JPH01209707A - Magnetic alloy film incorporating nitrogen - Google Patents
Magnetic alloy film incorporating nitrogenInfo
- Publication number
- JPH01209707A JPH01209707A JP3575688A JP3575688A JPH01209707A JP H01209707 A JPH01209707 A JP H01209707A JP 3575688 A JP3575688 A JP 3575688A JP 3575688 A JP3575688 A JP 3575688A JP H01209707 A JPH01209707 A JP H01209707A
- Authority
- JP
- Japan
- Prior art keywords
- alloy film
- film
- composition
- resistance
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims description 12
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 title claims description 7
- 239000000203 mixture Substances 0.000 claims abstract description 23
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 21
- 239000000956 alloy Substances 0.000 claims abstract description 21
- 150000004767 nitrides Chemical class 0.000 claims abstract description 12
- 238000010030 laminating Methods 0.000 claims abstract 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- 230000005291 magnetic effect Effects 0.000 abstract description 19
- 238000005299 abrasion Methods 0.000 abstract description 7
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 239000000696 magnetic material Substances 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 230000005415 magnetization Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 230000005389 magnetism Effects 0.000 description 6
- 238000011160 research Methods 0.000 description 5
- 238000002845 discoloration Methods 0.000 description 4
- 229910019854 Ru—N Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 229910000929 Ru alloy Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は磁気ヘッドコア等に適した軟磁性材料、特に窒
素を含むＦｅ系磁性合金膜に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a soft magnetic material suitable for a magnetic head core etc., particularly to a nitrogen-containing Fe-based magnetic alloy film.
従来の技術
鉄系の磁気ヘッド材料としては、ｒｒｅ−ｓｉ−ｈｇの
セフダストやＦｅ−Ｎｉのパーマロイ等が従来より知ら
れている。しかし、前者は耐触性に問題があり、耐摩耗
性においてもやや難がある。また、後者は耐摩耗性にお
いて大いに問題があり、ＶＴＲ用へ・フドに用いること
はできない。そのうえ、これらの合金の飽和磁化４πＭ
ｓ はせいぜい１０１００００Ｇａｕ 程度である
。BACKGROUND OF THE INVENTION As iron-based magnetic head materials, RRE-SI-HG Cefdust, Fe--Ni Permalloy, and the like are conventionally known. However, the former has a problem in contact resistance and also has some difficulty in abrasion resistance. Furthermore, the latter has great problems in wear resistance and cannot be used for VTR or hoods. Moreover, the saturation magnetization of these alloys is 4πM
s is about 1,010,000 Gau at most.
近年、高飽和磁化を有するＦｅ−３ｉ系合金が注目され
るようになってきたが、この合金は前記ＦＦｅ−５ｉ−
Ａ合金、およびＦｅ−Ｎｉ系合金のような優れた軟磁性
を示さず、さらに耐触性、および耐摩耗性も劣るため、
磁気へ、７ドコアとしては使用できない。In recent years, Fe-3i alloys with high saturation magnetization have been attracting attention, and this alloy is similar to the FFe-5i-
It does not exhibit excellent soft magnetism like A alloy and Fe-Ni alloy, and also has poor contact resistance and wear resistance.
It cannot be used as a magnetic or 7-dcore.
発明が解決しようとする課題
そこで、優れた軟磁性を得、かつ耐触性、および耐摩耗
性を高めるという見地から種々の窒化合金の研究がなさ
れており、これは例えば、Ｆｅの窒化物の研究（ジャー
ナルオプアプライドフィジ・ソクス： Ｊ、Ａｐｐｌ、
Ｐｈ７ｇ、 ５３ （１１） Ｐ８３３２（１９８２）
）や、Ｆｅ−Ｂ 系の窒化物の研究（特開昭５４−９
４４２８号公報、および同昭６０−１５２６１号公報）
として知られている。しかし、一般には、窒化によって
軟磁性は損なわれ、これらの研究においては、軟磁性の
指標である抗磁力Ｈａが極めて大きくなるという問題を
生じていた。Problems to be Solved by the Invention Therefore, research has been conducted on various nitride alloys from the viewpoint of obtaining excellent soft magnetism and improving corrosion resistance and wear resistance. Research (Journal Op Applied Phys. Socs: J, Appl.
