JPH01220973A - Picture forming method with high contrast - Google Patents
Picture forming method with high contrastInfo
- Publication number
- JPH01220973A JPH01220973A JP63003577A JP357788A JPH01220973A JP H01220973 A JPH01220973 A JP H01220973A JP 63003577 A JP63003577 A JP 63003577A JP 357788 A JP357788 A JP 357788A JP H01220973 A JPH01220973 A JP H01220973A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- general formula
- developer
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 30
- -1 silver halide Chemical class 0.000 claims abstract description 122
- 150000001875 compounds Chemical class 0.000 claims abstract description 60
- 229910052709 silver Inorganic materials 0.000 claims abstract description 58
- 239000004332 silver Substances 0.000 claims abstract description 58
- 239000000463 material Substances 0.000 claims abstract description 35
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 17
- 229910001414 potassium ion Inorganic materials 0.000 claims abstract description 11
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000002500 ions Chemical class 0.000 claims abstract description 9
- 150000001768 cations Chemical class 0.000 claims abstract description 6
- 125000000547 substituted alkyl group Chemical group 0.000 claims abstract description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract description 5
- 238000009792 diffusion process Methods 0.000 claims abstract description 4
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 3
- 125000005647 linker group Chemical group 0.000 claims abstract description 3
- 125000003118 aryl group Chemical group 0.000 claims description 19
- 125000000623 heterocyclic group Chemical group 0.000 claims description 14
- 238000012545 processing Methods 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 238000001179 sorption measurement Methods 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 5
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 125000004104 aryloxy group Chemical group 0.000 claims description 3
- 230000001737 promoting effect Effects 0.000 claims description 3
- 125000005415 substituted alkoxy group Chemical group 0.000 claims description 3
- 125000000626 sulfinic acid group Chemical group 0.000 claims 1
- 238000011161 development Methods 0.000 abstract description 20
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 12
- 239000007788 liquid Substances 0.000 abstract description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 description 27
- 125000000217 alkyl group Chemical group 0.000 description 22
- 239000010410 layer Substances 0.000 description 20
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 19
- 230000018109 developmental process Effects 0.000 description 19
- 125000004432 carbon atom Chemical group C* 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 125000001424 substituent group Chemical group 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- IRSCLWYPLNPCQX-UHFFFAOYSA-N 1-phenyl-2h-tetrazole-5-thione;sodium Chemical compound [Na].S=C1N=NNN1C1=CC=CC=C1 IRSCLWYPLNPCQX-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 108010010803 Gelatin Proteins 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 239000008273 gelatin Substances 0.000 description 5
- 229920000159 gelatin Polymers 0.000 description 5
- 235000019322 gelatine Nutrition 0.000 description 5
- 235000011852 gelatine desserts Nutrition 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 4
- LLOAINVMNYBDNR-UHFFFAOYSA-N 2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2NC(=S)NC2=C1 LLOAINVMNYBDNR-UHFFFAOYSA-N 0.000 description 4
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 4
- GUQQSAWTCKBBQS-UHFFFAOYSA-N 7-methyl-2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonic acid Chemical compound CC1=CC(S(O)(=O)=O)=CC2=C1NC(=S)N2 GUQQSAWTCKBBQS-UHFFFAOYSA-N 0.000 description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002334 glycols Chemical class 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical class O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 206010070834 Sensitisation Diseases 0.000 description 3
- 125000004442 acylamino group Chemical group 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical group 0.000 description 3
- 125000002619 bicyclic group Chemical group 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 230000008313 sensitization Effects 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 2
- LUBJCRLGQSPQNN-UHFFFAOYSA-N 1-Phenylurea Chemical compound NC(=O)NC1=CC=CC=C1 LUBJCRLGQSPQNN-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical class O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 2
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002503 iridium Chemical class 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 239000002562 thickening agent Substances 0.000 description 2
- 125000001391 thioamide group Chemical group 0.000 description 2
- 125000001425 triazolyl group Chemical group 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- FZENGILVLUJGJX-NSCUHMNNSA-N (E)-acetaldehyde oxime Chemical compound C\C=N\O FZENGILVLUJGJX-NSCUHMNNSA-N 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- PCGADGNLXMZRCY-UHFFFAOYSA-N 1-(4-aminophenyl)-4-methyl-4-propylpyrazolidin-3-one Chemical compound N1C(=O)C(CCC)(C)CN1C1=CC=C(N)C=C1 PCGADGNLXMZRCY-UHFFFAOYSA-N 0.000 description 1
- SIQZJFKTROUNPI-UHFFFAOYSA-N 1-(hydroxymethyl)-5,5-dimethylhydantoin Chemical class CC1(C)N(CO)C(=O)NC1=O SIQZJFKTROUNPI-UHFFFAOYSA-N 0.000 description 1
- LBRNGKKJVDPPQT-UHFFFAOYSA-N 1-phenyl-2h-tetrazole-5-thione;potassium Chemical compound [K].SC1=NN=NN1C1=CC=CC=C1 LBRNGKKJVDPPQT-UHFFFAOYSA-N 0.000 description 1
- XTNHVTIXTMOWGU-UHFFFAOYSA-N 2,3,4-triaminophenol Chemical compound NC1=CC=C(O)C(N)=C1N XTNHVTIXTMOWGU-UHFFFAOYSA-N 0.000 description 1
- DPKOCFTZJRJTQL-UHFFFAOYSA-N 2,4-diamino-5-methylphenol Chemical compound CC1=CC(O)=C(N)C=C1N DPKOCFTZJRJTQL-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- QPKNFEVLZVJGBM-UHFFFAOYSA-N 2-aminonaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(N)=CC=C21 QPKNFEVLZVJGBM-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- OVOZYARDXPHRDL-UHFFFAOYSA-N 3,4-diaminophenol Chemical compound NC1=CC=C(O)C=C1N OVOZYARDXPHRDL-UHFFFAOYSA-N 0.000 description 1
- SAQHUYUDATUGDI-UHFFFAOYSA-N 4,4-diethyl-1-(4-methoxyphenyl)pyrazolidin-3-one Chemical compound N1C(=O)C(CC)(CC)CN1C1=CC=C(OC)C=C1 SAQHUYUDATUGDI-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- OUIITAOCYATDMY-UHFFFAOYSA-N 4-amino-2-phenylphenol Chemical compound NC1=CC=C(O)C(C=2C=CC=CC=2)=C1 OUIITAOCYATDMY-UHFFFAOYSA-N 0.000 description 1
- XSFKCGABINPZRK-UHFFFAOYSA-N 4-aminopyrazol-3-one Chemical class NC1=CN=NC1=O XSFKCGABINPZRK-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- JXRGUPLJCCDGKG-UHFFFAOYSA-N 4-nitrobenzenesulfonyl chloride Chemical compound [O-][N+](=O)C1=CC=C(S(Cl)(=O)=O)C=C1 JXRGUPLJCCDGKG-UHFFFAOYSA-N 0.000 description 1
- KMVPXBDOWDXXEN-UHFFFAOYSA-N 4-nitrophenylhydrazine Chemical compound NNC1=CC=C([N+]([O-])=O)C=C1 KMVPXBDOWDXXEN-UHFFFAOYSA-N 0.000 description 1
- CWIYBOJLSWJGKV-UHFFFAOYSA-N 5-methyl-1,3-dihydrobenzimidazole-2-thione Chemical compound CC1=CC=C2NC(S)=NC2=C1 CWIYBOJLSWJGKV-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 1
- ORZRMRUXSPNQQL-UHFFFAOYSA-N 6-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2C=NNC2=C1 ORZRMRUXSPNQQL-UHFFFAOYSA-N 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- WLJUQHJNPIQOMP-UHFFFAOYSA-N C(#N)BrCl Chemical compound C(#N)BrCl WLJUQHJNPIQOMP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- RYECOJGRJDOGPP-UHFFFAOYSA-N Ethylurea Chemical compound CCNC(N)=O RYECOJGRJDOGPP-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910003803 Gold(III) chloride Inorganic materials 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- GMEHFXXZSWDEDB-UHFFFAOYSA-N N-ethylthiourea Chemical compound CCNC(N)=S GMEHFXXZSWDEDB-UHFFFAOYSA-N 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N Resorcinol Natural products OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000005153 alkyl sulfamoyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000001769 aryl amino group Chemical group 0.000 description 1
- 125000005116 aryl carbamoyl group Chemical group 0.000 description 1
- 125000005162 aryl oxy carbonyl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000006627 ethoxycarbonylamino group Chemical group 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- RJHLTVSLYWWTEF-UHFFFAOYSA-K gold trichloride Chemical compound Cl[Au](Cl)Cl RJHLTVSLYWWTEF-UHFFFAOYSA-K 0.000 description 1
- 229940076131 gold trichloride Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000003452 oxalyl group Chemical group *C(=O)C(*)=O 0.000 description 1
- CELWCAITJAEQNL-UHFFFAOYSA-N oxan-2-ol Chemical compound OC1CCCCO1 CELWCAITJAEQNL-UHFFFAOYSA-N 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000005554 pyridyloxy group Chemical group 0.000 description 1
- 125000005030 pyridylthio group Chemical group N1=C(C=CC=C1)S* 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Image Processing (AREA)
- Facsimile Image Signal Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、画像形成方法に関し、特に高コントラスト写
真画像を安定して与える銀画像形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an image forming method, and particularly to a silver image forming method that stably provides a high contrast photographic image.
一般に、写真製版工程では文字や網分解された写真像ま
た超精密写真製版工程では微細線画像の形成にコントラ
ストの高い写真画像が用いられている。このための成る
種のハロゲン化銀写真感光材料では、−極めてコントラ
ストの高い写真画像が形成できることが知られている。In general, high-contrast photographic images are used in the photolithography process to form characters and halftone-resolved photographic images, and in the ultra-precision photolithography process to form fine line images. It is known that silver halide photographic materials for this purpose can form photographic images with extremely high contrast.
従来、例えば平均粒子径が0.2μmで粒子分布が狭く
粒子の形も揃っていて、かつ塩化銀の含有率の高い(少
なくとも50モル%以上)塩臭化銀乳剤からなる感光材
料を亜硫酸イオン濃度が低いアルカリ性ハイドロキノン
現像液で処理することにより高いコントラスト、高鮮鋭
度、高解像力の画質、例えば、網点画像あるいは微細線
画像を得る方法が行なわれている。Conventionally, for example, a photosensitive material consisting of a silver chlorobromide emulsion with an average grain size of 0.2 μm, a narrow grain distribution, a uniform grain shape, and a high silver chloride content (at least 50 mol %) has been processed using sulfite ions. A method of obtaining an image with high contrast, high sharpness, and high resolution, such as a halftone dot image or a fine line image, is carried out by processing with an alkaline hydroquinone developer having a low concentration.
この種のハロゲン化銀感光材料はリス型感光材料として
知られている。This type of silver halide photosensitive material is known as a lithium-type photosensitive material.
写真製版過程には連続階調の原稿を網点画像に変換する
工程、すなわち原稿の連続階調の濃度変化を、該濃度に
比例する面積を有する網点の集合に変換する過程が含ま
れている。The photolithography process involves converting a continuous-tone original into a halftone image, that is, converting the continuous-tone density changes of the original into a set of halftone dots with an area proportional to the density. There is.
このために上記リス型感光材料を使用して、交線スクリ
ーン又はコンタクトスクリーンを介して原稿の撮影を行
い、ついで現像処理を行うことによって、網点像を形成
させるのである。For this purpose, a dot image is formed by using the above-mentioned lithium-type photosensitive material and photographing an original through an intersection line screen or a contact screen, followed by development processing.
