JPH01208452A - Method and apparatus for evaporating sublimable substance - Google Patents
Method and apparatus for evaporating sublimable substanceInfo
- Publication number
- JPH01208452A JPH01208452A JP3089788A JP3089788A JPH01208452A JP H01208452 A JPH01208452 A JP H01208452A JP 3089788 A JP3089788 A JP 3089788A JP 3089788 A JP3089788 A JP 3089788A JP H01208452 A JPH01208452 A JP H01208452A
- Authority
- JP
- Japan
- Prior art keywords
- sublimable substance
- crucible
- heater
- sublimable
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 title claims abstract description 67
- 238000001704 evaporation Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims description 5
- 230000008020 evaporation Effects 0.000 claims abstract description 28
- 239000003779 heat-resistant material Substances 0.000 claims description 4
- 230000008016 vaporization Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 6
- 239000012777 electrically insulating material Substances 0.000 abstract description 3
- 230000005855 radiation Effects 0.000 description 7
- 238000000859 sublimation Methods 0.000 description 6
- 230000008022 sublimation Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 241000272525 Anas platyrhynchos Species 0.000 description 3
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は昇華性物質の蒸発に関し、特に蒸着薄膜、超微
粒子を製造するのに適した昇華性物質の蒸発方法と蒸発
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the evaporation of sublimable substances, and more particularly to a method and an evaporation apparatus for evaporating sublimable substances suitable for producing deposited thin films and ultrafine particles.
［従来の技術］
物質の気化、蒸発は液体からの他、固体からの昇華があ
る。液体からの蒸発の場合、通常高温になった液体の部
分が体積′を増し、上昇し、上表面で蒸発する。真空蒸
着では、る□つぼを囲んだり。[Prior Art] Sublimation and evaporation of substances include not only liquids but also sublimation from solids. In the case of evaporation from a liquid, usually the hotter part of the liquid increases in volume, rises, and evaporates at the upper surface. In vacuum evaporation, surrounding the pot.
るつぼに埋め込まれたりしている加熱用フィラメントに
流す電流を制御することなどで蒸発量を制御する。昇華
性物質についても同様の蒸発方法を採っている。The amount of evaporation is controlled by controlling the current flowing through the heating filament embedded in the crucible. A similar evaporation method is used for sublimable substances.
第５図に抵抗加熱式真空蒸着に用いられるるっぼの例を
示す。タングステン等の高融点金属のフィラメント２１
がるつぼの骨格を画定し、アルミナ等の化学的に不活性
で耐熱性の物質２２がフィラメント２１をコートしつつ
、容器を形成している。アルミナは高温で焼成されてい
る。るつぼは蒸発物質をどの位ロードするかによって種
々の大きさに作られる。このようなるつぼを真空容器内
に股！し、目的物質をロードし、そのフィラメントに低
圧大電流回路から電流を流すことによって、物質を加熱
、蒸発させる。FIG. 5 shows an example of a rubbish plate used in resistance heating vacuum deposition. Filament 21 of high melting point metal such as tungsten
A chemically inert, heat-resistant material 22 such as alumina coats the filament 21, defining the skeleton of the crucible and forming the container. Alumina is fired at high temperatures. Crucibles are made in various sizes depending on how much vaporized material is to be loaded. Place a crucible like this in a vacuum container! Then, the target substance is loaded and a current is passed through the filament from a low-voltage, high-current circuit to heat and evaporate the substance.
［発明が解決しようとする問題点コ
昇華性の物質を通常のるつぼで蒸発させる場合、突沸等
の現象が起き易く、蒸発′量の経時的変化が大きい。[Problems to be Solved by the Invention] When a sublimable substance is evaporated in an ordinary crucible, phenomena such as bumping are likely to occur, and the amount of evaporation changes greatly over time.