Ph7g, 53 (11) P8332 (1982)
) and research on Fe-B-based nitrides (Japanese Patent Application Laid-Open No. 1986-9)
No. 4428, and No. 60-15261)
known as. However, in general, soft magnetism is impaired by nitriding, and in these studies, a problem has arisen in that the coercive force Ha, which is an index of soft magnetism, becomes extremely large.
又ｙｅ −ｓｉ系合金に添加物を入れてその耐触性の改
善が試みられており、Ｆｅ −Ｓｉ −Ｒｕ 系に関
する研究（第８回日本応用磁気学会学術講演概要集１９
８４．１１）等がなされている。しかしながら添加物に
よりある程度のＦｅ−８ｉ系の耐触性の改善はなされて
も軟磁気特性の改善はなされないばかりか、多量の添加
は飽和磁化の減少と軟磁気特性の劣化を生ずるという問
題点があった。In addition, attempts have been made to improve the contact resistance of ye-Si alloys by adding additives to them, and research on the Fe-Si-Ru system (Research on the 8th Japanese Society of Applied Magnetics, Abstracts of Academic Lectures 19)
84.11) etc. have been done. However, even if additives improve the contact resistance of Fe-8i to some extent, they do not improve the soft magnetic properties, and addition of large amounts causes a decrease in saturation magnetization and deterioration of the soft magnetic properties. was there.
本発明は、このような問題点を解決し、抗磁力Ｈｃが小
さく、かつ耐触性と耐摩耗性に優れた、高飽和磁化を有
する、窒素を含む軟磁性合金を作成しようとするもので
ある。The present invention aims to solve these problems and create a nitrogen-containing soft magnetic alloy that has a low coercive force Hc, has excellent contact resistance and wear resistance, and has high saturation magnetization. be.
課題を解決するだめの手段
本発明合金は膜自体が以下に述べるような超構造を有す
るＦａ−３ｉ−Ｒｕ −Ｎ より成る磁歪の比較的小
さい結晶質合金膜であり、このように超構造化する事に
より軟磁気特性を得る事を可能とし、かつ窒化していな
いＦａ −Ｓｉ −Ｒｕ合金膜よりも優れた耐融、耐摩
耗性と軟磁気特性を得る事を可能とするものである。Means for Solving the Problems The alloy of the present invention is a crystalline alloy film with relatively low magnetostriction, which is composed of Fa-3i-Ru-N and has a superstructure as described below. By doing so, it is possible to obtain soft magnetic properties, and it is also possible to obtain melt resistance, abrasion resistance, and soft magnetic properties superior to those of a non-nitrided Fa-Si-Ru alloy film.
本発明による磁性合金膜は、次の組成式で表わされる合
金膜
Ｆｅ ｔＬＳｉ ｂＲｕ ０・・・・−・”・”（１）
と窒化合金膜
・・・・・・・・・・・・（２）
とを積層して成る事を特徴とする積層合金膜、又は完全
な積層膜ではなくむしろ組成変調構造を有し、平均組成
で
（Ｆａ ａ−Ｓｉ ｂｌ Ｒｕ ０− ）
１０Ｃ≧−ｄ’ Ｎ ｄ−・・・・・・・・・・
・・（３）
で表わされ、少くとも元素Ｎ（窒素）が膜厚方向に組成
変調されている事を特徴とする窒素を含む磁性合金膜で
ある。ただしａ、ｂ、ｃ、ｄ及びａ′。The magnetic alloy film according to the present invention is an alloy film represented by the following compositional formula: Fe tLSi bRu 0...
and a nitride alloy film (2) A laminated alloy film characterized by being laminated with a nitride alloy film... With the composition (Fa a-Si bl Ru 0- )
10C≧−d' N d−・・・・・・・・・・
... (3) A magnetic alloy film containing nitrogen, characterized in that the composition of at least the element N (nitrogen) is modulated in the film thickness direction. However, a, b, c, d and a'.
