JPH0121622B2 - - Google Patents

Info

Publication number
JPH0121622B2
JPH0121622B2 JP5795484A JP5795484A JPH0121622B2 JP H0121622 B2 JPH0121622 B2 JP H0121622B2 JP 5795484 A JP5795484 A JP 5795484A JP 5795484 A JP5795484 A JP 5795484A JP H0121622 B2 JPH0121622 B2 JP H0121622B2
Authority
JP
Japan
Prior art keywords
semiconductor wafer
enclosure
piston rod
punching device
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5795484A
Other languages
Japanese (ja)
Other versions
JPS60201622A (en
Inventor
Ryoji Wakabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JOSAI SEIKI KK
Original Assignee
JOSAI SEIKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JOSAI SEIKI KK filed Critical JOSAI SEIKI KK
Priority to JP59057954A priority Critical patent/JPS60201622A/en
Publication of JPS60201622A publication Critical patent/JPS60201622A/en
Publication of JPH0121622B2 publication Critical patent/JPH0121622B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Description

【発明の詳細な説明】 本発明は半導体ウエーハの保護膜の自動打抜き
装置に係るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an automatic punching device for protecting a semiconductor wafer.

半導体ウエーハ(0.2〜0.25mm厚)はそのまま
では脆いので取扱いの際に損壊しないよう半導体
ウエーハの底面に台紙、頂面にビニール等の保護
膜を付着させる。通常半導体ウエーハよりも大き
な保護膜を半導体ウエーハの頂面に置いて半導体
ウエーハの周縁に沿つて保護膜を切り抜いて半導
体ウエーハに保護膜を付着させている。従来この
半導体ウエーハの周縁に沿つての保護膜の切り抜
きはナイフを使用して手作業により行なわれてい
た。手作業によつたのは半導体ウエーハの保護膜
を切出し位置に精確に設定することの困難さと、
切出し工具による半導体ウエーハへの衝撃が半導
体ウエーハの破壊を招くからである。
Semiconductor wafers (0.2 to 0.25 mm thick) are fragile as they are, so a mount is attached to the bottom of the semiconductor wafer and a protective film such as vinyl is attached to the top to prevent damage during handling. Usually, a protective film larger than the semiconductor wafer is placed on the top surface of the semiconductor wafer, and the protective film is cut out along the periphery of the semiconductor wafer to attach the protective film to the semiconductor wafer. Conventionally, the protective film was cut out along the periphery of the semiconductor wafer by hand using a knife. The manual process was due to the difficulty of accurately setting the protective film on the semiconductor wafer at the cutting position.
This is because the impact on the semiconductor wafer caused by the cutting tool may lead to destruction of the semiconductor wafer.

本発明の目的は、このような半導体ウエーハの
保護膜を自動的に打ち抜き効率よく半導体ウエー
ハに保護膜を被せる装置を提供することにある。
An object of the present invention is to provide an apparatus that automatically punches out the protective film of such a semiconductor wafer and efficiently covers the semiconductor wafer with the protective film.

以下に添付図を参照して本発明の実施例を説明
する。
Embodiments of the present invention will be described below with reference to the accompanying drawings.

第1図は本発明の半導体ウエーハの保護膜の自
動打抜き装置の略図であり、半導体ウエーハの位
置検出状態を示す。
FIG. 1 is a schematic diagram of an automatic punching device for a protective film of a semiconductor wafer according to the present invention, and shows a position detection state of a semiconductor wafer.