蒸発量をモニタし、加熱用電源にフィードバックするこ
とも考えられるが、装置が複雑化する割合に制御性が良
くない。It is conceivable to monitor the amount of evaporation and feed it back to the heating power source, but this would complicate the device and would not provide good controllability.
［問題点を解決するために行った解析コ昇華性物質の蒸
着の場合、物質はるつぼ内で固体のままである。液体で
あれば、るつぼの壁面で加熱され高温になった部分は上
昇し、対流を起こすのでるつぼ内の温度分布は平均化さ
れ、蒸発速度も一定化すると考えられる。ところが、昇
華性物質の場合は、対流によって混ざり合うことがない
。[Analysis carried out to solve the problem] In the case of vapor deposition of sublimable substances, the substances remain solid in the crucible. If it is a liquid, the heated portion of the crucible wall will rise and cause convection, so the temperature distribution within the crucible will be averaged and the evaporation rate will be constant. However, in the case of sublimable substances, they do not mix due to convection.
抵抗加熱用フィラメントを埋めこんだるつぼの場合、る
つぼの壁面に接する部分とるつぼ内部とを比較すれば、
壁面に接している部分の方が高温になる。したがって、
昇華性物質の蒸発、昇華はるつぼ壁面でのみ起こる。る
つぼには昇華性物質がロードされているので、下部壁面
で蒸発した蒸気分子はそのまま外部に飛び出すわけには
行かず、閉じ込められる感じになろう、上部に載ってい
る昇華性物質の量が少なく、機械的にもろい場合そこを
破って、蒸発分子が飛び出すことも起ころう。In the case of a crucible in which a filament for resistance heating is embedded, if you compare the part in contact with the wall of the crucible with the inside of the crucible,
The part that is in contact with the wall gets hotter. therefore,
Evaporation and sublimation of sublimable substances occur only on the crucible wall. Since the crucible is loaded with a sublimable substance, the vapor molecules that evaporate on the bottom wall cannot just fly out to the outside, and will feel trapped, since the amount of sublimable substance on the top is small. , if it is mechanically fragile, it may break and the evaporated molecules may fly out.
また、壁面に接した部分が蒸発すると壁面と昇華性物質
との間に隙間ができる。隙間を介して壁面から雛れた部
分は放射でのみ熱せられることになろう、残った昇華性
物質の形が不安定なものとなったときには昇華性物質が
崩れ、昇華性物質が再びるつぼ壁面と接触し、伝導によ
って６加熱されるようになろう、これらの現象はｇ４発
的で制御することは困難であろう。突沸が起こるのは昇
華性物質に特有の現象と考えられる。Furthermore, when the portion in contact with the wall surface evaporates, a gap is created between the wall surface and the sublimable substance. The part that leaks out from the wall through the gap will be heated only by radiation.When the shape of the remaining sublimable material becomes unstable, the sublimable material will collapse and the sublimable material will return to the crucible wall. in contact with g4 and would become heated by conduction, these phenomena would be emissive and difficult to control. The occurrence of bumping is considered to be a phenomenon peculiar to sublimable substances.
［問題点を解決するための手段］
上記問題点を改善するため、本発明によれば、るつぼに
昇華性物質を収容し、昇華性物質の上方に抵抗加熱ヒー
タを配置し、抵抗加熱ヒータを加熱して熱放射させ、放
射熱によって昇華性物質をその上面から蒸発させる。[Means for Solving the Problems] In order to improve the above problems, according to the present invention, a sublimable substance is housed in a crucible, a resistance heater is disposed above the sublimation substance, and the resistance heater is It is heated to radiate heat, and the radiant heat evaporates the sublimable substance from its upper surface.
るつぼと抵抗加熱ヒータとの上に開孔を有する蓋部材を
設けてもよい。A lid member having an opening may be provided above the crucible and the resistance heater.
［作用コ
昇華性物質の上面から放射熱によって加熱すると、昇華
性物質はその上面から順次蒸発できる。[Operation] When the top surface of a sublimable substance is heated by radiant heat, the sublimable substance can be evaporated sequentially from the top surface.