ｂ’ 、 ｃ’ 、 （１’ は各々原子パーセント
を表わし及び
である。ただしａ’ 、 ｂ’ 、 ｃ’ 、 ｄ’
は平均値であり、膜の厚さ方向に各組成は組成変調さ
れている為変動し、膜内のある部分においてその局所部
分の組成は必ずしも（６）式で示された組成範囲内にあ
るとは限らない。b', c', (1' each represents an atomic percent. However, a', b', c', d'
is an average value, and each composition varies in the thickness direction of the film because the composition is modulated, and the local composition of a certain part of the film is not necessarily within the composition range shown by equation (6). Not necessarily.
作用
Ｆｅ−３ｉ系合金膜は、Ｓｌが約６および１８（原子係
）でほぼ磁歪が零となることが実験的に知られており、
適当な熱処理により、Ｓｌが約３〜２０（原子幅）で抗
磁力Ｈｃは１０００以下となる。しかし、これでは十分
満足のいく軟磁気特性が得られないばかりか、耐摩耗性
、および耐触性に難があり、磁気へラドコアには使用で
きない。It is experimentally known that the magnetostriction of the functional Fe-3i alloy film becomes almost zero when the Sl content is approximately 6 and 18 (atomic ratio).
By appropriate heat treatment, the coercive force Hc becomes 1000 or less when Sl is about 3 to 20 (atomic width). However, this method not only does not provide sufficiently satisfactory soft magnetic properties, but also has poor wear resistance and contact resistance, and cannot be used for magnetic helad cores.
耐触性に関してはＦｅ−８ｉにＲｕを１係以１添加する
事によりある程度の改善がなされる事が知られている。It is known that the corrosion resistance can be improved to some extent by adding one or more parts of Ru to Fe-8i.
しかしながらＲｕ添加では軟磁気特性の改善はなされず
６係を越えると逆に特性が劣化する。又十分な耐摩耗性
、耐触性が得られないという問題がある。そこで、本発
明は、まず窒化によって耐触性・耐摩耗性が大幅に改善
されるという特質を利用し、しかも単なる窒化膜ではな
く、非窒化層と窒化層より成る多層構造膜（それ自体広
義の「組成変調構造膜」に含まれる。）もしくは、組成
変調構造膜（ここでは、狭義の「組成変調構造膜」とし
て、膜厚方向に各物質の組成が実質上正弦波状に変化す
るものを指す。以下同じ。However, the addition of Ru does not improve the soft magnetic properties, and on the contrary, the properties deteriorate when the coefficient exceeds 6. Another problem is that sufficient wear resistance and contact resistance cannot be obtained. Therefore, the present invention utilizes the property that nitriding greatly improves contact resistance and abrasion resistance, and is not a simple nitride film, but a multilayer structure film (in its own broad sense) consisting of a non-nitride layer and a nitride layer. ) or a compositionally modulated structure film (here, a "composition modulated structure film" in a narrow sense refers to a film in which the composition of each substance changes substantially sinusoidally in the film thickness direction). The same applies hereafter.
なお、広義の組成変調構造膜を超構造膜と称することに
する。）とすることで、Ｌ記の軟磁気特性としては不十
分であった抗磁力Ｈｃをさらに小さくできるという、本
発明者らの発見を具体化したものである。ただし、この
時多層構造のものは熱的に不安定であるため、適切な熱
処理を施すことにより、構造の変化を生じさせ、好まし
い組成変調構造とする事が可能である。Note that the compositionally modulated structure film in a broad sense will be referred to as a superstructure film. ), it is possible to further reduce the coercive force Hc, which was insufficient for the soft magnetic properties in L. However, since the multilayer structure is thermally unstable at this time, by applying appropriate heat treatment, it is possible to change the structure and obtain a preferable compositionally modulated structure.