半導体ウエーハ19をXテーブル1の上にの
せ、半導体ウエーハ19の位置を位置検出器5の
センサー18で検出する。センサー18からの信
号に応じて制御装置13はX方向テーブル1、Y
方向テーブル2そして回転テーブル3のそれぞれ
の駆動パルスモータ14,15,16に駆動パル
ス信号を送つて半導体ウエーハ19を直交方向と
回転方向に漸動させてウエーハ19の心出しと配
向とを精確に定める。位置の検出には光センサー
18を使用して半導体ウエーハの周縁を検知す
る。しかしこの周縁はビニール膜が被さつている
ため周縁の角はなだらかな傾斜となつておりその
位置検出は困難である。このためこの実施例では
発光ダイオード等の発光素子を使用して半導体ウ
エーハの周縁を照明してその反射光を光センサー
18にて検出することにより精確な位置検出を行
なつている。
A semiconductor wafer 19 is placed on the X table 1, and the position of the semiconductor wafer 19 is detected by the sensor 18 of the position detector 5. In response to the signal from the sensor 18, the control device 13 controls the X-direction table 1, the Y-direction table 1,
A drive pulse signal is sent to the drive pulse motors 14, 15, and 16 of the direction table 2 and the rotary table 3 to gradually move the semiconductor wafer 19 in the orthogonal direction and the rotational direction, thereby accurately centering and orienting the wafer 19. stipulate. To detect the position, an optical sensor 18 is used to detect the peripheral edge of the semiconductor wafer. However, since this peripheral edge is covered with a vinyl film, the corners of the peripheral edge are gently sloped, making it difficult to detect their positions. For this reason, in this embodiment, a light emitting element such as a light emitting diode is used to illuminate the periphery of the semiconductor wafer, and the reflected light is detected by the optical sensor 18, thereby achieving accurate position detection.

半導体ウエーハ19が所定位置に設定されると
制御装置13はシリンダ17への作動流体の供給
を開始させ、ピストンロツド4を一定距離Aだけ
後退させる。ピストンロツド4が一定距離Aだけ
後退すると、この一定距離Aだけ検出器5から離
してピストンロツド4に固定してある打抜き装置
6が半導体ウエーハ19の上に位置する。
When the semiconductor wafer 19 is set at a predetermined position, the control device 13 starts supplying working fluid to the cylinder 17 and causes the piston rod 4 to retreat by a certain distance A. When the piston rod 4 is retracted by a certain distance A, the punching device 6, which is fixed to the piston rod 4 at a distance A from the detector 5, is positioned above the semiconductor wafer 19.

第2図は保護膜の打抜き状態にある自動打抜き
装置を示す。打ち抜き装置6が半導体ウエーハ1
9の直上にくると、制御装置13は第1の空気作
動系(図示せず)を作動させて打ち抜き装置6の
筒体7の空気流路8を介して圧縮空気を筒体7の
拡大端9と包囲体10の下端との間の空間に送つ
てこの空間を押し拡げて包囲体10を押し下げ、
打抜き工具12を半導体ウエーハ19の周囲に押
付けて半導体ウエーハ19のビニール薄膜を打抜
く。包囲体10の下端のガイドピン20を通す孔
をガイドピン20の直径よりも幾らか大きくして
おくとその孔から空気が下方へ漏出して半導体ウ
エーハ19をXテーブル1の上に固定する。ガイ
ドピン20の孔を大きくする代りに細孔(図示せ
ず)を包囲体10の下端にあけて半導体ウエーハ
19を固定するための空気を流出させるようにし
てもよい(半導体ウエーハ19の下に負圧をかけ
て吸引するようにすると台紙の上にのつている半
導体ウエーハ19は不均一な力を受けて破壊する
ことが多い。)。
FIG. 2 shows the automatic punching device in the state of punching out the protective film. The punching device 6 is a semiconductor wafer 1
9, the control device 13 operates a first pneumatic actuation system (not shown) to supply compressed air to the enlarged end of the cylinder 7 of the punching device 6 through the air passage 8 of the cylinder 7. 9 and the lower end of the enclosure 10 to expand this space and push down the enclosure 10;
The punching tool 12 is pressed around the semiconductor wafer 19 to punch out the vinyl thin film of the semiconductor wafer 19. If the hole at the lower end of the enclosure 10 through which the guide pin 20 is passed is made somewhat larger than the diameter of the guide pin 20, air will leak downward from the hole and the semiconductor wafer 19 will be fixed on the X table 1. Instead of enlarging the hole of the guide pin 20, a small hole (not shown) may be made at the lower end of the enclosure 10 to allow air for fixing the semiconductor wafer 19 to flow out. If negative pressure is applied and suction is applied, the semiconductor wafer 19 placed on the mount will often be damaged by the uneven force applied to it.)