昇華性物質はその上部がら蒸発していくので物理的に安
定な形状を保つ。Since the sublimable substance evaporates from the top, it maintains a physically stable shape.
昇華性物質の加熱がほぼ上方がらの放射熱のみによって
行われるので、加熱条件を一定に保ち易い。Since the sublimable substance is heated almost exclusively by radiant heat from above, it is easy to keep the heating conditions constant.
昇華性物質の蒸発がほぼ上面でのみ行われるので突沸が
低減する。Bumping is reduced because the sublimable substance is evaporated almost only on the upper surface.
開孔を有する蓋部材を使用すると、蒸発分子は一旦蓋部
材とるつぼが画定する空間内に貯えられ。When a lid member with openings is used, the evaporated molecules are once stored in the space defined by the lid member and the crucible.
緩衝作用を受け１開孔から安定化した昇華性物質の蒸気
が発生する。Stabilized vapor of a sublimable substance is generated from one opening under the buffering effect.
［実施例コ
第１図に本発明の１実施例による昇華性物質の蒸発装置
を示す。るつぼ１はアルミナ等の化学的に不活性で耐熱
性の材料で作られ、昇華性物質２を収容する。抵抗加熱
ヒータ３はタングステン等の高融点金属のコイルからな
り、昇華性物質２の上方に配置される。ボビン４はアル
ミナ等の化学的に不活性で耐熱性の電気的絶縁材料で作
られており、その内壁上の溝内にヒータ３のコイルを保
持する。ボビン４はヒータ３を高温に加熱した時。[Embodiment] FIG. 1 shows an evaporation apparatus for a sublimable substance according to an embodiment of the present invention. The crucible 1 is made of a chemically inert and heat resistant material such as alumina and contains a sublimable substance 2. The resistance heater 3 is made of a coil made of a high melting point metal such as tungsten, and is placed above the sublimable substance 2 . The bobbin 4 is made of a chemically inert, heat resistant, electrically insulating material such as alumina and holds the coil of the heater 3 in a groove on its inner wall. Bobbin 4 is when heater 3 is heated to a high temperature.
ヒータ３が垂れ下がるのを防ぐ、るつぼ１は底部から上
部に向かうにしたがって広がる断面形状を有している。The crucible 1 has a cross-sectional shape that widens from the bottom toward the top to prevent the heater 3 from sagging.
ヒータ３のコイル部分全体がるつぼ１の上端より下にな
る配置構成を示したか、部分的にるつぼ１の上端より上
に出る構成配置等色の構成配置形状としてもよい、ヒー
タ３としてコイルヒータの代わりに高融点金属のリボン
ヒータや切り込み入り円筒状カーボンヒータなどを使用
条件に応じて使うこともできる。ヒータ３の自己保持力
が高温でも十分ある場合は、ボビン４等のヒータ用治具
は省略してらよい。Although the entire coil portion of the heater 3 is shown below the upper end of the crucible 1, it may also be partially placed above the upper end of the crucible 1. Alternatively, a ribbon heater made of a high melting point metal or a cylindrical carbon heater with notches can be used depending on the usage conditions. If the heater 3 has sufficient self-holding power even at high temperatures, the heater jig such as the bobbin 4 may be omitted.
第１図のヒータ３は、第２図に示すような低電圧大電流
の電源に接続される。第２図において、商用交流電源１
４に可変降圧用のスライダック１５が接続され、スライ
ダック１５の出力側に低圧トランス１６が接続される。The heater 3 shown in FIG. 1 is connected to a low voltage, large current power source as shown in FIG. In Figure 2, commercial AC power supply 1
A slide duck 15 for variable voltage step-down is connected to 4, and a low voltage transformer 16 is connected to the output side of the slide duck 15.