実施例
本発明の具体的実施において判明した、好ましい組成比
は次のとおりである。Examples Preferred composition ratios found in the specific implementation of the present invention are as follows.
（１） 、 （２）式で示された積層膜もしくは（３）
式で示された組成変調膜が軟磁性を示すには
ａ≦９６．ｂ≧３．Ｃ≦６ ・・・・・・・・・・・
・（６）ａ′≦ｅｅ、ｂ’≧３．ｃ≦６ ・・・・・
・・・・・・・（７）である事が必要である、又高飽和
磁化４πＭｇ ）１ｏｏｏｏＧを有する為には
７４＜ａ、ｂ≦２０．（１≦２０ ・・・・・・・・・
（８）７４＜ＩＬ’ 、 ｂ’＜２ｏ 、 ｄ’≦１６
・・・・・・・・・（９）である事が必要である。更
に高耐触、高耐摩耗性を有するには少くとも
Ｃ２０，ｄ≧１ ・・・・・・・・・・・
・（１ｏ）Ｃ′≧１．ｄ′≧１ ・・・・
・・・・・・・・（１１）である事が必要である事がわ
かった。(1), (2) A laminated film shown by formula (2) or (3)
For the composition modulated film shown by the formula to exhibit soft magnetism, a≦96. b≧3. C≦6 ・・・・・・・・・・・・
・(6) a'≦ee, b'≧3. c≦6・・・・・・
......(7), and in order to have high saturation magnetization 4πMg)1ooooG, 74<a, b≦20. (1≦20 ・・・・・・・・・
(8) 74<IL', b'<2o, d'≦16
・・・・・・・・・(9) is required. Furthermore, in order to have high contact resistance and high wear resistance, at least C20, d≧1.
・(1o) C'≧1. d'≧1...
It turns out that (11) is necessary.
特に優れた軟磁性を示す為には、（１） 、 （２）式
の積層膜の場合には一層の層厚ｔが
ｔく１０ｏｏ入 ・・・・・・・・・・
・・（１２）の時、又（３）式の組成変調膜の場合には
、その組成変調波長λが
λ〈２ｏＯｏ人 ・・・・・・・・・・
・・（１３）の時その効果が顕著である事が実験よりわ
かった。In order to exhibit especially excellent soft magnetism, in the case of the laminated film of formulas (1) and (2), the thickness of one layer t must be 100 mm.
...In the case of (12), or in the case of the composition modulation film of formula (3), the composition modulation wavelength λ is λ<2oOo person...
It was found through experiments that the effect was significant when (13) was met.
以下具体的実施例を従来の単層構造膜及び非窒化膜と比
較して説明する。Specific examples will be described below in comparison with a conventional single-layer structure film and a non-nitride film.
〈実施例１〉
Ｆｅ Ｓｚ Ｒｕ 、Ｆｅ ７５５１２０ Ｒｕ
６な９２ ７ す
るターゲットを用いて１．Ｉ Ｘ １０ ＴＯｒｒ
のＡｒガス中、及び１ｏ４Ｎ２ガスを混合したＡｒガ
ス中でスパッタして、Ｆｅ−８ｉ−Ｒｕ 合金膜及び
Ｆｅ −Ｓｉ −Ｒｕ −Ｎ合金膜をそれぞれ作成した
。次にこの２種類のターゲットを用いてＡｒガス中とＮ
２ガス分圧１０チのＡｒガス中で交互にスパッタするこ
とにより一層の層厚ｔが約１０００人と２００人（即ち
組成変調波長が２０００人と４００八）の２種類のＦｅ
−３ｉ −Ｒｕ／Ｆｅ−８ｉ−Ｒｕ−Ｎ多層膜を作成し
た。これらの膜の磁気特性を測定した後、４２０℃です
べての膜を熱処理し、その磁気特性を測定した。結果を
まとめて以下の表に示した。なお表中には得られた膜の
分析組成を示した。<Example 1> Fe Sz Ru, Fe 755120 Ru
1. Using a target of 692 7. I x 10 Torr
A Fe-8i-Ru alloy film and a Fe-Si-Ru-N alloy film were respectively formed by sputtering in Ar gas of 100% and in Ar gas mixed with 104N2 gas. Next, using these two types of targets, in Ar gas and N
By alternately sputtering in Ar gas with a partial pressure of two gases of 10 cm, two types of Fe with layer thicknesses t of about 1000 and 200 (that is, composition modulation wavelengths of 2000 and 4008) were formed.