このために、微粒子でかつ粒子サイズおよび粒子の形の
そろったハロゲン化銀乳剤を含有するノ\ロゲン化銀写
真感光材料が用いられるが、この種のハロゲン化銀感光
材料を用いた場合でも、一般白黒用現像液で処理した場
合には、網点品質等においてリス型現像液を用いた場合
より劣る。そのため、亜硫酸イオン濃度が極めて低く、
現像主薬としてハイドロキノン単薬であるリスを現像液
と呼ばれる現像液で処理される。しかしながらリス型現
像液は自動酸化を受けやすいことがら保恒性が極めて悪
いため、連続使用の際においても、現像品質を一定に保
つ制御方法が極力求められており、この現像液の保恒性
を改良するために多大の努力がなされて来ている。For this purpose, a silver halide photographic material containing a silver halide emulsion with fine grains and a uniform grain size and shape is used, but even when this type of silver halide photographic material is used, When processed with a general black and white developer, the quality of halftone dots, etc. is inferior to when a Lith type developer is used. Therefore, the sulfite ion concentration is extremely low.
It is processed with a developer called a developer using Lis, which is a single drug called hydroquinone, as a developing agent. However, Lith-type developer is susceptible to auto-oxidation and has extremely poor storage stability.Therefore, there is a strong need for a control method to maintain constant development quality even during continuous use. Significant efforts have been made to improve the.
その改良する方法として、上記リス型現像液の保恒性を
維持するために現像処理による活性度の劣化分を補償す
る補充液(処理疲労補充)と経時による酸化劣化分を補
償する補充液(経時疲労補充)とを別々の補充液を使用
して補充する、いわゆる2液分離補充方式が、写真製版
用自動現像機等で一般的に広く採用されている。しかし
ながら、上記方法は2液の補充バランスのコントロール
ヲ制御する必要があり、装置の点および操作の点で複雑
化するという欠点を有している。As a method to improve this, in order to maintain the stability of the above-mentioned Lith-type developer, there is a replenisher (processing fatigue replenisher) that compensates for the deterioration in activity due to development processing, and a replenisher (processing fatigue replenisher) that compensates for the oxidative deterioration over time. A so-called two-liquid separation replenishment system, in which the replenisher (replenishment due to fatigue over time) and the replenisher (replenishment due to aging) are replenished using separate replenishers, is generally widely adopted in automatic developing machines for photolithography and the like. However, the above method has the disadvantage that it is necessary to control the replenishment balance of the two liquids, which complicates the equipment and operation.
一方、亜硫酸イオン濃度の高い現像液で処理して高コン
トラスト画像を得る方法が知られている。On the other hand, a method is known in which a high contrast image is obtained by processing with a developer having a high sulfite ion concentration.
上記方法はハロゲン化銀写真感光材料中にヒドラジン化
合物を含有せしめるものである。The above method involves incorporating a hydrazine compound into a silver halide photographic light-sensitive material.
この方法によれば、現像液中に亜硫酸イオン濃度を高く
保つことができ、保恒性を高めた状態で安定に処理する
ことができる。According to this method, it is possible to maintain a high concentration of sulfite ions in the developer, and it is possible to stably process with improved preservation.
しかしながらヒドラジン化合物を含有するハロゲン化銀
写真感光材料に用いる現像液は、良好な網点品質を得る
ためにはpH値を比較的高くすることが必要なため、カ
ブリが発生し易く、このカブリを抑えるためにハロゲン
化銀乳剤に、カブリ抑制剤、安定剤等を含有させるため
、網点特に欠点(網点面積が95%である付近の網点)
のフリンジ、揃い、ヌケの状態が悪くなり網点品質の低
下を招いていた。However, the developer used for silver halide photographic light-sensitive materials containing hydrazine compounds requires a relatively high pH value in order to obtain good halftone dot quality, which tends to cause fog. In order to suppress fogging, the silver halide emulsion contains a fog suppressor, stabilizer, etc., so that the halftone dots are particularly defective (halftone dots near where the halftone dot area is 95%).
The condition of fringe, alignment, and blanking became poor, leading to a decline in the quality of halftone dots.
本発明の目的は保恒性の良い現像液で現像してカブリが
低く、かつ網点品質の優れた銀画像を形成しうる方法を
提供することであり、また他の目的は、ヒドラジド化、
金物を含有するハロゲン化銀写真感光材料を用いて、カ
ブリが低く、かつ網点品質の優れた銀画像を保恒性の良
い現像液によって形成しうる方法を提供することである
。An object of the present invention is to provide a method for forming a silver image with low fog and excellent halftone dot quality by developing with a developer having good stability.
An object of the present invention is to provide a method for forming a silver image with low fog and excellent halftone dot quality using a developer having good stability using a silver halide photographic light-sensitive material containing a metal.
本発明者等は上記技術課題にかんがみて、現像液の処方
を鋭意検討した結果、高濃度の亜硫酸イオンを含む現像
液処方において、カリウムイオン濃度および全陽イオン
中に占めるカリウムイオン濃度の関係において極めて網
点品質の高くなる最適範囲を見い出し、本発明に至った
ものである。In view of the above-mentioned technical issues, the present inventors have conducted intensive studies on developer formulations, and have found that in developer formulations containing high concentrations of sulfite ions, the relationship between the potassium ion concentration and the potassium ion concentration in the total cations is The present invention was achieved by discovering an optimal range in which the halftone dot quality is extremely high.
本発明の目的は、ヒドラジド化合物を含有するハロゲン
化銀写真感光材料を、亜硫酸イオン濃度が0.20グラ
ムイオン/12以上、カリウムイオンが全陽イオンの8
0グラムイオン%以上でかつpHが10〜13である現
像液で処理する画像形成方法によって達成される。An object of the present invention is to produce a silver halide photographic light-sensitive material containing a hydrazide compound with a sulfite ion concentration of 0.20 gram ions/12 or more and a potassium ion content of 8 of the total cations.
This is achieved by an image forming method in which processing is performed with a developer containing 0 gram ion % or more and having a pH of 10 to 13.
なお、上記陽イオンはナトリウムイオン、カリウムイオ
ンおよびリチウムイオンをいう。(但し、これらの3種
のイオンをすべて含有する必要はない。)
本発明に用いられるハロゲン化銀写真感光材料(以下感
光材料という)に含まれるヒドラジド化合物は、下記一
般式〔1〕、〔2〕、〔3〕で表される化合物である。Note that the above cations refer to sodium ions, potassium ions, and lithium ions. (However, it is not necessary to contain all three types of ions.) The hydrazide compound contained in the silver halide photographic light-sensitive material (hereinafter referred to as light-sensitive material) used in the present invention has the following general formula [1], [ 2] and [3].
一般式(1)
式中、RI及びR2はアリール基またはへテロ環基を表
わし、Rは2価の有機基を表わし、nは0〜6、mは0
またはlを表わす。General formula (1) In the formula, RI and R2 represent an aryl group or a heterocyclic group, R represents a divalent organic group, n is 0 to 6, and m is 0.
or represents l.
ここで、R1及びR2で表わされるアリール基としては
フェニル基、ナフチル基等が挙げられ、ヘテロ環基とし
てはピリジル基、ベンゾチアゾリル基、キノリル基、チ
エニル基等が挙げられるが、R1及びR2として好まし
くはアリール基である。Here, examples of the aryl group represented by R1 and R2 include a phenyl group, a naphthyl group, etc., and examples of the heterocyclic group include a pyridyl group, a benzothiazolyl group, a quinolyl group, a thienyl group, etc., but preferred as R1 and R2. is an aryl group.
R1及びR2で表わされるアリール基またはへテロ環基
には種々の置換基が導入できる。置換基としては例えば
ハロゲン原子(例えば塩素、フッ素など)、アルキル基
(例えばメチル、エチル、ドデシルなど)、アルコキシ
基(例えばメトキシ、エトキシ、イソプロポ・キシ、ブ
トキシ、オクチルオキシ、ドデシルオキシなど)、アシ
ルアミノ基 (例えばアセチルアミノ、ピバリルアミノ
、ベンゾイルアミノ、テトラデカノイルアミノ、a−C
2,4−ジ−t−アミルフェノキシ)ブチリルアミノな
ど)、スルホニルアミノ基(例えば、メタンスルホニル
アミノ、ブタンスルホニルアミノ、ドデカンスルホニル
アミノ、ベンゼンスルホニルアミノなど)、ウレア基(
例えば、フェニルウレア、エチルウレアなど)、チオウ
レア基(例えば、フェニルチオウレア、エチルチオウレ
アなど)、ヒドロキシ基、アミノ基、アルキルアミノ基
(例えば、メチルアミノ、ジメチルアミノなど)、カル
ボキシ基、アルコキシカルボニル基(例えば、エトキシ
カルボニル)、カルバモイル基、スルホ基などが挙げら
れる。Rで表わされる2価の有機基としては、例えばア
ルキレン基(例えば、メチレン、゛エチレン、トリメチ
レン、テトラメチレンなど)、アリーレン基(例えば、
フェニレン、ナフチレンなど)、アラルキレン基等が挙
げられるがアルキレン基は結合中にオキシ基、チオ基、
セレノ基、カルボニアリール基を表わす)、スルホニル
基等を含んでも良い。Rで表わされる基には種々の置換
基が導入できる。Various substituents can be introduced into the aryl group or heterocyclic group represented by R1 and R2. Examples of substituents include halogen atoms (e.g., chlorine, fluorine, etc.), alkyl groups (e.g., methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g., methoxy, ethoxy, isopropoxy, butoxy, octyloxy, dodecyloxy, etc.), acylamino groups (e.g. acetylamino, pivallylamino, benzoylamino, tetradecanoylamino, a-C
(2,4-di-t-amylphenoxy)butyrylamino, etc.), sulfonylamino groups (e.g., methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino, etc.), urea groups (
(e.g., phenylurea, ethylurea, etc.), thiourea groups (e.g., phenylthiourea, ethylthiourea, etc.), hydroxy groups, amino groups, alkylamino groups (e.g., methylamino, dimethylamino, etc.), carboxy groups, alkoxycarbonyl groups (e.g. , ethoxycarbonyl), carbamoyl group, sulfo group, etc. Examples of the divalent organic group represented by R include alkylene groups (e.g., methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g.,
phenylene, naphthylene, etc.), aralkylene groups, etc., but alkylene groups include oxy groups, thio groups,
(representing a seleno group, a carbonialyl group), a sulfonyl group, etc. Various substituents can be introduced into the group represented by R.
置換基としては例えば、−C0NHNHR4(R4は上
述したR、及びR2と同じ意味を表わす)、アルキル基
、アルコキシ基、ハロゲン原子、ヒドロキシ基、カルボ
キシ基、アシル基、アリール基、等が挙げられる。Examples of the substituent include -C0NHNHR4 (R4 has the same meaning as R and R2 described above), an alkyl group, an alkoxy group, a halogen atom, a hydroxy group, a carboxy group, an acyl group, an aryl group, and the like.
Rとして好ましくはアルキレン基である。R is preferably an alkylene group.
一般式CI)で表わされる化合物のうち好ましくはR3
及びR2が置換または未置換のフェニル基であり、n=
m=1でRがアルキレン基を表わす化合物である。Of the compounds represented by the general formula CI), preferably R3
and R2 is a substituted or unsubstituted phenyl group, and n=
A compound in which m=1 and R represents an alkylene group.