次に、制御装置13は第2の空気作動系(図示
せず)を作動して筒体7の拡大端9と包囲端10
の上端との間に圧縮空気を送り、包囲体10の上
端を押上げることにより打抜き工具12を半導体
ウエーハ19から引離す。この場合も包囲体の下
端のガイドピン20とこのガイドピン20の通る
孔との間の僅かな隙間から流れる空気が半導体ウ
エーハを打抜工具から吹き落す。
Next, the controller 13 operates a second pneumatic actuation system (not shown) to connect the enlarged end 9 and the enclosed end 10 of the barrel 7.
The punching tool 12 is separated from the semiconductor wafer 19 by sending compressed air between the punching tool 12 and the top end of the envelope 10 to push up the top end of the enclosure 10 . In this case as well, air flowing through a small gap between the guide pin 20 at the lower end of the enclosure and the hole through which the guide pin 20 passes blows the semiconductor wafer off the punching tool.

半導体ウエーハは位置合せの指標とするため円
形の一部を切欠いた切欠き円となつており、打抜
き工具12はこの切欠き円と同形状で一周り大き
い打抜き刃である。
The semiconductor wafer has a notched circle with a portion cut out to serve as an alignment index, and the punching tool 12 is a punching blade that has the same shape as this notched circle but is slightly larger.

半導体ウエーハ19が特に薄い場合には打抜き
刃による切断時にビニールにかかる張力のためウ
エーハが破壊することがある。打抜き刃を両側か
らテーパをつけた両刃とするか、又は一方にテー
パをつけた片刃の場合にはテーパをつけた側をウ
エーハに向けて使用することによりウエーハの破
壊を回避することができる。
If the semiconductor wafer 19 is particularly thin, the wafer may break due to the tension applied to the vinyl during cutting by the punching blade. Destruction of the wafer can be avoided by using the punching blade as a double-edged blade tapered from both sides, or in the case of a single-edged blade with a taper on one side, by using the punching blade with the tapered side facing the wafer.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例の側面略図であり、位
置合せ状態を示す。第2図は第1図と同様の図で
あるが、打抜き状態を示す。 図中:1:Xテーブル、2:Yテーブル、3:
回転テーブル、4:ピストンロツド、5:検出
器、6:打抜き装置、7:筒体、8:空気流路、
9:拡大端、10:包囲体、11:チヤツク、1
2:打抜き工具、13:制御装置、14;15;
16:駆動パルスモータ、18:光センサー、1
9:半導体ウエーハ、20:ガイドピン。
FIG. 1 is a schematic side view of an embodiment of the invention, shown in alignment. FIG. 2 is a view similar to FIG. 1, but in a punched state. In the diagram: 1: X table, 2: Y table, 3:
rotary table, 4: piston rod, 5: detector, 6: punching device, 7: cylinder, 8: air flow path,
9: Expansion end, 10: Enveloping body, 11: Chuck, 1
2: Punching tool, 13: Control device, 14; 15;
16: Drive pulse motor, 18: Optical sensor, 1
9: Semiconductor wafer, 20: Guide pin.

