, as shown in Fig. 2(C). ) as shown in n-1nPjJ plate 01)
Above, we obtain a spherical lens shape whose apex is no higher than the n-electrode 09). A spherical lens has a circular shape with a diameter of approximately 120 mm.
The height of the apex is approximately 161M, and the apex is approximately 30 m above the substrate surface.
-It's getting lower. Finally, the dielectric film QI is removed.
[発明の効果〕
以上説明したように本発明によれば、半導体基板の光取
り出し面上に形成された球レンズ形状の半導体基板と垂
直方向の頂点の位置が電極面と同じか、またはより活性
層側に位置しているため、次工程でレンズ面を損傷する
ことがなく、取扱いが容易で歩留りが向上し、さらに、
基板を素子の機械的強度を保つ十分な厚みにしても、発
光部とレンズの距離を近くに保つことができ、光取り出
し効率を大きくすることができるという優れた効果があ
る。[Effects of the Invention] As explained above, according to the present invention, the position of the apex in the vertical direction of the semiconductor substrate in the shape of a spherical lens formed on the light extraction surface of the semiconductor substrate is the same as the electrode surface, or is more active than the electrode surface. Because it is located on the layer side, it does not damage the lens surface in the next process, making handling easier and improving yield.
Even if the substrate is made thick enough to maintain the mechanical strength of the element, the distance between the light emitting part and the lens can be kept close, which has the excellent effect of increasing light extraction efficiency.
第1図(a)、(b)は本発明にがかる一実施例の要部
断面図、第2図(a)〜(C)は前記実施例の製造工程
説明図、第3図、第4図(a)、(ト))は従来例の要
部断面図である。
1・・・半導体基板、 2・・・電極、 3・・・ガラ
ス球レンズ、 4・・・樹脂、 5・・・先球ファイバ
ー、6・・・球状加工面、 7・・・発光部、 8・・
・エピタキシャル層、 1l−n−1nP基板、 12
− n −1nPクランド層、 13−p −1nGa
As P活性層、 14・・・p−1nPクラッド層、
15・・・P二1nGaAs Pキ+ツブ層、 16
− S i Oz膜、17・・・p電極、 18−Au
−PH3,19・n−電極、 20・・・誘電体膜、
21・・・レジスト。1(a) and 1(b) are sectional views of essential parts of an embodiment according to the present invention, FIGS. 2(a) to 4(C) are explanatory diagrams of the manufacturing process of the embodiment, Figures (a) and (g) are sectional views of main parts of a conventional example. DESCRIPTION OF SYMBOLS 1... Semiconductor substrate, 2... Electrode, 3... Glass bulb lens, 4... Resin, 5... Spherical fiber, 6... Spherical processed surface, 7... Light emitting part, 8...
・Epitaxial layer, 1l-n-1nP substrate, 12
-n-1nP ground layer, 13-p-1nGa
AsP active layer, 14...p-1nP cladding layer,
15...P21nGaAs P+tube layer, 16
- SiOz film, 17...p electrode, 18-Au
-PH3,19・n-electrode, 20... dielectric film,
21...Resist.
Claims (2)
光取り出し面となり、前記半導体基板の他面は、その上
に活性層を有する半導体発光素子において、光取り出し
面上に球レンズ形状が形成され、該レンズの半導体基板
と垂直方向の頂点の位置が、光取り出し面に形成された
電極と同じ位置か、またはより活性層側に位置している
ことを特徴とする半導体発光素子。(1) One surface of the semiconductor substrate has an electrode formed thereon and serves as a light extraction surface, and the other surface of the semiconductor substrate has a spherical lens shape on the light extraction surface in a semiconductor light emitting device having an active layer thereon. 1. A semiconductor light emitting device, wherein a vertex of the lens in a direction perpendicular to a semiconductor substrate is located at the same position as an electrode formed on a light extraction surface or closer to an active layer side.
る請求項1記載の半導体発光素子。(2) The semiconductor light emitting device according to claim 1, wherein the semiconductor substrate is made of InP.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63054627A JPH01228181A (en) | 1988-03-08 | 1988-03-08 | Semiconductor light emitting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63054627A JPH01228181A (en) | 1988-03-08 | 1988-03-08 | Semiconductor light emitting element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01228181A true JPH01228181A (en) | 1989-09-12 |
Family
ID=12975988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63054627A Pending JPH01228181A (en) | 1988-03-08 | 1988-03-08 | Semiconductor light emitting element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01228181A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002007229A1 (en) * | 2000-07-19 | 2002-01-24 | Qinetiq Limited | Light emitting diode arrangements |
JP2006114594A (en) * | 2004-10-13 | 2006-04-27 | Oki Electric Ind Co Ltd | Micro lens manufacturing method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380989A (en) * | 1976-12-27 | 1978-07-17 | Nippon Telegr & Teleph Corp <Ntt> | Light emitting diode |
JPS57143880A (en) * | 1981-03-02 | 1982-09-06 | Fujitsu Ltd | Semiconductor light emitting element and its manufacture |
-
1988
- 1988-03-08 JP JP63054627A patent/JPH01228181A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5380989A (en) * | 1976-12-27 | 1978-07-17 | Nippon Telegr & Teleph Corp <Ntt> | Light emitting diode |
JPS57143880A (en) * | 1981-03-02 | 1982-09-06 | Fujitsu Ltd | Semiconductor light emitting element and its manufacture |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002007229A1 (en) * | 2000-07-19 | 2002-01-24 | Qinetiq Limited | Light emitting diode arrangements |
JP2006114594A (en) * | 2004-10-13 | 2006-04-27 | Oki Electric Ind Co Ltd | Micro lens manufacturing method |
JP4568076B2 (en) * | 2004-10-13 | 2010-10-27 | Okiセミコンダクタ株式会社 | Microlens manufacturing method |
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