以′下余白
・〈ニー′
具体的化合物
l −34
tC@H++
tcs11+ +
次に一般式[2]について説明する
R2+で表わされる脂肪族基は、好ましくは、炭素数0
以上のものであって、特に炭素数8〜50の直鎖、分岐
または環状のアルキル基である。ここで分岐アルキル基
はその中に1つまたはそれ以上のへテロ原子を含んだ飽
和のへテロ環を形成するように環化されてもよい。また
このアルキル基はアリール基アルコキソ基、スルホキシ
基、等の置換基を有してもよい。The following margin/〈Knee' Specific compound l -34 tC@H++ tcs11+ + Next, general formula [2] will be explained. The aliphatic group represented by R2+ preferably has 0 carbon atoms.
Among the above, it is particularly a straight chain, branched or cyclic alkyl group having 8 to 50 carbon atoms. The branched alkyl group herein may be cyclized to form a saturated heterocycle containing one or more heteroatoms therein. Further, this alkyl group may have a substituent such as an aryl group, an alkoxo group, or a sulfoxy group.
R21で表される芳香族基は単環または2環アリール基
または不飽和へテロ環基である。ここで不飽和へテロ環
基は単環または2環のアリール基と縮合してヘテロアリ
ール基を形成してもよい。The aromatic group represented by R21 is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic aryl group to form a heteroaryl group.
例えばベンゼン環、ナフタレン環、ピリジン環、ピリミ
ジン環、イミダゾール環、ビロラゾール環、キノリン環
、イソキノリン環、ベンズイミダゾール環、チアゾール
環、ベンゾチアゾール環等があるがなかでもベンゼン環
を含むものが好ましい。Examples include a benzene ring, a naphthalene ring, a pyridine ring, a pyrimidine ring, an imidazole ring, a virolazole ring, a quinoline ring, an isoquinoline ring, a benzimidazole ring, a thiazole ring, and a benzothiazole ring, among which those containing a benzene ring are preferred.
R21として特に好ましいものはアリール基である。Particularly preferred as R21 is an aryl group.
RZ+のアリール基まI;は不飽和へテロ環基は置換さ
れていてもよく、代表的な置換基としては直鎖、分岐ま
たは環状のアルキル基(好ましくはアルキル部分の炭素
数が1〜20の単環または2環のもの)、アルコキシ基
(好ましくは炭素数1〜20のもの)、rIt換アニア
ミノ基ましくは炭素数1〜20のアルキル基で置換され
たアミノ基)、アシルアミノ基(好ましくは炭素数2〜
30を持つもの)、スルホンアミド基(好ましくは炭素
数1〜30を持つもの)、ウレイド基(好ましくは炭素
数1〜30を持つもの)などがある。The aryl group or I; of RZ+ may be substituted, and typical substituents include linear, branched, or cyclic alkyl groups (preferably those in which the alkyl moiety has 1 to 20 carbon atoms). monocyclic or bicyclic), alkoxy groups (preferably those having 1 to 20 carbon atoms), rIt-substituted aniamino groups or amino groups substituted with alkyl groups having 1 to 20 carbon atoms), acylamino groups ( Preferably 2 or more carbon atoms
30), a sulfonamide group (preferably having 1 to 30 carbon atoms), and a ureido group (preferably having 1 to 30 carbon atoms).
一般式[2]のR22で表される基のうち置換されても
よいアルコキシ基としては炭素数l〜20のものであっ
て、ハロゲン原子、アリール基などで置換されていても
よい。Among the groups represented by R22 in general formula [2], the optionally substituted alkoxy group has 1 to 20 carbon atoms, and may be substituted with a halogen atom, an aryl group, or the like.
一般式[21においてR22で表される基のうち置換さ
れてもよいアリールオキシ基またはへテロ環オキシ基と
しては単環のものが好ましく、また置換基としてはハロ
ゲン原子アルキル基、アルコキシ基、シアノ基などがあ
る
R22で表される基のうちで好ましいものは、置換され
てもよいアルコキシ基またはアミノ基である。Among the groups represented by R22 in general formula [21, the optionally substituted aryloxy group or heterocyclic oxy group is preferably a monocyclic group, and the substituents include a halogen atom alkyl group, an alkoxy group, a cyano Among the groups represented by R22, preferred are an optionally substituted alkoxy group or an amino group.
A2置換されてもよいアルキル基、アルコシ基または一
〇−1−S−1−N−基結合を含む環状構造であっても
よい。但しR82がヒドラジノ基であることはない。A2 may be a cyclic structure containing an optionally substituted alkyl group, alkoxy group, or 10-1-S-1-N- group bond. However, R82 is never a hydrazino group.
一般式[1]のR21またはR2□はその中にカプラー
等の不動性写真用添加剤において常用されているバラス
ト基が組み込まれているものでもよい。R21 or R2□ in general formula [1] may have a ballast group commonly used in immobile photographic additives such as couplers incorporated therein.
バラスト基は8以上の炭素数を有する写真性に対して比
較的不活性な基であり、例えばアルキル基、アルコキシ
基、フェニル基、アルキルフェニル基、フニノキシ基、
アルキルフェノキシ基などの中から選ぶことができる。The ballast group is a group having a carbon number of 8 or more and is relatively inert to photography, such as an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a fninoxy group,
It can be selected from alkylphenoxy groups, etc.
一般式[2]のR2IまたはR2Hはその中にハロゲン
化銀粒子表面に対する吸着を強める基が組み込まれてい
るものでもよい。かかる吸着基としては、チオ尿素基、
複素環チオアミド基、メルカプト複素環基、トリアゾー
ル基などの米国特許第4.355゜105号に記載され
た基があげられる。一般式[2]で表される化合物のう
ち下記一般式[2−alで表される化合物は特に好まし
い。R2I or R2H in general formula [2] may have a group incorporated therein to enhance adsorption to the silver halide grain surface. Such adsorption groups include thiourea group,
Examples include groups described in US Pat. No. 4,355,105, such as a heterocyclic thioamide group, a mercapto heterocyclic group, and a triazole group. Among the compounds represented by the general formula [2], the compounds represented by the following general formula [2-al] are particularly preferred.
一般式[2−al
上記一般式[2−al中、
RasおよびR2,は水素原子、置換されてもよいアル
キル基(例えばメチル基、エチル基、ブチル基、ドデシ
ル基、2−ヒドロキシプロピル基、2−シアノエチル基
、2−クロロエチル基)、置換されてもよいフェニル基
、ナフチル基、シクロヘキシル基、ピリジル基、ピロリ
ジル基(例えばフェニル基、p−メチルフェニル基、ナ
フチル基、a−ヒドロキシナフチル基、シクロヘキシル
基、p−メチルシクロヘキシル基、ピリジル基、4−プ
ロピル−2−ピリジル基、ピロリジル基、4−メチル−
2−ピロリジル基)を表し、
R□は水素原子または置換されてもよいベンジル基、ア
ルコキシ基及びアルキル基(例えばベンジル基、p−メ
チルベンジル基、メトキシ基、エトキシ基、エチル基、
ブチル基)を表し、Ro及びR27は2価の芳誉族基(
例えばフェニレン基まI;はナフチレン基)を表し、Y
はイオウ原子または酸素原子を表し、Lは2価の結合基
(例えば−502CtlICI1.Nll−SO,Nl
l、−0CH2SO,NH,−0−1−CH−N−)を
表し、
R2aは−NR’R“または−0R2,を表し、R’、
R〃及びR29は水素原子、置換されてもよいアルキル
基(例えばメチル基、エチル基、ドデシル基)、フェニ
ル基(例えばフェニル基、p−メチルフェニル基、p−
メトキシフェニル基)またはナフチル基(例えばα−ナ
フチル基、β−す7チル基)を表し、fil、nはOま
たはlを表す。R26がOR,、を表すときYはイオウ
原子を表すのが好ましい。General formula [2-al In the above general formula [2-al, Ras and R2, are hydrogen atoms, optionally substituted alkyl groups (e.g. methyl group, ethyl group, butyl group, dodecyl group, 2-hydroxypropyl group, 2-cyanoethyl group, 2-chloroethyl group), optionally substituted phenyl group, naphthyl group, cyclohexyl group, pyridyl group, pyrrolidyl group (e.g. phenyl group, p-methylphenyl group, naphthyl group, a-hydroxynaphthyl group, Cyclohexyl group, p-methylcyclohexyl group, pyridyl group, 4-propyl-2-pyridyl group, pyrrolidyl group, 4-methyl-
2-pyrrolidyl group), R□ represents a hydrogen atom or an optionally substituted benzyl group, alkoxy group and alkyl group (e.g. benzyl group, p-methylbenzyl group, methoxy group, ethoxy group, ethyl group,
butyl group), and Ro and R27 represent a divalent aromatic group (
For example, phenylene group or I; represents naphthylene group), Y
represents a sulfur atom or an oxygen atom, and L represents a divalent bonding group (e.g. -502CtlICI1.Nll-SO, Nl
R2a represents -NR'R" or -0R2, R',
R and R29 are hydrogen atoms, optionally substituted alkyl groups (e.g. methyl group, ethyl group, dodecyl group), phenyl groups (e.g. phenyl group, p-methylphenyl group, p-
methoxyphenyl group) or a naphthyl group (for example, α-naphthyl group, β-7thyl group), and fil and n represent O or l. When R26 represents OR, , Y preferably represents a sulfur atom.
上記一般式[2]及び[2−alで表される代表的なゝ
、□−1+
一般式[2]の具体例
IllI0
CF。Representative ゝ, □-1+ Specific example of general formula [2] IllI0CF represented by the above general formula [2] and [2-al.
■
※−NHNHCCOCH 、CI ! So ! CH
! CH ! Oi1※−NHNHCCOCHzCH
zSCHiCHzOHCH。■ *-NHNHCCOCH, CI! So! CH
! CH! Oi1*-NHNHCCOCHzCH
zSCHiCHzOHCH.
しII。II.
へ
曽
※ −N)INHccN)Ic、□11□次に、上記具
体的化合物のうち化合物2−45゜2−47を例にとっ
て、その合成法を示す。Heso* -N)INHccN)Ic, □11□Next, a method for synthesizing the compound 2-45°2-47 will be shown as an example from among the above-mentioned specific compounds.
化合物2−45の合成
合成スキーム
(A)
(B)
化合物4−二トロフェニルヒドラジン153gと500
mQのジエチルオキザレートを混合し、1時間還流する
。反応を進めながらエタノールを除去していき、最後に
冷却し結晶を析出させる。濾過し石油エーテルで数回洗
浄し、再結晶する。次に得られた結晶(A)のうち50
9を1000mffのメタノールで加温溶解し、pd/
C(パラジウム・炭素〕触媒下に50Psiのか加圧
したH2雰囲気で還元し、化合物(B)を得る。Synthesis of compound 2-45 Synthesis scheme (A) (B) Compound 4-nitrophenylhydrazine 153g and 500g
Mix mQ of diethyl oxalate and reflux for 1 hour. Ethanol is removed as the reaction progresses, and finally it is cooled to precipitate crystals. Filter, wash several times with petroleum ether and recrystallize. Next, 50 of the obtained crystals (A)
9 was heated and dissolved in 1000 mff of methanol, and pd/
Reduction is carried out under a C (palladium/carbon) catalyst in a H2 atmosphere pressurized at 50 Psi to obtain compound (B).
この化合物(B)22gをアセトニトリル200mQと
ピリジン169の溶液に溶かし室温で化合物(C)24
gのアセトニトリル溶液を滴下した。不溶物を濾別後、
濾液を濃縮し再結晶精製して化合物(D )31gを得
た。22 g of this compound (B) was dissolved in a solution of 200 mQ of acetonitrile and 169 pyridine, and the compound (C) 24 was dissolved at room temperature.
g of acetonitrile solution was added dropwise. After filtering out insoluble matter,
The filtrate was concentrated and purified by recrystallization to obtain 31 g of Compound (D).