低圧トランスの出力にヒータ３が接続される。さらに、
制御回路を備えてもよい。A heater 3 is connected to the output of the low voltage transformer. moreover,
It may also include a control circuit.
昇華性物質２をるつぼ１に装填し、真空装置内に配置し
、ヒータ３をその上に設置する。第２図のような電源か
らヒータ３に電流を供給するとヒータ３は加熱し、放射
熱を発射する。ボビン４の内壁に保持されなヒータ３か
、ら発した放射は主としてボビン４の内壁に囲まれた部
分の昇華性物質２の上表面を照射し、加熱する。放射を
受け、高温になった表面から昇華性物質が蒸発し、上方
に飛散する。−旦蒸発した分子が空中（真空中または雰
囲気中）で冷えて、再び固相に戻ってもヒータ３からの
熱放射を受ければ、再び気相になることができる。真空
度が高い場合は、蒸気分子はほぼ直線的運動をして上方
に配置した基板上に堆積する。不活性ガス等の雰囲気中
で蒸発させた場合は雰囲気ガスの分子と衝突し、微粒子
となって降下する。A sublimable substance 2 is loaded into a crucible 1, placed in a vacuum device, and a heater 3 is placed above it. When a current is supplied to the heater 3 from a power source as shown in FIG. 2, the heater 3 heats up and emits radiant heat. Radiation emitted from the heater 3 held on the inner wall of the bobbin 4 mainly irradiates and heats the upper surface of the sublimable material 2 in a portion surrounded by the inner wall of the bobbin 4. Sublimable substances evaporate from the high-temperature surface that receives radiation and scatter upward. - Even if the evaporated molecules cool in the air (vacuum or atmosphere) and return to the solid phase, they can change to the gas phase again if they receive heat radiation from the heater 3. When the degree of vacuum is high, the vapor molecules move approximately in a straight line and are deposited on the substrate placed above. When evaporated in an atmosphere such as an inert gas, it collides with the molecules of the atmospheric gas and falls as fine particles.
昇華性物質の照ｑｔされた部分は昇華蒸発によって次第
に消費されるが、上表面が次第に下方に下がる形で消費
されるため、昇華性物質の内部に空洞ができて崩れたり
内部で蒸発した蒸気が上方の温度が低い部分に堆積した
りすることがない、突沸等の変動が低減した安定な蒸発
を続けることかできる。The illuminated part of the sublimable substance is gradually consumed by sublimation and evaporation, but as the upper surface is consumed in a manner that gradually falls downward, a cavity is created inside the sublimable substance and the vapor evaporated inside. It is possible to continue stable evaporation with reduced fluctuations such as bumping, which prevents evaporation from accumulating in the upper part where the temperature is low.
第３図に本発明の他の実施例による蒸発装置を示す、上
拡がりのるつぼ１に昇華性物質２が収容されている。抵
抗加熱用ヒータ３は上に行くに従って径が小さくなるコ
イル形状に巻かれており、上窄まりのボビン４の内壁に
形成された溝内に保持されている。るつぼ１とボビン４
とは接触係合しており、るつぼ１の内壁がボビン４の底
部を支持している。ボビン４の上端は窄められ、開孔６
を作っている。昇華性物質２の上面はヒータ３を装荷し
たボビン４の内面と対向し、空間５を画定している。FIG. 3 shows an evaporation device according to another embodiment of the invention, in which a sublimable substance 2 is contained in an upwardly expanding crucible 1. The resistance heating heater 3 is wound into a coil shape whose diameter decreases toward the top, and is held in a groove formed in the inner wall of the bobbin 4 that tapers upward. Crucible 1 and bobbin 4
are in contact engagement with each other, and the inner wall of the crucible 1 supports the bottom of the bobbin 4. The upper end of the bobbin 4 is narrowed and the opening 6
is making. The upper surface of the sublimable substance 2 faces the inner surface of the bobbin 4 loaded with the heater 3, and defines a space 5.