-3i-Ru/Fe-8i-Ru-N multilayer film was created. After measuring the magnetic properties of these films, all the films were heat treated at 420°C and their magnetic properties were measured. The results are summarized in the table below. In addition, the analyzed composition of the obtained film is shown in the table.
（以下余白）
表中五５〜８の試料は作成時は積層構造で熱処理後は組
成変調構造となっており、前者は窒化層と非窒化層の各
層の組成を、又後者については膜全体の平均組成を示し
た。又図に試料＆８についてＡＥＳにより測定したＦθ
、Ｓｉ、Ｎ元素についての膜厚方向の組成プロファイル
を示した。図より作成時積層構造だったものムが熱処理
により組成変調構造Ｂとなっている事がわかる。(Leaving space below) Samples 5 to 8 in the table have a laminated structure at the time of preparation, and a compositionally modulated structure after heat treatment. The average composition of The figure also shows Fθ measured by AES for sample &8.
, Si, and N elements in the film thickness direction. It can be seen from the figure that the layered structure at the time of fabrication was changed to a compositionally modulated structure B by heat treatment.
以上の実験結果より試料煮１，２の単層非窒化膜及び試
料＆３．４の単層窒化膜に比べて本発明の試料五７，８
の超構造膜は軟磁気特性が改善されている事がわかる。From the above experimental results, compared to the single-layer non-nitride films of samples 1 and 2 and the single-layer nitride films of samples &3.4, samples 57 and 8 of the present invention
It can be seen that the superstructured film has improved soft magnetic properties.
又試料煮５．６のようにｔ＝１０００人Ｏｒ λ＝２０
００人のものは黒３゜４に比べである程度軟磁気特性が
改善されているモノノ、！７．８０！うＫｔ＜１０００
Ａ ｏｒλ（２０００人のものに比べると十分満足でき
る軟磁気特性にはなっていない。Also, as in sample boiling 5.6, t = 1000 people or λ = 20
The one from 00 has improved soft magnetic properties to some extent compared to the black 3゜4! 7.80! Kt<1000
A orλ (compared to those of 2000 people, the soft magnetic properties are not sufficiently satisfactory.
〈実施例２〉
実施例１と同様の方法で試料悪１〜８と同じ組成・構成
で総膜厚が４０μｍのＩＦ；ｏ、 １ ’〜ｌ慝８′の
各種の合金膜を作成した。これらの膜の耐摩耗性をメタ
ルテープと市販のＶＴＲデツキを用いて評価した。評価
法としては試料五１の摩耗量で他の試料の摩耗量をノー
マライズした。更に各試料を蒸留水中に４８時間放置し
、その変色度により、○：変色なし、Δ：やや変色あり
、×：変色あり。<Example 2> In the same manner as in Example 1, various alloy films having the same composition and structure as Samples 1 to 8 and having a total film thickness of 40 μm were prepared. The abrasion resistance of these films was evaluated using a metal tape and a commercially available VTR deck. As an evaluation method, the wear amount of Sample 51 was used to normalize the wear amount of other samples. Further, each sample was left in distilled water for 48 hours, and the degree of discoloration was determined: ○: no discoloration, Δ: slight discoloration, ×: discoloration.
とじて評価した。又各試料の電気抵抗を４端子法により
、更にはＶＳＭにより各試料の飽和磁化４πＭｇ を
測定した。以上の結果をまとめて下表に示した。It was evaluated as follows. Further, the electrical resistance of each sample was measured by the four-probe method, and the saturation magnetization 4πMg of each sample was also measured by VSM. The above results are summarized in the table below.