化合物(D )309を上記と同様゛に水添をして化合
物(E)209を得た。Compound (D) 309 was hydrogenated in the same manner as above to obtain Compound (E) 209.
化合物(E)109をアセトニトリル100+nQに溶
解しエチルインチオシアネート3.09を加え、1時間
還流した。溶媒を留去後頁結晶精製して化合物CF)7
.0gを得た。化合物(F )5.09をメタノール5
0mffに溶解してメチルアミン(40%水溶液8ra
Q)を加え攪拌した。メタノールを若干濃縮後、析出し
た固体をとり出し再結晶精製して化合物2−45を得た
。Compound (E) 109 was dissolved in 100+nQ of acetonitrile, 3.09% of ethyl inthiocyanate was added, and the mixture was refluxed for 1 hour. After distilling off the solvent, the compound CF)7 was purified by crystallization.
.. Obtained 0g. Compound (F) 5.09 methanol 5
Methylamine (40% aqueous solution 8ra
Q) was added and stirred. After slightly concentrating methanol, the precipitated solid was taken out, recrystallized and purified to obtain Compound 2-45.
化合物2−47の合成
合成スキーム
CB)
1’lA
(C)
(D)
(E)
化合物2−47
化合物(B)229をピリジン200m12に溶解し攪
拌すル中へ、p・ニトロベンゼンスルホニルクロライド
22gを加えた。反応混合物を水あけ、後析出する固体
をとり出し化合物(C)を得t;。この化合物(C)を
合成スキームに従って化合物2−45と同様の反応によ
り化合物2−47を得た。Synthesis of Compound 2-47 Synthesis Scheme CB) 1'lA (C) (D) (E) Compound 2-47 Compound (B) 229 was dissolved in 200 mL of pyridine, and 22 g of p-nitrobenzenesulfonyl chloride was added to a stirring vessel. added. The reaction mixture was poured with water, and the precipitated solid was taken out to obtain compound (C). This compound (C) was subjected to the same reaction as compound 2-45 according to the synthesis scheme to obtain compound 2-47.
次に一般式[3]について説明する。Next, general formula [3] will be explained.
一般式[3] 。General formula [3].
Ar NIINH C Rs+
一般式[31中、A「は耐拡散基又はハロゲン化銀吸着
促進基を少なくとも1つを含むアリール基を表わすが、
耐拡散基としてはカプラー等の不動性写真用添加剤にお
いて常用されているバラスト基が好ましい。バラスト基
は8以上の炭素数を有する写真性に対して比較的不活性
な基であり、例えばアルキル基、アルコキシ基、フェニ
ル基、アルキルフェニル基、フェノキシ基、アルキルフ
ェノキシ基などの中から選ぶことができる。Ar NIINH C Rs+ In the general formula [31, A" represents an aryl group containing at least one diffusion-resistant group or silver halide adsorption promoting group,
The diffusion-resistant group is preferably a ballast group commonly used in immobile photographic additives such as couplers. The ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, and may be selected from, for example, an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group, an alkylphenoxy group, etc. Can be done.
ハロゲン化銀吸着促進基としてはチオ尿素基、チオウレ
タン基、複素環チオアミド基、メルカプト複素環基、ト
リアゾール基などの米国特許第4。Examples of silver halide adsorption promoting groups include a thiourea group, a thiourethane group, a heterocyclic thioamide group, a mercapto heterocyclic group, and a triazole group, as disclosed in US Pat. No. 4.
385、108号に記載された基が挙げられる。Examples include the groups described in No. 385, No. 108.
R31は置換アルキル基を表わすが、アルキル基として
は、直鎖、分岐、環状のアルキル基を表わし、例えばメ
チル、エチル、プロピル、ブチル、イソプロピル、ペン
チル、シクロヘキシル等の基が挙げられる。R31 represents a substituted alkyl group, and the alkyl group represents a linear, branched, or cyclic alkyl group, such as methyl, ethyl, propyl, butyl, isopropyl, pentyl, cyclohexyl, and the like.
これらのアルキル基へ導入される置換基としては、アル
コキシ(例えばメトキシ、エトキシ等)、アリールオキ
シ(例えばフェノキシ、p・クロルフェノキシ等)、ペ
テロ環オキシ(例えばピリジルオキシ等)、メルカプト
、アルキルチオ(メチルチオ、エチルチオ等)、アリー
ルチオ(例えばフェニルチオ、p−クロルフェニルチオ
等)、ヘテロ環チオ(例えば、ピリジルチオ、ピリミジ
ルチオ、チアジアゾリルチオ等)、アルキルスルホニル
(例えばメタンスルホニル、ブタンスルホニル等)、ア
リールスルホニル(例えばベンゼンスルホニル等)、ペ
テロ環スルホニル(例えばピリジルスルホニル、モルホ
リノスルホニル等)、アシル(例えばアセチル、ベンゾ
イル等)、シアノ、クロル、臭素、アルコキシカルボニ
ル(例えばエトキシカルボニル、メトキシカルボニル等
)、アリールオキシカルボニル(例えばフェノキシカル
ボニル等)、カルボキシ、カルバモイル、アルキルカル
バモイル(例えば、N−メチルカルバモイル、N,N−
ジメチルカルバモイル等)、アリールカルバモイル(例
えば、N−フェニルカルバモイル等)、アミノ、アルキ
ルアミノ(例えば、メチルアミン、N,N−ジメチルア
ミノ等)、アリールアミノ(例えば、フェニルアミノ、
ナフチルアミノ等)、アシルアミノ(例えばアセチルア
ミノ、ベンゾイルアミノ等)、アルコキシカルボニルア
ミノ(例えば、エトキシカルボニルアミノ等)、アリー
ルオキシカルボニルアミノ(例えば、フェノキシカルボ
ニルアミノ等)、アシルオキシ(例えば、アセチルオキ
シ、ベンゾイルオキシ等)、アルキルアミノカルボニル
オキシ
アミノカルボニルオキシ等)、アリールアミノカルボニ
ルオキシ(例えば、フェニルアミ7カルポニルオキシ等
)、スルホ、スルファモイル、アルキルスルファモイル
(例えハ、メチルスルファモイル等)、アリールスルフ
ァモイル(例えば、フェニルスルファモイル等)等の各
基が挙げられる。Substituents introduced into these alkyl groups include alkoxy (for example, methoxy, ethoxy, etc.), aryloxy (for example, phenoxy, p-chlorophenoxy, etc.), peterocyclic oxy (for example, pyridyloxy, etc.), mercapto, alkylthio (methylthio, etc.). , ethylthio, etc.), arylthio (e.g., phenylthio, p-chlorophenylthio, etc.), heterocyclic thio (e.g., pyridylthio, pyrimidylthio, thiadiazolylthio, etc.), alkylsulfonyl (e.g., methanesulfonyl, butanesulfonyl, etc.), arylsulfonyl ( For example, benzenesulfonyl, etc.), peterocyclic sulfonyl (for example, pyridylsulfonyl, morpholinosulfonyl, etc.), acyl (for example, acetyl, benzoyl, etc.), cyano, chlor, bromine, alkoxycarbonyl (for example, ethoxycarbonyl, methoxycarbonyl, etc.), aryloxycarbonyl ( (e.g., phenoxycarbonyl), carboxy, carbamoyl, alkylcarbamoyl (e.g., N-methylcarbamoyl, N,N-
dimethylcarbamoyl, etc.), arylcarbamoyl (e.g., N-phenylcarbamoyl, etc.), amino, alkylamino (e.g., methylamine, N,N-dimethylamino, etc.), arylamino (e.g., phenylamino,
naphthylamino, etc.), acylamino (e.g., acetylamino, benzoylamino, etc.), alkoxycarbonylamino (e.g., ethoxycarbonylamino, etc.), aryloxycarbonylamino (e.g., phenoxycarbonylamino, etc.), acyloxy (e.g., acetyloxy, benzoyloxy), ), alkylaminocarbonyloxyaminocarbonyloxy, etc.), arylaminocarbonyloxy (e.g., phenylami7carponyloxy, etc.), sulfo, sulfamoyl, alkylsulfamoyl (e.g., methylsulfamoyl, etc.), arylsulfamoyl (For example, phenylsulfamoyl, etc.).
ヒドラジンの水素π子はスルホニル基(例えばメタンス
ルホニル
シル基(例えば、アセチル、トリフルオロアセチル等)
、オキザリル基(例えば、エトキザリル等)等)等の置
換基で置換されていてもよい。The hydrogen pi molecule of hydrazine is a sulfonyl group (e.g., methanesulfonyl syl group (e.g., acetyl, trifluoroacetyl, etc.))
, oxalyl group (eg, ethoxalyl, etc.)).
上記一般式[3]で表される代表的な化合物としては、
以下に示すものがある。Representative compounds represented by the above general formula [3] include:
There are the following.
−I6
υ
しりしt3
※−Nl!N1(CCH20CII2CH□0C11□
CH□011次に化合物3−5の合成例について述べる
。-I6 υ Shirishi t3 *-Nl! N1(CCH20CII2CH□0C11□
CH□011 Next, a synthesis example of compound 3-5 will be described.
化合物3−5の合成
合成スキーム
化a物2−45の合成法に準じて化合物3−5を得 I
こ 。Synthesis of compound 3-5 Synthesis scheme Compound 3-5 was obtained according to the synthesis method of compound a 2-45.
child .
本発明のハロゲン化銀写真感光材料に含まれる一般式[
1]、[2]、[3]の化合物の量は、本発明のハロゲ
ン化銀写真感光材料中に含有されるハロゲン化銀1モル
当り、5 X 10−7ないし5 X 10−’モルま
でが好ましく、更に好ましくは5 X 10−’ないし
I X 10−”モルの範囲である。General formula [
The amount of the compounds 1], [2], and [3] is from 5 x 10-7 to 5 x 10-' mol per mol of silver halide contained in the silver halide photographic material of the present invention. is preferred, and more preferably in the range of 5 x 10-' to I x 10-'' moles.
本発明に用いられるヒドラジド化合物はハロゲン化銀乳
剤層中、乳剤層に隣接する層及びその他の支持体上乳剤
層側に塗設されるいずれの層中にも含有させることがで
きるが、好ましくはハロゲン化銀乳剤層中であり、支持
体上乳剤層側に設ける塗設層に含有せしめて、ハロゲン
化銀乳剤層中に拡散せしめる方法でもよい。吸着基をも
つヒドラジド化合物は吸着基をもたないヒドラジド化合
物よりその添加量を少くして効果を上げることができる
。The hydrazide compound used in the present invention can be contained in the silver halide emulsion layer, the layer adjacent to the emulsion layer, and any other layer coated on the emulsion layer side of the support, but preferably It may be contained in a coating layer provided on the emulsion layer side of the support and diffused into the silver halide emulsion layer. The effect of a hydrazide compound having an adsorption group can be increased by adding a smaller amount than a hydrazide compound having no adsorption group.
本発明の感光材料に用いられるヒドラジド化合物の量は
ハロゲン化銀1モル当り10−6〜1O−1モルの範囲
が適当であり、好ましくはハロゲン化銀1モル当り1O
−4〜1O−2モルの範囲である。その適量はハロゲン
化銀の組成、粒径、化学熟成度、バインダーである親水
性コロイドの量、安定剤、抑制剤、促進剤等の添加剤と
のバランスを考慮して任意に決めることができる。The amount of the hydrazide compound used in the photosensitive material of the present invention is suitably in the range of 10-6 to 1O-1 mol per mol of silver halide, preferably 10-1 mol per mol of silver halide.
-4 to 1 O-2 moles. The appropriate amount can be arbitrarily determined by considering the composition of silver halide, particle size, chemical ripeness, amount of hydrophilic colloid as a binder, and balance with additives such as stabilizers, suppressors, and accelerators. .