ヒータ３に電流を流すとヒータ３が加熱し、全形の放射
熱源を形成する。昇華性物質２の表面は放射熱によって
加熱される。放射は上方から入射するので昇華性物質２
はその上面が最も高温となり、昇華は上面から起こる。When a current is passed through the heater 3, the heater 3 heats up and forms a complete radiant heat source. The surface of the sublimable substance 2 is heated by radiant heat. Since the radiation enters from above, sublimable substance 2
The temperature is highest at the top, and sublimation occurs from the top.
昇華した蒸気はボビン４、るつぼ１、昇華性物質２の上
面がつくる空間５に一旦蓄えられ、緩衝作用を受けて、
上方の開孔６から外部へと出ていく、空間５内の圧力（
真空度）と外部の真空度の差を大きくとる場合は開孔６
を小さくし、ボビン４とるっぽ１の接触を密にする。The sublimated vapor is temporarily stored in the space 5 created by the bobbin 4, the crucible 1, and the upper surface of the sublimable substance 2, and receives a buffering effect.
The pressure inside the space 5 (
If there is a large difference between the degree of vacuum) and the degree of vacuum outside, use hole 6.
Make the contact between bobbin 4 and Ruppo 1 closer.
第４図に他の実施例による昇華性物質の蒸発装置を示す
、昇華性物質２を収容するるつぼ１の内部上方にボビン
４に保持されたコイル状ヒータ３が配置され、るつぼ１
の上に蓋部材８がヒータ３を覆って配置されている０Ｍ
部材８には中央部に開孔６が設けられている０Ｍ部材８
はタングステン等の高融点金属の板、またはアルミナ、
石英等の耐熱性の電気的絶縁材などで作ることができる
。FIG. 4 shows a sublimable substance evaporation device according to another embodiment. A coiled heater 3 held on a bobbin 4 is disposed above the inside of a crucible 1 containing a sublimable substance 2.
A lid member 8 is placed on top of the heater 3 to cover the heater 3.
0M member 8 in which the member 8 has an opening 6 in the center.
is a plate of high melting point metal such as tungsten, or alumina,
It can be made of heat-resistant electrically insulating materials such as quartz.
たとえば、中央に直径１ｍｍの開孔を有するタングステ
ンの板部材で形成できる。蓋部材８が金属で作られてい
る場合は、蓋部材８とヒータ３とをギャップ、絶縁剤等
で電気的に絶縁する６Ｍ部材８の温度が低くなると蒸発
分子がそこに凝固堆積するのでヒータ３によって十分高
温に加熱される構造とする必要がある。蒸発用ヒータ３
と別に蓋部材８の加熱用ヒータを設けてもよい。For example, it can be formed from a tungsten plate member having a hole with a diameter of 1 mm in the center. When the lid member 8 is made of metal, when the temperature of the 6M member 8, which electrically insulates the lid member 8 and the heater 3 with a gap, an insulating agent, etc., becomes low, evaporated molecules are solidified and deposited there. 3, it is necessary to have a structure that can be heated to a sufficiently high temperature. Evaporation heater 3
A heater for heating the lid member 8 may be provided separately.
第４図を参照して、ヒータ３を加熱すると昇華性物質２
の表面が熱放射によって加熱される。るつぼ１内の昇華
性物質２表面から蒸発した昇華・性物質の蒸気はるつぼ
１と蓋部材８との間の空間９に貯えられる。開孔６から
この貯えられた昇華性物質の蒸気が発射される。るつぼ
と蓋部材の組み合わせがクヌーセンセルと同様な作用を
果たす。Referring to FIG. 4, when the heater 3 is heated, the sublimable substance 2
surface is heated by thermal radiation. The vapor of the sublimable substance evaporated from the surface of the sublimable substance 2 in the crucible 1 is stored in the space 9 between the crucible 1 and the lid member 8. The vapor of the stored sublimable substance is ejected from the aperture 6. The combination of the crucible and the lid member performs the same function as a Knudsen cell.