Claims (1)

【特許請求の範囲】 1 直交方向に移動することができ、そして回転
することができるX−Yテーブル; このX−Yテーブル上で一定距離を往復動する
ことができるピストンロツド; このピストンロツドに固定した半導体ウエーハ
の位置検出器; この位置検出器から前記の一定距離だけ離して
前記のピストンロツドに固定した打抜き装置;及
び 制御装置 を備え、前記の打抜き装置は前記のピストンロツ
ドに固定され、空気流路と拡大端とを有する筒体
と、この筒体の拡大端に気密に接触して筒体を包
囲し、滑動するよう筒体に固定されている包囲体
と、この包囲体の下端に打抜き工具を取外せるよ
うに固定する手段と、前記の空気流路を通して筒
体の拡大端と包囲端の下端との間に空気を送り包
囲体を押下げる第1の空気作動系と、筒体の拡大
端と包囲体の上端との間に空気を送り包囲体を押
上げる第2の空気作動系とを含み、前記の制御装
置は前記の位置検出器からの半導体のウエーハの
位置検出信号に応じて前記のピストンロツドを移
動させ、前記の第1の空気作動系を作動させてウ
エーハの保護膜を打抜き、前記の第2の空気作動
系を作動させて包囲体を押上げ、そして前記のピ
ストンロツドを反対方向に移動させて前記の位置
検出器を前記のX−Yテーブル上に配置すること
を特徴とする半導体ウエーハの保護膜の自動打抜
き装置。 2 前記の位置検出器は半導体ウエーハの位置検
出のための光センサーと発光素子とを含んでいる
特許請求の範囲第1項に記載の半導体ウエーハの
保護膜の自動打抜き装置。 3 前記の包囲体の下端は空気漏出孔を有してい
る特許請求の範囲第1項に記載の半導体ウエーハ
の保護膜の自動打抜き装置。
[Claims] 1. An X-Y table that can move orthogonally and rotate; A piston rod that can reciprocate a certain distance on this X-Y table; A piston rod that is fixed to this piston rod. a semiconductor wafer position detector; a punching device fixed to the piston rod at a distance from the position detector; and a control device, the punching device being fixed to the piston rod and connected to an air flow path. a cylinder having an enlarged end; an enclosure surrounding the cylinder in airtight contact with the enlarged end of the cylinder and slidingly secured to the cylinder; a punching tool at the lower end of the enclosure; means for removably securing the body; a first pneumatic actuation system for directing air through said air passageway between the enlarged end of the barrel and the lower end of the envelope end to push down the envelope; and a second pneumatic actuating system for pushing up the enclosure by sending air between the upper end of the enclosure and the upper end of the enclosure; moving the piston rod, actuating the first pneumatic actuating system to punch the protective membrane of the wafer, actuating the second pneumatic actuating system to push up the enclosure, and moving the piston rod in the opposite direction. 1. An automatic punching device for a protective film of a semiconductor wafer, characterized in that the position detector is moved on the X-Y table. 2. The automatic punching device for a protective film of a semiconductor wafer according to claim 1, wherein the position detector includes a light sensor and a light emitting element for detecting the position of the semiconductor wafer. 3. The automatic punching device for a protective film of a semiconductor wafer according to claim 1, wherein the lower end of the enclosure has an air leak hole.
JP59057954A 1984-03-26 1984-03-26 Automatic punching equipment of protection film for semiconductor wafer Granted JPS60201622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59057954A JPS60201622A (en) 1984-03-26 1984-03-26 Automatic punching equipment of protection film for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59057954A JPS60201622A (en) 1984-03-26 1984-03-26 Automatic punching equipment of protection film for semiconductor wafer

Publications (2)

Publication Number Publication Date
JPS60201622A JPS60201622A (en) 1985-10-12
JPH0121622B2 true JPH0121622B2 (en) 1989-04-21

Family

ID=13070418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59057954A Granted JPS60201622A (en) 1984-03-26 1984-03-26 Automatic punching equipment of protection film for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS60201622A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02134038U (en) * 1989-04-12 1990-11-07

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02134038U (en) * 1989-04-12 1990-11-07

Also Published As

Publication number Publication date
JPS60201622A (en) 1985-10-12

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