本発明に用いられる感光材料のハロゲン化銀乳剤には、
各種のハロゲン化銀を用いることができる。例えば塩化
銀、臭化銀、塩臭化銀、沃臭化銀あるいは塩沃臭化銀な
どである。特に臭化銀および沃臭化銀に対して本発明の
効果は顕著であり、沃化銀の少い沃臭化銀型の(A9I
5モル%以下)高感度ハロゲン化銀写真感光材料に対し
て特に効果的である。The silver halide emulsion of the light-sensitive material used in the present invention includes:
Various silver halides can be used. Examples include silver chloride, silver bromide, silver chlorobromide, silver iodobromide, and silver chloroiodobromide. In particular, the effect of the present invention on silver bromide and silver iodobromide is remarkable, and the silver iodobromide type (A9I
(5 mol% or less) is particularly effective for high-sensitivity silver halide photographic materials.
本発明の方法に用いられる感光材料のハロゲン化銀乳剤
の調製方法は公知の方法により親水性コロイド中に懸濁
させたハロゲン化銀乳剤でよく、例えば中性法、アンモ
ニア法でのシングルジェット法、ダブルジェット法など
による乳剤調製法が用いられる。The silver halide emulsion of the light-sensitive material used in the method of the present invention may be prepared by a silver halide emulsion suspended in a hydrophilic colloid by a known method, such as a neutral method, a single jet method using an ammonia method, etc. Emulsion preparation methods such as , double jet method, etc. are used.
本発明に用いられる感光材料のハロゲン化銀乳剤層中に
含有せしめるハロゲン化銀は、好ましくは平均粒子サイ
ズ0.1−1.0μm、特に好ましくは0.1〜0.7
μmで、かつ全粒子数の少くとも75%、特に好ましく
は80%以上が平均粒径の0.7〜1.3倍の粒子サイ
ズを有するハロゲン化銀を含むことが好ましい。The silver halide contained in the silver halide emulsion layer of the light-sensitive material used in the present invention preferably has an average grain size of 0.1 to 1.0 μm, particularly preferably 0.1 to 0.7 μm.
It is preferred that at least 75%, particularly preferably 80% or more of the total number of grains contain silver halide having a grain size in μm and from 0.7 to 1.3 times the average grain size.
更に多価金属イオン(例えばイリジウム、ロジウム等)
が、ハロゲン化銀1モル当り10−’−10−’モル吸
蔵されているハロゲン化銀乳剤も使用できる。ハロゲン
化銀乳剤は表面潜像型であることが好ましく、通常行わ
れるイオウ化合物、塩化金酸塩、三塩化金、などのよう
な金化合物等の化学増感によって増感することができる
。Furthermore, polyvalent metal ions (e.g. iridium, rhodium, etc.)
However, silver halide emulsions in which 10-'-10-' moles are occluded per mole of silver halide can also be used. The silver halide emulsion is preferably of the surface latent image type, and can be sensitized by conventional chemical sensitization using a gold compound such as a sulfur compound, chloroauric acid salt, gold trichloride, or the like.
また化学増感時にイリジウム塩またはロジウム塩を存在
させてもよい。Further, an iridium salt or a rhodium salt may be present during chemical sensitization.
本発明に用いられる感光材料のハロゲン化銀乳剤は増感
色素を用いて所望の感光波長域に感色性を付与すること
ができる。増感色素としてはシアニン、ヘミシアニン、
ログシアニン、メロシアニン、オキサノール、ヘミオキ
サノールなどのメチン色素及びスチリール色素など通常
用いられるものを用いることができる。The silver halide emulsion of the light-sensitive material used in the present invention can be imparted with color sensitivity in a desired wavelength range by using a sensitizing dye. Sensitizing dyes include cyanine, hemicyanine,
Commonly used methine dyes and styryl dyes such as logocyanine, merocyanine, oxanol, and hemioxanol can be used.
上記色素は米国特許第2,742.833号、同2,7
56.148号、同3,567.458号、同3,61
5.519号、同3,632゜340号、同3,155
.519号、同3,384.485号、同4,232゜
115号、同3,796.580号、同4,028.1
10号、同3,752゜673号、特開昭55−450
15号等の記載を参考にすることができる。The above dye is disclosed in U.S. Pat. No. 2,742.833 and U.S. Pat.
56.148, 3,567.458, 3,61
5.519, 3,632゜340, 3,155
.. 519, 3,384.485, 4,232°115, 3,796.580, 4,028.1
No. 10, No. 3,752゜673, JP-A-55-450
The description in No. 15 etc. can be referred to.
ハロゲン化銀乳剤層およびその他の支持体上に塗設され
る層にアルキルアクリレート、アルキルメタアクリレー
ト、アクリル酸、グリシジルアクリレート等のホモ又は
コポリマーからなるポリマーラテックスを、写真材料を
寸度安定性の向上、膜物性の改良などの目的で含有せし
めてよい。A polymer latex consisting of a homo- or copolymer of alkyl acrylate, alkyl methacrylate, acrylic acid, glycidyl acrylate, etc. is applied to the silver halide emulsion layer and other layers coated on the support to improve the dimensional stability of photographic materials. , may be included for the purpose of improving the physical properties of the film.
ハロゲン化銀乳剤中に安定剤またはカプリ防止剤として
4−ヒドロキシ・6・メチル−1,3,3a、7−チト
ラザインデン、l−フェニル−5−メルカプトテトラゾ
ール、ハイドロキノン、レゾルシノールオキシム、ハイ
ドロキノンアルドキシムをはじめ多くの化合物をハロゲ
ン化銀1モル当り1O−4〜10−’モルの量で添加す
ることができる。4-Hydroxy-6-methyl-1,3,3a, 7-titrazaindene, l-phenyl-5-mercaptotetrazole, hydroquinone, resorcinol oxime, hydroquinone aldoxime, etc. are used as stabilizers or anti-capri agents in silver halide emulsions. Many compounds can be added in amounts of 10-4 to 10-' moles per mole of silver halide.
本発明に用いられる感光材料のハロゲン化銀乳剤はその
塗布液に通常用いられる硬膜剤として例えばアルデヒド
類(ホルムアルデヒド類、グリオキザール類、グルタル
アルデヒド類、ムコクロル酸等)、N−メチロール化合
物(ジメチロール尿素、メチロールジメチルヒダントイ
ン
ン誘導体(2,3−ジヒドロキシジオキサン等)、活性
ビニル化合物(1.3.5− 1−リアクロイル−へキ
サヒドロ・S−トリアジン、ビス(ビニルスルホニル)
メチルエーテル等)、活性ハロゲン化物(2.4−シク
ロルー6−ヒドロキシ−S−)リアジン等)等を単独又
は組合わせて用いることができ、また増粘剤、マット剤
、塗布助剤等として通常用いられるものが使用できる。The silver halide emulsion of the light-sensitive material used in the present invention has a hardening agent usually used in its coating solution, such as aldehydes (formaldehydes, glyoxals, glutaraldehydes, mucochloric acid, etc.), N-methylol compounds (dimethylol urea, etc.). , methyloldimethylhydantoin derivatives (2,3-dihydroxydioxane, etc.), active vinyl compounds (1.3.5-1-lyacroyl-hexahydro/S-triazine, bis(vinylsulfonyl)
Methyl ether, etc.), active halides (2,4-cyclo-6-hydroxy-S-) riazine, etc.) can be used alone or in combination, and they are also commonly used as thickeners, matting agents, coating aids, etc. You can use whatever is used.
また結合剤としては通常用いられる保護コロイド性を有
する親水性結合剤を使用できる。Further, as the binder, a commonly used hydrophilic binder having protective colloidal properties can be used.
更に本発明において、目的に応じて感光材料中にカプラ
ー、紫外線吸収剤、蛍光増白剤、画像安定剤、酸化防止
剤、潤滑剤、金属イオン封鎖剤、乳化分散剤等として通
常用いられるものを含有させることができる。Furthermore, in the present invention, substances commonly used as couplers, ultraviolet absorbers, optical brighteners, image stabilizers, antioxidants, lubricants, metal ion sequestrants, emulsifying dispersants, etc. may be added to photosensitive materials depending on the purpose. It can be included.
本発明に用いられる感光材料にはハロゲン化銀乳剤層以
外の層として保護層、中間層、フィルター層、アンチハ
レーション層、下引層、補助層、イラジェーション防止
層、裏引層などを有してよく、使用される支持体として
はバライタ紙、ポリエチレン被覆紙、セルロースアセテ
ート、セルロースナイトレート、ポリエチレンテレフタ
レートなどがそれぞれ感光材料の使用目的に応じて適宜
選択できる。・
本発明に用いられる現像液の現像主薬としては、HO−
(CH−CH)n−OH型現像剤、t(O−(C)I−
CI()n−NHz型現像剤、H,N−CC−C)n−
Nl(、型現像剤等が含まれる。The light-sensitive material used in the present invention has layers other than the silver halide emulsion layer, such as a protective layer, an intermediate layer, a filter layer, an antihalation layer, a subbing layer, an auxiliary layer, an irradiation prevention layer, and a backing layer. The support to be used may be appropriately selected from baryta paper, polyethylene-coated paper, cellulose acetate, cellulose nitrate, polyethylene terephthalate, etc. depending on the intended use of the photosensitive material. - As the developing agent of the developer used in the present invention, HO-
(CH-CH)n-OH type developer, t(O-(C)I-
CI()n-NHz type developer, H,N-CC-C)n-
Nl(, mold developer, etc. are included.
lo−(CH= CH)n−OH型現像剤としては、下
記一般式〔4〕で示される化合物が有用である。As the lo-(CH=CH)n-OH type developer, a compound represented by the following general formula [4] is useful.
一般式〔4〕
式中、R41+ R42およびR43は各々水素原子、
ハロゲン原子(例えばCff、Br)、置換もしくは無
置換のアルキル基(例えばメチル、エチル、フェネチル
等)、置換もしくは無置換のアリール基(例えばフェニ
ル)、置換もしくは無置換のへテロ環基、 ORaa
または一5Raaを表わし、R44は置換もしくは無置
換のアルキル基(例えばメチル、エチル)、置換もしく
は無置換のアリール基(例えばフェニル)、置換もしく
は無置換のへテロ環基を表わす。DIはO又はlを表し
、n+−0のときは水素原子を表わす。General formula [4] In the formula, R41+ R42 and R43 are each a hydrogen atom,
Halogen atoms (e.g. Cff, Br), substituted or unsubstituted alkyl groups (e.g. methyl, ethyl, phenethyl, etc.), substituted or unsubstituted aryl groups (e.g. phenyl), substituted or unsubstituted heterocyclic groups, ORaa
or -5Raa, and R44 represents a substituted or unsubstituted alkyl group (eg, methyl, ethyl), a substituted or unsubstituted aryl group (eg, phenyl), or a substituted or unsubstituted heterocyclic group. DI represents O or l, and when n+-0 represents a hydrogen atom.
この型の現像剤の代表的具体例としては、ハイドロキノ
ンが挙げられる。A typical example of this type of developer is hydroquinone.