蓋部材８の開孔６以外の部分に当たった蒸気はヒータ３
による加熱のなめ蓋部材８には凝固堆積せず、空間９に
閉じこめられる。蒸気を一旦貯える中間状態を作ること
により１Ｍ街効果が生じ、蒸発速度の時間的変動が平滑
化されると考えられる。The steam that hits the part of the lid member 8 other than the opening 6 is transferred to the heater 3
When heated by heating, the particles are not solidified and deposited on the lid member 8, but are confined in the space 9. It is thought that by creating an intermediate state in which steam is temporarily stored, a 1M city effect occurs, and temporal fluctuations in the evaporation rate are smoothed out.
蓋部材８とるつぼ１および昇華性物質２の上表面が作る
空間９は第３図の実施例の空間５と同様の役割を果たし
ている。内外の真空度の差を大きくするには開孔６を小
さく、蓋部材８とるつぼ１の接触を密にする。The space 9 created by the lid member 8, the upper surfaces of the crucible 1 and the sublimable substance 2 plays the same role as the space 5 in the embodiment shown in FIG. In order to increase the difference in the degree of vacuum between the inside and outside, the opening 6 is made small and the lid member 8 and the crucible 1 are brought into close contact.
第１図と第４図の実施例に示す構造を用いた例によって
ＺｎＳの蒸着を行い結果を調べた。ZnS was deposited using an example using the structure shown in the example of FIGS. 1 and 4, and the results were investigated.
火翌亙遇
蒸発 型 水晶発振器 蒸発速度の物・
膜二〇設 −差
ＺｎＳ 第１図 ２Ａ／ｓｅｃ、 ±２０％ＺｎＳ
第４図 ２ Ａ ／ ｓ 、ｅ ｃ 、 ±１０
％上方からの放射加熱によって蒸発速度が安定化され、
閉じ込め空間を作ることによって、さらに蒸発速度が安
定化することが示されたと考えられる。Evaporation type crystal oscillator with evaporation speed
20 membranes - difference ZnS Figure 1 2A/sec, ±20% ZnS
Fig. 4 2 A/s, e c , ±10
%The evaporation rate is stabilized by radiant heating from above,
This suggests that creating a confined space further stabilizes the evaporation rate.
昇華性物質としてＺｎＳを例に説明したが、ＺｎＳ他の
無機物質、およびピレン、アントラセン等の有機物質の
昇華性物質を昇華、蒸発させることができる。Although ZnS has been described as an example of a sublimable substance, sublimable substances such as ZnS, other inorganic substances, and organic substances such as pyrene and anthracene can be sublimated and evaporated.
［発明の効果コ
るつぼに収容した昇華性物質を上から熱放射によって加
熱し蒸発させるため、加熱条件が安定な蒸発源が形成さ
れる。[Effects of the Invention Since the sublimable material contained in the crucible is heated and evaporated from above by thermal radiation, an evaporation source with stable heating conditions is formed.
また、昇華性物質の内部からはほとんど蒸発が起きない
ので突沸等の急激な蒸発速度の変動が低減する。Further, since almost no evaporation occurs from inside the sublimable substance, sudden fluctuations in evaporation rate such as bumping are reduced.
また、開孔を有する蓋部材を用いることによりさらに変
動を低減できる。Further, by using a lid member having an opening, fluctuations can be further reduced.