（以下余白）
表−２
なお試料１′〜８′ についてはすべて４２０℃熱処理
後の試料について測定を行なった。(The following is a blank space) Table 2 For samples 1' to 8', measurements were all made on the samples after heat treatment at 420°C.
以上実施例１．２より軟磁気特性、耐蝕性、耐摩耗性、
高抵抗、高飽和磁化といったすべての条件を本発明の試
料悪７，８は満足している事がわかった。From Example 1.2 above, soft magnetic properties, corrosion resistance, wear resistance,
It was found that Samples 7 and 8 of the present invention satisfied all conditions such as high resistance and high saturation magnetization.
〈実施例３〉
ターゲットにＦｅ ８４８１１３ Ｒｕ ｓを用いて実
施例１と同様の方法で層厚が約２００人の窒化層と非窒
化層より成る積層膜を形成した後、４２０°Ｃの熱処理
により組成変調膜とした。次に比較の為スバンタ中のＮ
２ガス分圧を１０係以外の１係。<Example 3> A laminated film consisting of a nitrided layer and a non-nitrided layer with a thickness of approximately 200 layers was formed in the same manner as in Example 1 using Fe 848113 Ru s as a target, and then heat treated at 420°C. It was made into a composition modulated film. Next, for comparison, N in Svantha
2 Gas partial pressure is 1 factor other than 10 factor.
２％、２０％、３０チとして同様の方法で膜を作成した
。得られた膜の４πＭ＋９ 、耐摩耗性、耐触性を実施
例２と同様の方法で調べた、結果を下表に示した。Films of 2%, 20%, and 30% were prepared in the same manner. The 4πM+9, abrasion resistance, and contact resistance of the obtained film were examined in the same manner as in Example 2, and the results are shown in the table below.
（以 下金 白）
以上の結果より耐蝕性、耐摩耗性を考慮すれば窒素Ｎを
膜中に１チ以上含む事が望ましく、又４πＭｇ＞１００
００ＧとするにはＮは１６係以下にする事が望ましい事
がわかる。(Hereinafter referred to as "Kinshiro") From the above results, considering corrosion resistance and abrasion resistance, it is desirable to contain 1 or more nitrogen in the film, and 4πMg>100
It can be seen that in order to obtain 00G, it is desirable to set N to 16 or less.
発明の効果
以上実施例により説明したように本発明の窒素を含む磁
性合金膜は、高飽和磁化を有しかつ耐摩耗・耐触性に優
れ比較的電気抵抗の高いＦｅ系軟磁性材料を可能とする
ものである。Effects of the Invention As explained above with reference to Examples, the nitrogen-containing magnetic alloy film of the present invention enables the production of Fe-based soft magnetic materials that have high saturation magnetization, are excellent in wear resistance and corrosion resistance, and have relatively high electrical resistance. That is.
における膜の組成のムＥＳによるデプスプロファイルを
示す図である。FIG. 3 is a diagram showing the depth profile of the composition of the film by ES.
Claims (4)
０）Ｎ＿ｄで表わされる窒化合金膜とを積層した事を特
徴とする窒素を含む磁性合金膜。 ただしａ，ｂ，ｃ，ｄはそれぞれ ７４≦ａ≦９６ ３≦ｂ≦２０ １≦ｃ≦６ １≦ｄ≦２０ を満足するものである。(1) An alloy film represented by Fe_aSi_bRu_c in terms of atomic composition percentage, (Fe_aSI_bRU_c)(100-d)/(10
0) A magnetic alloy film containing nitrogen characterized by laminating a nitride alloy film represented by N_d. However, a, b, c, and d each satisfy 74≦a≦96, 3≦b≦20, 1≦c≦6, and 1≦d≦20.
を含む磁性合金膜。(2) The nitrogen-containing magnetic alloy film according to claim 1, wherein t<1000 Å, where t is the thickness of one layer.