HO−(CH= 0H)n−NHz型現像剤としてはオ
ルト及びパラのアミノフェノール又はアミノピラゾロン
が代表的なもので、例えば4−アミノフェノール、2−
アミノ−6−フェニルフェノール、2−アミノ−4−ク
ロロ−6−フェニルフェノール、4−アミノ−2−フェ
ニルフェノール、3,4・ジアミノフェノール、3・メ
チル−4,6−ジアミノフェノール、2,4・シアミル
ゾルシノール、2.4.6・トリアミノフェノール、N
−メチル−p−アミノフェノール、N−β−ヒドロキシ
エチル−p−アミノフェノール、p・ヒドロキシフェニ
ルアミノ酢酸、2−アミノナフトール等が挙げられる。Typical HO-(CH=0H)n-NHz type developers are ortho- and para-aminophenols or aminopyrazolones, such as 4-aminophenol, 2-aminophenol,
Amino-6-phenylphenol, 2-amino-4-chloro-6-phenylphenol, 4-amino-2-phenylphenol, 3,4-diaminophenol, 3-methyl-4,6-diaminophenol, 2,4・Cyamylsorcinol, 2.4.6・Triaminophenol, N
Examples include -methyl-p-aminophenol, N-β-hydroxyethyl-p-aminophenol, p-hydroxyphenylaminoacetic acid, and 2-aminonaphthol.
ヘテロ現像剤とじ−では、下記一般式[5]で示される
化合物が本発明に有用である。In the case of binding with a hetero developer, a compound represented by the following general formula [5] is useful in the present invention.
一般式[5]
上式において、R51はフェニル基またはメチル基、ク
ロロ基、アミノ基、メチルアミノ基、アセチルアミノ基
及びメトキシ基のような基で置換されたフェニル基を表
わし、Rs、、RssおよびR□は各々メチル基、エチ
ル基、プロピル基等のアルキル基あるいはヒドロキシ基
、カルボキシ基及びスルホ基のような置換基で置換され
たアルキル基(例えばメチル、エチル、プロピル、ヒド
ロキシメチル等)を表す。General formula [5] In the above formula, R51 represents a phenyl group or a phenyl group substituted with a group such as a methyl group, a chloro group, an amino group, a methylamino group, an acetylamino group, or a methoxy group, and Rs, Rss and R□ each represent an alkyl group such as a methyl group, an ethyl group, or a propyl group, or an alkyl group substituted with a substituent such as a hydroxy group, a carboxy group, or a sulfo group (e.g., methyl, ethyl, propyl, hydroxymethyl, etc.). represent.
具体的には下記の化合物が挙げられる。Specifically, the following compounds may be mentioned.
l−フェニル−3−ピラゾリドン(フェニドン)l−フ
ェニル−4−アミノ−5−ピラゾロン1−(p−アミノ
フェニル)−3−アミノ−ピラゾロンl−フェニル−3
−メチル−4・アミノ−5−ビラゾロントフェニルー4
.4 ・ジメチル−3−ピラゾリドン(ジメゾン)
l−フェニル−4−メチル−4−ヒドロキシメチル−3
−ピラゾリドン(ジメゾン・5)
1−7二二ル〜4,4−ジヒドロキシメチル−3−ピラ
ゾリドン
■−フェニルー5・メチル−3−ピラゾリドン1−p−
アミノフェニル−4・メチル−4−プロピル−3−ピラ
ゾリドン
ip−クロロフェニル−4−メチル−4−エチル−3−
ビラゾリドン
1−p・アセトアミドフェニル−4,4・ジエチル−3
−ピラゾリドン
1−p−ヘータヒドロキシエチルフェニルー4.4−ジ
メチル−3−ピラゾリドン
1−p−メトキシフェニル−4,4−ジエチル−3−ピ
ラゾリドン
1−p−)ジル−4,4−ジメチルー3−ピラゾリドン
等。l-Phenyl-3-pyrazolidone (phenidone) l-phenyl-4-amino-5-pyrazolone 1-(p-aminophenyl)-3-amino-pyrazolone l-phenyl-3
-Methyl-4-amino-5-virazolontophenyl-4
.. 4 ・Dimethyl-3-pyrazolidone (dimezone) l-phenyl-4-methyl-4-hydroxymethyl-3
-Pyrazolidone (dimezone 5) 1-72-4,4-dihydroxymethyl-3-pyrazolidone -Phenyl-5-methyl-3-pyrazolidone 1-p-
Aminophenyl-4-methyl-4-propyl-3-pyrazolidone ip-chlorophenyl-4-methyl-4-ethyl-3-
Virazolidone 1-p・acetamidophenyl-4,4・diethyl-3
-Pyrazolidone 1-p-hetahydroxyethylphenyl-4,4-dimethyl-3-pyrazolidone 1-p-methoxyphenyl-4,4-diethyl-3-pyrazolidone 1-p-)dyl-4,4-dimethyl-3- Pyrazolidone etc.
その他、T、H,ジェームス著、ザ・セオリイ・オプ・
ザ・ホトグラフィック・プロセス第4版(TheThe
ory of the Photographic P
rocess、 FourthEd’1tion)第2
91〜334頁及びジャナール・オブ・ザ・アメリカン
・ケミカル・ソサエティ(Journalof the
American Chemical 5ociet
y)第73巻、第3100頁(1951)に記載されて
いるごとき現像剤が本発明に有効に使用し得るものであ
る。これらの現像剤は単独で使用しても2種以上組合せ
てもよいが、2種以上を組合せて用いる方法が好ましい
。Other books include T. H. James, The Theory Op.
The Photographic Process 4th Edition
ory of the Photographic P
rocess, Fourth Ed'1tion) 2nd
pp. 91-334 and Journal of the American Chemical Society.
American Chemical 5ociet
y) The developer described in Vol. 73, p. 3100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but a method of using two or more types in combination is preferred.
好ましい組み合せはハイドロキノン及びジメゾン又はハ
イドロキノン及びフェニドン又はハイドロキノン及びジ
メゾン−5の組み合わせであり、ハイドロキノンは5g
〜50g/Q、又フェニドンあるいはジメゾンあるいは
ジメゾン−5は0.05g〜5g/12の範囲で用いる
のが好適である。A preferred combination is hydroquinone and dimezone or hydroquinone and phenidone or hydroquinone and dimezone-5, where hydroquinone is 5 g
It is preferable to use phenidone, dimezone, or dimezone-5 in a range of 0.05 g to 5 g/12.
本発明に使用する現像液の亜硫酸イオンの供給源として
例えば亜硫酸ソーダ、亜硫酸カリ等の亜硫酸塩を用いる
ことができる。As a source of sulfite ions in the developer used in the present invention, sulfites such as sodium sulfite and potassium sulfite can be used.
又、保恒剤としてヒドロキシルアミン、ヒドラジン、ヒ
ドラジド化合物を用いてもよい。カリウムイオンの供給
源としては感光材料の現像液に通常用いられる亜硫酸カ
リウム、炭酸カリウム、臭化カリウム等を用いることが
できる。その他一般白黒現像液で用いられるような苛性
アルカリ、炭酸アルカリまたはアミンなどによるpHの
調整とバッファー機能をもたせること及びブロムカリな
ど無機現像抑制剤、エチレンジアミン四酢酸等の金属イ
オン捕捉剤、メタノール、エタノール、ベンジルアルコ
ール、ポリアルキレンオキシド等の現像促進剤、アルキ
ルアリールスルホン酸ナトリウム、天然のサポニン、糖
類または前記化合物のアルキルエステル物等の界面活性
剤、グルタルアルデヒド、ホルマリン、グリオキザール
等の硬膜剤、硫酸ナトリウム等のイオン強度調整剤等の
添加を行うことは任意である。p)(値はlO〜13の
任意に設定できるが保恒剤及び写真性能上からは特に1
1−12の範囲で用いるのが好ましい。Furthermore, hydroxylamine, hydrazine, and hydrazide compounds may be used as preservatives. As a source of potassium ions, potassium sulfite, potassium carbonate, potassium bromide, etc., which are commonly used in developing solutions for photosensitive materials, can be used. In addition, pH adjustment and buffering functions should be provided using caustic alkali, alkali carbonate, or amines used in general black and white developers, inorganic development inhibitors such as brompotali, metal ion scavengers such as ethylenediaminetetraacetic acid, methanol, ethanol, Development accelerators such as benzyl alcohol and polyalkylene oxide, sodium alkylarylsulfonate, natural saponins, surfactants such as sugars or alkyl esters of the above compounds, hardening agents such as glutaraldehyde, formalin, and glyoxal, sodium sulfate. It is optional to add ionic strength adjusting agents such as. p) (The value can be set arbitrarily from 10 to 13, but from the viewpoint of preservative and photographic performance, it is especially 1.
It is preferable to use it in the range of 1-12.
本発明に用いられる現像液はアルカノールアミンを含有
することが好ましく、アルカノールアミンとしては、例
えばモノエタノールアミン、ジェタノールアミン、トリ
エタノールアミン等が挙げられ、好ましくはトリエタノ
ールアミンである。The developer used in the present invention preferably contains an alkanolamine, and examples of the alkanolamine include monoethanolamine, jetanolamine, and triethanolamine, with triethanolamine being preferred.
これらのアルカノールアミンの好ましい含有量は現像液
lαあたり2〜500gであり、特に現像液IQあたり
5〜100gが好ましい。The preferred content of these alkanolamines is 2 to 500 g per developer lα, particularly preferably 5 to 100 g per developer IQ.
本発明に用いられる現像液にはグリコール類を含有させ
ることが好ましく、グリコール類としては、例工ばエチ
レングリコール、ジエチレングリコール、プロピレング
リコール、トリエチレングリコール、l、4−ブタンジ
オール、■、5−ベンタンジオール、2−メトキシエタ
ノール等が挙げられ、好ましくはジエチレングリコール
である。これらのグリコール類の好ましい使用量は現像
液12あたり10〜500gであり、特に現像液IQあ
たり20〜500gであり、特に現像液IQあたり20
−1009が好ましい。The developer used in the present invention preferably contains glycols, and examples of the glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol, and 5-bentane. Examples include diol, 2-methoxyethanol, etc., and diethylene glycol is preferred. The preferred usage amount of these glycols is 10 to 500 g per developer IQ, particularly 20 to 500 g per developer IQ, especially 20 to 500 g per developer IQ.
-1009 is preferred.
上記アルカノールアミン及びグリコール類は単独で用い
てもあるいは2種以上併用してもよい。The above alkanolamines and glycols may be used alone or in combination of two or more.
本発明に用いる現像液には有機カブリ抑制剤を含有させ
ることができる。好ましい有機カブリ抑制剤としては下
記−数式[’61.[71又は[8〕で示される化合物
が挙げられ、これらの化合物の少くとも一種を含有する
ことが好ましく、上記化合物を任意に少なくとも2種以
上組み合わせて用いても良い。The developer used in the present invention may contain an organic fog inhibitor. Preferred organic fog inhibitors include the following formula ['61. Compounds represented by [71 or [8] are mentioned, and it is preferable to contain at least one of these compounds, and at least two or more of the above compounds may be used in combination.
一般式[6]
式中、Gは窒素原子またはメチン基を表わし、Hは窒素
原子または炭素原子を表わし、Jは硫黄原子、酸素原子
またはイミノ基を表わし、FはHが炭素原子のとき水素
原子又はアルキル基を表す。General formula [6] In the formula, G represents a nitrogen atom or a methine group, H represents a nitrogen atom or a carbon atom, J represents a sulfur atom, an oxygen atom or an imino group, and F represents hydrogen when H is a carbon atom. Represents an atom or an alkyl group.
ただし、GとHの少くとも一方は窒素原子であり、Gが
メチン基を表すときJはイミノ基である。However, at least one of G and H is a nitrogen atom, and when G represents a methine group, J is an imino group.
nはOまたはlを表わし、Hが窒素原子のときnは0で
あり、Hが炭素原子のときnはlである。n represents O or l; when H is a nitrogen atom, n is 0; when H is a carbon atom, n is l;
R1,は水素原子、ハロゲン原子、炭素数3以下の低級
アルキル基、炭素原子3以下の低級アルコキシ基、ヒド
ロキシ基、カルボキシ基、スルホン酸基、またはニトロ
基を表す。R1 represents a hydrogen atom, a halogen atom, a lower alkyl group having 3 or less carbon atoms, a lower alkoxy group having 3 or less carbon atoms, a hydroxy group, a carboxy group, a sulfonic acid group, or a nitro group.