第１図は本発明の１実施例による蒸発装置を示す概略横
断面図、第２図は電源の回路図、第３図は他の実施例に
よる蒸発装置を示す概略横断面図、第４図は他の実施例
による蒸発装置の概略横断面図、第５図は従来技術によ
るるつぼの例を示す部分横断面図である。
符号の説明
１ るつぼ
２ 昇華性物質
３ ヒータ
４ ボビン
５ 空間
６ 開孔
８ 蓋部材
９ 空間
１５ スライダック
１６ 低圧トランスFIG. 1 is a schematic cross-sectional view showing an evaporator according to one embodiment of the present invention, FIG. 2 is a circuit diagram of a power supply, FIG. 3 is a schematic cross-sectional view showing an evaporator according to another embodiment of the present invention, and FIG. 5 is a schematic cross-sectional view of an evaporator according to another embodiment, and FIG. 5 is a partial cross-sectional view showing an example of a crucible according to the prior art. Explanation of symbols 1 Crucible 2 Sublimable substance 3 Heater 4 Bobbin 5 Space 6 Opening 8 Lid member 9 Space 15 Slide duck 16 Low voltage transformer
Claims (4)
ぼに昇華性物質を収容し、該昇華性物質の上方に抵抗加
熱ヒータを配置し、抵抗加熱ヒータを加熱して熱放射さ
せ、放射熱によって昇華性物質をその上面から蒸発させ
ることを特徴とする昇華性物質の蒸発方法。(1) A sublimable substance is placed in a crucible made of a chemically inert and heat-resistant material, a resistance heater is placed above the sublimable substance, and the resistance heater is heated to radiate heat. A method for evaporating a sublimable substance, characterized by evaporating the sublimable substance from its upper surface using radiant heat.
方法であって、さらに該るつぼと該抵抗加熱ヒータとを
開孔を有する蓋部材で覆い、該昇華性物質から蒸発した
蒸気が該開孔を介して外部に出ていくことを特徴とする
昇華性物質の蒸発方法。(2) A method for evaporating a sublimable substance according to claim 1, further comprising covering the crucible and the resistance heater with a lid member having an opening, and vaporizing the vapor evaporated from the sublimable substance. A method for evaporating a sublimable substance, characterized in that the substance exits to the outside through the opening.
性物質を収容するためのるつぼと、該るつぼに収容され
る昇華性物質の上方に配置される抵抗加熱ヒータとを有
することを特徴とする昇華性物質の蒸発装置。(3) A crucible made of a chemically inert and heat-resistant material for containing a sublimable substance, and a resistance heater disposed above the sublimable substance housed in the crucible. An evaporation device for sublimable substances characterized by:
装置であって、さらに該るつぼと該抵抗加熱ヒータとを
覆う、開孔を有する蓋部材を含むことを特徴とする昇華
性物質の蒸発装置。(4) The sublimable substance evaporation device according to claim 3, further comprising a lid member having an opening that covers the crucible and the resistance heater. Device for evaporating substances.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3089788A JPH01208452A (en) | 1988-02-15 | 1988-02-15 | Method and apparatus for evaporating sublimable substance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3089788A JPH01208452A (en) | 1988-02-15 | 1988-02-15 | Method and apparatus for evaporating sublimable substance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01208452A true JPH01208452A (en) | 1989-08-22 |
Family
ID=12316524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3089788A Pending JPH01208452A (en) | 1988-02-15 | 1988-02-15 | Method and apparatus for evaporating sublimable substance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01208452A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011256427A (en) * | 2010-06-09 | 2011-12-22 | Hitachi Zosen Corp | Method for evaporating/sublimating evaporation material in vacuum deposition apparatus and crucible device for vacuum deposition |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6147066B2 (en) * | 1978-11-02 | 1986-10-17 | Supechiaru* Konsuto* Enerugohimashi |
-
1988
- 1988-02-15 JP JP3089788A patent/JPH01208452A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6147066B2 (en) * | 1978-11-02 | 1986-10-17 | Supechiaru* Konsuto* Enerugohimashi |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011256427A (en) * | 2010-06-09 | 2011-12-22 | Hitachi Zosen Corp | Method for evaporating/sublimating evaporation material in vacuum deposition apparatus and crucible device for vacuum deposition |
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