ｅ＿ａ＿′Ｓｉ＿ｂ＿′ＲＵ＿ｃ＿′）（１００−ｄ′
）／（１００）Ｎ＿ｄ＿′で表わされ、かつ膜の厚さ方
向に少くともＮ（窒素）が組成変調されている事を特徴
とする窒素を含む磁性合金膜。 ただしａ′，ｂ′，ｃ′，ｄ′はそれぞれ ７４≦ａ′≦９６ ３≦ｂ′≦２０ １≦ｃ′≦６ １≦ｄ′≦１５ を満足するものである。(3) The average composition of the entire film is (Y
e_a_'Si_b_'RU_c_')(100-d'
)/(100)N_d_', and is characterized in that the composition of at least N (nitrogen) is modulated in the thickness direction of the film. However, a', b', c', and d' each satisfy 74≦a'≦96, 3≦b'≦20, 1≦c'≦6, and 1≦d'≦15.
を含む磁性合金膜。(4) The nitrogen-containing magnetic alloy film according to claim 3, wherein the compositional modulation wavelength λ is λ<2000 Å.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3575688A JPH01209707A (en) | 1988-02-18 | 1988-02-18 | Magnetic alloy film incorporating nitrogen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3575688A JPH01209707A (en) | 1988-02-18 | 1988-02-18 | Magnetic alloy film incorporating nitrogen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01209707A true JPH01209707A (en) | 1989-08-23 |
Family
ID=12450680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3575688A Pending JPH01209707A (en) | 1988-02-18 | 1988-02-18 | Magnetic alloy film incorporating nitrogen |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01209707A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017160899A (en) * | 2016-03-08 | 2017-09-14 | 儀徴亜新科双環活塞環有限公司 | Diamond-like carbon-coating layer for piston ring surface, piston ring and manufacturing process |
-
1988
- 1988-02-18 JP JP3575688A patent/JPH01209707A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017160899A (en) * | 2016-03-08 | 2017-09-14 | 儀徴亜新科双環活塞環有限公司 | Diamond-like carbon-coating layer for piston ring surface, piston ring and manufacturing process |
| US11215283B2 (en) | 2016-03-08 | 2022-01-04 | ASIMCO Shuanghuan Piston Ring(YiZheng) Co., Ltd. | Diamond-like coating for piston ring surfaces, piston ring and processes for preparing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4904543A (en) | Compositionally modulated, nitrided alloy films and method for making the same | |
| US4836865A (en) | Magnetic nitride film | |
| JP2790451B2 (en) | Soft magnetic alloy film containing nitrogen | |
| Kato et al. | Magneto-optical effect in MnPt3 alloy films | |
| JPH0573242B2 (en) | ||
| JP2763165B2 (en) | Manufacturing method of magnetic recording medium | |
| JPH01209707A (en) | Magnetic alloy film incorporating nitrogen | |
| JPS6357758A (en) | Nitriding magnetic alloy film | |
| US4897318A (en) | Laminated magnetic materials | |
| Wierman et al. | Long-range order and magnetic properties of MnxPt1− x thin films | |
| JPH03124005A (en) | Superstructure nitride alloy film | |
| EP0298840B1 (en) | Magnetic recording medium and manufacturing method thereof | |
| JPH01238106A (en) | Corrosion-resistant ferromagnetic thin-film | |
| JPH02263416A (en) | Manufacture of soft magnetic alloy film | |
| JPH02163911A (en) | Soft magnetic alloy film and manufacture thereof | |
| JP3028564B2 (en) | Soft magnetic alloy film | |
| JPH118149A (en) | Formation of soft magnetic alloy film | |
| JPH01143312A (en) | Amorphous soft magnetic laminated film | |
| JPH0191482A (en) | Magnetoresistance effect film | |
| JPH01125910A (en) | Magnetic alloy film containing nitrogen | |
| JPS61258331A (en) | Magnetic recording medium | |
| JP3233538B2 (en) | Soft magnetic alloys, soft magnetic thin films and multilayer films | |
| JP3113514B2 (en) | Amorphous magnetic alloy thin film and thin film magnetic head using the same | |
| JPH0610848B2 (en) | Laminated magnetic material | |
| JPH06325419A (en) | Magneto-optical recording medium |