一般式[71
式中、Xは水素原子、ハロゲン原子、アルキル基、ニト
ロ基−COOM’、 −303M’、 −OH又は−C
ONH,の多基を表わしM/は水素原子又は炭素数3以
下の低級アルキル基を表わし、nはl又は2であり、W
′は硫黄原子、酸素原子又はイミノ基を表わし、MIは
水素原子、アルカリ金属原子又はアンモニウム基を表わ
し、R7,は水素原子、炭素数3以下の低級アルキル基
、炭素原子数3以下の低級アルコキシ基、ヒドロキシ基
、カルボキシ基、ハロゲン原子又はスルホン酸基を表す
。General formula [71 In the formula, X is a hydrogen atom, a halogen atom, an alkyl group, a nitro group -COOM', -303M', -OH or -C
ONH, M/ represents a hydrogen atom or a lower alkyl group having 3 or less carbon atoms, n is 1 or 2, and W
'represents a sulfur atom, an oxygen atom, or an imino group, MI represents a hydrogen atom, an alkali metal atom, or an ammonium group, and R7, represents a hydrogen atom, a lower alkyl group having 3 or less carbon atoms, or a lower alkoxy group having 3 or less carbon atoms. group, hydroxy group, carboxy group, halogen atom or sulfonic acid group.
一般式[8]
式中、M2は水素原子、アルカリ金属原子又は−NH4
基を表わし、Xは一〇〇〇M” 、−So、M“、−O
H又は−CONH2の多基を表わし、M“は水素原子、
アルカリ金属原子又は−NH,基を表わし、R8,は水
素原子又は炭素数3以下の低級アルキル基を表わし、n
は0.1又は2である。General formula [8] In the formula, M2 is a hydrogen atom, an alkali metal atom, or -NH4
represents a group, and X is 1000M", -So, M", -O
Represents a polygroup of H or -CONH2, M" is a hydrogen atom,
represents an alkali metal atom or -NH, group, R8 represents a hydrogen atom or a lower alkyl group having 3 or less carbon atoms, n
is 0.1 or 2.
上記一般式[6]で示される化合物として好ましい例示
化合物として下記を挙げることができる。Preferred examples of the compound represented by the above general formula [6] include the following.
(1) 5−ニトロインダゾール
(2) 6−ニトロインダゾール
(3) 5−メチルベンゾトリアゾール(4) 6−メ
チルベンゾトリアゾール(5) 5−ニトロベンツイ
ミダゾール(6) 6−ニトロペンツイミダゾ−11
次に、一般式[7]で表わされる好ましい化合物の例を
以下に挙げる。(1) 5-nitroindazole (2) 6-nitroindazole (3) 5-methylbenzotriazole (4) 6-methylbenzotriazole (5) 5-nitrobenzimidazole (6) 6-nitropenzimidazole-11
Next, examples of preferable compounds represented by the general formula [7] are listed below.
(1) 2−メルカプトベンツイミダゾール−5−スル
ホン酸
(2) 2−メルカプトベンツイミダゾール(3) 2
−メルカプト−7・メチルベンツトリアゾール−5−ス
ルホン酸
(4) 2−メルカプト−7−アセチル・ベンツイミダ
ゾール−5・スルホン酸ナトリウム塩
(5) 2−メルカプト−5・メチルベンツイミダゾー
ル
(6) 2−メルカプト−5−ニトロペンツイミダゾ
ール
(7) 2−メルカプト・6−アセチルベンツイミダゾ
ール−5−スルホン酸アンモニウム塩(8) 2−メル
カプト−7−クロロベンツイミダゾール−5−スルホン
酸
(9) 2−メルカプト−7−プロモベンツイミダゾー
ルー5−スルホン酸ナトリウム
(10) 2−メルカプト−5−スルホン酸−7−カ
ルボン酸ヘンツイミダゾール
(11) 2・メルカプト−7−ヒトロキシベンツイ
ミダゾールー5−スルホン酸
(12) 2・メルカプト−7−エチルベンツイミダ
ゾール−5−スルホン酸
次に一般式[8]で示される化合物の具体例を以下に示
す。(1) 2-mercaptobenzimidazole-5-sulfonic acid (2) 2-mercaptobenzimidazole (3) 2
-Mercapto-7-methylbenzimidazole-5-sulfonic acid (4) 2-mercapto-7-acetylbenzimidazole-5-sulfonic acid sodium salt (5) 2-mercapto-5-methylbenzimidazole (6) 2- Mercapto-5-nitropenzimidazole (7) 2-mercapto-6-acetylbenzimidazole-5-sulfonic acid ammonium salt (8) 2-mercapto-7-chlorobenzimidazole-5-sulfonic acid (9) 2-mercapto- Sodium 7-promobenzimidazole-5-sulfonate (10) 2-mercapto-5-sulfonic acid-7-carboxylic acid henzimidazole (11) 2-mercapto-7-hydroxybenzimidazole-5-sulfonic acid (12) 2.Mercapto-7-ethylbenzimidazole-5-sulfonic acid Specific examples of the compound represented by the general formula [8] are shown below.
(1) l−フェニル−5−メルカプトテトラゾール
(2) l・(3−スルホン酸−4−メチル)フェニ
ル−5−メルカプトテトラゾールナトリウム(3)
1−(3−スルホン酸−7−クロロ)フェニル−5−メ
ルカプトテトラゾールナトリウム塩(4) l(p−
スルホン酸)フェニル−5−メルカプトテトラゾールナ
トリウム塩
(5) 1−(トクロロ・4−スルホン酸)フェニル
−5−メルカプトテトラゾールナトリウム塩(6)
1−(3−スルホン酸−4・メチル)フェニル−5−メ
ルカプトテトラゾールカリウム塩(7 ) 1−(p
−スルホン酸)フェニル−5−メルカプトテトラゾール
カリウム塩
(8) 1−(p−メトキシ)フェニル・5−メルカ
プトテトラゾール
(9) 1−(p−ヒドロキシ)フェニル−5−メル
カプトテトラゾール
(10) 1−(p−ヒドロキシエトキシ)フェニル
−5−メルカプトテトラゾール
(11) 1−(3,5−ジカルバミル)フェニル−
5−メルカプトテトラゾール
(12) l−(p−カルバミル)フェニル−5−メ
ルカプトテトラゾール
前記−数式[6]で示される化合物は現像液11当り1
0−’〜lO−1モル、より好ましくはlO−4〜IO
−2モル、前記[7]又は[8]で示される化合物は現
像液112当りlO−6〜1モル、より好ましくは10
−’〜lO−2モルであり、総計としてこれらの現像抑
制剤の好ましい含有量は現像液lO当り10−’〜lO
−1モルであり、特に現像液Nl当りlO−4〜lO−
2モルが好ましい。又、上記現像抑制剤はアルカノール
アミン及び/又はグリコール類に溶かしてから現像液中
に添加することが好ましい。(1) l-phenyl-5-mercaptotetrazole (2) l-(3-sulfonate-4-methyl)phenyl-5-mercaptotetrazole sodium (3)
1-(3-sulfonic acid-7-chloro)phenyl-5-mercaptotetrazole sodium salt (4) l(p-
Sulfonic acid) phenyl-5-mercaptotetrazole sodium salt (5) 1-(Tochloro4-sulfonic acid) phenyl-5-mercaptotetrazole sodium salt (6)
1-(3-sulfonic acid-4-methyl)phenyl-5-mercaptotetrazole potassium salt (7) 1-(p
-sulfonic acid) phenyl-5-mercaptotetrazole potassium salt (8) 1-(p-methoxy)phenyl 5-mercaptotetrazole (9) 1-(p-hydroxy)phenyl-5-mercaptotetrazole (10) 1-( p-hydroxyethoxy)phenyl-5-mercaptotetrazole (11) 1-(3,5-dicarbamyl)phenyl-
5-Mercaptotetrazole (12) l-(p-carbamyl)phenyl-5-mercaptotetrazole - The compound represented by the above formula [6] is used in an amount of 1 per 11 developer solutions.
0-' to lO-1 mole, more preferably lO-4 to IO
-2 mol, the compound represented by [7] or [8] above is 10-6 to 1 mol, more preferably 10
-' to lO-2 mol, and in total the preferred content of these development inhibitors is from 10-' to lO-2 per lO of developer solution.
-1 mol, especially 1O-4 to 1O- per Nl of developer solution.
2 mol is preferred. Further, it is preferable that the development inhibitor is dissolved in alkanolamine and/or glycol before being added to the developer.
本発明における現像液による処理は種々の条件で行うこ
とができるが、現像温度は50℃以下が好ましく、特に
40°C前後が好ましく、また現像時間は3分以内に終
了することが一般的であるが、特に好ましくは2分以内
が好結果をもたらすことが多い。現像以外の処理工程例
えば水洗、停止、安定、定着さらに必要に応じて前硬膜
、中和等の工程を採用することは任意であり、これらは
適宜省略することもできる。さらにまたこれらの処理は
、皿現像、枠現像などいわゆる手現像処理でもよいし、
ローラー現像、ハンガー現像など機械現像であってもよ
い。Processing with a developer in the present invention can be carried out under various conditions, but the development temperature is preferably 50°C or lower, particularly around 40°C, and the development time is generally completed within 3 minutes. However, preferably within 2 minutes often brings about good results. Processing steps other than development, such as washing, stopping, stabilizing, fixing, and if necessary, pre-hardening, neutralization, etc. may optionally be employed, and these may be omitted as appropriate. Furthermore, these processes may be so-called manual development processes such as plate development and frame development,
Mechanical development such as roller development or hanger development may be used.
以下、実施例を挙げて本発明をさらに具体的に説明する
。本発明の技術的範囲は以下の実施例によって何等制限
されるものではなく、種々多様の実施態様が可能なもの
である。Hereinafter, the present invention will be explained in more detail with reference to Examples. The technical scope of the present invention is not limited in any way by the following examples, and various embodiments are possible.
特に本発明の実施態様は、高感度ハロゲン化銀写真感光
材料、いわゆる暗室タイプのハロゲン化銀写真感光材料
にて説明するが、本発明はこれによって何ら制限される
ものではない。In particular, embodiments of the present invention will be explained using a high-sensitivity silver halide photographic light-sensitive material, a so-called darkroom type silver halide photographic light-sensitive material, but the present invention is not limited thereto in any way.
実施例 l
同時混合法を用いて沃臭化銀乳剤(銀1モル当り沃化銀
2モル%)を調製した。平均粒径は0.08μmでこの
乳剤を常法に従って水洗および脱塩後、イリジウム塩お
よびロジウム塩を2 X 10−@モル/銀1モル当り
存在させてイオウ増感し、増感後安定剤としてハイドロ
キノンを1g、レゾルシンアルドキシムを2gおよび4
−ヒドロキシ−6−メチル−1、3.3a,7−チトラ
ザインデン化合物を1.5gそれぞれ銀1モル当り加え
、更にオルソ増感色素として前記した1−(ヒドロキシ
エトキシエチル)−3−(ピリジン−2・イル)−5−
((3−スルホブチル−5−クロロ・ペンゾオキサゾ
リニリデン)エチリデン−2−チオヒダントイン化合物
を銀1モル当り2。19添加し、カブリ抑制剤としてア
デニン、5−メチルベンゾトリアゾール、l−フェニル
−5−メルカプトテトラゾール2−メルカプトベンツイ
ミダゾール−ホン酸を銀1モル当りそれぞれ0.19、
現像調節剤としてエチレンオキサイド鎖30のポリエチ
レングリコール(末端基の一方はドデシルベンゼン)を
銀1モル当り0.05g添加し、更に塗布助剤として弗
素化ドデシルベンゼンスルホン酸ナトリウム、サホニン
、増粘剤としてスチレン−マレイン酸の共重合体ポリマ
ー加えて乳剤を調製した。この乳剤を10分割して各々
表−2に示すヒドラジド化合物を銀1モル当り10−”
モルそれぞれ添加して乳剤塗布液とした。Example 1 A silver iodobromide emulsion (2 mole % silver iodide per mole silver) was prepared using the simultaneous mixing method. The average grain size was 0.08 μm. The emulsion was washed with water and desalted in a conventional manner, and then sensitized with sulfur in the presence of an iridium salt and a rhodium salt of 2×10 −@mol/mole of silver. After sensitization, a stabilizer was added. 1 g of hydroquinone, 2 g of resorcinaldoxime and 4
-Hydroxy-6-methyl-1,3.3a,7-titrazaindene compound (1.5 g each per mole of silver) was added, and the above-mentioned 1-(hydroxyethoxyethyl)-3-(pyridine-2) was added as an ortho-sensitizing dye.・Iru)-5-
((3-sulfobutyl-5-chloropenzoxazolinylidene) ethylidene-2-thiohydantoin compound was added at 2.19% per mole of silver, and as fog suppressants adenine, 5-methylbenzotriazole, l-phenyl -5-mercaptotetrazole 2-mercaptobenzimidazole-phonic acid at 0.19 per mole of silver, respectively;
0.05g per mole of silver of polyethylene glycol with 30 ethylene oxide chains (one of the end groups is dodecylbenzene) was added as a development regulator, and sodium fluorinated dodecylbenzene sulfonate and sahonin were added as coating aids, and as a thickener. An emulsion was prepared by adding a styrene-maleic acid copolymer. This emulsion was divided into 10 parts, and hydrazide compounds shown in Table 2 were divided into 10 parts per mole of silver.
Each mole was added to prepare an emulsion coating solution.
次いで保護膜用塗布液を次のようにして調製した。即ち
、ゼラチンI Ky中に純水100.を加え、膨潤後4
0°Cに加温し、延展剤としてドデシルベンゼンスルホ
ン酸20g、マット剤として不定形の平均粒子3μmの
シリカゲル30gをゼラチン中に分散し、20Qに仕上
げて保護膜用塗布液を調製した。Next, a coating solution for a protective film was prepared as follows. That is, 100% pure water in gelatin I Ky. 4 after swelling.
The gelatin was heated to 0°C, and 20 g of dodecylbenzenesulfonic acid as a spreading agent and 30 g of amorphous silica gel with an average particle size of 3 μm as a matting agent were dispersed in gelatin and finished to 20Q to prepare a coating solution for a protective film.
ハロゲン化銀感光材料の調製
下引加工済(特開昭59−19941号の実施例−1参
照)の厚さ100μmのポリエチレンテレフタレート支
持体上に上記により調製された乳剤塗布液および保護膜
用塗布液を組み合わせ、銀量が1.8g/m”乳剤層の
ゼラチン付量が1.g/I112,保護層のゼラチン付
量が0.8g/m”になるように同時重層塗布し、表−
2に示す感光材料試料No. l − No.lQを作
成した。重層塗布時に保護膜用塗布液中にホルムアルデ
ヒド、ムコクロル酸および下記構造の3種類の以:゛下
゛余^
CQ
前記作成した感光材料試料を市販の通常のコンタクトス
クリーン(グレーネガ150L)を介してタングステン
光による段階露光を与えた後、表−1に示す現像液試料
9種類で現像処理した。Preparation of silver halide photosensitive material The emulsion coating solution prepared above and coating for protective film are coated on a polyethylene terephthalate support with a thickness of 100 μm that has been subjected to subbing processing (see Example 1 of JP-A-59-19941). The liquids were combined and simultaneously coated in multiple layers so that the amount of silver was 1.8 g/m, the amount of gelatin applied in the emulsion layer was 1.g/I112, and the amount of gelatin applied in the protective layer was 0.8 g/m.
Photosensitive material sample No. 2 shown in FIG. l-No. I created lQ. During multilayer coating, formaldehyde, mucochloric acid, and three types of compounds with the following structure are added to the coating solution for the protective film. After stepwise exposure to light, the samples were developed using nine kinds of developer samples shown in Table 1.
用いた定着液は下記組成の迅速用定着液であった。現像
処理条件は現像が40℃で10秒、定着が35℃で10
秒、水洗は30℃で10秒乾燥は50℃10秒であった
。The fixing solution used was a rapid fixing solution having the following composition. The development processing conditions were development at 40°C for 10 seconds and fixing at 35°C for 10 seconds.
washing with water at 30°C for 10 seconds and drying at 50°C for 10 seconds.
く定着液処方〉
(組成A)
チオ硫酸アンモニウム
(72,5%W/V水溶液)240I!IQ亜硫酸ナト
リウム 17g酢酸すトリウム
・3水塩 6.5g硼 酸
6gクエン酸ナトリウム・2水塩 2g(
組成り)
純水(イオン交換水) 17mQ
硫酸(50%W/Vの水溶液) 4.
7g硫酸アルミニウム
(A12.0.換算含量が8.1%wiv)水溶液)
26.5g定着液の使用時に水500mQ中に上記組
成人1組成りの順に溶かし、IQに仕上げて用いた。こ
の定以′下余白
上記処理済みの試料の網点面積lO%、50%、95%
の各々の網点品質を100倍のルーペによる目視観察に
て5段階評価をした。評価点はrlJが最も品位が低く
、順次品位が向上し、ランク「5」は最もよいレベルを
示す。測定結果を表−2に示す。Fixer formulation> (Composition A) Ammonium thiosulfate (72.5% W/V aqueous solution) 240I! IQ Sodium sulfite 17g Sodium acetate trihydrate 6.5g Boric acid
6g Sodium citrate dihydrate 2g (
Composition) Pure water (ion exchange water) 17mQ
Sulfuric acid (50% W/V aqueous solution) 4.
7g aluminum sulfate (A12.0. converted content is 8.1% wiv) aqueous solution)
When using 26.5 g of fixer solution, it was dissolved in 500 mQ of water in the order of composition 1 above and finished to IQ. Below this certain margin, the halftone dot area of the sample processed above is 10%, 50%, 95%.
The quality of each halftone dot was visually observed using a 100x magnifying glass and evaluated on a five-point scale. Regarding the evaluation points, rlJ has the lowest quality, and the quality improves sequentially, with rank "5" indicating the best level. The measurement results are shown in Table-2.
表−2
表−2から明らかなように)Sロゲン化銀写真感光材料
が一般式[1] 、[2] 、[3]で示されるヒドラ
ジド化合物を含有し、現像液のカリウムイオン濃度、亜
硫酸イオン濃度、及びpHが本発明の範囲にあるとき好
ましい結果が得られることが分かる。Table 2 As is clear from Table 2), the S silver halide photographic light-sensitive material contains the hydrazide compounds represented by the general formulas [1], [2], and [3], and the potassium ion concentration of the developer and the sulfite It can be seen that favorable results are obtained when the ion concentration and pH are within the range of the present invention.
本発明によれば、保恒性が良好な現像液を用いて優れた
品質の網点画像を形成することができる。According to the present invention, a halftone dot image of excellent quality can be formed using a developer with good stability.
また、ヒドラジンを含有するハロゲン化銀写真感光材料
を用いて画像を形成する場合の欠点であるカブリの発生
及び網点(特に欠点)のフリンジ、揃い及びヌケが改善
される。In addition, the occurrence of fog, which is a drawback when forming images using a silver halide photographic light-sensitive material containing hydrazine, and the fringing, uniformity, and missing halftone dots (particularly defects) are improved.
Claims (1)
ド化合物の少なくとも1種を含有するハロゲン化銀写真
感光材料を、亜硫酸イオン濃度が0.20グラムイオン
/l以上、カリウムイオン濃度が0.35グラムイオン
/l以上、カリウムイオンが全陽イオンの80グラムイ
オン%以上でかつpHが10〜13である現像液で処理
することを特徴とする画像形成方法。 一般式[1] ▲数式、化学式、表等があります▼ (式中、R_1及びR_2はアリール基またはヘテロ環
基を表し、Rは有機結合基を表し、nは0〜6、mは0
または1を表し、nが2以上のときは、各Rは同じであ
っても、異なっていてもよい。) 一般式[2] ▲数式、化学式、表等があります▼ (式中、R_2_1は脂肪族基、芳香族基またはヘテロ
環基を、R_2_2は水素原子、置換してもよいアルコ
キシ基、ヘテロ環オキシ基、アミノ基、もしくはアリー
ルオキシ基を表し、P_1及びP_2は水素原子、アシ
ル基、またはスルフィン酸基を表す。) 一般式[3] ▲数式、化学式、表等があります▼ (式中、Arは耐拡散基またはハロゲン化銀吸着促進基
を少なくとも1つ含むアリール基を表し、R_3_1は
置換アルキル基を表す。)[Scope of Claims] A silver halide photographic light-sensitive material containing at least one hydrazide compound represented by the following general formulas [1], [2], and [3] is prepared so that the sulfite ion concentration is 0.20 g ion. Image formation characterized by processing with a developer having a potassium ion concentration of 0.35 gram ions/l or more, a potassium ion concentration of 80 gram ions/l or more of the total cations, and a pH of 10 to 13. Method. General formula [1] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_1 and R_2 represent an aryl group or a heterocyclic group, R represents an organic bonding group, n is 0 to 6, m is 0
or 1, and when n is 2 or more, each R may be the same or different. ) General formula [2] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_2_1 is an aliphatic group, aromatic group, or heterocyclic group, and R_2_2 is a hydrogen atom, an optionally substituted alkoxy group, or a heterocyclic group. It represents an oxy group, an amino group, or an aryloxy group, and P_1 and P_2 represent a hydrogen atom, an acyl group, or a sulfinic acid group.) General formula [3] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, Ar represents an aryl group containing at least one diffusion-resistant group or silver halide adsorption promoting group, and R_3_1 represents a substituted alkyl group.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63003577A JPH01220973A (en) | 1987-10-13 | 1988-01-11 | Picture forming method with high contrast |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-259389 | 1987-10-13 | ||
JP25938987 | 1987-10-13 | ||
JP63003577A JPH01220973A (en) | 1987-10-13 | 1988-01-11 | Picture forming method with high contrast |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01220973A true JPH01220973A (en) | 1989-09-04 |
Family
ID=26337200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63003577A Pending JPH01220973A (en) | 1987-10-13 | 1988-01-11 | Picture forming method with high contrast |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01220973A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6147950A (en) * | 1984-08-14 | 1986-03-08 | Konishiroku Photo Ind Co Ltd | Image forming method |
JPS62160438A (en) * | 1986-01-09 | 1987-07-16 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPS62180361A (en) * | 1986-02-04 | 1987-08-07 | Mitsubishi Paper Mills Ltd | Image forming method |
-
1988
- 1988-01-11 JP JP63003577A patent/JPH01220973A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6147950A (en) * | 1984-08-14 | 1986-03-08 | Konishiroku Photo Ind Co Ltd | Image forming method |
JPS62160438A (en) * | 1986-01-09 | 1987-07-16 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPS62180361A (en) * | 1986-02-04 | 1987-08-07 | Mitsubishi Paper Mills Ltd | Image forming method |
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